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51. 发明申请

US20130182941A1 APPEARANCE INSPECTION APPARATUS AND METHOD 有权
标题翻译：外观检查装置和方法
公开(公告)号：US20130182941A1
公开(公告)日：2013-07-18
申请号：US13733206
申请日：2013-01-03
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Yuichiro HIKIDA , Takeshi SARUWATARI
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/30148
摘要： An appearance inspection apparatus comprises an inspection part for detecting a defect of a pattern on the basis of an image of a surface of a substrate on which the pattern is formed, which is captured by an imaging part. The inspection part comprises an image transfer part for transferring image data which is obtained by imaging a region to be inspected on the substrate and stored in an image storing memory by the imaging part to a plurality of image processing memories and a plurality of GPUs for taking image data corresponding to respective regions to be processed out of transferred image data which are transferred to the image processing memories by the image transfer part and performing an inspection process for defect detection on the image data. The inspection part further comprises an image processing control part for acquiring inspection tasks each prescribing inspection details from an inspection task holding part and controlling the plurality of GPUs in accordance with the inspection tasks, respectively, independently of the image transfer by the image transfer part.
摘要翻译：外观检查装置包括检查部件，用于基于由成像部件捕获的形成有图案的基板的表面的图像来检测图案的缺陷。检查部分包括用于传送图像数据的图像传送部件，该图像数据是通过在基板上成像被检查的区域而被成像部分存储在图像存储器中而获得的图像数据到多个图像处理存储器和多个GPU 图像数据对应于要由图像传送部分传送到图像处理存储器的传送图像数据中要处理的各个区域，并且对图像数据进行缺陷检测的检查处理。检查部分还包括图像处理控制部分，用于从检查任务保持部分获取检查细节，并分别根据检查任务分别控制多个GPU，独立于图像传送部分的图像传送。

52. 发明申请

US20040261817A1 Foreign matter removing apparatus, substrate treating apparatus, and substrate treating method 审中-公开
标题翻译：异物去除装置，基板处理装置和基板处理方法
公开(公告)号：US20040261817A1
公开(公告)日：2004-12-30
申请号：US10873017
申请日：2004-06-21
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Hiroyuki Araki , Kazuo Nakajima , Kaoru Shimbara
IPC分类号： B08B003/00
CPC分类号： H01L21/67051
摘要： A foreign matter removing apparatus for removing foreign matter from a surface of a substrate. The apparatus is provided with: a substrate rotating mechanism which holds and rotates the substrate; and a fluid mixture supplying mechanism which generates a fluid mixture by mixing a treatment liquid and a gas, and supplies the fluid mixture onto the surface of the substrate held by the substrate rotating mechanism. The treatment liquid may be deionized water or a resist removing liquid. Examples of the foreign matter to be removed include a resist film formed on the substrate and a residue remaining on the surface of the substrate after ashing of the resist film.
摘要翻译：一种用于从基板的表面去除异物的异物去除装置。该装置设置有：保持并旋转基板的基板旋转机构; 以及流体混合物供给机构，其通过混合处理液体和气体而产生流体混合物，并将流体混合物供给到由基板旋转机构保持的基板的表面上。处理液体可以是去离子水或抗蚀剂去除液体。待除去的异物的实例包括形成在基板上的抗蚀剂膜和在抗蚀剂膜灰化之后剩余在基板表面上的残余物。

