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41. 发明授权

US06762325B2 Method for production of alkoxylated compound 失效
标题翻译：烷氧基化合物的制造方法
公开(公告)号：US06762325B2
公开(公告)日：2004-07-13
申请号：US10144491
申请日：2002-05-13
申请人： Toru Inaoka , Yasuhiko Sato , Yoshiyuki Onda , Hiromichi Tanaka , Tsuyoshi Hirata
发明人： Toru Inaoka , Yasuhiko Sato , Yoshiyuki Onda , Hiromichi Tanaka , Tsuyoshi Hirata
IPC分类号： C07C21300
CPC分类号： C04B24/267 , B01F7/18 , B01J19/006 , B01J19/0066 , B01J19/18 , B01J2219/00063 , B01J2219/00168 , B01J2219/00768 , B01J2219/00779 , C04B24/2647 , C04B2103/408 , C08G65/2609 , C08G65/2696 , C08G65/30
摘要： When the reaction solution formed during the addition of an alkylene oxide to an active hydrogen-containing compound has viscosity of not less than 10 mPa·s, this invention provides a method for stirring the reaction solution by the rotation of a vane or vanes continuously disposed in the vertical direction within an agitating reaction vessel in such a manner that the numerical value C represented by the following formula (1): C=A/(h2−h1) (1) (wherein A denotes the length (m) of the vane or the vanes newly immersed by the supply of alkylene oxide, h1 denotes the height (m) of the liquid level before the supply of alkylene oxide, and h2 denotes the height (m) of the liquid level after the supply of alkylene oxide) may be not less than 0.5. By employing the method of this invention, it is made possible to effect addition of an alkylene oxide to the active hydrogen-containing compound with high efficiency. Further, the use of this method allows repression of the content of a by-product which causes the degradation of the characteristic properties of the alkoxylated compound.
摘要翻译：当在含有活性氢的化合物中加入烯化氧时形成的反应溶液的粘度不低于10mPa.s，本发明提供一种通过连续设置的叶片或叶片的旋转来搅拌反应溶液的方法在搅拌反应容器内沿垂直方向以下式（1）表示的数值C :(其中A表示叶片或通过供给环氧烷而新浸入的叶片的长度（m） h1表示供给环氧烷前的液面的高度（m），h2表示供给环氧烷以后的液面高度（μm））可以为0.5以上。通过采用本发明的方法，可以高效率地向含活性氢的化合物中加入烯化氧。此外，使用该方法可抑制副产物的含量，这导致烷氧基化化合物的特征性质的降解。

42. 发明授权

US06465290B1 Method of manufacturing a semiconductor device using a polymer film pattern 失效
标题翻译：使用聚合物膜图案制造半导体器件的方法
公开(公告)号：US06465290B1
公开(公告)日：2002-10-15
申请号：US09818409
申请日：2001-03-27
申请人： Kyoichi Suguro , Kouji Matsuo , Atsushi Murakoshi , Yasuhiko Sato , Hiromi Niiyama
发明人： Kyoichi Suguro , Kouji Matsuo , Atsushi Murakoshi , Yasuhiko Sato , Hiromi Niiyama
IPC分类号： H01L21338
CPC分类号： H01L29/6659 , H01L29/66537 , H01L29/66545
摘要： Claimed and disclosed is a method of manufacturing a semiconductor device, the method comprising the steps of forming a dummy gate on a semiconductor substrate, forming a source-drain diffusion region by introducing an impurity into the semiconductor substrate having the dummy gate as a mask, removing the dummy gate to form an opening, and forming a gate electrode within the opening with a gate insulating film formed below the gate electrode. The dummy gate is further formed by coating the semiconductor substrate with a polymer having a higher carbon content than hydrogen content so as to form a polymer film, forming a photoresist pattern on the polymer film, and transferring the pattern shape of the photoresist pattern onto the polymer film.
摘要翻译：权利要求和公开的是一种制造半导体器件的方法，所述方法包括以下步骤：在半导体衬底上形成虚拟栅极，通过将杂质引入到具有伪栅极的半导体衬底中作为掩模形成源极 - 漏极扩散区域，去除所述虚拟栅极以形成开口，并且在所述开口内形成栅极电极，所述栅极绝缘膜形成在所述栅电极下方。通过用具有比氢含量高的碳含量的聚合物涂覆半导体衬底以形成聚合物膜，在聚合物膜上形成光刻胶图案，并将光致抗蚀剂图案的图案形状转印到聚合物膜。

