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1. 发明申请

US20080177226A1 Syringe Device and Method of Preparing Medicine Using the Device 失效
标题翻译：注射装置及使用装置制备药物的方法
公开(公告)号：US20080177226A1
公开(公告)日：2008-07-24
申请号：US11883934
申请日：2006-02-08
申请人： Norio Watanabe , Yasuhiko Sato , Kouichi Sugita , Katsuya Taguchi
发明人： Norio Watanabe , Yasuhiko Sato , Kouichi Sugita , Katsuya Taguchi
IPC分类号： A61M37/00 , A61M5/178
CPC分类号： A61J1/2096 , A61J1/201 , A61J1/2013 , A61J1/2051 , A61J1/2065 , A61M5/1782 , A61M2005/3121 , Y10S604/905
摘要： A syringe device and a method of preparing medicine using the device capable of easily and accurately performing operations for mixing and dissolving a lyophilized product into a dissolution liquid before use. A double ended needle assembly and an intermediate holder are fitted to the first cylindrical part of a connection holder, a first syringe in which the dissolution liquid is stored is inserted into the first cylindrical part through the intermediate holder, and a second syringe in which the lyophilized product is stored in a depressurized state is fixedly inserted into the second cylindrical part of the connection holder. First, the intermediate holder is locked by a finger hooking projected piece, the first syringe is pushed into the intermediate holder in the locked state of the double ended needle assembly at an initial position by locking ribs, and the first syringe is unsealed by one end of the double ended needle. Next, the intermediate holder and the double ended needle assembly are pushed into the first cylindrical part by the first syringe, and the second syringe in the second cylindrical part is unsealed by the other end of the double ended needle.
摘要翻译：一种注射器装置和使用该装置的药物的制备方法，其能够容易且准确地进行使用前将冻干品混入并溶解于溶解液中的作业。双端针组件和中间保持器安装在连接保持器的第一圆柱形部分上，其中存储溶解液体的第一注射器通过中间保持器插入第一圆柱形部分，第二注射器中，冻干产品储存在减压状态，固定地插入到连接保持器的第二圆柱形部分中。首先，中间保持器被指钩突起部件锁定，第一注射器通过锁定肋在初始位置处被锁定在双头针组件的锁定状态中，并且第一注射器被一端开封的双针针。接下来，中间保持器和双头针组件通过第一注射器被推入第一圆筒部，第二圆筒部的第二注射器被双头针的另一端开封。

2. 发明授权

US06786717B2 Combustion apparatus 失效
标题翻译：燃烧装置
公开(公告)号：US06786717B2
公开(公告)日：2004-09-07
申请号：US10348058
申请日：2003-01-21
申请人： Masahiko Shimazu , Yasutaka Kuriyama , Takao Morigaki , Takashi Hasegawa , Hidenori Hata , Masaaki Matsuda , Shingo Kimura , Masahiro Iguchi , Takashi Akiyama , Yasuhiko Sato , Koji Shimomura , Toshikazu Miki , Shuji Kameyama , Keiichi Miura
发明人： Masahiko Shimazu , Yasutaka Kuriyama , Takao Morigaki , Takashi Hasegawa , Hidenori Hata , Masaaki Matsuda , Shingo Kimura , Masahiro Iguchi , Takashi Akiyama , Yasuhiko Sato , Koji Shimomura , Toshikazu Miki , Shuji Kameyama , Keiichi Miura
IPC分类号： F23D1462
CPC分类号： F23D14/586 , F23C2201/301 , F23D14/04 , F23D14/10 , F23D14/26 , F23D14/62 , F23D14/70 , F23D14/74 , F23D2207/00 , F23D2209/20 , F23D2210/00 , F23D2213/00
摘要： A combustion apparatus (1) is generally composed of a principal part (5), a supplementary part (6) and a burner port assembly (3). Four metal plates (7,8,10,11) constituting the principal and supplementary parts (5,6) are pressed to have in them several protuberances and recesses. These metal plates are laid one on another to form in them some hollow spaces and sealed regions. These hollow spaces communicate with each other to form a thin gas passage (22) together with a thick gas passage (73) in this combustion apparatus (1) in such a manner that its condition of thick and thin fuel combustion is rendered more stable.
摘要翻译：燃烧装置（1）通常由主要部分（5），辅助部分（6）和燃烧器端口组件（3）组成。构成主要部分和辅助部分（5,6）的四个金属板（7,8,10,11）被压制成具有几个突起和凹槽。这些金属板被放置在一起，在其中形成一些中空空间和密封区域。这些中空空间彼此连通，以便在这种燃烧装置（1）中与浓气体通道（73）一起形成薄的气体通道（22），使得其燃料燃烧燃烧条件变得更加稳定。

