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61. 发明申请

WO2006009852A2 OPTICAL ELEMENTS WITH PROTECTIVE UNDERCOATING 审中-公开
标题翻译：具有防护底涂层的光学元件
公开(公告)号：WO2006009852A2
公开(公告)日：2006-01-26
申请号：PCT/US2005021475
申请日：2005-06-17
申请人： CYMER INC , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ZHANG KEVIN WEIMAN
发明人： PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ZHANG KEVIN WEIMAN
IPC分类号： B05D5/06 , B32B9/00 , G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/11 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23 , H05G2/00
CPC分类号： B82Y10/00 , G02B1/105 , G02B1/14 , G02B5/0891 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/0346 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/1022 , H01S3/1024 , H01S3/104 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H05G2/003
摘要： An apparatus and method are disclosed for an optical element which may comprise a main optical body comprising a crystal containing halogen atoms; a reflectivity coating for changing the reflectivity of a surface of the main body; and, an intermediate protective layer comprising a material containing free halogen atoms. The crystal may comprise an alkaline earth metal and may comprise fluorine atoms, e.g., calcium fluoride or magnesium fluoride. The intermediate protective layer may comprises a material containing free fluorine atoms, e.g., a material doped with fluorine atoms, e.g., doped fused silica. The intermediate layer comprises an amorphous portion and a polycrystalline portion. The optical element may also comprise a main optical element body; a reflectivity coating comprising a metal halide on an exterior the a surface of the main optical body; and a thin layer of protective outer coating on the reflectivity coating comprising a dense non-porous material thin enough to be transparent to the light of a selected short wavelength. The reflectivity coating may comprise a plurality of layers with at least one layer comprising a metal fluoride and the protective outer coating may comprise a layer of silicon oxyfluoride.
摘要翻译：公开了一种用于光学元件的装置和方法，该光学元件可以包括包含含有卤素原子的晶体的主光学体; 用于改变主体表面的反射率的反射涂层; 以及包含含有游离卤素原子的材料的中间保护层。晶体可以包含碱土金属并且可以包含氟原子，例如氟化钙或氟化镁。中间保护层可以包含含有游离氟原子的材料，例如掺杂有氟原子的材料，例如掺杂的熔凝硅石。中间层包含无定形部分和多晶部分。光学元件还可以包括主光学元件主体; 在主光学体的表面的外部包括金属卤化物的反射涂层; 以及在反射率涂层上的薄层保护性外涂层，其包含足够薄的致密无孔材料以对选定的短波长的光是透明的。反射率涂层可以包括多个层，其中至少一个层包含金属氟化物并且保护性外部涂层可以包含一层氟氧化硅。

62. 发明申请

WO2005046011A3 RELAX GAS DISCHARGE LASER LITHOGRAPHY LIGHT SOURCE 审中-公开
标题翻译：放电气体放电激光光刻光源
公开(公告)号：WO2005046011A3
公开(公告)日：2005-12-22
申请号：PCT/US2004035671
申请日：2004-10-27
申请人： CYMER INC , SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ERSHOV ALEXANDER I , RAFAC ROBERT J , RYLOV GERMAN E
发明人： SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ERSHOV ALEXANDER I , RAFAC ROBERT J , RYLOV GERMAN E
IPC分类号： B23K26/06 , B23K26/40 , G01J1/42 , G01J9/02 , G02B26/00 , G02B26/08 , G03F7/20 , H01S20060101 , H01S3/00 , H01S3/1055 , H01S3/22 , H01S3/225
CPC分类号： G01J1/429 , B23K26/0622 , B23K2201/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
摘要翻译：公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在分散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置脉冲光束在可变折射光学元件上。可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。脉冲参数测量和脉冲调制控制的其他方面包括响应于来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

