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51. 发明专利

JPH10175733A WAFER CARRIER MECHANISM 失效
公开(公告)号：JPH10175733A
公开(公告)日：1998-06-30
申请号：JP33794996
申请日：1996-12-18
申请人： HITACHI LTD
发明人： KANETOMO MASABUMI , YAMAMOTO TATSUHARU , HARADA KUNIO , MATSUMURA YASUHIDE , KASHIMA HIDEO , SUGAYA MASAKAZU
IPC分类号： B65G49/07
摘要： PROBLEM TO BE SOLVED: To confirm presence or absence of a wafer and confirm also the location by detecting weight when the wafer is mounted on a holder. SOLUTION: Before a wafer 1 is mounted on a holder 22, a plate spring 23 is mounted on the holder 22 and a distortion guage 24 is stuck to this plate spring 23. The tip of the plate spring 23 is made to have a structure that the tip slightly springs out from the upper surface of the holder 22. If the wafer 1 is placed on the holder 22, the lower surface of the wafer 1 and the plate spring 23 come into contact with each other. If the plate spring 23 is made to have a dimension to sufficiently perform deformation by weight of the wafer 1, distortion amount due to the deformation can be detected by a distortion gauge 24. Thus, presence or absence of the wafer 1 on a wafer carrier mechanism can be confirmed and also a prescribed location of the wafer can be confirmed.

52. 发明专利

JPH10156781A WAFER HANDLING DEVICE 失效
公开(公告)号：JPH10156781A
公开(公告)日：1998-06-16
申请号：JP31756296
申请日：1996-11-28
申请人： HITACHI LTD
发明人： YAMAMOTO TATSUHARU , KANETOMO MASABUMI , MATSUMURA YASUHIDE , HARADA KUNIO , SUGAYA MASAKAZU , KASHIMA HIDEO , KURODA KATSUHIRO
IPC分类号： B25J15/06
摘要： PROBLEM TO BE SOLVED: To enable a wafer to be handled from the direction of a processed surface and eliminate the influence of he curve of the wafer during electrostatic attraction. SOLUTION: When a silicon wafer 3 is electrostatically attracted by an inner electrode 1 with an outer electrode 2 in contact with the outer periphery of the silicon wafer 3, an electrode correcting actuator 6 is operated to deform the inner electrode 1 into the same shape as the silicon wafer 3 curved by the electrostatic attraction. Thereby a gap between the inner electrode 1 and the silicon wafer 3 can be held constant throughout their surfaces, so that the silicon wafer 3 can be handled from the direction of its processed surface, a mechanism for transferring it onto a stage is not required, and dust can be removed.

53. 发明专利

JPH04162622A MANUFACTURE OF SEMICONDUCTOR DEVICE; PLASMA TREATMENT APPARATUS 失效
公开(公告)号：JPH04162622A
公开(公告)日：1992-06-08
申请号：JP28700490
申请日：1990-10-26
申请人： HITACHI LTD
发明人： MIYAZAKI HIROSHI , HONMA YOSHIO , MATSUMURA YASUHIDE , HARADA KUNIO , KANETOMO MASABUMI , SUZUKI ISAO
IPC分类号： H01L21/302 , H01L21/3065 , H01L21/3205 , H01L21/3213
摘要： PURPOSE:To restrain the temperature of a substrate from being raised and to keep the temperature of the substrate definite during an etching operation by a method wherein a plasma treatment apparatus is used, the surface of the substrate is heated to a temperature which is equal to or higher than that of an electrode, a high frequency is applied to the electrode and the substrate is treated. CONSTITUTION:An oxide film 3, a copper film 4 and a mask 5 which is composed of an oxide film on which a pattern has been transcribed are formed on the surface of a silicon wafer 2. A polyimide film 6 is formed on the rear of the silicon wafer 2. A substrate 1 is placed inside an apparatus. The heating air from a heater 16 for gas heating use is supplied to a heating-gas passage 13 inside an electrode 12; the temperature of an electrode surface plate 11 is kept. Silicon tetrachloride as a reaction gas is supplied to the inside of an etching chamber 10 which has been evacuated to produce a vacuum; the pressure of the etching chamber is adjusted. Electric power is supplied to an infrared lamp 28 from an infrared-lamp power supply 27; the substrate 1 is heated. When the substrate 1 reaches a prescribed temperature, the output of the power supply 27 becomes zero by a signal from a temperature indicator 23; electric power is supplied to the electrode 12 from a high-frequency power supply 26.

