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    • 42. 发明授权
    • Fuel distribution apparatus for a V-type engine
    • 用于V型发动机的燃油分配装置
    • US08033270B2
    • 2011-10-11
    • US12392402
    • 2009-02-25
    • Naoto YamagishiTakashi Yokoyama
    • Naoto YamagishiTakashi Yokoyama
    • F02M55/02F02M55/00
    • F02B75/22F02M37/007
    • A fuel distribution apparatus for a V-type engine wherein first and second throttle bodies connected to first and second banks disposed in a V shape, respectively, are disposed therebetween and a main fuel distribution pipe for distributing fuel from a common fuel supply system is connected to first and second fuel injection valves provided in the first and second throttle bodies, respectively, is configured such that the fuel distribution pipe is formed from first and second distribution pipes separate from each other and connected to the first and second fuel injection valves and besides fastened to the first and second throttle bodies, respectively, a joint pipe connects the fuel supply to the first or second distribution pipes. Communication conduit connects the first and second distribution pipes.
    • 一种用于V型发动机的燃料分配装置,其中分别设置有连接到V形状的第一和第二排的第一和第二节流体,并且连接用于从公共燃料供应系统分配燃料的主燃料分配管 设置在第一和第二节流体中的第一和第二燃料喷射阀分别被构造成使得燃料分配管由彼此分离并连接到第一和第二燃料喷射阀的第一和第二分配管形成,此外 分别固定在第一和第二节流体上,连接管将燃料供给部与第一或第二分配管连接起来。 通信管道连接第一和第二分配管道。
    • 45. 发明授权
    • Film forming apparatus
    • 成膜装置
    • US07691203B2
    • 2010-04-06
    • US11341093
    • 2006-01-27
    • Toru InagakiTakahiro ShirahataTakashi YokoyamaMichihiro SanoNaochika Horio
    • Toru InagakiTakahiro ShirahataTakashi YokoyamaMichihiro SanoNaochika Horio
    • C23C16/22H01L21/36C23C16/00
    • C23C16/45514C23C16/4411C23C16/4412C23C16/45563C23C16/4584C30B25/14C30B29/16
    • A film forming apparatus is provided that can prevent source gases from reacting together before reaching the substrate being processed in the apparatus, minimize the influence of the radiation heat from the substrate, and make the gas behavior in the reaction chamber better for crystal film formation. The apparatus forms a film on a surface of a heated substrate 5 by causing a first source gas and a second source gas to react together. The apparatus has a processing chamber 1, in which the substrate 5 is placed. The processing chamber 1 is divided into a heating chamber 1a and a reaction chamber 1b by at least the substrate 5 so that the substrate surface can be exposed to the source gases in the reaction chamber 1b. The apparatus further has an exhaust duct 7, through which the exhaust gas can be discharged. The exhaust duct 7 faces the exposed substrate surface and connects with the reaction chamber 1b. The apparatus further has first supply ports 11 and second supply ports 12, through which the first and second source gases respectively can be supplied independently onto the substrate surface. The supply ports 11 and 12 are positioned outside the exhaust duct 7. This enables the source gases to react immediately near the substrate 5 so that high-quality crystal film formation can be performed on the substrate.
    • 提供了一种成膜装置,其可以在到达装置内被处理的基板之前防止源气体一起反应,从而最小化来自基板的辐射热的影响,并使反应室中的气体行为更好地用于晶体膜形成。 该装置通过使第一源气体和第二源气体一起反应而在加热的基板5的表面上形成膜。 该装置具有处理室1,其中放置有基板5。 处理室1至少由基板5分成加热室1a和反应室1b,使得基板表面能够暴露于反应室1b中的源气体。 该装置还具有排气管7,排气可以排出。 排气管7面对暴露的基板表面并与反应室1b连接。 该装置还具有第一供应端口11和第二供应端口12,第一和第二源气体可以分别通过第一供应端口11和第二供应端口12独立地供应到基板表面上。 供给口11和12位于排气管7的外部。这使得源气体能够在基板5附近立即反应,从而可以在基板上进行高质量的晶体成膜。
    • 46. 发明授权
    • Multicast packet control apparatus
    • 组播包控制装置
    • US07532624B2
    • 2009-05-12
    • US11508240
    • 2006-08-23
    • Kozo IkegamiTakashi YokoyamaMinoru NagaiYoshitaka SakamotoShigehiro Onizawa
    • Kozo IkegamiTakashi YokoyamaMinoru NagaiYoshitaka SakamotoShigehiro Onizawa
    • H04L12/28
    • H04L12/1881
    • When multicast distribution is performed on a network where a point-to-point connection is made between user terminals and a multicast router, the multicast router is protected from load due to response reports, join requests, or leave statements sent from the user terminals simultaneously. If the user terminals send response reports simultaneously, a Layer 2 switch disposed between the user terminals and the multicast router limits response reports sent to the multicast router. The Layer 2 switch prevents response reports sent from the same user terminal from being discarded consecutively, by sending a response report sent from the same user terminal to the multicast router 200 with priority in the next join confirmation event. If the user terminals send join requests or leave statements simultaneously, the Layer 2 switch limits the join requests or leave statements sent to the multicast router 200 in the same manner. The Layer 2 switch further enlarges a transmission buffer thereof at the multicast router side, so that the packets can be stored in the buffer.