53. 发明申请

US20040240970A1 Method and apparatus for transferring an article to be processed and processing apparatus 有权
标题翻译：用于转移待处理物品的处理装置和方法
公开(公告)号：US20040240970A1
公开(公告)日：2004-12-02
申请号：US10801007
申请日：2004-03-16
申请人： Kabushiki Kaisha Kobe Seiko Sho , DAINIPPON SCREEN MFG. CO., LTD.
发明人： Shogo Saramaru , Hideshi Yamane , Katsumi Watanabe , Hiroyuki Ueno , Hideki Adachi , Eiji Fukatsu
IPC分类号： B65G001/00
CPC分类号： H01L21/67751 , H01L21/67126 , H01L21/68728 , H01L21/68735 , Y10S414/139
摘要： A transferring apparatus transfers an article to be processed, which is carried by a carrier device, to a holder provided in a processing chamber defined by a processing vessel and adapted to hold the article at a specified processing position. The transferring apparatus includes a temporarily holding member, and transfers the article from the intermediate position to the processing position after receiving the article carried by the carrier device at an intermediate position distanced from the holder and temporarily holding it. The temporarily holding member is retracted to a position in the outside of the processing vessel after the article is transferred.
摘要翻译：传送装置将由承载装置携带的待处理物品传送到设置在由处理容器限定的处理室中的保持器，并适于将物品保持在指定的处理位置。传送装置包括临时保持构件，并且在远离保持器的中间位置接收由托架装置承载的物品并暂时保持物品后，将物品从中间位置传送到处理位置。在传送物品之后，临时保持构件缩回到处理容器的外部的位置。

54. 发明申请

US20040226655A1 Substrate processing apparatus 审中-公开
标题翻译：基板加工装置
公开(公告)号：US20040226655A1
公开(公告)日：2004-11-18
申请号：US10811285
申请日：2004-03-26
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Itsuki Kajino , Takashi Kawamura , Kaori Asakino
IPC分类号： H01L021/8238
CPC分类号： H01L21/67051
摘要： A substrate processing apparatus is provided with a spin base for rotationally holding a substrate, an atmosphere cutoff plate for cutting off a top surface of the substrate from the outer atmosphere, a splash guard for receiving a processing solution spun off from the substrate or the like, a guard up-and-down moving mechanism for vertically moving the splash guard. In performing processing with a processing solution while rotating a substrate, the splash guard is disposed by the guard up-and-down moving mechanism so that the level of a top surface of the splash guard should not be higher than the level of a top surface of the atmosphere cutoff plate and it is thereby possible to prevent the atmosphere above the atmosphere cutoff plate from being involved in the recovery duct through rotation of the atmosphere cutoff plate. This makes it possible to provide a substrate processing apparatus capable of preventing redeposition of processing solution removed from a substrate by centrifugal forces onto the substrate.
摘要翻译：基板处理装置设置有用于旋转地保持基板的旋转基座，用于从外部空气切除基板的顶表面的气氛切断板，用于接收从基板等剥离的处理溶液的防溅罩一个用于垂直移动防溅罩的上下移动机构。在旋转基板的同时用处理溶液进行处理时，防溅罩由防护装置上下移动机构设置，使得防溅罩顶面的水平不应高于顶面的高度并且因此可以通过气氛切断板的旋转来防止气氛切断板上方的气氛参与回收管道。这使得可以提供一种基板处理装置，其能够防止通过离心力将从基板除去的处理溶液再沉积到基板上。

55. 发明申请

US20040226505A1 Treating solution supply nozzle, a substrate treating apparatus having this nozzle, and a method of manufacturing a treating solution supply nozzle 有权
标题翻译：处理溶液供给喷嘴，具有该喷嘴的基板处理装置以及处理液供给喷嘴的制造方法
公开(公告)号：US20040226505A1
公开(公告)日：2004-11-18
申请号：US10836146
申请日：2004-04-30
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Shigehiro Goto , Hiroshi Kobayashi
IPC分类号： B05D005/10 , B05C005/00
CPC分类号： H01L21/6715 , B05C11/08 , B05C11/1042
摘要： A resin block has a treating solution channel extending between and opening at front and back surfaces thereof Heat conductive members are face-bonded to the front and back surfaces of the resin block, respectively, for closing the channel. Consequently, no air is present between the resin block and heat conduction members, thereby improving the efficiency of heat exchange. A nozzle of simple construction is realized only by face-bonding the two heat conductive members to the open front and rear surfaces of the resin block. Temperature control plates hold the heat conductive members along with the resin block to effect a temperature control, whereby the temperature of a treating solution in the treating solution channel is controlled effectively through the heat conductive members. The treating solution adjusted to a desired temperature is delivered from a discharge opening to a substrate for performing substrate treatment with high accuracy.
摘要翻译：树脂块具有在其前表面和后表面之间延伸并处于开口的处理溶液通道。导热构件分别面对粘合到树脂块的前表面和后表面以封闭通道。因此，树脂块和导热构件之间不存在空气，从而提高热交换的效率。仅通过将两个导热构件面对粘合到树脂块的敞开的前表面和后表面上来实现简单结构的喷嘴。温度控制板与树脂块一起保持导热构件以进行温度控制，从而通过导热构件有效地控制处理溶液通道中的处理溶液的温度。调节到期望温度的处理溶液从排出口输送到基板，以高精度进行基板处理。

