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31. 发明申请

US20070064225A1 Method and apparatus for detecting defects 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20070064225A1
公开(公告)日：2007-03-22
申请号：US11602247
申请日：2006-11-21
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/21
摘要： A method and apparatus for detecting a defect in which image signals of a same area of a sample are obtained by imaging the sample under different optical conditions, and the obtained image signals are analyzed and optical conditions are selected which modify a contrast in the image signal. Image signals of the sample under the selected optical conditions are obtained by imaging the sample with an inspection system, and the images under the selected optical conditions are evaluated to adjust optical conditions for inspection including an inspection threshold, which is greater than a maximum contrast difference among false defects detected at the step of obtaining and with which a maximum number of actual defects can be detected. A defect of the sample is detected by processing the image signals of the sample obtained through the inspection system under the adjusted optical conditions.
摘要翻译：一种检测缺陷的方法和装置，其中通过在不同光学条件下对样本进行成像而获得样品的相同区域的图像信号，并且分析所获得的图像信号，并且选择修改图像信号中的对比度的光学条件。通过用检查系统对样品进行成像获得样品的图像信号，并且在所选择的光学条件下评估图像以调整检查的光学条件，包括大于最大对比差的检查阈值在获取步骤中检测到的虚假缺陷中，可以检测到最大数量的实际缺陷。通过在调整光学条件下处理通过检查系统获得的样品的图像信号来检测样品的缺陷。

32. 发明申请

US20070058164A1 Method and apparatus for detecting defects 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20070058164A1
公开(公告)日：2007-03-15
申请号：US11478617
申请日：2006-07-03
申请人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
发明人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N2021/8822
摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.
摘要翻译：本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。

33. 发明申请

US20060290930A1 Method and apparatus for inspecting pattern defects 审中-公开
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20060290930A1
公开(公告)日：2006-12-28
申请号：US11434070
申请日：2006-05-16
申请人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Sachio Uto
发明人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/95623
摘要： The present invention relates to a pattern defect inspection apparatus, wherein light emitted from an illumination source capable of outputting a plurality of wavelengths is linearly illuminated by an illuminating optical system. Diffracted or scattered light due to a circuit pattern or defect on a wafer is collected by an imaging optical system onto a line sensor and converted into a digital signal, and the defect is detected by a signal processing section. Then, the defect can be detected with high sensitivity since a surface to be formed by an optical axis of the illuminating optical system and an optical axis of the imaging optical system is almost collimated to a direction of a wiring pattern and further since an angle to be formed by the optical axis of the imaging optical system and the wafer is set to an angle with less diffracted light from the pattern. Thereby, the pattern defect inspection detecting various defects on the wafer with high sensitivity at high speed can be achieved.
摘要翻译：本发明涉及一种图案缺陷检查装置，其中从能够输出多个波长的照明源发射的光线由照明光学系统线性地照亮。由于晶片上的电路图案或缺陷导致的衍射或散射光被成像光学系统收集到线传感器上并转换成数字信号，并且由信号处理部分检测缺陷。然后，由于要由照明光学系统的光轴和成像光学系统的光轴形成的表面几乎准直到布线图案的方向，因此可以以高灵敏度检测缺陷，并且进一步由于与由成像光学系统的光轴形成，并且将晶片设置成与来自图案的较少衍射光的角度。由此，可以实现以高速度高灵敏度地检测晶片上的各种缺陷的图案缺陷检查。

