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51. 发明专利

JPH10223955A DESIGN OF AERODYNAMIC CHAMBER FOR HIGH PULSE REPETITION RATE EXCIMER LASER 失效
公开(公告)号：JPH10223955A
公开(公告)日：1998-08-21
申请号：JP2958498
申请日：1998-02-12
申请人： CYMER INC
发明人： MORTON RICHARD G , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/097 , H01S3/036 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To increase the number of oscillations of an excimer laser by providing insulating members on both sides of a cathode and a pre-ionizer assembly by increasing the flow rate of a gas by reducing the disturbance of the gas flow in a discharging area. SOLUTION: A housing is constituted of a pair of half parts 102, etc., and a gas is enclosed in the housing. In the housing, in addition, a cathode 108 and an anode are arranged on both sides of a discharge area 112. On both sides of the cathode 108, pre-ionizers 130 and the insulators 307 of insulating members are arranged. When a voltage pulse is impressed upon the cathode 108, discharge occurs in the discharge area 112 and discharged as light to the outside through a window. While the gas in the housing is circulated by means of a fan 138, the gas is heated through the discharge area 113 and cooled through a water-cooled heat exchanger 154. Since the insulators 307 are arranged on both sides of the discharge area 112, the disturbance of the gas flow is reduced and the gas flow forms a smooth flow. Therefore, flow rate of the gas increases.

52. 发明专利

JP2012054580A System and method for euv light source measurement 有权
标题翻译：用于EUV光源测量的系统和方法
公开(公告)号：JP2012054580A
公开(公告)日：2012-03-15
申请号：JP2011228554
申请日：2011-10-18
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： FOMENKOV IGOR V , BOWERING NORBERT L , HOFFMAN JERZY R
IPC分类号： H01L21/027 , G01J1/02 , G01J1/42
CPC分类号： G03F7/7085 , B82Y10/00 , G21K2201/061
摘要： PROBLEM TO BE SOLVED: To provide a measurement apparatus for an extreme ultraviolet (EUV) light source.SOLUTION: A system and method for "EUV light source" measurement are provided. In a first mode, a system for measuring an EUV light source power output includes a photoelectron raw material arranged along an EUV path, and the material is caused to be exposed for generating photoelectron in a curtain amount. The system, further, may include a detector which detects the photoelectron for generating an output representing EUV power. In another mode, the system for measuring EUV light intensity includes a multilayer mirror, for example Mo/Si, which can be arranged along the EUV light path, and can cause the mirror to be exposed for generating an optical current at the mirror. A current monitor can be connected to the mirror to measure the optical current to generate an output representing the EUV power. Further, in other mode, an off-line EUV measurement system can include an instrument for measuring an optical characteristic as well as an MoSi/Si multilayer mirror.
摘要翻译：要解决的问题：提供一种用于极紫外（EUV）光源的测量装置。解决方案：提供了“EUV光源”测量的系统和方法。在第一模式中，用于测量EUV光源功率输出的系统包括沿着EUV路径布置的光电子原料，并且使该材料暴露以产生帘光量的光电子。该系统还可以包括检测器，其检测光电子以产生表示EUV功率的输出。在另一种模式中，用于测量EUV光强度的系统包括多层反射镜，例如可沿着EUV光路布置的Mo / Si，并且可以使反射镜暴露以在反射镜处产生光电流。可以将电流监视器连接到反射镜以测量光电流以产生表示EUV功率的输出。此外，在其他模式中，离线EUV测量系统可以包括用于测量光学特性的仪器以及MoSi 2 / SB / Si多层反射镜。版权所有（C）2012，JPO＆INPIT

53. 发明专利

JP2011181935A Collector for euv light source 有权
标题翻译： EUV光源收集器
公开(公告)号：JP2011181935A
公开(公告)日：2011-09-15
申请号：JP2011062167
申请日：2011-03-22
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： H01L21/027 , G02B5/10 , G03F7/20 , G21K1/06 , H01L21/304 , H05G2/00
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for removing debris from a reflecting surface of an EUV (Extreme ultraviolet) collector in an EUV light source. SOLUTION: A current source (DC voltage source) 220 may be connected to a collector mirror 150, a metallic backing material (aluminum or nickel) for the mirror 150. The mirror 150 may be heated to a temperature higher than the temperature of ambient gas (helium gas) filling the inside of a chamber 26. In another aspect of debris cleaning, introduction of RF from an antenna schematically shown by an RF frequency voltage 230 and 232 in the chamber 26 may be incorporated. The RF may be connected to the mirror 150 or the metallic backing material, and in this case, a dark shield made of an appropriate conductive material and connected to the earth potential may be formed by covering the back face of the collector mirror 150, and is separated from the mirror by an insulator (air gap) and a voltage (DC from the DC power source 220 connected to the mirror 150 as well). COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种在EUV光源中从EUV（极紫外）捕集器的反射表面去除碎屑的方法和装置。解决方案：电流源（DC电压源）220可以连接到收集器反射镜150，用于反射镜150的金属背衬材料（铝或镍）。反射镜150可以被加热到高于温度环境气体（氦气）填充在室26的内部。在碎片清洁的另一方面，可以并入从RF 26电压230和232中示意性地示出的天线引入RF。 RF可以连接到反射镜150或金属背衬材料，并且在这种情况下，可以通过覆盖收集镜150的背面形成由适当的导电材料制成并连接到地电位的暗屏蔽，通过绝缘体（气隙）和电压（也连接到反射镜150的直流电源220的DC）与反射镜分离。版权所有（C）2011，JPO＆INPIT

