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41. 发明申请

US20110094680A1 VACUUM APPARATUS INCLUDING A PARTICLE MONITORING UNIT, PARTICLE MONITORING METHOD AND PROGRAM, AND WINDOW MEMBER FOR USE IN THE PARTICLE MONITORING 有权
标题翻译：真空装置，包括颗粒监测单元，颗粒监测方法和程序，以及用于颗粒监测的窗口部件
公开(公告)号：US20110094680A1
公开(公告)日：2011-04-28
申请号：US12985099
申请日：2011-01-05
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama
IPC分类号： H01L21/465 , G01N21/84
CPC分类号： H01J37/32935 , B08B9/08 , G01N15/0272 , G01N15/06 , G01N2015/0693 , Y10T428/30 , Y10T428/315 , Y10T428/8305
摘要： A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride.
摘要翻译：粒子监测装置包括：设置在排气管上的壳体，用于向气体排出管线中的颗粒发射激光束的激光束源;设置在壳体处的用于监测排气管线中的颗粒的窗口部件。窗构件具有由透明树脂或含硅的玻璃形成的透明基底，并且具有与气体排出管线内的气体相对的气体接触面，以及形成在透明基底的气体接触面上的表面处理层，其中所述表面处理层含有选自钇和氟化钙的一种材料。

42. 发明申请

US20100332364A1 PARTICLE GENERATION FACTOR DETERMINING SYSTEM, CHARGING METHOD AND STORAGE MEDIUM 有权
标题翻译：颗粒生成因子确定系统，充电方法和存储介质
公开(公告)号：US20100332364A1
公开(公告)日：2010-12-30
申请号：US12820692
申请日：2010-06-22
申请人： Tsuyoshi Moriya
发明人： Tsuyoshi Moriya
IPC分类号： G06Q50/00 , G06Q10/00 , G06Q30/00 , G06F17/30
CPC分类号： G06Q30/06 , G06Q30/0283 , G06Q30/04 , H01L22/12
摘要： Provided is a charging method capable of offering a user an incentive to use a particle generation factor determining system. In the particle generation factor determining system including a user interface device 11 through which a user inputs a particle map and a server 13, the server 13 calculates accuracy of each of multiple particle generation factors based on the particle map; the user interface device 11 displays the calculated accuracy or a title of generation-factor-relevant information 27 on each particle generation factor corresponding to this accuracy; the server 13 provides the generation-factor-relevant information 27 to the user interface device 11; a charged fee for providing particle generation-factor-relevant information 27 is determined based on accuracy of a particle generation factor corresponding to the provided generation-factor-relevant information 27.
摘要翻译：提供了一种能够向用户提供使用粒子生成因子确定系统的激励的计费方法。在包括用户通过其输入粒子映射的用户界面装置11和服务器13的粒子生成因子确定系统中，服务器13基于粒子图计算多个粒子生成因子中的每一个的精度; 用户界面装置11对与该精度对应的每个粒子生成因子显示计算出的生成因子相关信息27的精度或标题; 服务器13向用户接口设备11提供生成因子相关信息27; 基于与所提供的生成因子相关信息27相对应的粒子生成因子的精度，确定用于提供粒子生成因子相关信息27的收费。

43. 发明授权

US07852476B2 Particle monitor system and substrate processing apparatus 有权
标题翻译：粒子监测系统和基板处理装置
公开(公告)号：US07852476B2
公开(公告)日：2010-12-14
申请号：US11969501
申请日：2008-01-04
申请人： Tsuyoshi Moriya
发明人： Tsuyoshi Moriya
IPC分类号： G01N21/00
CPC分类号： C23C16/4412 , G01N15/1404 , G01N21/53 , G01N2015/1415 , H01J37/32834
摘要： A particle monitor system capable of accurately detecting the number of or the size of particles flowing through an exhaust pipe. In a bypass line through which a chamber is communicated with a dry pump, there is disposed the particle monitor system that includes a laser oscillator for irradiating laser light, a photo multiplier tube having a focal point thereof located at a location where the center axis of the bypass line crosses the laser light, and a particle converging member formed by a circular disk-like member and formed with a through hole facing the focal point FP. A gap is defined between the bypass line and an outer periphery of the particle converging member.
摘要翻译：一种能够准确地检测流过排气管的颗粒的数量或尺寸的粒子监测系统。在室内与干泵连通的旁通管路中，设置有包括用于照射激光的激光振荡器的光电倍增管，其焦点位于中心轴的位置，旁路管穿过激光，以及由圆盘状部件形成并形成有面向焦点FP的通孔的颗粒会聚部件。在旁路管线和颗粒会聚部件的外周之间限定间隙。

