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1. 发明申请

US20060091330A1 Alignment systems and methods for lithographic systems 有权
公开(公告)号：US20060091330A1
公开(公告)日：2006-05-04
申请号：US11294476
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Koren , Hoite Pieter Tolsma , Hubertus Johannes Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Koren , Hoite Pieter Tolsma , Hubertus Johannes Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

2. 发明申请

US20050189502A1 Alignment systems and methods for lithographic systems 有权
标题翻译：光刻系统的对准系统和方法
公开(公告)号：US20050189502A1
公开(公告)日：2005-09-01
申请号：US10665404
申请日：2003-09-22
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00 , G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

3. 发明申请

US20060081791A1 Alignment systems and methods for lithographic systems 审中-公开
公开(公告)号：US20060081791A1
公开(公告)日：2006-04-20
申请号：US11294475
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

4. 发明申请

US20060081790A1 Alignment systems and methods for lithographic systems 审中-公开
标题翻译：光刻系统的对准系统和方法
公开(公告)号：US20060081790A1
公开(公告)日：2006-04-20
申请号：US11294473
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

5. 发明申请

US20060081792A1 Alignment systems and methods for lithographic systems 有权
公开(公告)号：US20060081792A1
公开(公告)日：2006-04-20
申请号：US11294559
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

6. 发明授权

US08726103B2 Visual outage management tool 失效
标题翻译：视觉中断管理工具
公开(公告)号：US08726103B2
公开(公告)日：2014-05-13
申请号：US12962215
申请日：2010-12-07
申请人： Brian Lee
发明人： Brian Lee
IPC分类号： G06F11/00
CPC分类号： G06F11/328 , G06F11/3006 , G06F11/3017 , G06F11/302 , G06F11/3055 , G06Q10/06
摘要： Described herein are systems related to a visual tool for providing a dynamic and accessible collaborative environment during a production outage or network downtime. An outage management tool comprising a server application tool receiving and storing monitoring data related to an operation of a network and application-level components of the network, wherein the monitoring data includes outage information corresponding to one of the network and the application-level components, and a visualization tool generating an interactive representation of the network including the outage information, the visualization tool and generating, in response to a request, an adjusted interactive representation of the network including application-level components affected by an outage and event traffic related to the outage.
摘要翻译：这里描述的是与可视化工具相关的系统，用于在生产中断或网络停机期间提供动态和可访问的协作环境。一种中断管理工具，包括服务器应用工具，其接收和存储与网络的操作和网络的应用级组件相关的监控数据，其中所述监控数据包括与所述网络和所述应用级组件之一相对应的中断信息，以及可视化工具，其生成包括所述中断信息，所述可视化工具的所述网络的交互式表示，并响应于所述请求生成所述网络的经调整的交互式表示，所述交互式表示包括由与所述中断相关的中断和事件流量影响的应用级组件停电

7. 发明授权

US08541247B2 Non-volatile memory cell with lateral pinning 失效
标题翻译：具有侧向锁定的非易失性存储单元
公开(公告)号：US08541247B2
公开(公告)日：2013-09-24
申请号：US12973536
申请日：2010-12-20
申请人： Haiwen Xi , Antoine Khoueir , Brian Lee , Patrick J. Ryan
发明人： Haiwen Xi , Antoine Khoueir , Brian Lee , Patrick J. Ryan
IPC分类号： H01L27/115
CPC分类号： H01L43/08 , B82Y40/00 , G11C11/161 , G11C11/1675 , H01F10/3254 , H01F10/3272 , H01F10/329 , H01F41/303 , H01L43/12
摘要： An apparatus and associated method for a non-volatile memory cell, such as an STRAM cell. In accordance with various embodiments, a magnetic free layer is laterally separated from an antiferromagnetic layer (AFM) by a non-magnetic spacer layer and medially separated from a synthetic antiferromagnetic layer (SAF) by a magnetic tunneling junction. The AFM pins the magnetization of the SAF through contact with a pinning region of the SAF that laterally extends beyond the magnetic tunneling junction.
摘要翻译：用于非易失性存储器单元（例如STRAM单元）的装置和相关方法。根据各种实施例，无磁性层通过非磁性间隔层与反铁磁层（AFM）横向分离，并通过磁性隧道结从中间分离的合成反铁磁层（SAF）。 AFM通过与SAF的钉扎区域的接触来引导SAF的磁化，该区域横向延伸超过磁性隧道结。