34. 发明授权

US07142294B2 Method and apparatus for detecting defects 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07142294B2
公开(公告)日：2006-11-28
申请号：US10020977
申请日：2001-12-19
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G01N21/9501 , G01N21/21
摘要： An image of a sample that has high contrast both in large and fine pattern parts is acquired by using an optical system for coaxial bright field epi-illumination, forming the optical image of the sample with various transmission ratio of 0-th order diffracted light that is reflected regularly from the sample, and capturing the image by an image sensor. Optical conditioning is automatically set and in a short time by detecting a plurality of optical images of the sample under various conditions for the transmission ratio of the 0-th order diffracted light, evaluating quality of the detected images, and determining the transmission ratio of the 0-th order diffracted light showing the maximum defect detection sensitivity.
摘要翻译：通过使用用于同轴的亮场表面照明的光学系统来获得具有大的和精细图案部分中的高对比度的样本的图像，以0级衍射光的各种传输比形成样品的光学图像，从样本中经常反射，并通过图像传感器捕获图像。通过在各种条件下检测出0级衍射光的透射率，评估检测图像的质量，并确定检测到的图像的透射率，自动设置光学调理并且在短时间内检测样品的多个光学图像表示最大缺陷检测灵敏度的0级衍射光。

35. 发明申请

US20050052642A1 Method and its apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法及其装置
公开(公告)号：US20050052642A1
公开(公告)日：2005-03-10
申请号：US10893988
申请日：2004-07-20
申请人： Yukihiro Shibata , Shunji Maeda , Hitoshi Kubota
发明人： Yukihiro Shibata , Shunji Maeda , Hitoshi Kubota
IPC分类号： G01B11/30 , G01N21/13 , G01N21/15 , G01N21/88 , G01N21/95 , G01N21/956 , G06K9/00 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/13 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/154 , G01N2021/8825 , G01N2021/9513
摘要： The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens 30 and a sample 1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.
摘要翻译：本发明涉及一种适用于图案精细化的高灵敏度检测方法和装置，其中使用以下技术提高了缺陷检查灵敏度：通过填充物镜30与物镜30之间的间隙来提高检测光学系统的分辨率。样品1，具有液体，并且增加有效NA（数值孔径）; 并且当在样品的表面上形成透明的层间绝缘膜时，抑制液体与绝缘膜之间的界面处的振幅分裂，以减少由于薄膜的干扰引起的光学图像在亮度上的不均匀性，由将物镜与样品之间的间隙浸入折射率接近于透明膜的液体。

36. 发明授权

US06674890B2 Defect inspection method and apparatus therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US06674890B2
公开(公告)日：2004-01-06
申请号：US09733092
申请日：2000-12-11
申请人： Shunji Maeda , Kenji Oka , Hiroshi Makihira , Yasuhiko Nakayama , Minoru Yoshida , Yukihiro Shibata , Chie Shishido
发明人： Shunji Maeda , Kenji Oka , Hiroshi Makihira , Yasuhiko Nakayama , Minoru Yoshida , Yukihiro Shibata , Chie Shishido
IPC分类号： G06K900
CPC分类号： G06T7/001 , G01R31/308 , G01R31/311 , G03F7/7065 , G06T7/0004 , G06T2207/10061 , G06T2207/30121 , G06T2207/30148
摘要： A pattern inspection method and apparatus in which an image of a first pattern formed on a sample and an image of a second pattern formed on the sample is detected. At least one of the first pattern image and the second pattern image is converted to a gray level so as to be substantially the same with each other by linear combination including a gain and offset. A defect of the sample is detected by using the first pattern image and the second pattern image at least one of which has been converted to the gray level and a result of the detection is outputted to an external storage or processor by a communication arrangement.
摘要翻译：检测形成在样本上的第一图案的图像和形成在样本上的第二图案的图像的图案检查方法和装置。第一图案图像和第二图案图像中的至少一个被转换为灰度级，以便通过包括增益和偏移的线性组合彼此基本相同。通过使用第一图案图像和其中至少一个已经被转换为灰度级的第二图案图像和通过通信装置将检测结果输出到外部存储器或处理器来检测样本的缺陷。