63. 发明申请

WO2005054949A3 LASER THIN FILM POLY-SILICON ANNEALING SYSTEM 审中-公开
标题翻译：激光薄膜多晶硅退火系统
公开(公告)号：WO2005054949A3
公开(公告)日：2005-12-15
申请号：PCT/US2004037617
申请日：2004-11-12
申请人： CYMER INC , PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
发明人： PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
IPC分类号： B23K26/06 , G03F20060101 , H01L21/20 , H01S3/081 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译：公开了一种气体放电激光结晶装置和方法，用于在工件上进行膜内晶体结构或取向的变换，其可包括主振荡器功率放大器MOPA或功率振荡器功率放大器配置的XeF激光系统，产生激光输出光脉冲束以高重复率和高功率以及脉冲到脉冲剂量控制; 光学系统从激光输出光脉冲束产生细长的薄脉冲工作光束。该设备可以进一步包括激光系统被配置为POPA激光系统并且还包括：中继光学器件，用于将来自第一激光PO单元的第一输出激光脉冲光束引导到第二激光PA单元中; 以及定时和控制模块，用于在第一和第二激光单元中产生正或负3ns内的气体放电，以产生作为第一激光输出光脉冲束的放大的第二激光输出光脉冲束。该系统可以包括振荡器激光器单元中的发散控制。发散控制可以包括不稳定的谐振器布置。该系统还可以包括位于激光器和工件之间的光束指向控制机构以及位于激光器和工件之间的光束位置控制机构。波束参数测量可以提供对波束指向机构的主动反馈控制和对波束位置控制机构的主动反馈控制。

64. 发明申请

WO2005104313A2 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/007168
申请日：2005-03-03
申请人： CYMER, INC. , PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
发明人： PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光器UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网眼屏幕，其具有小于第一规格的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间中间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可以包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可以包括涡流控制袋。所述腔室可以包括预电离机构，其包括在所述预电离管内的细长开口内包含接地棒的前置离子槽，其可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，其可以包括多个金字塔结构，其包括不同数量的大体锥体元件，并且以不同数量的大体锥体元件组成并且沿纵向轴线并且横向于纵向轴线定向。通过将人工钳位器引入激光放电的定时，也可以通过在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲周期的时间来减小腔室内的声共振。

65. 发明申请

WO2005054949A2 LASER THIN FILM POLY-SILICON ANNEALING SYSTEM 审中-公开
标题翻译：激光薄膜聚硅氧烷退火系统
公开(公告)号：WO2005054949A2
公开(公告)日：2005-06-16
申请号：PCT/US2004/037617
申请日：2004-11-12
申请人： CYMER, INC. , PARTLO, William, N. , DAS, Palash, P. , HUDYMA, Russell , THOMAS, Michael
发明人： PARTLO, William, N. , DAS, Palash, P. , HUDYMA, Russell , THOMAS, Michael
IPC分类号： G03F
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译：公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。该系统可以包括振荡器激光单元中的发散控制。发散控制可以包括不稳定的谐振器装置。该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。

66. 发明申请

WO2003078940A3 HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE 审中-公开
公开(公告)号：WO2003078940A3
公开(公告)日：2003-09-25
申请号：PCT/US2003/002052
申请日：2003-01-15
申请人： CYMER, INC. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , SMITH, Scott, T. , BROWN, Daniel, J., W.
发明人： SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , SMITH, Scott, T. , BROWN, Daniel, J., W.
IPC分类号： G01J3/18
摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser (D) illuminates an etalon (ET). A portion of its light exiting the etalon (ET) is collected and directed into a slit (S1) positioned at a fringe pattern of the etalon (ET). Light passing through the slit (S1) is collimated and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon (ET) and the grating (GR1) are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array (PDA) and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array (PDA). Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer (50), and the etalon (ET) can be scanned.

