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    • 41. 发明授权
    • System and method for driving an industrial control device
    • 用于驱动工业控制装置的系统和方法
    • US07394639B2
    • 2008-07-01
    • US11177814
    • 2005-07-08
    • Kenneth FinleyMichael J. ZolockBrian Lee
    • Kenneth FinleyMichael J. ZolockBrian Lee
    • H01H57/00H02N2/00
    • H02N2/062
    • A process control apparatus including an actuator configured to effect changes in an industrial process, a power supply, a plurality of current switches coupled between the actuator and the power supply and a controller coupled to the plurality of current switches. The controller is configured to selectively close one or more of the plurality of current switches so as to provide a selectable level of current from the power supply to the actuator. In variations, a plurality of discharge switches are coupled to the actuator and the controller is configured to selectively close the discharge switches so as to provide a selectable level of charge to discharge from the actuator.
    • 一种过程控制装置,包括致动器,其被配置为实现工业过程,电源,耦合在致动器和电源之间的多个电流开关以及耦合到多个电流开关的控制器的变化。 控制器被配置为选择性地关闭多个电流开关中的一个或多个,以便从电源向致动器提供可选择的电流水平。 在变型中,多个放电开关耦合到致动器,并且控制器被配置为选择性地关闭放电开关,以便提供可选择的电荷水平以从致动器排出。
    • 43. 发明授权
    • Optimization of circuit designs using a continuous spectrum of library cells
    • 使用连续光谱库细胞优化电路设计
    • US07107551B1
    • 2006-09-12
    • US10447396
    • 2003-05-30
    • Paul de DoodBrian LeeDaniel Albers
    • Paul de DoodBrian LeeDaniel Albers
    • G06F17/50
    • G06F17/505G06F2217/08
    • A method and apparatus for optimizing a circuit design using a library of cells in which a continuous spectrum of cells are provided. A library containing real and virtual cells is used so that cells can be selected across a wide spectrum of a design parameter, such as drive strength. The cells are provided in discrete steps small enough that the effect of having a continuous spectrum of cells is achieved. After optimization, only the cells finally selected need be actually synthesized, and when these constitute a small percentage of the total number of cells, the impact to library size and final placement and routing is minimized. Thus the ability to optimize across a continuous spectrum is achieved while preserving a cell library based design flow.
    • 一种用于使用其中提供有连续细胞谱的单元库优化电路设计的方法和装置。 使用包含真实和虚拟单元格的库,以便可以在设计参数的广泛范围(如驱动强度)中选择单元格。 以足够小的离散步骤提供细胞,以实现具有细胞连续光谱的效果。 优化后,只有最终选择的单元需要实际合成,当这些单元构成单元总数的一小部分时,对库大小和最终布局和路由的影响最小化。 因此,在保持基于细胞库的设计流程的同时,实现了连续光谱优化的能力。
    • 48. 发明申请
    • Method and apparatus to illuminate the interior of a fashion accessory
    • 照亮时尚配件内部的方法和装置
    • US20050057923A1
    • 2005-03-17
    • US10972008
    • 2004-10-22
    • Kara Catherine KurczBrian Lee
    • Kara Catherine KurczBrian Lee
    • A45C13/04A45C15/06B28D1/18
    • A45C15/06A45C13/04
    • The invention includes an apparatus for illuminating the interior of a fashion accessory and a method for assembling the same. An illumination device may include a dual illumination source, a power source, and a switch electrically coupled to one another. The dual illumination source may be a pair of electric luminescent wires affixed to the interior of the fashion accessory. The switch may cause the dual illumination source to illuminate when the fashion accessory is opened and to turn off when the fashion accessory is closed. Various elements of the illumination device may be obscured from view by including the same behind an interior lining of the fashion accessory, and the illumination source may be selected from any suitable color so as to provide illumination of a desired color. Additionally, the power source may be rechargeable, and may be configured to power additional electronic devices.
    • 本发明包括用于照亮时尚配件内部的装置及其组装方法。 照明装置可以包括双照明源,电源和彼此电耦合的开关。 双重照明源可以是固定到时尚配件内部的一对电发光线。 当时尚配件打开时,开关可能导致双重照明光源照亮,而当时尚配件关闭时,开关可能会熄灭。 通过将照明装置的各个元件包括在时尚配件的内衬之后,可以将照明装置遮蔽,并且可以从任何合适的颜色中选择照明源,以便提供所需颜色的照明。 另外,电源可以是可再充电的,并且可以被配置为对附加的电子设备供电。
    • 50. 发明授权
    • Self-aligned active array along the length direction to form un-biased buried strap formation for sub-150 NM BEST DRAM devices
    • 沿着长度方向的自对准有源阵列,以形成用于次150 NM BEST DRAM器件的非偏置掩埋带形成
    • US06528367B1
    • 2003-03-04
    • US10002983
    • 2001-11-30
    • Brian Lee
    • Brian Lee
    • H01L218242
    • H01L27/10867H01L27/10829H01L29/66181
    • An improved buried strap method in the fabrication of a DRAM integrated circuit device where the active area is self-aligned to the deep trench in the length direction only is described. An etch stop layer is provided on a substrate. A deep trench is etched into the substrate not covered by the etch stop layer and filled with a silicon layer to form a deep trench capacitor. A polysilicon layer is deposited over the capacitor to form a buried strap. A liner layer is deposited over the etch stop layer and the buried strap having the same material as the etch stop layer. A hard mask material is deposited over the liner layer and etched where it is not covered by a mask wherein etching stops at the liner layer. The liner layer and the etch stop layer are etched away where they are not covered by the hard mask layer to form an etch stop frame. The substrate and the deep trench are etched into where they are exposed by the hard mask and the etch stop frame to form isolation trenches. The isolation trenches are filled with a dielectric layer. Gate electrodes are formed overlying the isolation trenches and the substrate. The substrate is annealed whereby dopants from the buried strap diffuse into the substrate to form a buried strap diffusion wherein the buried strap diffusion connects the deep trench capacitor to one of the gate electrodes to complete the buried strap DT DRAM device.
    • 描述了DRAM集成电路器件的制造中的改进的埋地带方法,其中有源区域仅在长度方向上与深沟槽自对准。 在基板上设置蚀刻停止层。 将深沟槽蚀刻到未被蚀刻停止层覆盖的衬底中,并填充有硅层以形成深沟槽电容器。 在电容器上沉积多晶硅层以形成掩埋带。 衬底层沉积在蚀刻停止层上,并且掩埋带与蚀刻停止层具有相同的材料。 将硬掩模材料沉积在衬里层上并蚀刻,其中未被掩模覆盖,其中蚀刻在衬层处停止。 衬里层和蚀刻停止层被蚀刻掉,其中它们不被硬掩模层覆盖以形成蚀刻停止框架。 衬底和深沟槽被蚀刻到它们被硬掩模和蚀刻停止框架暴露的位置,以形成隔离沟槽。 隔离沟槽填充有介电层。 栅电极形成在隔离沟槽和衬底上。 退火衬底,由此来自掩埋带的掺杂剂扩散到衬底中以形成掩埋带扩散,其中掩埋带扩散将深沟槽电容器连接到其中一个栅电极以完成掩埋带DT DRAM器件。