43. 发明授权

US06337163B1 Method of forming a pattern by making use of hybrid exposure 失效
标题翻译：通过利用混合曝光形成图案的方法
公开(公告)号：US06337163B1
公开(公告)日：2002-01-08
申请号：US09400280
申请日：1999-09-21
申请人： Yasuhiko Sato
发明人： Yasuhiko Sato
IPC分类号： G03F900
CPC分类号： G03F7/7045 , G03F7/0757 , G03F7/095 , G03F7/203 , G03F7/2037 , G03F7/2059
摘要： A method of forming a pattern, which comprises the steps of, forming an underlying film on a work film, forming a resist film on the underlying film, exposing the resist film to ultraviolet rays of predetermined pattern, forming a resist pattern by subjecting the resist film to a developing treatment, exposing the underlying film to an electron beam of predetermined pattern, and dry-etching the underlying film with the resist pattern and the region of the predetermined pattern of exposure by means of the electron beam being employed as an etching mask.
摘要翻译：一种形成图案的方法，包括以下步骤：在工作膜上形成下面的膜，在下面的膜上形成抗蚀剂膜，将抗蚀剂膜暴露于预定图案的紫外线，通过使抗蚀剂将显影处理膜暴露于预定图案的电子束，并用电子束作为蚀刻掩模用抗蚀剂图案和预定曝光模式的区域干蚀刻底层膜。

44. 发明授权

US06270948B1 Method of forming pattern 失效
标题翻译：形成图案的方法
公开(公告)号：US06270948B1
公开(公告)日：2001-08-07
申请号：US09327223
申请日：1999-06-07
申请人： Yasuhiko Sato , Yoshihiko Nakano , Rikako Kani , Shuji Hayase , Yasunobu Onishi , Eishi Shiobara , Seiro Miyoshi , Hideto Matsuyama , Masaki Narita , Sawako Yoshikawa
发明人： Yasuhiko Sato , Yoshihiko Nakano , Rikako Kani , Shuji Hayase , Yasunobu Onishi , Eishi Shiobara , Seiro Miyoshi , Hideto Matsuyama , Masaki Narita , Sawako Yoshikawa
IPC分类号： G03F700
CPC分类号： G03F7/094 , H01L21/0214 , H01L21/02164 , H01L21/0217 , H01L21/02282 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/3121
摘要： A method of forming a pattern which comprises the steps of, forming an organosilicon film on a work film, the organosilicon film comprising an organosilicon compound having a silicon-silicon bond in a backbone chain thereof and a glass transition temperature of 0° C. or more, forming a resist pattern on the organosilicon film, and transcribing the resist pattern on the organosilicon film through an etching of the organosilicon film by making use of an etching gas containing at least one kind of atom selected from the group consisting of chlorine, bromine and iodine. The organosilicon pattern obtained by the etching is employed as a mask for patterning the work film.
摘要翻译：一种形成图案的方法，包括以下步骤：在工作薄膜上形成有机硅膜，所述有机硅膜包含其主链中具有硅 - 硅键的有机硅化合物和玻璃化转变温度为0℃，或在有机硅膜上形成抗蚀剂图案，通过利用含有选自氯，溴中的至少一种原子的蚀刻气体，通过蚀刻有机硅膜来转印有机硅膜上的抗蚀剂图案和碘。采用通过蚀刻获得的有机硅图案用作对工作膜进行图案化的掩模。