44. 发明申请

US20100118302A1 METHOD AND APPARATUS FOR DETECTING FOREIGN MATERIALS AND STORAGE MEDIUM 有权
标题翻译：用于检测外部材料和储存介质的方法和装置
公开(公告)号：US20100118302A1
公开(公告)日：2010-05-13
申请号：US12617235
申请日：2009-11-12
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hideaki Yakushiji
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hideaki Yakushiji
IPC分类号： G01N21/00 , G01N33/00
CPC分类号： H01L21/67288 , G01N21/91 , G01N21/94 , G01N21/9501
摘要： A foreign material detecting method for detecting a foreign material attached to a substrate surface includes a spraying step of spraying an organic solvent or an oil-phase material containing a halogen element to the substrate surface, a condensing step of emphasizing the foreign material by condensing the sprayed organic solvent or oil-phase material around the foreign material attached to the substrate surface by controlling a temperature of the substrate surface, and a surface inspecting step of detecting the foreign material emphasized by the condensation of the organic solvent or the oil-phase material by a surface inspecting device.
摘要翻译：用于检测附着在基板表面上的异物的异物检测方法包括：向基板表面喷射含有卤素元素的有机溶剂或油相材料的喷射步骤，通过冷凝来强调异物的冷凝步骤通过控制基板表面的温度，附着于基板表面的异物附近的喷涂有机溶剂或油相材料，以及检测由有机溶剂或油相材料的冷凝强调的异物的表面检查步骤通过表面检查装置。

45. 发明申请

US20100054722A1 FOCUSING POSITION DETERMINING APPARATUS, IMAGING APPARATUS AND FOCUSING POSITION DETERMINING METHOD 有权
标题翻译：聚焦位置确定装置，成像装置和聚焦位置确定方法
公开(公告)号：US20100054722A1
公开(公告)日：2010-03-04
申请号：US12548570
申请日：2009-08-27
申请人： Yuki Endo , Toshiyuki Tanaka , Toshihiro Hamamura , Tsuyoshi Moriya , Naoki Takafuji
发明人： Yuki Endo , Toshiyuki Tanaka , Toshihiro Hamamura , Tsuyoshi Moriya , Naoki Takafuji
IPC分类号： G03B13/00
CPC分类号： G03B13/00
摘要： Provided are a focusing position determining apparatus, an imaging apparatus, and a focusing position determining method, the method including setting an aperture to a first aperture value; driving a focus lens through a first range of positions as a first drive; during the first drive, obtaining images periodically, and calculating a first sampling of contrast values from the obtained images; calculating a first focus position from the first sampling of contrast values; setting the aperture to a second aperture value; driving a focus lens through a second range of positions as a second drive, the second range of positions being based on the first focus position; during the second drive, obtaining images periodically, and calculating a second sampling of contrast values from the obtained images; calculating a focusing position from the second sampling of contrast values; and driving the focus lens to the calculated focusing position.
摘要翻译：提供了一种聚焦位置确定装置，成像装置和聚焦位置确定方法，该方法包括将光圈设置为第一光圈值; 通过第一范围的位置驱动聚焦透镜作为第一驱动; 在第一驱动期间，周期性地获得图像，并从所获得的图像中计算对比度值的第一采样; 从对比度值的第一取样计算第一焦点位置; 将光圈设置为第二光圈值; 通过第二范围的位置驱动聚焦透镜作为第二驱动，所述第二位置范围基于所述第一对焦位置; 在第二驱动期间，周期性地获取图像，并且从所获得的图像中计算对比度值的第二采样; 从对比度值的第二取样计算聚焦位置; 并将聚焦透镜驱动到计算出的聚焦位置。

46. 发明申请

US20090246406A1 PLASMA PROCESSING APPARATUS, CHAMBER INTERNAL PART, AND METHOD OF DETECTING LONGEVITY OF CHAMBER INTERNAL PART 审中-公开
标题翻译：等离子体加工设备，室内部件和检测室内部件长度的方法
公开(公告)号：US20090246406A1
公开(公告)日：2009-10-01
申请号：US12412039
申请日：2009-03-26
申请人： Hiroyuki Nakayama , Tsuyoshi Moriya
发明人： Hiroyuki Nakayama , Tsuyoshi Moriya
IPC分类号： H05H1/24 , C23C16/00
CPC分类号： H01J37/32642 , H01J37/32467 , H01J37/32623 , H01J37/32963
摘要： A plasma processing apparatus that can accurately detect the longevity of a chamber internal part to eliminate the waste of the replacement of the chamber internal part that has not reached its end of longevity and prevent the occurrence of troubles caused by continuously using the chamber internal part that has reached its end of longevity. In the chamber internal part, at least one longevity detecting elemental layer comprised of an element different from a constituent material of the chamber internal part is buried.
摘要翻译：一种等离子体处理装置，其可以精确地检测室内部的寿命，以消除更换室内部件的浪费，该室内部件尚未达到其寿命结束，并且防止由连续使用室内部件引起的故障的发生，已经到了长寿的终结。在腔室内部，埋设由不同于室内部件的构成材料的元件构成的至少一个寿命检测元件层。