54. 发明专利

JPH01241504A ASSEMBLING METHOD FOR COMPOSITE OPTICAL DEVICE 失效
公开(公告)号：JPH01241504A
公开(公告)日：1989-09-26
申请号：JP6737188
申请日：1988-03-23
申请人： HITACHI LTD
发明人： KATO TAKESHI , KUBOTA SHIGEO , YAMAGUCHI SUMIO , TAJIMA TAKESHI , HARADA KUNIO , MATSUMURA YASUHIDE , MIZUISHI KENICHI , CHIBA KATSUAKI , MORIZAKI HIROSHI
IPC分类号： G02B6/42 , G02B6/12 , G02F1/313 , H01S5/00
摘要： PURPOSE:To perform high-accuracy positioning and fixation between plural optical elements through easy operation by positioning the optical elements relatively while changing the positions of the optical elements individually, and fixing the optical elements to a base body. CONSTITUTION:An optical element 501 is fitted to a supporting body 503 and the optical element 500 and supporting body 503 are held individually by mechanisms 506 and 507. The mechanisms 506 and 507 position the optical elements 500 and 501 relatively while operated individually by a fine moving devices, and adhesives 504 and 505 are caked while the relative position relation is maintained, thereby fixing the optical element 500 and supporting body 503 to a base body 502. Therefore, even if the adhesive layers 504 and 505 vary in volume or even if there is a position change generated between the mechanisms 506 and 507 and base body 502, the relative position relation between the optical elements 500 and 501 is held by the mechanisms 506 and 507. Consequently, the high-accuracy positioning and fixation between the optical elements 500 and 501 are enabled.

55. 发明专利

JPS6258528B2 失效
公开(公告)号：JPS6258528B2
公开(公告)日：1987-12-07
申请号：JP19679881
申请日：1981-12-09
申请人： HITACHI LTD
发明人： KANAI NORIO , NAGATOMO KATSUAKI , SHIBATA FUMIO , HARADA KUNIO
IPC分类号： F16K51/02 , C30B25/14 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31

56. 发明专利

JPS59198352A Ultrasonic microscope 失效
标题翻译：超声波显微镜
公开(公告)号：JPS59198352A
公开(公告)日：1984-11-10
申请号：JP7289783
申请日：1983-04-27
申请人： Hitachi Ltd
发明人： HARADA KUNIO , YAMAGUCHI SUMIO , KANDA HIROSHI , ISHIKAWA KIYOSHI , OOJI YUZURU
IPC分类号： G01N29/28 , G01H3/12 , G01N29/06 , G10K11/02
CPC分类号： G10K11/02 , G01H3/125
摘要： PURPOSE: To make it possible to efficiently perform the holding, the supply and the discharge of a medium, by providing a ring around which a lens is arranged is provided while holding a liquid coming to a sonic wave propagation substance between the ring and a specimen by a capillary action.
CONSTITUTION: A ring 11 has a dimensional structure capable of obtaining slight gap 10' even between the ring 11 and a specimen 5 and water is penetrated into the gap 10 between a spherical surface lens 2 and the ring 11 and the gap 10' between the ring 11 and the specimen 5 by a capillary phenomenon to be stably held in both gaps. In order to automatically supply and discharge water, for example, when water is supplied, the solenoid valve 16 arranged between a tank 14 and a supply port 12 is opened whereupon the pressure in the tank 14 and the capillary action are acted in good efficiency and only a proper amount of water can be easily supplied.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：为了有效地进行保持，通过设置设置有透镜的环的介质的供给和放电，同时保持在声环与样本之间的声波传播物质的液体通过毛细作用。构成：环11具有能够在环11和样品5之间获得轻微的间隙10'的尺寸结构，并且水渗透到球面透镜2与环11之间的间隙10中，环11和样品5通过毛细管现象稳定地保持在两个间隙中。为了自动供水和排水，例如当供水时，布置在罐14和供应口12之间的电磁阀16打开，因此箱14中的压力和毛细管作用效率高，只能提供适量的水。

57. 发明专利

JPS5229569A REVOLVING DEVICE 失效
公开(公告)号：JPS5229569A
公开(公告)日：1977-03-05
申请号：JP10401475
申请日：1975-08-29
申请人： HITACHI LTD
发明人： KANAI KENYUU , HARADA KUNIO
IPC分类号： F16H19/02 , F16F1/10 , F16H33/02
摘要： PURPOSE:Revolving device in which linearity is excellent in linear motion, lubricant parts are few, maintenance can be easy, structure is simple and manufacturing is easy.

