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51. 发明申请

US20140191108A1 ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：对准系统和极端超紫外光发生系统
公开(公告)号：US20140191108A1
公开(公告)日：2014-07-10
申请号：US14238405
申请日：2012-09-05
申请人： Masato Moriya , Osamu Wakabayashi
发明人： Masato Moriya , Osamu Wakabayashi
IPC分类号： H01S3/101 , H05G2/00
CPC分类号： H01S3/101 , H01S3/005 , H01S3/0078 , H01S3/2391 , H05G2/008
摘要： An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.
摘要翻译：用于激光装置的对准系统包括：输出导向激光束的导向激光装置，调整引导激光束的行进方向的调节机构和来自激光装置的激光束;光束组合器，控制激光束的行进方向; 所述引导激光束彼此基本一致，从所述光束组合器提供的检测所述激光和引导激光束的第一光学检测单元，基于第一光学检测单元检测结果控制所述调节机构的第一控制器，控制光束路径组合器的下游，控制激光束和引导激光束的行进方向，第二光学检测单元，在检测引导激光束的光束转向单元的下游;以及第二控制器，其基于第二光学检测器控制光束转向单元单位检测结果。

52. 发明授权

US08592787B2 Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device 有权
标题翻译：极紫外镜，极紫外镜的制造方法，以及远紫外光源装置
公开(公告)号：US08592787B2
公开(公告)日：2013-11-26
申请号：US13437678
申请日：2012-04-02
申请人： Masato Moriya , Osamu Wakabayashi , Georg Soumagne
发明人： Masato Moriya , Osamu Wakabayashi , Georg Soumagne
IPC分类号： G21K5/04
CPC分类号： G02B5/1838 , G02B5/0891 , G02B5/1857 , G03F7/70575 , G21K1/065 , G21K2201/064
摘要： An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.
摘要翻译： EUV光源被配置为产生用于曝光装置的EUV光。所述EUV光源包括室，被配置为将靶供给到所述室中的目标供给装置，用于将来自驱动器激光器的激光引入所述室并且用所述激光照射所述靶的光学系统，以将所述靶转换成等离子体哪个EUV光被发射，并且在室中的EUV收集器反射镜。 EUV收集器反射镜可以包括具有凹槽的多层反射表面并且将来自等离子体的EUV光收集到焦点。凹槽可以以同心的方式布置，并且被配置为至少衍射与来自驱动器激光器的激光的波长相同的光。

53. 发明授权

US08395133B2 Apparatus and method of adjusting a laser light source for an EUV source device 有权
标题翻译：调整EUV源装置的激光光源的装置和方法
公开(公告)号：US08395133B2
公开(公告)日：2013-03-12
申请号：US12560864
申请日：2009-09-16
申请人： Masato Moriya , Hideo Hoshino , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Masato Moriya , Hideo Hoshino , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21K5/00
CPC分类号： H01S3/10 , H01S3/005 , H01S3/0064 , H01S3/034 , H01S3/1061 , H01S3/1307 , H01S3/136 , H01S3/2232 , H01S3/2316 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.
摘要翻译： EUV光源装置适当地补偿由热量改变的激光束的波前。在放大激光束的放大系统中提供波前补偿器和传感器。传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

54. 发明申请

US20130048886A1 CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS 有权
标题翻译：室外装置和极端超紫外线（EUV）发光装置，包括室外装置
公开(公告)号：US20130048886A1
公开(公告)日：2013-02-28
申请号：US13696517
申请日：2011-12-13
申请人： Masato Moriya , Osamu Wakabayashi
发明人： Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B5/10 , G21K5/04 , G02B7/182
CPC分类号： G03F7/708 , G03F7/70008 , G03F7/70808 , G03F7/70833
摘要： A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.
摘要翻译：与激光装置一起使用的室装置可以包括室，扩束光学系统和聚焦光学系统。该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。扩束光学系统被配置为直径地扩大激光束。聚焦光学系统被配置为聚焦已经扩大直径的激光束。