54. 发明专利

JP2011176358A Laser system 有权
标题翻译：激光系统
公开(公告)号：JP2011176358A
公开(公告)日：2011-09-08
申请号：JP2011106816
申请日：2011-05-12
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： ERSHOV ALEXANDER I , PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BERGSTEDT ROBERT A , SANDSTROM RICHARD L , LALOVIC IVAN
IPC分类号： H01S3/23 , H01S3/225
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To provide a high electric power gas discharge laser system for a DUV light source. SOLUTION: A method and apparatus may include a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may include a seed laser oscillator producing an output including a pulsed laser output light beam and which may include a first gas discharge excimer or a molecular fluorine laser chamber and a line narrowing module within a first oscillator cavity; and a laser amplification stage which contains an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output including a pulsed laser output light beam, and which may include a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为DUV光源提供高功率气体放电激光系统。解决方案：方法和装置可以包括线变窄的脉冲准分子或分子氟气体放电激光系统，其可以包括产生包括脉冲激光输出光束的输出的种子激光振荡器，并且可以包括第一气体放电准分子或分子氟激光室和第一振荡器腔内的线窄模块; 以及激光放大级，其在第二气体放电准分子或分子氟激光室中含有放大增益介质，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成包括脉冲激光输出的激光系统输出光束，并且其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质每循环至少两次。版权所有（C）2011，JPO＆INPIT

55. 发明专利

JP2007298980A Collector for euv light source 审中-公开
标题翻译： EUV光源收集器
公开(公告)号：JP2007298980A
公开(公告)日：2007-11-15
申请号：JP2007101959
申请日：2007-04-09
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： G02B5/10 , G02B5/00 , G03F7/20 , G21C11/00 , G21K1/06 , H01J1/50 , H01L21/027
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： PROBLEM TO BE SOLVED: To provide a method for removing debris from the reflecting surface of an EUV collector, in an EUV light source. SOLUTION: The method and a system comprise the reflecting surface containing a first material and the debris comprising a second material and/or compounds of the second material, and the system and method comprise a controlled sputtering ion source (containing a gas containing the atoms of the sputtering ion material); and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, with the ionized state being selected to have a distribution about a selected energy peak that has high probability of sputtering the second material and very low probability of sputtering the first material. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种在EUV光源中从EUV收集器的反射表面去除碎屑的方法。解决方案：该方法和系统包括含有第一材料的反射表面和包含第二材料和/或第二材料的化合物的碎屑，并且该系统和方法包括受控的溅射离子源（含有含有溅射离子材料的原子）; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，其中选择离子化状态以具有围绕第二材料溅射的可能性高的选定能量峰的分布，并且溅射第一材料的可能性非常低。版权所有（C）2008，JPO＆INPIT

56. 发明专利

JP2002043667A ELECTRIC DISCHARGE LASER WITH ACTIVE WAVELENGTH CHIRP CORRECTION 失效
公开(公告)号：JP2002043667A
公开(公告)日：2002-02-08
申请号：JP2001077200
申请日：2001-02-09
申请人： CYMER INC
发明人： SANDSTROM RICHARD L , DAS PALASH P , EVERAGE GEORGE J , ERIE FREDERICK G , PARTLO WILLIAM N , FOMENKOV IGOR V
IPC分类号： H01S3/139 , G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/097 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/136 , H01S3/22 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide an electric discharge laser, particularly, a laser having a device that corrects acoustic disturbance. SOLUTION: This application is provided with the electric discharge laser using active wavelength chirp correction and discloses techniques for moderating and dispensing these pressure waves. In some lasers, small predictable patterns remain and can be corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment, a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chip pattern. Embodiments include stepper motors having very fine adjustments so that the sizes of tuning steps may be reduced substantially for more accurate tuning.

57. 发明专利

JP2001168440A NARROW-BAND LASER HAVING FINE WAVELENGTH CONTROL 失效
公开(公告)号：JP2001168440A
公开(公告)日：2001-06-22
申请号：JP2000309919
申请日：2000-09-04
申请人： CYMER INC
发明人： ALGOTS JOHN M , MARCHI CHRISTOPHER A , ERIE FREDRICK G , JESSIE D BUCK , ERSHOV ALEXANDER I , DAS PALASH P , FOMENKOV IGOR V
IPC分类号： H01S3/225 , G02B5/18 , G03F7/20 , H01S3/03 , H01S3/08 , H01S3/081 , H01S3/086 , H01S3/10 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/136 , H01S3/139
摘要： PROBLEM TO BE SOLVED: To provide a laser, particularly laser with feedback control for beam quality. SOLUTION: Pulse energy is controlled by controlling discharge voltage, using feedback signals from a wavemeter. Wavelength is controlled by positioning an RMAX mirror in a line narrowing module. Bandwidth is controlled by adjusting the curvature of a diffraction grating in the line narrowing module. An optimal preferred embodiment here includes automatic feedback control of horizontal and vertical beam profiles by the automatic adjustment of a prism plate, on which beam expander prisms are located and automatic adjustment of an RMAX tilt. Another preferred embodiment includes automatic adjustment for the horizontal position of the laser chamber within the resonance cavity.