    • 当在用户终端和组播路由器之间进行点对点连接的网络上执行组播分发时,由于响应报告,加入请求或者从用户终端同时发送的离开语句,组播路由器受到保护而受到保护 。 如果用户终端同时发送响应报告,则设置在用户终端和组播路由器之间的二层交换机限制发送给组播路由器的响应报告。 第二层交换机防止从同一用户终端发送的响应报告被连续丢弃,通过在下一个加入确认事件中以优先级的方式发送从同一用户终端发送到组播路由器200的响应报告。 如果用户终端同时发送加入请求或离开语句,则二层交换机以相同的方式限制加入请求或发送到组播路由器200的语句。 二层交换机进一步放大了组播路由器侧的发送缓冲区,使得分组可以存储在缓冲器中。
    • 47. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
    • 半导体器件及其制造方法
    • US20090108367A1
    • 2009-04-30
    • US12246210
    • 2008-10-06
    • Takashi Yokoyama
    • Takashi Yokoyama
    • H01L47/00H01L21/76
    • H01L21/823807H01L27/0207H01L29/7843H01L2924/0002H01L2924/00
    • The present invention provides a semiconductor device includes: an element isolation region configured to be formed in a semiconductor substrate; a P-type field effect transistor configured to be formed in a first element formation region of the semiconductor substrate for which isolation by the element isolation region is carried out; an N-type substrate region configured to be formed in the semiconductor substrate for which isolation by the element isolation region is carried out, arsenic being ion-implanted into the N-type substrate region; a nickel silicide layer configured to be formed on the N-type substrate region; a first insulating film configured to cover the P-type field effect transistor and have compressive stress; and a second insulating film configured to cover the N-type substrate region and have tensile stress or compressive stress lower than the compressive stress of the first insulating film.
    • 本发明提供一种半导体器件,包括:元件隔离区,被配置为形成在半导体衬底中; P型场效应晶体管被配置为形成在半导体衬底的由元件隔离区进行隔离的第一元件形成区域中; 构造成形成在半导体衬底中的由元件隔离区进行隔离的N型衬底区域,将砷离子注入到N型衬底区域中; 构造成形成在所述N型衬底区域上的硅化镍层; 配置为覆盖P型场效应晶体管并具有压应力的第一绝缘膜; 以及第二绝缘膜,其构造成覆盖所述N型基板区域,并且具有比所述第一绝缘膜的压缩应力低的拉伸应力或压缩应力。
    • 50. 发明申请
    • Previous amplifier circuit, light-receiving amplifier circuit, and optical pickup apparatus
    • 以前的放大器电路,光接收放大器电路和光学拾取装置
    • US20070228260A1
    • 2007-10-04
    • US11710506
    • 2007-02-26
    • Takashi Yokoyama
    • Takashi Yokoyama
    • H01L31/00
    • G11B7/131H03F3/08
    • A previous amplifier circuit of the present invention includes: a grounded emitter amplifier circuit using a grounded emitter transistor connected to a light receiving device; another grounded emitter amplifier circuit using another grounded emitter transistor connected to another light receiving device; and a grounded emitter changing switch to be switched in a manner such that an emitter of the grounded emitter transistors is grounded so as to cause only one of the grounded emitter amplifier circuits to operate. A light-receiving amplifier circuit includes the previous amplifier circuit. An optical pickup apparatus includes the light-receiving amplifier circuit.
    • 本发明的先前的放大器电路包括:使用连接到光接收装置的接地发射极晶体管的接地发射极放大器电路; 另一接地发射极放大器电路,使用另一接地发射极晶体管连接到另一光接收装置; 以及接地发射极改变开关,以使得接地的发射极晶体管的发射极接地,从而仅使一个接地的发射极放大器电路工作。 光接收放大器电路包括先前的放大器电路。 光拾取装置包括光接收放大器电路。