45. 发明授权

US6099765A Optical component formation method 有权
标题翻译：光学元件形成方法
公开(公告)号：US6099765A
公开(公告)日：2000-08-08
申请号：US249161
申请日：1999-02-12
申请人： Hajime Yamanaka , Yasuhiko Sato
发明人： Hajime Yamanaka , Yasuhiko Sato
IPC分类号： C03B11/00 , B29C43/14 , B29D11/00 , C03B11/08 , C03B23/00
CPC分类号： B29C43/021 , B29C43/14 , B29D11/00009 , C03B11/08 , B29C2043/3433 , B29C2043/3618 , B29L2011/0016 , Y02P40/57 , Y10S425/808
摘要： A method of forming an optical component wherein imperfections in molding the optical component, such as a lens, are removed by: heating an optical material to its plastic state; forming the optical material into the desired shape by employing a mold apparatus and applying a molding pressure; releasing all pressure from the shaped optical material by separating sections of the mold in order to relieve internal stress in the optical material while the optical material is at its plastic state temperature; slowly and controllably reducing the temperature of the optical material. At the time of, or shortly after commencing the slow and controlled reduction in temperature of the optical material, applying a more moderate pressure on the optical material while it is still in its plastic state; either maintaining the moderate pressure on the optical material during its controlled, gradual cooling until a solid state temperature is reached, or alternatively, after a period of time gradually reducing the pressure applied to the mold until a solid state temperature is reached; and, after said solid state temperature is reached, exposing the mold with enclosed optical material to ambient or room temperature without adding heat to thereby rapidly cool the optical material while applying a light pressure on the optical material. A light pressure, corresponding to that produced by the weight of the upper mold when supported by the optical material, can be applied for a time when the optical material is in its plastic state coincident with the molding pressure being released, or application of the molding pressure can be preceded by successive steps of increased pressure. Further, after applying the moderate pressure, the pressure can be gradually relieved as the temperature of the optical material is gradually lowered.
摘要翻译：一种形成光学部件的方法，其中模制诸如透镜的光学部件的缺陷通过以下方式被去除：将光学材料加热到其塑性状态; 通过使用模具装置并施加成型压力将光学材料形成为期望的形状; 通过分离模具的部分来释放来自成形光学材料的所有压力，以便在光学材料处于其塑性状态温度时缓解光学材料中的内部应力; 缓慢且可控地降低光学材料的温度。在开始光学材料的缓慢且受控制的温度降低之后或不久之后，在光学材料仍然处于其塑性状态时对光学材料施加更适度的压力; 在其受控的逐渐冷却期间保持光学材料的适度压力直到达到固态温度，或者在经过一段时间后逐渐降低施加到模具上的压力直到达到固态温度; 并且在达到所述固态温度之后，将封闭的光学材料的模具暴露于环境温度或室温，而不加热，从而在对光学材料施加轻压的同时快速冷却光学材料。当光学材料处于其塑性状态与成型压力一致时，与光学材料支撑时相当于由上模的重量产生的轻压可以施加，或施加模塑压力之前可以是增加压力的连续步骤。此外，在施加中等压力后，随着光学材料的温度逐渐降低，可以逐渐减轻压力。