47. 发明授权

US07560083B2 Method for removing water molecules from vacuum chamber, program for executing the method, and storage medium storing the program 有权
标题翻译：用于从真空室除去水分子的方法，用于执行该方法的程序和存储该程序的存储介质
公开(公告)号：US07560083B2
公开(公告)日：2009-07-14
申请号：US11376162
申请日：2006-03-16
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Hiroshi Nagaike
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Hiroshi Nagaike
IPC分类号： C01B7/01 , C01B3/02 , C01B7/19 , H01L21/3065
CPC分类号： C01B3/12 , C01B7/191 , C01B7/20 , C07C17/23
摘要： A method for removing water molecules from a vacuum chamber for carrying out a process on a target object in vacuum includes the steps of introducing into the vacuum chamber a water molecule removal gas including at least a reduction gas which reduces the water molecules to produce hydrogen molecules and a halogen-based gas which reacts with the produced hydrogen molecules to produce acid, exhausting gases in the vacuum chamber measuring an amount of water molecules present inside the vacuum chamber, and determining whether or not the measured amount of water molecules is greater than or equal to a threshold value, wherein if the measured amount of water molecules is greater than or equal to the threshold value, the water molecule removal gas is introduced into the vacuum chamber in the introducing step.
摘要翻译：从真空室除去水分子的方法，用于在真空中进行目标物体的处理，包括以下步骤：向真空室中引入至少包含还原气体的水分子去除气体，所述还原气体减少水分子以产生氢分子和与所产生的氢分子反应产生酸的卤素气体，在真空室中排出气体，测量真空室内存在的水分子的量，并测定测量的水分子量是否大于或等于等于阈值，其中如果测量的水分子量大于或等于阈值，则在引入步骤中将水分子去除气体引入真空室。

48. 发明申请

US20080245389A1 METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES 审中-公开
标题翻译：真空室清洁元件的方法及加工基板的设备
公开(公告)号：US20080245389A1
公开(公告)日：2008-10-09
申请号：US12131818
申请日：2008-06-02
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
IPC分类号： B08B7/04
CPC分类号： H01L21/67028 , B08B3/12 , H01J37/32862 , H01L21/6831
摘要： To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.
摘要翻译：为了通过使颗粒粘附到元件上来清洁真空室中的元件散射，本发明使用了一种用于向元件施加电压并且通过利用麦克斯韦应力使颗粒散射的装置，用于对颗粒进行充电的装置和通过利用库仑力使颗粒散射，用于将气体引入真空室中并通过使气体冲击波撞击元件而使颗粒粘附到元件上的装置，用于加热元件并引起通过利用热应力和热压力来散射的颗粒，或通过对元件施加机械振动来使颗粒散射的装置。通过在相对高压气氛中的气流中携带它们来除去如此散落的颗粒。

49. 发明申请

US20080181750A1 GATE VALVE CLEANING METHOD AND SUBSTRATE PROCESSING SYSTEM 有权
标题翻译：门阀清洗方法和基板处理系统
公开(公告)号：US20080181750A1
公开(公告)日：2008-07-31
申请号：US11969428
申请日：2008-01-04
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： H01L21/677 , B08B5/02
CPC分类号： H01L21/67126
摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
摘要翻译：一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低基板处理系统。在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力在大气传递室。

50. 发明授权

US07299104B2 Substrate processing apparatus and substrate transferring method 有权
标题翻译：基板加工装置及基板转印方法
公开(公告)号：US07299104B2
公开(公告)日：2007-11-20
申请号：US10858049
申请日：2004-06-02
申请人： Kazuyuki Tezuka , Hiroshi Koizumi , Tsuyoshi Moriya , Hiroyuki Nakayama
发明人： Kazuyuki Tezuka , Hiroshi Koizumi , Tsuyoshi Moriya , Hiroyuki Nakayama
IPC分类号： G06F19/00 , G06F7/66
CPC分类号： H01L21/67276 , H01L21/67742 , H01L21/67745
摘要： Shock waves occurring when opening a gate valve between two vacuum chambers and peeling of particles by a viscous force taking place when a gas is supplied into a vacuum chamber are necessary to be suppressed by the apparatus and method of the invention, whereby contamination of a substrate by particles is suppressed. If one vacuum chamber is a substrate processing chamber for performing a vacuum process on the substrate and the other chamber is a transfer chamber having a substrate transfer device therein, the gate valve is opened when inner pressures of both the vacuum chambers are less than 66.5 Pa and higher one thereof is less than twice a lower one thereof. Preferably, a purge gas for peeling of particles is supplied, before supplying the purge gas for pressure control, into the substrate processing chamber with a flow rate greater than that of the purge gas for pressure control.
摘要翻译：通过本发明的装置和方法来抑制当气体供应到真空室中时通过发生粘性力而在两个真空室之间打开闸阀时产生的冲击波和颗粒的剥离是必要的，由此基板的污染颗粒被抑制。如果一个真空室是用于在基板上进行真空处理的基板处理室，另一个室是其中具有基板传送装置的传送室，则当两个真空室的内部压力小于66.5Pa时，闸阀打开其中较高的一个小于其较低的一个的两倍。优选地，在将用于压力控制的吹扫气体供给到用于压力控制的吹扫气体的流量以上的流量之前，供给用于剥离颗粒的吹扫气体。

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