3. 发明授权

US06569595B1 Method of forming a pattern 失效
标题翻译：形成图案的方法
公开(公告)号：US06569595B1
公开(公告)日：2003-05-27
申请号：US09512286
申请日：2000-02-24
申请人： Yasuhiko Sato , Eishi Shiobara , Yasunobu Onishi , Shuji Hayase , Yoshihiko Nakano
发明人： Yasuhiko Sato , Eishi Shiobara , Yasunobu Onishi , Shuji Hayase , Yoshihiko Nakano
IPC分类号： G03F700
CPC分类号： G03F7/091
摘要： A method of forming a pattern which comprises the steps of, forming a matrix pattern on a work film, filling an opened space in the matrix pattern with a mask material layer containing at least one kind of a network carbon polymer having a repeating unit represented by the following general formulas (CP1) to (CP4) on the work film, forming a mask material pattern by removing the matrix pattern, and forming a work film pattern by transferring the mask material pattern to the work film: wherein R is halogen atom, hydrogen atom or a substituted or unsubstituted hydrocarbon group, A is a polyvalent organic group, and m, n and k denote respectively a positive integer.
摘要翻译：一种形成图案的方法，包括以下步骤：在工作膜上形成矩阵图案，用掩模材料层填充矩阵图案中的开放空间，掩模材料层含有至少一种具有由在工作薄膜上的以下通式（CP1）〜（CP4），通过去除矩阵图案形成掩模材料图案，并通过将掩模材料图案转印到工作薄膜上形成工作薄膜图案：其中R是卤素原子，氢原子或取代或未取代的烃基，A为多价有机基团，m，n和k分别表示正整数。

4. 发明授权

US06368524B1 Optical element molding method and optical material for molding optical element 有权
标题翻译：光学元件成型方法和用于模制光学元件的光学材料
公开(公告)号：US06368524B1
公开(公告)日：2002-04-09
申请号：US09820799
申请日：2001-03-30
申请人： Hiroaki Fujita , Hajime Yamanaka , Yasuhiko Sato
发明人： Hiroaki Fujita , Hajime Yamanaka , Yasuhiko Sato
IPC分类号： B29D1100
CPC分类号： B29C43/021 , B29C37/0053 , B29D11/00019 , B29L2011/0016 , B29L2011/0058
摘要： An optical element molding method for molding an optical element having an asymmetrical optically functional surface by pressing a heated preform in which, after a center part of a transfer surface of a molding die and a center part of the preform are brought into contact with each other, peripheries of the center part of the preform are brought into contact with the transfer surface, to transfer the form of the transfer surface to the preform. Consequently, the optically functional surface shape can be favorably transferred to the preform.
摘要翻译：一种光学元件成型方法，用于通过对加热的预成型件进行挤压来模制具有不对称光学功能表面的光学元件，其中，在成型模具的转印面的中心部分和预成型体的中心部分彼此接触之后，使预成型体的中心部分的周边与转印面接触，将转印面的形状转印到预成型体上。因此，光学功能表面形状可以有利地转移到预成型件。

5. 发明授权

US4228168A Azepino [1,2,3-lm]-.beta.-carboline compounds and pharmaceutical composition thereof 失效
标题翻译：氮杂[1,2,3-lm]-β-咔啉化合物及其药物组合物
公开(公告)号：US4228168A
公开(公告)日：1980-10-14
申请号：US90528
申请日：1979-11-02
申请人： Yasuhiko Sato , Tomishige Mizoguchi , Yukitsuka Kudo , Ryuichi Ishida
发明人： Yasuhiko Sato , Tomishige Mizoguchi , Yukitsuka Kudo , Ryuichi Ishida
IPC分类号： A61K31/55 , A61P9/00 , A61P9/08 , A61P9/10 , A61P25/28 , C07D209/16 , C07D471/04 , C07D471/16 , C07D471/14
CPC分类号： C07D471/04 , C07D209/16
摘要： An azepino[1,2,3-lm]-.beta.-carboline compound of the formula: ##STR1## wherein R.sup.1 is hydrogen, cycloalkyl of 3 to 7 carbon atoms, phenyl, hydroxy, alkoxycarbonyl of 2 or 3 carbon atoms or alkanoyl of 2 or 3 carbon atoms, and A is single bond or straight or branched alkylene of one to 5 carbon atoms. Several methods of preparing the compound [I] are disclosed. The compound [I] and a pharmaceutical acceptable acid addition salt thereof have a potent anti-anoxic activity.
摘要翻译：具有下式的氮杂环庚烷并[1,2,3-lm]-β-咔啉化合物：其中R 1为氢，3至7个碳原子的环烷基，苯基，羟基，2或3个碳原子的烷氧基羰基或2或3个碳原子的烷酰基，A是单键或1至5个碳原子的直链或支链亚烷基。公开了几种制备化合物[I]的方法。化合物[I]及其药学上可接受的酸加成盐具有有效的抗缺氧活性。