56. 发明申请

US20040201832A1 Pattern writing apparatus and pattern writing method 有权
标题翻译：图案书写装置和图案书写方法
公开(公告)号：US20040201832A1
公开(公告)日：2004-10-14
申请号：US10814429
申请日：2004-04-01
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Hiroyuki Shirota
IPC分类号： G03B027/54
CPC分类号： G03B27/54
摘要： A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. In the pattern writing apparatus, for pattern writing, an irradiation region group on a substrate, which corresponds to the micromirror group of the DMD, is scanned in a main scanning direction that is angled relative to the direction of arrangement of the irradiation region group. The irradiation region group is also intermittently moved in the sub-scanning direction by a distance shorter than the width of the irradiation region group in the sub-scanning direction, for pattern writing of the entire substrate. Thus, even with slight changes in an intermittent travel distance (A) of the irradiation region group, light is suitably applied to a region between strips (71, 72), whereby high-precision high-speed pattern writing is achieved.
摘要翻译：用于将图案写在感光材料上的图案写入装置包括设置有具有调制反射光的微镜组的DMD的头，保持基板的台，以及用于相对于彼此移动头部和台架的机构。在图案写入装置中，对于图案写入，对应于DMD的微镜组的基板上的照射区域组在相对于照射区域组的排列方向成角度的主扫描方向进行扫描。对于整个基板的图案写入，照射区域组也沿副扫描方向间歇地移动比副扫描方向上的照射区域组的宽度短的距离。因此，即使在照射区域组的间歇行驶距离（A）稍微变化的情况下，也可以将光适当地施加到条带71,72之间的区域，从而实现高精度高速图案书写。

57. 发明申请

US20040163683A1 Substrate processing apparatus for drying substrate 有权
标题翻译：用于干燥基材的基板处理装置
公开(公告)号：US20040163683A1
公开(公告)日：2004-08-26
申请号：US10740711
申请日：2003-12-18
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Hiroaki Sugimoto , Seiichiro Okuda , Akio Hashizume
IPC分类号： B08B003/02
CPC分类号： H01L21/67034 , Y10S134/902
摘要： A substrate processing apparatus includes a container in which a heating plate, a discharge nozzle for discharging a vapor of organic solvent, and a discharge nozzle for supplying a process gas and a cooling gas are provided. A pump in communication with an exhaust outlet of the container exhausts an atmosphere from the container to reduce pressure in the container. Therefore, the substrate processing apparatus is capable of performing (1) the process of drying a substrate in a reduced-pressure atmosphere by the use of the vapor of organic solvent, and (2) the process of drying the substrate in the reduced-pressure atmosphere by heating, to thereby efficiently dry the substrate.
摘要翻译：基板处理装置包括：容器，其中设置有加热板，用于排出有机溶剂的蒸气的排出喷嘴和用于供给处理气体和冷却气体的排出喷嘴。与容器的排气口连通的泵从容器排出气氛以减小容器中的压力。因此，基板处理装置能够通过使用有机溶剂的蒸气来进行（1）在减压气氛中干燥基板的工序，（2）在减压下干燥基板的工序通过加热，从而有效地干燥基板。

