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1. 发明专利

GB2140249A ACOUSTIC MICROSCOPE 未知
公开(公告)号：GB2140249A
公开(公告)日：1984-11-21
申请号：GB8410533
申请日：1984-04-25
申请人： HITACHI LTD
发明人： HARADA KUNIO , YAMAGUCHI SUMIO , KANDA HIROSHI , ISHIKAWA ISAO , OHJI YUZURU
IPC分类号： G01N29/28 , G01H3/12 , G01N29/06 , G10K11/02 , B06B3/00
摘要： In an acoustic microscope wherein an acoustic wave is projected to a predetermined specimen by an acoustic lens, and a disturbed acoustic wave from the specimen is imaged; an acoustic microscope characterized in that the lens has a ring which is arranged around it, whereby a liquid to serve as an acoustic propagation medium is held between the ring and the specimen by capillarity.

2. 发明专利

CA1207470A APPARATUS FOR MOLECULAR BEAM EPITAXY 未知
公开(公告)号：CA1207470A
公开(公告)日：1986-07-08
申请号：CA455995
申请日：1984-06-06
申请人： HITACHI LTD
发明人： SATO KAZUO , YAMAGUCHI SUMIO , KATO SHIGEO , MATSUMURA YASUHIDE , MIZUMOTO MUNEO , OKUNO SUMIO , TAMURA NAOYUKI
IPC分类号： C30B23/02 , C30B35/00 , H01L21/203 , H01L21/68
摘要： : An apparatus for molecular beam epitaxy is constructed so that a substrate is introduced into a vacuum vessel with the substrate surface for epitaxial growth facing downwards. The substrate is conveyed to and transferred into vacuum chambers for performing processes necessary for the epitaxial growth while the substrate surface is maintained facing downwards and without directly touching the substrate surface. The result is less surface contamination and a higher rate of production of successful products.

3. 发明专利

GB2140249B ACOUSTIC MICROSCOPE 未知
公开(公告)号：GB2140249B
公开(公告)日：1987-02-25
申请号：GB8410533
申请日：1984-04-25
申请人： HITACHI LTD
发明人： HARADA KUNIO , YAMAGUCHI SUMIO , KANDA HIROSHI , ISHIKAWA ISAO , OHJI YUZURU
IPC分类号： G01N29/28 , G01H3/12 , G01N29/06 , G10K11/02 , B06B3/00
摘要： In an acoustic microscope wherein an acoustic wave is projected to a predetermined specimen by an acoustic lens, and a disturbed acoustic wave from the specimen is imaged; an acoustic microscope characterized in that the lens has a ring which is arranged around it, whereby a liquid to serve as an acoustic propagation medium is held between the ring and the specimen by capillarity.

4. 发明专利

DE3415618A1 未知
公开(公告)号：DE3415618A1
公开(公告)日：1984-10-31
申请号：DE3415618
申请日：1984-04-26
申请人： HITACHI LTD
发明人： HARADA KUNIO , YAMAGUCHI SUMIO , KANDA HIROSHI , ISHIKAWA ISAO , OHJI YUZURU
IPC分类号： G01N29/28 , G01H3/12 , G01N29/06 , G10K11/02 , G01N29/00 , G01B17/00
摘要： In an acoustic microscope wherein an acoustic wave is projected to a predetermined specimen by an acoustic lens, and a disturbed acoustic wave from the specimen is imaged; an acoustic microscope characterized in that the lens has a ring which is arranged around it, whereby a liquid to serve as an acoustic propagation medium is held between the ring and the specimen by capillarity.

5. 发明专利

DE3462375D1 AN APPARATUS FOR MOLECULAR BEAM EPITAXY 未知
公开(公告)号：DE3462375D1
公开(公告)日：1987-03-19
申请号：DE3462375
申请日：1984-05-29
申请人： HITACHI LTD
发明人： SATO KAZUO , YAMAGUCHI SUMIO , KATO SHIGEO , MATSUMURA YASUHIDE , MIZUMOTO MUNEO , OKUNO SUMIO , TAMURA NAOYUKI
IPC分类号： C30B23/02 , C30B35/00 , H01L21/203
摘要： An apparatus for molecular beam epitaxy according to the present invention is so constructed that a substrate is introduced into a vacuum vessel with a substrate surface for epitaxial growth facing in the direction of gravity, and that the substrate is conveyed to and transferred into vacuum chambers for performing processes necessary for the epitaxial growth, with the substrate surface maintained in the direction of gravity and without directly touching the substrate surface.

6. 发明专利

JP2002082094A METHOD FOR REMOVING COATING OF GLASS CAPILLARY AND GLASS CAPILLARY 失效
公开(公告)号：JP2002082094A
公开(公告)日：2002-03-22
申请号：JP2000269218
申请日：2000-09-05
申请人： HITACHI LTD
发明人： HARADA KUNIO , KAMAHORI MASAO , KANBARA HIDEKI , YAMAGUCHI SUMIO , TSUNEKAWA SUKEYOSHI
IPC分类号： C03C17/00 , C03C17/32 , G01N27/447
摘要： PROBLEM TO BE SOLVED: To safely manufacture a capillary of good quality used in an electrophoretic device at a low cost. SOLUTION: The resin coating of the capillary is changed to a gaseous substance by the oxidation reaction of the oxygen radical formed by decomposition of ozone, and removed.

