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    • 41. 发明授权
    • Microcomputer having a protection function in a register
    • 微机在寄存器中具有保护功能
    • US08789169B2
    • 2014-07-22
    • US12783252
    • 2010-05-19
    • Sugako OtaniHiroyuki Kondo
    • Sugako OtaniHiroyuki Kondo
    • G06F21/00
    • G06F9/30123G06F9/30054G06F9/30138G06F9/30189G06F9/3861
    • A control unit controls execution of an instruction according to a decode result of an instruction code. A GRA register stores an access attribute for each of the plurality of general-purpose registers. A mode storage unit stores modes for controlling an operation of a CPU. When the control unit makes a request for access to the general-purpose register, register access allowance determining circuit determines whether the access to the general-purpose register in question is to be allowed or not, depending on the access attribute stored in the GRA register and the mode stored in the mode storage unit. Therefore, the number of the general-purpose registers used corresponding to the mode can be changed, and efficiency of use of the general-purpose registers can be optimized.
    • 控制单元根据指令代码的解码结果控制指令的执行。 GRA寄存器存储多个通用寄存器中的每一个的访问属性。 模式存储单元存储用于控制CPU的操作的模式。 当控制单元请求访问通用寄存器时,寄存器访问允许确定电路根据存储在GRA寄存器中的访问属性来确定是否允许访问通用寄存器 以及存储在模式存储单元中的模式。 因此,可以改变与模式对应使用的通用寄存器的数量,并且可以优化通用寄存器的使用效率。
    • 48. 发明申请
    • Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same
    • 用于EUV的多层反射镜,用于其的波前像差校正方法以及包含该反射镜的EUV光学系统
    • US20050157384A1
    • 2005-07-21
    • US11025002
    • 2004-12-28
    • Masayuki ShiraishiKatsuhiko MurakamiHiroyuki KondoNoriaki Kandaka
    • Masayuki ShiraishiKatsuhiko MurakamiHiroyuki KondoNoriaki Kandaka
    • G02B5/08G03F7/20
    • G03F7/706G02B5/08G03F7/70216G03F7/70258G03F7/70316
    • Multilayer mirrors are disclosed for use especially in “Extreme Ultraviolet” (“soft X-ray,” or “EUV”) optical systems. Each multilayer mirror includes a stack of alternating layers of a first material and a second material, respectively, to form an EUV-reflective surface. The first material has a refractive index substantially the same as a vacuum, and the second material has a refractive index that differs sufficiently from the refractive index of the first material to render the mirror reflective to EUV radiation. The wavefront profile of EUV light reflected from the surface is corrected by removing (“machining” away) at least one surficial layer of the stack in selected region(s) of the surface of the stack. Machining can be performed such that machined regions have smooth tapered edges rather than abrupt edges. The stack can include first and second layer groups that allow the unit of machining to be very small, thereby improving the accuracy with which wavefront-aberration correction can be conducted. Also disclosed are various at-wavelength techniques for measuring reflected-wavelength profiles of the mirror. The mirror surface can include a cover layer of a durable material having high transparency and that reduces variations in reflectivity of the surface caused by machining the selected regions.
    • 公开了多层反射镜用于特别是在“极光紫外线”(“软X射线”或“EUV”)光学系统中。 每个多层反射镜分别包括第一材料和第二材料的交替层叠,以形成EUV反射表面。 第一材料具有与真空基本相同的折射率,并且第二材料具有与第一材料的折射率充分不同的折射率,以使反射镜反射成EUV辐射。 通过在堆叠的表面的选定区域中移除(“加工”)去除堆叠的至少一个表面层来校正从表面反射的EUV光的波前轮廓。 可以进行加工,使得加工区域具有平滑的锥形边缘而不是突然的边缘。 堆叠可以包括允许加工单元非常小的第一和第二层组,从而提高可以进行波前像差校正的精度。 还公开了用于测量反射镜的反射波长分布的各种一般波长技术。 镜面可以包括具有高透明度的耐用材料的覆盖层,并且减少由加工所选择的区域引起的表面的反射率的变化。
    • 50. 发明授权
    • X-ray sources that maintain production of rotationally symmetrical x-ray flux during use
    • X射线源在使用过程中保持产生旋转对称的X射线通量
    • US06690764B2
    • 2004-02-10
    • US09817900
    • 2001-03-26
    • Hiroyuki Kondo
    • Hiroyuki Kondo
    • G21G400
    • G03F7/70916B82Y10/00G03F7/70033G03F7/7055
    • Apparatus and methods are disclosed for producing a flux of X-rays, from a plasma, wherein the flux remains rotationally symmetrical about a propagation axis over a period of use, even if the plasma produce flying debris. The plasma can be generated by a laser-plasma source or a discharge-plasma source, for example. The X-rays produced by the plasma are directed by an optical element to a downstream location. To such end, the optical element is located where it is subject to deposition and accumulation of flying debris from the plasma. The optical element has an axis of rotational symmetry. A rotational actuator is situated relative to the optical element and is configured to rotate the optical element about the axis of rotational symmetry during use. Hence, if deposits of flying debris form on the optical element, the deposits will be rotationally symmetrical and thus have an identical affect on the X-ray flux at any angle about the axis of rotational symmetry.
    • 公开了用于从等离子体产生X射线通量的装置和方法,其中在使用期间,通量在传播轴线周围保持旋转对称,即使等离子体产生飞溅碎片。 例如,等离子体可以由激光等离子体源或放电等离子体源产生。 由等离子体产生的X射线由光学元件引导到下游位置。 为此,光学元件位于其被等离子体飞行碎屑沉积和堆积的地方。 光学元件具有旋转对称轴。 旋转致动器相对于光学元件设置并且被配置为在使用期间围绕旋转对称轴旋转光学元件。 因此,如果飞散碎片的沉积物形成在光学元件上,则沉积物将是旋转对称的,因此对于围绕旋转对称轴线的任何角度的X射线通量具有相同的影响。