58. 发明申请

US20040130697A1 Reflection preventing film modifying apparatus and reflection preventing film modifying method 审中-公开
标题翻译：防反射膜修改装置和防反射膜修改方法
公开(公告)号：US20040130697A1
公开(公告)日：2004-07-08
申请号：US10738908
申请日：2003-12-16
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Masayoshi Kobayashi
IPC分类号： G03B027/58
CPC分类号： G03B27/58
摘要： An apparatus for selectively modifying a reflection preventing film formed on a substrate to change the optical characteristic of a region in the reflection preventing film. The apparatus includes: a substrate holding mechanism; a modifying light irradiating mechanism; and a processing position changing mechanism configured to change a processing position of the modifying light on the substrate by changing a relative position between an irradiation position of the modifying light and the substrate held by the substrate holding mechanism.
摘要翻译：一种用于选择性地修改形成在基板上的防反射膜以改变反射防止膜中的区域的光学特性的装置。该装置包括：基板保持机构; 修改光照射机构; 以及处理位置改变机构，其被配置为通过改变修改光的照射位置和由基板保持机构保持的基板之间的相对位置来改变基板上的修改光的处理位置。

59. 发明申请

US20040112890A1 Apparatus for and method of heat treatment by light irradiation 有权
标题翻译：光照射加热处理装置及方法
公开(公告)号：US20040112890A1
公开(公告)日：2004-06-17
申请号：US10729460
申请日：2003-12-05
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Tatsufumi Kusuda , Tsutomu Ueyama
IPC分类号： A21B002/00 , H05B003/06
CPC分类号： H01L21/67115 , H05B3/0047
摘要： A semiconductor wafer is held by support pins horizontally. A susceptor and a heating plate are moved upwardly so that the semiconductor wafer is transferred from the support pins to the susceptor. At this time, a gas layer is sandwiched between the upper surface of the susceptor and the lower surface of the semiconductor wafer to cause the semiconductor wafer to float over the upper surface of the susceptor for about seventy seconds immediately after the semiconductor wafer is mounted on the upper surface of the susceptor. Then, flash lamps are lit up to perform flash heating while the semiconductor wafer is floating over the upper surface of the susceptor. Even when flashlight irradiation causes rapid thermal expansion of the wafer surface, the semiconductor wafer does not suffer a great stress. This can prevent the semiconductor wafer from breaking.
摘要翻译：半导体晶片由支撑销水平地保持。感受器和加热板向上移动，使得半导体晶片从支撑销转移到基座。此时，气氛层被夹在基座的上表面和半导体晶片的下表面之间，以使得半导体晶片在半导体晶片安装之后立即漂浮在基座的上表面上大约七十秒感受器的上表面。然后，闪光灯点亮以进行闪光加热，同时半导体晶片浮在基座的上表面上。即使当手电筒照射导致晶片表面的快速热膨胀时，半导体晶片也不会承受很大的应力。这可以防止半导体晶片破裂。

60. 发明申请

US20040105936A1 Substrate processing method, substrate processing apparatus and substrate processing system 失效
标题翻译：基板加工方法，基板处理装置和基板处理系统
公开(公告)号：US20040105936A1
公开(公告)日：2004-06-03
申请号：US10700020
申请日：2003-11-03
申请人： Dainippon Screen Mfg. Co. Ltd.
发明人： Yusuke Muraoka , Kimitsugu Saito , Tomomi Iwata , Eiji Fukatsu , Ikuo Mizobata , Hiroyuki Ueno , Yasuo Okuyama , Takashi Gama , Yoshihiko Sakashita , Katsumi Watanabe , Jun Munemasa , Hisanori Oshiba , Shogo Sarumaru
IPC分类号： B05D003/02 , A23G003/20
CPC分类号： H01L21/67051 , G11B7/261 , G11B7/265 , H01L21/67028 , Y10S134/902
摘要： After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10A, 10B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary transport robot 30. The supercritical drying unit 20 performs a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.
摘要翻译：在显影单元10A，10B中，依次进行显影处理，漂洗处理和替换处理后，用防干燥溶液湿润的基板W通过主输送机器人被湿式输送到超临界干燥单元20 超临界干燥装置20以专用的方式进行高压干燥处理（超临界干燥处理）。因此，通过存在防干燥溶液，能够有效地防止基板W在基板W的输送过程中变得风干。

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