46. 发明授权

US5885316A Nozzle tip for glass injection cartridge 失效
标题翻译：玻璃注射筒喷嘴
公开(公告)号：US5885316A
公开(公告)日：1999-03-23
申请号：US977670
申请日：1997-11-24
申请人： Yasuhiko Sato , Hiroaki Fujita
发明人： Yasuhiko Sato , Hiroaki Fujita
IPC分类号： C03B40/02 , C03B7/00 , C03B7/14 , C03B11/08 , C03B17/00 , C03B19/02 , C03B40/00 , C23C14/02 , C23C14/06 , C23C14/32 , C03B5/26
CPC分类号： C03B19/025 , C03B40/00 , C03B7/00 , C03B7/14 , C23C14/025 , C23C14/0641 , C23C14/32 , H01J37/34 , C03B2215/71
摘要： A nozzle tip for a glass injection cartridge loaded with a rod-shaped glass material and having a heater for melting down the glass material into a molten state for injection into a mold, the nozzle tip containing:a) a nozzle body having a conical shape converging forwardly from a rear-end portion fitted on a fore-end portion of the glass injection cartridge, the nozzle body being formed of tungsten carbide and internally defining a molten glass passage extending axially throughout the nozzle body from the rear-end portion toward a converging fore-end portion to be connected to the mold; andb) a glass releasing layer coated substantially on the entire surface of the nozzle body including the molten glass passage,wherein the glass releasing layer is selected from the group consisting of HfN, BN, TiAlN, CrN, ZrN and TiN.
摘要翻译：一种装有棒状玻璃材料并具有用于将玻璃材料熔化成熔融状态用于注入模具的加热器的玻璃注射筒的喷嘴尖端，所述喷嘴头包含：a）具有锥形形状的喷嘴体从安装在玻璃注射筒的前端部分的后端部向前收敛，喷嘴体由碳化钨形成并且内部限定了从后端部向轴向延伸穿过喷嘴主体的熔融玻璃通道会聚的前端部分连接到模具; 以及b）基本上涂覆在包括熔融玻璃通道的喷嘴体的整个表面上的玻璃释放层，其中所述玻璃释放层选自HfN，BN，TiAlN，CrN，ZrN和TiN。

47. 发明授权

US5676217A Method and system for detecting abnormality of vehicle constant speed travel control 失效
标题翻译：车辆恒速行驶控制异常检测方法及系统
公开(公告)号：US5676217A
公开(公告)日：1997-10-14
申请号：US548860
申请日：1995-10-26
申请人： Yoshinari Torii , Yasuhiko Sato
发明人： Yoshinari Torii , Yasuhiko Sato
IPC分类号： B60K31/00 , B60K31/04 , B60W30/00 , F02D11/10 , F02D41/14
CPC分类号： B60K31/047 , B60W2550/142
摘要： A constant speed travel control system uses a time period Q which is set such that, if a motor of the actuator is not locked but normally rotated, actuator opening becomes almost certainly fully closed within that time period with the result that a first limit switch is made open. If the motor is normal, the processing operation proceeds to a normal constant speed travel control by which an electric current to the motor ceases and "motor open" condition is detected. When no "motor open" state is detected, even after the elapse of the time period Q, under the condition that the vehicle speed is higher than a reference speed, a determination that the motor is in the locked condition is made and the operation proceeds to a speed control cancellation process.
摘要翻译：恒速行驶控制系统使用时间段Q，其被设置为使得如果致动器的电机未被锁定但是正常旋转，则在该时间段内致动器打开几乎肯定完全关闭，结果是第一限位开关开了如果电动机正常，则处理操作进行到正常的恒速行驶控制，通过该控制，到电动机的电流停止并且检测到“电动机打开”状态。当没有检测到“电动机打开”状态时，即使在经过时间段Q之后，在车速高于基准速度的条件下，进行电动机处于锁定状态的判定，并且操作进行到速度控制取消过程。

48. 发明授权

US4412906A Sputtering apparatus 失效
标题翻译：溅射装置
公开(公告)号：US4412906A
公开(公告)日：1983-11-01
申请号：US332996
申请日：1981-12-21
申请人： Yasuhiko Sato , Takamasa Sakai , Shoichi Minagawa
发明人： Yasuhiko Sato , Takamasa Sakai , Shoichi Minagawa
IPC分类号： C23C14/34 , H01L21/302 , H01L21/3065 , H01L21/31 , C23C15/00
CPC分类号： H01L21/31 , C23C14/3407
摘要： A sputtering apparatus includes a target and a substrate holder respectively supported in a lower portion and an upper portion of a vacuum chamber, a gas jet opening located near the upper surface of the target, and gas withdrawal conduits located near the substrate holder, so that by supplying a gas to the vacuum chamber through the gas jet opening, the gas pressure in the chamber gradually decreases from the region near the target to the region near the substrate holder.
摘要翻译：溅射装置包括分别支撑在真空室的下部和上部中的靶和衬底保持器，位于靶的上表面附近的气体射流开口和位于衬底保持器附近的气体取出管道，使得通过通过气体喷射口向真空室供给气体，室内的气体压力从靠近靶的区域逐渐减小到靠近衬底保持器的区域。