8. 发明授权

US08508981B2 Apparatus for variable resistive memory punchthrough access method 有权
标题翻译：用于可变电阻存储器穿透访问方法的装置
公开(公告)号：US08508981B2
公开(公告)日：2013-08-13
申请号：US13478174
申请日：2012-05-23
申请人： Maroun Georges Khoury , Hongyue Liu , Brian Lee , Andrew John Gjevre Carter
发明人： Maroun Georges Khoury , Hongyue Liu , Brian Lee , Andrew John Gjevre Carter
IPC分类号： G11C11/00
CPC分类号： G11C11/1675 , G11C11/1659
摘要： Variable resistive punchthrough access methods are described. The methods include switching a variable resistive data cell from a high resistance state to a low resistance state by passing a write current through the magnetic tunnel junction data cell in a first direction. The write current is provided by a transistor being electrically coupled to the variable resistive data cell and a source line. The write current passes through the transistor in punchthrough mode.
摘要翻译：描述了可变电阻穿透访问方法。所述方法包括通过使写入电流沿着第一方向通过磁性隧道结数据单元，将可变电阻数据单元从高电阻状态切换到低电阻状态。写入电流由电耦合到可变电阻数据单元和源极线的晶体管提供。写入电流在穿通模式下通过晶体管。

9. 发明授权

US08448766B2 Bi-directional clutch with staggered roller elements 有权
标题翻译：具有交错滚子元件的双向离合器
公开(公告)号：US08448766B2
公开(公告)日：2013-05-28
申请号：US12818751
申请日：2010-06-18
申请人： Tomas Smetana , Brian Lee
发明人： Tomas Smetana , Brian Lee
IPC分类号： F16D15/00 , F16D41/06
CPC分类号： F16D41/088 , F16D15/00
摘要： A coupling having at least two concentric rings, each having a circumferential surface and a recess, and at least two roller elements. The roller elements are each disposed in a channel formed by the circumferential surface of one of the rings and the recess of another of the rings. In some example embodiments of the invention, the coupling includes a coupling member with a bearing surface, at least one of the rings includes a split and the split ring is urged against the bearing surface when there is relative rotation between the rings. The coupling member is, for example, a shaft or a gear.
摘要翻译：具有至少两个同心环的联接器，每个具有圆周表面和凹槽，以及至少两个滚子元件。辊元件各自设置在由一个环的圆周表面和另一个环的凹部形成的通道中。在本发明的一些示例性实施例中，联接器包括具有支承表面的联接构件，至少一个环包括开口，并且当环之间存在相对旋转时，开口环被推靠在支承表面上。联接构件例如是轴或齿轮。

10. 发明申请

US20120120628A1 MODULAR FLAT-PANEL MONITOR STAND 有权
标题翻译：模块化平板监视器
公开(公告)号：US20120120628A1
公开(公告)日：2012-05-17
申请号：US13386428
申请日：2009-07-22
申请人： Robert P Bliven , Jacques Gagne , Kenneth G. Robertson , Brian Lee , Brian David Perry
发明人： Robert P Bliven , Jacques Gagne , Kenneth G. Robertson , Brian Lee , Brian David Perry
IPC分类号： H05K7/02 , F16L3/23 , H05K7/00
CPC分类号： G06F1/1601 , F16M11/041 , F16M11/10 , F16M13/00
摘要： A flat-panel display stand in accordance with the present invention includes a modular assembly for supporting a display on a horizontal surface so that the display tilt can be adjusted by the user. The stand has a modular design with only two modules: a retainer clip and supporting leg that are uniquely hinged together and connected to the rear of the display.
摘要翻译：根据本发明的平板显示支架包括用于在水平表面上支撑显示器的模块化组件，使得显示器倾斜度可以由用户调节。支架具有仅具有两个模块的模块化设计：保持夹和支撑腿，其独特地铰接在一起并连接到显示器的后部。

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