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1. 发明申请

US20040201832A1 Pattern writing apparatus and pattern writing method 有权
标题翻译：图案书写装置和图案书写方法
公开(公告)号：US20040201832A1
公开(公告)日：2004-10-14
申请号：US10814429
申请日：2004-04-01
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Hiroyuki Shirota
IPC分类号： G03B027/54
CPC分类号： G03B27/54
摘要： A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. In the pattern writing apparatus, for pattern writing, an irradiation region group on a substrate, which corresponds to the micromirror group of the DMD, is scanned in a main scanning direction that is angled relative to the direction of arrangement of the irradiation region group. The irradiation region group is also intermittently moved in the sub-scanning direction by a distance shorter than the width of the irradiation region group in the sub-scanning direction, for pattern writing of the entire substrate. Thus, even with slight changes in an intermittent travel distance (A) of the irradiation region group, light is suitably applied to a region between strips (71, 72), whereby high-precision high-speed pattern writing is achieved.
摘要翻译：用于将图案写在感光材料上的图案写入装置包括设置有具有调制反射光的微镜组的DMD的头，保持基板的台，以及用于相对于彼此移动头部和台架的机构。在图案写入装置中，对于图案写入，对应于DMD的微镜组的基板上的照射区域组在相对于照射区域组的排列方向成角度的主扫描方向进行扫描。对于整个基板的图案写入，照射区域组也沿副扫描方向间歇地移动比副扫描方向上的照射区域组的宽度短的距离。因此，即使在照射区域组的间歇行驶距离（A）稍微变化的情况下，也可以将光适当地施加到条带71,72之间的区域，从而实现高精度高速图案书写。

2. 发明申请

US20030222966A1 Pattern writing apparatus and pattern writing method 有权
标题翻译：图案书写装置和图案书写方法
公开(公告)号：US20030222966A1
公开(公告)日：2003-12-04
申请号：US10430302
申请日：2003-05-07
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Hiroyuki Shirota , Akira Kuwabara
IPC分类号： B41J002/47
CPC分类号： B41J2/465
摘要： An image recording apparatus (1) has a stage unit (2) for holding a substrate (9), an irradiation unit (4) having a plurality of irradiation parts (40) and a mechanism for relatively moving the stage unit (2) and the irradiation unit (4). An irradiation part (40) is provided with a DMD having a group of micromirrors for modulating a reflected light beam and a micro moving mechanism for moving the DMD relatively to the irradiation unit (4) in the X direction, thereby microscopically moving an irradiation position of the irradiation part (40) in the X direction. The irradiation part (40) is further provided with a zoom lens, thereby magnifying and reducing an image of the DMD on the substrate (9). By controlling a plurality of irradiation parts (40) parallelly and independently, the image recording apparatus (1) can write a fine pattern at high speed.
摘要翻译：图像记录装置（1）具有用于保持基板（9）的台单元（2），具有多个照射部（40）的照射单元（4）和用于使台单元（2）相对移动的机构，照射单元（4）。照射部分（40）设置有具有用于调制反射光束的一组微镜的DMD和用于相对于照射单元（4）在X方向上移动DMD的微移动机构，从而显微地移动照射位置的照射部（40）。照射部分（40）还设置有变焦透镜，从而放大和缩小基板（9）上的DMD的图像。通过平行且独立地控制多个照射部分（40），图像记录装置（1）可以高速地写入精细图案。

3. 发明申请

US20030214644A1 Pattern writing apparatus and pattern writing method 审中-公开
标题翻译：图案书写装置和图案书写方法
公开(公告)号：US20030214644A1
公开(公告)日：2003-11-20
申请号：US10394261
申请日：2003-03-24
申请人： DAINIPPON SCREEN MFG., CO., LTD.
发明人： Hiroyuki Shirota , Akira Kuwabara
IPC分类号： G03B027/54
CPC分类号： G03F7/70558 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70466
摘要： A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. Light from the micromirrors of the DMD are directed to irradiation regions (61) on the substrate, respectively. The irradiation regions (61) are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions (61) is tilted relative to the main scanning direction, and a center-to-center distance (L1) along the sub-scanning direction between two adjacent irradiation regions (61) arranged in the main scanning direction is made equal to a pitch (P1) of writing cells (620) on the substrate with respect to the sub-scanning direction. This allows multiple exposures centered about each of the writing cells (620), thereby achieving high-speed pattern writing while permitting precise control of the pattern linewidth.
摘要翻译：用于将图案写在感光材料上的图案写入装置包括设置有具有调制反射光的微镜组的DMD的头，保持基板的台，以及用于相对于彼此移动头部和台架的机构。来自DMD的微镜的光分别被引导到基板上的照射区域（61）。照射区域（61）通过衬底相对于头部的运动而移动到衬底上。 DMD设置在头部内，使得照射区域（61）的布置方向相对于主扫描方向倾斜，并且沿着副扫描方向在两个相邻照射之间的中心到中心距离（L1）使沿主扫描方向排列的区域（61）相对于副扫描方向等于基板上的写入单元（620）的间距（P1）。这允许以每个写入单元（620）为中心的多次曝光，从而实现高速图案写入，同时允许对图案线宽的精确控制。

4. 发明申请

US20030112323A1 Laser drawing apparatus and laser drawing method 失效
标题翻译：激光拉丝装置和激光拉丝法
公开(公告)号：US20030112323A1
公开(公告)日：2003-06-19
申请号：US10300151
申请日：2002-11-20
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Hiroyuki Shirota , Akira Kuwabara
IPC分类号： B41J002/435
CPC分类号： B23K26/04 , B23K2101/42 , G02B26/127 , H05K3/0082
摘要： A laser drawing apparatus according to the invention calibrates the accuracy of a first light quantity monitor in detecting the quantities of laser beams, based on results of detection by a second light quantity monitor of the quantities of laser beams emitted from an imaging optical system to a drawing stage, when a characteristic deterioration of or adhesion of foreign matter to optical components of the first light quantity monitor has resulted in variations in the optical characteristic of the first light quantity monitor, and variations in the detection by the first light quantity monitor of the quantities of the laser beams. The quantities of the laser beams emitted to a printed circuit board (image-receiving object) is thereby adjusted to a proper value, to maintain high-quality, high-definition drawings requiring a high degree of light quantity precision.
摘要翻译：根据本发明的激光绘制装置，基于第二光量监视器对从成像光学系统发射的激光束的量的检测结果，校正第一光量监视器在检测激光束的量时的精度当第一光量监视器的异物对光学部件的特性劣化或附着导致第一光量监视器的光学特性的变化以及第一光量监视器的检测的变化时，数量的激光束。因此，将发射到印刷电路板（图像接收对象）的激光束的量调整到适当的值，以保持需要高度光量精度的高质量高分辨率图形。

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