49. 发明授权

US4367230A Novel triazafluoranthene compound and processes for preparing the same 失效
标题翻译：新型三氮杂卟啉化合物及其制备方法
公开(公告)号：US4367230A
公开(公告)日：1983-01-04
申请号：US215107
申请日：1980-12-10
申请人： Yasuhiko Sato , Tomishige Mizoguchi , Yukitsuka Kudo , Ryuichi Ishida
发明人： Yasuhiko Sato , Tomishige Mizoguchi , Yukitsuka Kudo , Ryuichi Ishida
IPC分类号： A61K31/505 , A61P3/06 , A61P25/28 , C07D209/16 , C07D471/04 , C07D471/16
CPC分类号： C07D471/04 , C07D209/16
摘要： A triazafluoranthene compound of the formula: ##STR1## wherein R.sup.1 is hydrogen, phenyl, cycloalkyl having 3 to 6 carbon atom, (lower alkoxy)carbonyl, lower alkoxy or (lower alkyl)carbonyl, R.sup.2 is hydrogen or lower alkyl, R.sup.3 is hydrogen, phenyl, (lower alkoxy)carbonyl, lower alkoxy, di(lower alkyl)amino, (tetrahydropyran-2-yl)oxy, hydroxy or carboxyl, A is single bond, alkylene having one to 5 carbon atoms or alkenylene having 2 to 5 carbon atoms, and B is single bond or alkylene having one to 5 carbon atoms. Methods of preparing the compound (I) are disclosed. The compound (I) and a pharmaceutically acceptable acid addition salt thereof have a potent anti-anoxic activity.
摘要翻译：一种下式的三氮杂芴化合物：其中R1是氢，苯基，具有3-6个碳原子的环烷基，（低级烷氧基）羰基，低级烷氧基或（低级烷基）羰基，R2是氢或低级烷基，R3是氢，苯基，（低级烷氧基）羰基，低级烷氧基，二（低级烷基）氨基，（四氢吡喃-2-基）氧基，羟基或羧基，A为单键，碳原子数1〜5的亚烷基或亚乙烯基2〜5 碳原子，B为单键或碳原子数为1〜5的亚烷基。公开了制备化合物（I）的方法。化合物（I）及其药学上可接受的酸加成盐具有有效的抗缺氧活性。

50. 发明授权

US4293397A Photocurable organopolysiloxane compositions 失效
标题翻译：光固化有机聚硅氧烷组合物
公开(公告)号：US4293397A
公开(公告)日：1981-10-06
申请号：US120084
申请日：1980-02-08
申请人： Yasuhiko Sato , Hiroshi Inomata
发明人： Yasuhiko Sato , Hiroshi Inomata
IPC分类号： C08F2/00 , C08F2/46 , C08F2/48 , C08F290/00 , C08F299/00 , C08G77/00 , C08G77/28 , C08G77/38 , C08G77/388 , C08L83/08 , C09D183/04 , C09D183/07 , G03F7/075 , C08F30/08
CPC分类号： C08L83/08 , C08G77/388 , G03F7/0757
摘要： The present invention provides a novel photocurable organopolysiloxane composition having remarkably high photocurability as well as insensitiveness to the retarding effect of atmospheric oxygen and capable of giving a thick cured product with elasticity. The inventive composition comprises a reaction product of an amino-terminated diorganopolysiloxane and glycidyl acrylate or glycidyl methacrylate admixed with a photosensitizer.
摘要翻译：本发明提供了一种新颖的光固化性有机聚硅氧烷组合物，其具有非常高的光固化性，以及对大气氧的阻滞作用的不敏感性，并且能够赋予具有弹性的厚固化产物。本发明的组合物包含氨基封端的二有机聚硅氧烷和丙烯酸缩水甘油酯或与光敏剂混合的甲基丙烯酸缩水甘油酯的反应产物。

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