6. 发明授权

US4077943A Curable organopolysiloxane compositions 失效
标题翻译：可固化的有机聚硅氧烷组合物
公开(公告)号：US4077943A
公开(公告)日：1978-03-07
申请号：US725280
申请日：1976-09-21
申请人： Yasuhiko Sato , Hiroshi Inomata
发明人： Yasuhiko Sato , Hiroshi Inomata
IPC分类号： C08L83/00 , C08L83/04 , C08L83/05 , C08L83/07 , C08L101/02 , C09J183/00 , C08G77/04
CPC分类号： C08K5/54 , C08G77/12 , C08G77/14 , C08G77/20 , C08G77/70 , Y10T428/31663
摘要： Organopolysiloxane compositions are provided which are curable to elastomers and exhibit an excellent adhesion to the various surfaces of metals, glasses, ceramics and the like. The organopolysiloxane composition comprises (a) a diorganopolysiloxane terminated at both chain ends with vinyl groups directly bonded to the terminal silicon atoms in a molecule, (b) an organohydrogenpolysiloxane having at least two hydrogen atoms bonded directly to the silicon atoms in a molecule and at least one epoxy or ester group bonded to the silicon atom through an Si--C linkage in a molecule, and (c) a platinum catalyst. The compositions are useful for applications, such as, potting of electronic circuit units, coating of electrical parts, impregnation of fly-back transformers for television sets and coating of junctions for semiconductor devices.
摘要翻译：提供了可固化到弹性体并且对金属，玻璃，陶瓷等的各种表面具有优异粘附性的有机聚硅氧烷组合物。有机基聚硅氧烷组合物包含（a）在两个末端封端的二有机聚硅氧烷，其中分子内直接与末端硅原子键合的乙烯基团，（b）具有至少两个氢原子的有机氢聚硅氧烷，其直接键合在分子中的硅原子上，通过分子中的Si-C键与硅原子键合的至少一个环氧基或酯基，和（c）铂催化剂。组合物可用于电子电路单元的灌封，电气部件的涂覆，用于电视机的回扫变压器的浸渍以及用于半导体器件的结的涂覆。

7. 发明授权

US07198886B2 Method for forming pattern 失效
标题翻译：形成图案的方法
公开(公告)号：US07198886B2
公开(公告)日：2007-04-03
申请号：US11138216
申请日：2005-05-27
申请人： Yasuhiko Sato , Tsuyoshi Shibata , Junko Ohuchi , Yasunobu Onishi
发明人： Yasuhiko Sato , Tsuyoshi Shibata , Junko Ohuchi , Yasunobu Onishi
IPC分类号： G03F7/30
CPC分类号： G03F7/11 , H01L21/0274 , H01L21/3081
摘要： A method of forming a pattern, which comprises forming a masking material layer on a surface of a working film by coating the surface with a solution of a mixture comprising an inorganic compound having a bond between an inorganic element and oxygen atom, and a volatile unit, volatilizing the volatile unit to thereby make the masking material layer porous, forming a resist layer on a surface of the masking material layer, patterning the resist film to form a resist pattern, dry-etching the masking material layer to thereby transfer the resist pattern to the masking material layer, thereby forming a masking material pattern, and dry etching the working film to thereby transfer the masking material pattern to the working film to thereby form a working film pattern.
摘要翻译：一种形成图案的方法，其包括通过用包含无机元素和氧原子之间的键的无机化合物的混合物的溶液和挥发性单元涂覆表面来在工作膜的表面上形成掩模材料层挥发挥发性单元，使掩模材料层多孔，在掩模材料层的表面上形成抗蚀剂层，图案化抗蚀剂膜以形成抗蚀剂图案，干蚀刻掩模材料层，从而将抗蚀剂图案到掩蔽材料层，从而形成掩模材料图案，并干燥蚀刻加工膜，从而将掩模材料图案转印到工作膜上，从而形成工作膜图案。