67. 发明申请

WO2002093702A1 GAS DISCHARGE LASER WITH IMPROVED BEAM PATH 审中-公开
标题翻译：具有改进光束路径的气体放电激光
公开(公告)号：WO2002093702A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012200
申请日：2002-04-17
申请人： CYMER, INC. , PARTLO, William, N. , SANDSTROM, Richard, L. , GLATZEL, Holger, K. , CYBULSKI, Ray, F. , NEWMAN, Peter, C. , HOWEY, James, K. , HULBURD, William , MELCHIOR, John, T. , IVASCHENKO, Alex, P.
发明人： PARTLO, William, N. , SANDSTROM, Richard, L. , GLATZEL, Holger, K. , CYBULSKI, Ray, F. , NEWMAN, Peter, C. , HOWEY, James, K. , HULBURD, William , MELCHIOR, John, T. , IVASCHENKO, Alex, P.
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element (70A) to minimize thermal distortions in the LNP (54). This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. A wavemeter (7) is provided with a special purge of a compartment exposed to the output laser beam.
摘要翻译：具有清除光束路径的准分子激光器，其能够以大约5mJ或更大的脉冲能量产生超过2000Hz的脉冲速率的高质量脉冲激光束。通过激光系统的整个清除的光束路径被密封以最小化光束路径的污染。优选实施例包括热去耦LNP孔元件（70A），以最小化LNP（54）中的热失真。该优选实施例是专门设计为用于集成电路光刻的光源的ArF准分子激光器。波导计（7）具有暴露于输出激光束的隔室的特殊吹扫。

68. 发明申请

WO2002093699A1 FOUR KHz GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：四吉兹气体放电激光系统
公开(公告)号：WO2002093699A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012062
申请日：2002-04-15
申请人： CYMER, INC. , WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
发明人： WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
IPC分类号： H01S3/10
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter (4K) with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror, which is in a line narrowing module (15K) and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors (16K and 17K) drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长计（4K）监视输出光束参数，并控制一个非常快的PZT驱动调光镜，它在一个线路变窄模块（15K）和脉冲功率充电电压，以保持波长和脉冲能量达到所需的极限。在优选实施例中，两个风扇马达（16K和17K）驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

69. 发明申请

WO0111733A9 HIGH PULSE RATE PULSE POWER SYSTEM WITH FAST RISE TIME AND LOW LEAKAGE CURRENT 审中-公开
标题翻译：具有快速上升时间和低漏电流的高脉冲速率脉冲电源系统
公开(公告)号：WO0111733A9
公开(公告)日：2002-09-06
申请号：PCT/US0020266
申请日：2000-07-25
申请人： CYMER INC , PARTLO WILLIAM N , NESS RICHARD M , ROTHWEIL DANIEL A , MELCHER PAUL C , SMITH BRETT D , BIRX DEBORAH L EM
发明人： PARTLO WILLIAM N , BIRX DANIEL L DI , NESS RICHARD M , ROTHWEIL DANIEL A , MELCHER PAUL C , SMITH BRETT D
IPC分类号： G03F7/20 , H01S3/097 , H01S3/225 , H02M3/00 , H02M9/04 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (50) including a charging capacitor (42), a solid state switch (46) and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer (56) increases peak voltage to at least 12,000 volts. A very fast regulated power supply (20) is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源（20）。源极（20）包括包括充电电容器（42），固态开关（46）和限流电感器的脉冲发生电路（50）。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器（56）将峰值电压增加到至少12000伏特。提供了一种非常快速的调节电源（20），用于在小于400微秒内为充电电容器（42）充电，以及包括编程处理器（102）的脉冲控制系统，其将充电电容器（42）的充电控制到不到百分之一，每秒至少要2000次。

70. 发明申请

WO2012050685A1 METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 审中-公开
标题翻译：在EUV非输出期间的LPP驱动激光输出的方法
公开(公告)号：WO2012050685A1
公开(公告)日：2012-04-19
申请号：PCT/US2011/050565
申请日：2011-09-06
申请人： CYMER, INC. , PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
发明人： PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed, herein which may comprise a droplet generator producing droplets of target material; a sensor providing an. intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the. intercept time signal; a. laser source responsive to a trigger signal to produce a laser pulse-; and a system controlling said delay circuit to provide a. trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light -pulse which is not focused on a droplet.
摘要翻译：本文公开了一种装置，其可以包括产生目标材料的液滴的液滴发生器; 传感器提供。当液滴到达预选位置时截获时间信号; 与所述传感器耦合的延迟电路，所述延迟电路产生从所述传感器延迟的触发信号。拦截时间信号; 一个。激光源响应于触发信号以产生激光脉冲; 以及控制所述延迟电路以提供a的系统。触发信号从截取时间延迟第一延迟时间，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

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