58. 发明专利

JP2000357484A ELECTRON BEAM DRAWING DEVICE 失效
公开(公告)号：JP2000357484A
公开(公告)日：2000-12-26
申请号：JP16570199
申请日：1999-06-11
申请人： HITACHI LTD
发明人： KATO SHINICHI , HARADA KUNIO , KONUKI KATSUNORI
IPC分类号： H01J37/09 , G03F7/20 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a high-precision, high-throughput electron beam drawing device by preheating a beam restriction at a specified temp. and enhancing the throughput and the rate of operation. SOLUTION: A restriction replacing chamber 16 is furnished with a heat source 21 for heating a beam restriction and a sensor 26a to measure the temp. of the restriction 15, and the restriction is preheated to a temp. equal to or around the saturation temp. of the restriction 15 at the time of being irradiated with electron beam using a control means 22 and is transported into a body part 20. This allows reducing the amount of thermal expansion of the 15 caused by irradiation with electron beam 6 at the time of replacing the restriction 15, and a resultant electron beam drawing device has a reduced dislocation of the opening of the restriction 15.

59. 发明专利

JP2000241669A OPTICAL MODULE, CONNECTOR, AND OPTICAL COMMUNICATION DEVICE 失效
公开(公告)号：JP2000241669A
公开(公告)日：2000-09-08
申请号：JP4104799
申请日：1999-02-19
申请人： HITACHI LTD
发明人： TATENO KIMIO , HARADA KUNIO , KANETOMO MASABUMI , YOSHIDA KOJI , ANAKURA MASATO , FUKUDA KAZUYUKI , SHIMAOKA MAKOTO
IPC分类号： G02B6/38 , G02B6/42 , H01S5/00 , H01S5/022
摘要： PROBLEM TO BE SOLVED: To provide a structure that does not necessarily require a special jig for attaching/detaching an optical connector, by providing fins having recess and projection on both sides or one side of the optical connector, and constituting it so as to connect with the recess and projection formed on a connecting portion of an optical module body. SOLUTION: A connector portion 200 comprises a fiber 201, a ferrule 202, a split sleeve 203, a press-in bush 204, a spring 205, and a easing 206, and both sides of the easing 206 are mounted with a fin 207 and a projection 208. In a mounting state, the ferrule 202 on the connector side and a ferrule of a module body are both inserted into the split sleeve 203, and respective end surfaces abut to each other. The ferrule 202 is pressed onto the counterpart ferrule by the spring 205 via the bush 204, and physically brought into contact with each other. During attaching/detaching, the fin 207 is grabbed by fingers or an automatic machine, and pulled out along the split sleeve 203.

60. 发明专利

JP2000162476A MODULE FOR OPTICAL COMMUNICATION 失效
公开(公告)号：JP2000162476A
公开(公告)日：2000-06-16
申请号：JP33526198
申请日：1998-11-26
申请人： HITACHI LTD
发明人： HARADA KUNIO , TATENO KIMIO , KANETOMO MASABUMI
IPC分类号： G02B6/24 , G02B6/42
摘要： PROBLEM TO BE SOLVED: To facilitate connection between an optical fiber led out from a ferrule and an optical element and to firmly fix the ferrule to a main body by arranging a recess widening a flexible range of an optical fiber in a part for leading out the optical fiber in the ferrule. SOLUTION: A ferrule 5 is provided with a recess 9 or a recess 9' widening a flexible range of an optical fiber 6 arranged in a part, from which the optical fiber is led out, so that the optical fiber 6 can be greatly flexed. That is, a recess part structure having an opening diameter slightly smaller than the outside diameter of the ferrule 5 is formed into a conical space part whose diameter is gradually reduced toward the center of the ferrule 5. The recess part is formed into a cylindrical space part having an opening diameter slightly smaller than the outside diameter of the ferrule 5.

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