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1. 发明申请

US20060091330A1 Alignment systems and methods for lithographic systems 有权
公开(公告)号：US20060091330A1
公开(公告)日：2006-05-04
申请号：US11294476
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Koren , Hoite Pieter Tolsma , Hubertus Johannes Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Koren , Hoite Pieter Tolsma , Hubertus Johannes Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

2. 发明申请

US20050189502A1 Alignment systems and methods for lithographic systems 有权
标题翻译：光刻系统的对准系统和方法
公开(公告)号：US20050189502A1
公开(公告)日：2005-09-01
申请号：US10665404
申请日：2003-09-22
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00 , G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

3. 发明申请

US20060103033A1 Marker structure and method for controlling alignment of layers of a multi-layered substrate 有权
公开(公告)号：US20060103033A1
公开(公告)日：2006-05-18
申请号：US10986179
申请日：2004-11-12
申请人： Richard Johannes Van Haren , Arie Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bartolomeus Rijpers
发明人： Richard Johannes Van Haren , Arie Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bartolomeus Rijpers
IPC分类号： H01L23/544
CPC分类号： H01L23/544 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7076 , G03F9/7092 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.

4. 发明申请

US20070187358A1 Device manufacturing method and computer program product 有权
标题翻译：设备制造方法和计算机程序产品
公开(公告)号：US20070187358A1
公开(公告)日：2007-08-16
申请号：US11435296
申请日：2006-05-17
申请人： Richard Johannes Van Haren , Maurits Schaar , Ewoud Vreugdenhil , Harry Sewell
发明人： Richard Johannes Van Haren , Maurits Schaar , Ewoud Vreugdenhil , Harry Sewell
IPC分类号： C23F1/00 , G06F19/00 , B44C1/22 , G01L21/30
CPC分类号： H01L21/76816 , H01L21/0337 , H01L21/0338 , H01L21/31144
摘要： A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process. Also, the method may be repeated to create arrays at even higher densities.
摘要翻译：形成特征的方法，例如以比常规光刻技术更高的密度接触孔包括形成牺牲性特征阵列，从而保形地沉积牺牲层，使得负特征与正特征交错形成，定向蚀刻牺牲层并去除牺牲特征。结果是以比原始牺牲特征更高的密度的孔阵列。然后可以使用所需的方法将这些物质转移到下面的基底中。此外，可以重复该方法以以更高的密度创建阵列。

5. 发明申请

US20070222960A1 Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement 有权
标题翻译：平版印刷设备和器件制造方法，具有减少基片测量的划线通道用途
公开(公告)号：US20070222960A1
公开(公告)日：2007-09-27
申请号：US11384836
申请日：2006-03-21
申请人： Maurits Van Der Schaar , Arie Den Boef , Richard Johannes Van Haren , Everhardus Mos
发明人： Maurits Van Der Schaar , Arie Den Boef , Richard Johannes Van Haren , Everhardus Mos
IPC分类号： G03B27/54
CPC分类号： G03F7/70433 , G03F7/70625 , G03F7/70633 , G03F9/7049 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： In a device manufacturing method and lithographic apparatus wherein a pattern is transferred from a patterning device onto a substrate, a measurement target is provided on the substrate in a process enabling execution of a substrate measurement using radiation of a first wavelength. Subsequently the measurement target is transformed in a grid of conducting material, the grid having grid openings which are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.
摘要翻译：在其中将图案从图案形成装置转印到基板上的装置制造方法和光刻设备中，在能够使用第一波长的辐射执行基板测量的处理中，在基板上提供测量目标。随后，将测量目标变换为导电材料的栅格，栅格具有比第一波长小的栅格开口。测量目标的划线中的空间现在被屏蔽，并且可以再次用于基板的更多层或处理步骤。

6. 发明申请

US20060138682A1 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby 有权
标题翻译：基板在基本透射的工艺层中设置有对准标记，用于曝光所述标记的掩模，器件制造方法以及由此制造的器件
公开(公告)号：US20060138682A1
公开(公告)日：2006-06-29
申请号：US11357093
申请日：2006-02-21
申请人： Richard Johannes Van Haren
发明人： Richard Johannes Van Haren
IPC分类号： H01L23/544 , H01L21/42 , G03F1/00
CPC分类号： G03F9/7088 , G03F7/70633 , G03F9/7076 , H01L22/34 , H01L2223/54426 , H01L2924/0002 , Y10S438/975 , H01L2924/00
摘要： A substrate provided with an alignment mark in a substantially transmissive process layer overlying the substrate, said mark comprising high reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, wherein the high reflectance areas comprise at least one substantially linear sub-grating. In one example, a substantially linear sub-grating comprises a plurality of spaced square regions.
摘要翻译：在衬底上设置有基本上透射的工艺层中的对准标记的衬底，所述标记包括用于反射辐射对准束的辐射的高反射率区域和用于反射对准光束的较少辐射的低反射率区域，其中高反射率区域包括至少一个基本上线性的子光栅。在一个示例中，基本上线性的子光栅包括多个间隔开的正方形区域。