7. 发明专利

JPH08222617A SURFACE TREATING APPARATUS 失效
公开(公告)号：JPH08222617A
公开(公告)日：1996-08-30
申请号：JP2638595
申请日：1995-02-15
申请人： HITACHI LTD
发明人： FUJITO TOSHIAKI , INADA AKIISA , YAMAGUCHI SUMIO , KAKO MASAO
IPC分类号： B65G49/07 , H01L21/677 , H01L21/68
摘要： PURPOSE: To realize an economic apparatus in which the regulation of a conveyor is simplified, reliability is enhanced, and the installation of a detecting mechanism is reduced to the minimum limit. CONSTITUTION: A plurality of cassette placing bases 2-1, 2-2 are installed. At the time of operating, one cassette placing base is moved to a specific position 4, and the movement of a containing cassette of a material to be treated by a conveyor 3 to a treating chamber is conducted between the containing cassette of the position 4 and the chamber to treat it. Further, a detecting mechanism 6 in the cassette is installed near the contained cassette of the position 4. Accordingly, even if a plurality of the bases for placing the cassettes are installed, since the conveyor and the conveying position of the material to be treated at the base are at the same positions, the regulating position of the conveyor and the conveying position to the base can be set to one to be easily regulated.

8. 发明专利

JPH0831721A ORGANIC-MATTER REMOVING DEVICE 失效
公开(公告)号：JPH0831721A
公开(公告)日：1996-02-02
申请号：JP16182294
申请日：1994-07-14
申请人： HITACHI LTD
发明人： TAJIRI KENICHI , YAMAGUCHI SUMIO , FUJITO TOSHIAKI
IPC分类号： G03F7/42 , H01L21/027 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To equalize the flow of a reaction gas, and to reduce the dispersion of a removal rate on an article to be treated by adjacently mounting a plurality of parting plates oppositely on the article to be treated for flowing the reaction gas on the top face of the article to be treated and properly adjusting and setting the clearances and inclinations of each parting plate and the article to be treated. CONSTITUTION:A parting plate is divided, and clearances as reaction-gas flow paths are formed by a wafer 2 and the parting plates 4. When the size of the wafer is scaled up, pressure at the central section of the wafer is increased, and the flow distribution of a reaction gas is not equalized. Consequently, clearances at the central section on the wafer are set at large values, and clearances in the periphery are set at small values. Accordingly, the flow distribution of the reaction gas can be improved. The dispersion of a removal rate in a wafer surface is reduced, thus realizing stable treatment.

9. 发明专利

JPH0568849B2 失效
公开(公告)号：JPH0568849B2
公开(公告)日：1993-09-29
申请号：JP22414483
申请日：1983-11-30
申请人： HITACHI LTD
发明人： MIZUMOTO MUNEO , KONDO YOSHIMASA , SHIRAKI YASUHIRO , OKUNO SUMIO , SATO KAZUO , YAMAGUCHI SUMIO , KURODA TAKARO , TAMURA NAOYUKI
IPC分类号： C30B23/08 , H01L21/203

10. 发明专利

JPH053152A ORGANIC MATTER REMOVING DEVICE 失效
公开(公告)号：JPH053152A
公开(公告)日：1993-01-08
申请号：JP14841591
申请日：1991-06-20
申请人： HITACHI LTD
发明人： YAMAGUCHI SUMIO , TAJIRI KENICHI
IPC分类号： G01N1/24 , G03F7/42 , H01L21/027 , H01L21/30 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To prevent an organic matter or the like being contained in gathered gas from adhering by condensation or reevaporating in a piping and to obtain a stable device capable of detecting the end point of an ashing removal treatment by a method wherein a produced gas gathering port is provided with gas combustion mechanism. CONSTITUTION:In an organic matter removing device provided with a means 12, in which an organic matter is subjected to ashing by ultraviolet rays, ozone and heat under the atmospherric pressure and produced gas is sampled and analized to detect the end point of an ashing removal treatment, a produced gas gathering port 6 is provided with a gas fuel mechanism 21. For example, a wafer 2 with a resist applied thereon is heated to 150 to 300 deg.C, the ozone introduced through a gas introducing port 5 is turned into active oxygen atoms by ultraviolet lamps 7 and the resist is dispersed into carbonic acid gas, water or the like. Gas which is exhausted in a treating chamber 1 is made to exhaust also through the port 6. The mechanism 21, which is directly connected to the port 6 and makes the organic matter or the like in the produced gas decompose by heating, is provided and moreover, the gas detecting means 12 is provided via a filter 11 and a gas flow rate adjusting mechanism 13.

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