58. 发明专利

JP2001044549A LINE-NARROWED LASER WITH SPATIAL FILTER 失效
公开(公告)号：JP2001044549A
公开(公告)日：2001-02-16
申请号：JP2000177586
申请日：2000-05-10
申请人： CYMER INC
发明人： ERSHOV ALEXANDER I , FOMENKOV IGOR V
IPC分类号： H01S3/225 , G03F7/20 , H01S3/08 , H01S3/1055 , H01S3/106
摘要： PROBLEM TO BE SOLVED: To obtain a line-narrowed laser provided with a spatial filter for filtering light at wavelengths greater and/or smaller than the desired range of wavelengths. SOLUTION: A laser system is line narrowed with a line narrowing optical element, having a dispersive element which disperses laser light into wavelength- dependent directions. By spatially filtering a resulting beam 18, the bandwidth of the beam 18 can substantially be reduced. Although reduction of beam energy also occurs when the beam 18 is filtered spatially, the reduction is substantially less than some other known techniques for reducing the bandwidths. A preferred spatial filter 44 for reducing the bandwidth of a line-narrowed gas discharge laser includes two cylindrical mirrors separated by a distance equal to their focal lengths with a slit aperture 50 positioned at the common focal line.

59. 发明专利

JP2000004057A HIGHLY RELIABLE MODULAR NARROW BAND PRODUCTION QUALITY KrF EXCIMER LASER 失效
公开(公告)号：JP2000004057A
公开(公告)日：2000-01-07
申请号：JP10840499
申请日：1999-03-11
申请人： CYMER INC
发明人： KNOWLES DAVID S , AZZOLA JAMES H , BESAUCELE HERVE A , DAS PALASH P , ERSHOV ALEXANDER I , FOMENKOV IGOR V , JUHASZ TIBOR , OZARSKI ROBERT G , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L , UJAZDOWSKI RICHARD C , WATSON TOM A , NESS RICHARD M
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To attain a stabilized wavelength ensuring long term production operation and highly reliable product quality by including a more accurate wave meter and a laser computer controller of novel pulse energy control algorithm. SOLUTION: A preionization unit includes, as an integrated component, a brushing element incorporated with an antitracking groove. A part of acoustic energy is reflected and absorbed by arranging acoustic baffles on the opposite sides of a laser chamber and dropped into a lower region of the laser chamber separated from an electrode. Gas flow from a blower 10 is forced to flow between electrodes 6A, 6B by means of an anode supporting bar 44. A wave meter blocks an output beam from the laser chamber by means of a partial reflector which transmits about 95.5% of beam energy and reflects about 4.5% thereof. Detector output is fed to a computer controller using a specified algorithm for regulating the laser charge voltage.

60. 发明专利

JP2013214772A Laser output beam wavefront splitter for bandwidth spectrum control 审中-公开
标题翻译：激光输出波束分波器用于带宽频谱控制
公开(公告)号：JP2013214772A
公开(公告)日：2013-10-17
申请号：JP2013145759
申请日：2013-07-11
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： RICHARD L SANDSTROM , DANIEL J W BROWN , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/136 , G03F7/20 , H01S3/08 , H01S3/097 , H01S3/10 , H01S3/1055 , H01S3/13 , H01S3/139 , H01S3/22
CPC分类号： H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
摘要： PROBLEM TO BE SOLVED: To provide light sources for integrated circuit lithography illumination sources requiring spectrum processing within a pulse or from pulse to pulse within a burst.SOLUTION: An embodiment comprises: a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the corresponding pulse on a dispersive wavelength selection optic; and a tuning mechanism operative to select at least one angle of incidence of the laser light pulse beam containing the corresponding pulse on the dispersive center wavelength selection optic, the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each portion having one of at least two different selected center wavelengths.
摘要翻译：要解决的问题：为集成电路光刻照明源提供光源，其需要脉冲内的频谱处理或在脉冲内的脉冲或脉冲之间。解决方案：实施例包括：色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 以及调谐机构，用于选择在分散中心波长选择光学器件上包含相应脉冲的激光束的至少一个入射角，所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定入射角激光光脉冲的不同的空间分离但不是时间上分离的部分从分散中心波长选择光学器件返回包括多个空间上分离但不时间分离的部分的激光脉冲，每个部分具有至少两个不同的选定中心波长中的一个。

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