7. 发明申请

US20070222990A1 Alignment tool for a lithographic apparatus 失效
标题翻译：光刻设备对准工具
公开(公告)号：US20070222990A1
公开(公告)日：2007-09-27
申请号：US11389494
申请日：2006-03-27
申请人： Sami Musa , Richard Johannes Van Haren , Maurits Schaar
发明人： Sami Musa , Richard Johannes Van Haren , Maurits Schaar
IPC分类号： G01B11/00
CPC分类号： G03F9/7049 , G03F9/7015 , G03F9/7088
摘要： An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.
摘要翻译：用于光刻设备的对准工具用对准光照射衬底上的对准标记并测量反射光谱。将反射光谱与参考标记进行比较以确定任何未对准。使用闪耀的亚波长光栅来将通过将对准光束从对准标记衍射衍射到参考标记而产生的子光束偏转。

8. 发明申请

US20070132996A1 Alignment devices and methods for providing phase depth control 有权
标题翻译：对准装置和提供相位深度控制的方法
公开(公告)号：US20070132996A1
公开(公告)日：2007-06-14
申请号：US11606374
申请日：2006-11-30
申请人： Richard Johannes Van Haren , Sami Musa
发明人： Richard Johannes Van Haren , Sami Musa
IPC分类号： G01B11/00
CPC分类号： G03F9/7076
摘要： Alignment marks for use on substrates. An exemplary implementation provides phase depth control. A grating mark, for example, can be etched on a silicon wafer with sub-wavelength segmentation in the spacing portion of the alignment grating's period. The sub-wavelength segmentation can be applied to the spaces or to the lines, or both, of an alignment grating to control the phase depth of the grating. By applying segmentation with a period smaller than the alignment light wavelength in either the space(s) and/or in the line(s) of the grating, the effective refractive index in that region can be manipulated. This change in the effective index will result in a change in the phase depth (optical path length). By varying the duty cycle of the sub-wavelength segmented region, the effective refractive index can be controlled, thereby providing selective control over the phase depth.
摘要翻译：用于基板的对准标记。示例性实施例提供相位深度控制。例如，可以在对准光栅的周期的间隔部分中的亚波长分割的硅晶片上蚀刻光栅标记。亚波长分割可以应用于对准光栅的空间或线或两者，以控制光栅的相位深度。通过在光栅的空间和/或线中以比对准光波长小的周期进行分割，可以操纵该区域中的有效折射率。有效指标的变化将导致相位深度（光程长度）的变化。通过改变亚波长分割区域的占空比，可以控制有效折射率，从而提供对相位深度的选择性控制。

9. 发明申请

US20050040545A1 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby 失效
标题翻译：基板在基本透射的工艺层中设置有对准标记，用于曝光所述标记的掩模，器件制造方法以及由此制造的器件
公开(公告)号：US20050040545A1
公开(公告)日：2005-02-24
申请号：US10960695
申请日：2004-10-08
申请人： Richard Johannes Van Haren
发明人： Richard Johannes Van Haren
IPC分类号： G03F1/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/44 , H01L21/50 , H01L23/544
CPC分类号： G03F9/7088 , G03F7/70633 , G03F9/7076 , H01L22/34 , H01L2223/54426 , H01L2924/0002 , Y10S438/975 , H01L2924/00
摘要： A method according to one embodiment includes aligning an alignment mark in a substantially transmissive process layer overlying a substrate, said mark comprising high reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, wherein the low reflectance areas comprise scattering structures for scattering radiation of the alignment beam.
摘要翻译：根据一个实施例的方法包括将覆盖在衬底上的基本上透射的工艺层中的对准标记对准，所述标记包括用于反射放射线对准束的辐射的高反射率区域和用于反射对准光束的较少辐射的低反射率区域，其中低反射率区域包括用于散射对准光束的辐射的散射结构。

10. 发明申请

US20070114678A1 Binary sinusoidal sub-wavelength gratings as alignment marks 有权
标题翻译：二进正弦亚波长光栅作为对准标记
公开(公告)号：US20070114678A1
公开(公告)日：2007-05-24
申请号：US11284407
申请日：2005-11-22
申请人： Richard Johannes Van Haren , Sami Musa
发明人： Richard Johannes Van Haren , Sami Musa
IPC分类号： H01L23/544
CPC分类号： G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： The present invention relates to alignment marks for use on substrates, the alignment marks consisting of periodic 2-dimensional arrays of structures, the spacing of the structures being smaller than an alignment beam but larger than an exposure beam and the width of the structures varying sinusoidally from one end of an array to the other.
摘要翻译：本发明涉及在基板上使用的对准标记，对准标记由周期性二维结构阵列组成，其结构的间距小于对准光束但大于曝光光束，并且结构的宽度正弦变化从阵列的一端到另一端。

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