55. 发明授权

US08198613B2 Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device 有权
标题翻译：极紫外镜，极紫外镜的制造方法，以及远紫外光源装置
公开(公告)号：US08198613B2
公开(公告)日：2012-06-12
申请号：US12469140
申请日：2009-05-20
申请人： Masato Moriya , Osamu Wakabayashi , Georg Soumagne
发明人： Masato Moriya , Osamu Wakabayashi , Georg Soumagne
IPC分类号： G21K5/04 , G21K1/06
CPC分类号： G02B5/1838 , G02B5/0891 , G02B5/1857 , G03F7/70575 , G21K1/065 , G21K2201/064
摘要： The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.
摘要翻译： EUV光源装置除去其发射的光之外的EUV辐射以外的辐射，并且仅将EUV辐射提供给曝光装置。在EUV收集镜的前表面上设置由多个Mo / Si对层构成的复合层，在该复合层中形成闪耀槽。从等离子体发射的辐射入射到该EUV收集镜上，并被反射或衍射。反射的EUV辐射（包括衍射的EUV）进行到中间焦点IF。由于其反射角或衍射角不同，其他波长的辐射进入除了该焦点IF之外的某个位置。具有开口部分的SPF屏蔽设置在焦点IF处。因此，只有EUV辐射通过开口部分并被提供给曝光装置，而另一辐射被屏蔽件遮挡。

56. 发明授权

US07923705B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07923705B2
公开(公告)日：2011-04-12
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： G21G4/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

57. 发明申请

US20100078580A1 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置及用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US20100078580A1
公开(公告)日：2010-04-01
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02 , G21K1/00
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

58. 发明申请

US20100078577A1 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method of adjusting laser light source device for extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置以及用于极紫外光源装置调整激光光源装置的方法
公开(公告)号：US20100078577A1
公开(公告)日：2010-04-01
申请号：US12560864
申请日：2009-09-16
申请人： Masato Moriya , Hideo Hoshino , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Masato Moriya , Hideo Hoshino , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21K5/00 , H01S3/10
CPC分类号： H01S3/10 , H01S3/005 , H01S3/0064 , H01S3/034 , H01S3/1061 , H01S3/1307 , H01S3/136 , H01S3/2232 , H01S3/2316 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.
摘要翻译： EUV光源装置适当地补偿由热量改变的激光束的波前。在放大激光束的放大系统中提供波前补偿器和传感器。传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

59. 发明申请

US20100025231A1 Method for cleaning optical element of EUV light source device and optical element cleaning device 有权
标题翻译：用于清洁EUV光源装置和光学元件清洁装置的光学元件的方法
公开(公告)号：US20100025231A1
公开(公告)日：2010-02-04
申请号：US12148969
申请日：2008-04-24
申请人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
发明人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
IPC分类号： C23C14/34 , B08B7/00
CPC分类号： H05G2/001 , G03F7/70033 , H05G2/005
摘要： A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.
摘要翻译：一种用于清除极紫外光源装置的光学元件的方法，用于从腔室中的光学元件除去通过室中的靶的激光束激发而形成的等离子体与极紫外光一起产生的散射物质，包括：通过使用固体锡作为目标并使用CO 2激光器作为固体锡的激发源，使由等离子体产生的散射物质不大于纳米尺寸; 并且对不大于粘附到光学元件的纳米尺度的散射物质赋予克服散射物质的粘附的效果。

60. 发明申请

US20090301517A1 METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR 有权
标题翻译： EUV光发生器清洗收集器镜的方法和装置
公开(公告)号：US20090301517A1
公开(公告)日：2009-12-10
申请号：US12478083
申请日：2009-06-04
申请人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
发明人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
IPC分类号： B08B7/00
CPC分类号： B08B7/00 , B08B7/0035 , B08B13/00
摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
摘要翻译：一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置处的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置到聚光位置。

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