37. 发明授权

US6091075A Automatic focus detection method, automatic focus detection apparatus, and inspection apparatus 失效
标题翻译：自动对焦检测方法，自动对焦检测装置和检查装置
公开(公告)号：US6091075A
公开(公告)日：2000-07-18
申请号：US87901
申请日：1998-06-01
申请人： Yukihiro Shibata , Shunji Maeda , Hiroshi Makihara , Minoru Yoshida , Yasuhiko Nakayama , Kenji Oka
发明人： Yukihiro Shibata , Shunji Maeda , Hiroshi Makihara , Minoru Yoshida , Yasuhiko Nakayama , Kenji Oka
IPC分类号： G01N21/95 , G02B21/24 , G01N21/00 , G01N21/88
CPC分类号： G02B21/241 , G01N21/9501
摘要： An automatic focus detection method comprises the steps of: irradiating onto a single spot of a sample a plurality of beams of illuminating light transmitted and condensed through an objective lens in a symmetrically diagonal manner with respect to an optical axis of the objective lens; branching reflected light from the same spot of the illuminated sample after transmission through the objective lens, in directions of illumination symmetrical with respect to the optical axis so as to obtain a plurality of optical images; and causing a photoelectric conversion device to receive the branched optical images for conversion to an electric signal representing light intensity distribution of the images, whereby a defocus of the sample is detected based on a discrepancy between the optical axis and the center of the light intensity distribution.
摘要翻译：一种自动对焦检测方法，包括以下步骤：以相对于物镜的光轴对称对角线的方式，将通过物镜透射和聚光的多束照明光照射在样品的单个点上; 在相对于光轴对称的照明方向透射物镜之后，将来自照射样品的同一点的反射光分支，以获得多个光学图像; 并且使光电转换装置接收用于转换为表示图像的光强度分布的电信号的分支光学图像，由此基于光轴和光强度分布的中心之间的差异来检测样品的散焦。

38. 发明授权

US07916929B2 Defect inspection method and apparatus 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US07916929B2
公开(公告)日：2011-03-29
申请号：US12359452
申请日：2009-01-26
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
摘要翻译：一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并且针对样本的不同部分上的相似图案，以便更紧密地匹配亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。

39. 发明申请

US20090214102A1 DEFECT INSPECTION METHOD AND APPARATUS 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US20090214102A1
公开(公告)日：2009-08-27
申请号：US12359452
申请日：2009-01-26
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
摘要翻译：一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并指示到样本的不同部分上的相似图案，以便更紧密地匹配亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。

40. 发明申请

US20090059216A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS 审中-公开
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20090059216A1
公开(公告)日：2009-03-05
申请号：US12136799
申请日：2008-06-11
申请人： Yukihiro Shibata , Shunji Maeda , Shuichi Chikamatsu
发明人： Yukihiro Shibata , Shunji Maeda , Shuichi Chikamatsu
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N2021/8822
摘要： A defect inspection apparatus comprises: a stage which scans a sample in a horizontal plane; an illumination optical system which illuminates light at an oblique angle with respect to a normal of a sample surface, and illuminates light in a linear form on the sample at an angle inclined to a direction perpendicular to the scanning direction of the stage; a front scattered light detection optical system which is disposed in the same orientation as the scanning direction, positioned at an elevation angle where a specular reflection light from a pattern parallel to the scanning direction is not spatially detected, and detects scattered light from a region illuminated in the linear form; an image sensor detecting an image formed by the front scattered light detection optical system; and an image processing unit performing a comparison operation of the image detected by the image sensor, thereby determining a defect candidate.
摘要翻译：缺陷检查装置包括：在水平面扫描样品的台阶; 照射光学系统，其以相对于样品表面的法线倾斜的角度照射光，并以垂直于所述载物台的扫描方向的方向以样品的线性方式照射样品上的光; 以与扫描方向相同的方向设置的前散射光检测光学系统，位于与扫描方向平行的图案的镜面反射光未被空间检测的仰角处，并且检测来自被照射的区域的散射光呈线形; 检测由前散射光检测光学系统形成的图像的图像传感器; 以及图像处理单元，执行由图像传感器检测到的图像的比较操作，从而确定缺陷候选。

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