8. 发明申请

US20050153245A1 Method for forming a pattern and method of manufacturing semiconductor device 审中-公开
标题翻译：用于形成图案的方法和制造半导体器件的方法
公开(公告)号：US20050153245A1
公开(公告)日：2005-07-14
申请号：US10940757
申请日：2004-09-15
申请人： Yasuhiko Sato , Yasunobu Onishi
发明人： Yasuhiko Sato , Yasunobu Onishi
IPC分类号： G03F7/00 , G03F7/039 , G03F7/075 , G03F7/09 , G03F7/36
CPC分类号： G03F7/0035 , G03F7/0392 , G03F7/0757 , G03F7/094
摘要： Disclosed is a method of forming a pattern comprising coating a solution containing a compound having a silicon-nitrogen linkage in the main chain thereof over a surface of a working film to form a mask, replacing the nitrogen in the mask by oxygen, forming a resist film on a surface of the mask, forming a resist pattern by subjecting the resist film to a patterning exposure and to a developing treatment, transcribing the resist pattern to the mask to form a masking pattern, and transcribing the masking pattern to the working film to form a working film pattern.
摘要翻译：公开了一种形成图案的方法，包括在工作膜的表面上在其主链中涂覆含有具有硅 - 氮键的化合物的溶液以形成掩模，用氧代替掩模中的氮，形成抗蚀剂在掩模的表面上形成抗蚀剂图案，通过使抗蚀剂膜进行图案化曝光和显影处理，将抗蚀剂图案转印到掩模以形成掩模图案，并将掩模图案转印到工作膜上，形成抗蚀剂图案形成工作电影模式。

9. 发明授权

US06822803B2 Optical component with multiple glass optical elements and manufacturing method thereof 失效
标题翻译：具有多个玻璃光学元件的光学部件及其制造方法
公开(公告)号：US06822803B2
公开(公告)日：2004-11-23
申请号：US10386222
申请日：2003-03-11
申请人： Hiroyasu Muto , Katsunori Mukasa , Masaaki Fukuda , Yasuhiko Sato
发明人： Hiroyasu Muto , Katsunori Mukasa , Masaaki Fukuda , Yasuhiko Sato
IPC分类号： G02B2710
CPC分类号： G02B7/026
摘要： The present invention relates to an optical component in which a plurality of glass optical elements are integrated thus improving the productivity and providing consistent quality. The optical component of the present invention comprises a plurality of lens parts 1 which is formed from glass material by press molding, a tubular leg part 2 which is formed during the press molding, and which bends at and extends downward from the periphery of the lens part 1, a planar part 3 which bends outwardly and extends horizontally from the tubular leg part 2 providing connection to other lens parts 1, and the cover glass 4 of the image sensor chip 5, which is fixed onto the lower surface of the planar part 3, and/or image sensor chip 5 which is disposed below the lens part 1.
摘要翻译：本发明涉及一种其中集成了多个玻璃光学元件的光学部件，从而提高生产率并提供一致的质量。本发明的光学部件包括多个通过压制成型的玻璃材料形成的透镜部件1，在压制成型期间形成的管状腿部2，并且从透镜周边弯曲并向下延伸第一部分是平面部分3，其从管状腿部2向外弯曲并水平延伸，提供与其他透镜部分1的连接以及图像传感器芯片5的覆盖玻璃4，该玻璃4固定在平面部分的下表面上 3和/或设置在透镜部1下方的图像传感器芯片5。

10. 发明授权

US06806021B2 Method for forming a pattern and method of manufacturing semiconductor device 失效
标题翻译：用于形成图案的方法和制造半导体器件的方法
公开(公告)号：US06806021B2
公开(公告)日：2004-10-19
申请号：US10109714
申请日：2002-04-01
申请人： Yasuhiko Sato , Yasunobu Onishi
发明人： Yasuhiko Sato , Yasunobu Onishi
IPC分类号： B05D300
CPC分类号： G03F7/0035 , G03F7/0392 , G03F7/0757 , G03F7/094
摘要： Disclosed is a method of forming a pattern comprising coating a solution containing a compound having a silicon-nitrogen linkage in the main chain thereof over a surface of a working film to form a mask, replacing the nitrogen in the mask by oxygen, forming a resist film on a surface of the mask, forming a resist pattern by subjecting the resist film to a patterning exposure and to a developing treatment, transcribing the resist pattern to the mask to form a masking pattern, and transcribing the masking pattern to the working film to form a working film pattern.
摘要翻译：公开了一种形成图案的方法，包括在工作膜的表面上在其主链中涂覆含有具有硅 - 氮键的化合物的溶液以形成掩模，用氧代替掩模中的氮，形成抗蚀剂在掩模的表面上形成抗蚀剂图案，通过使抗蚀剂膜进行图案化曝光和显影处理，将抗蚀剂图案转印到掩模以形成掩模图案，并将掩模图案转印到工作膜上，形成抗蚀剂图案形成工作电影模式。

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