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    • 1. 发明授权
    • Apparatus for inspecting defects
    • 检查缺陷的装置
    • US08228494B2
    • 2012-07-24
    • US13198170
    • 2011-08-04
    • Yukihiro ShibataShunji Maeda
    • Yukihiro ShibataShunji Maeda
    • G01N21/00
    • G01N21/94G01N21/21G01N21/4788G01N21/9501G01N21/95623G01N2021/8822G01N2021/9513
    • A defect inspection apparatus includes an illumination optical system, a detection optical system which includes a reflecting objective lens, and wavelength separation optics for conducting wavelength separation, and after the wavelength separation, branching the scattered light into at least a first detection optical path and a second detection optical path. The detection optical system further includes, on the first detection optical path, a first sensor, and on the second detection optical path, a second sensor. A signal processor is provided which, in accordance with at least one of a first signal obtained from the first sensor and a second signal obtained from the second sensor, discriminates defects or defect candidates present on a surface of a sample.
    • 缺陷检查装置包括照明光学系统,包括反射物镜的检测光学系统和用于进行波长分离的波长分离光学器件,并且在波长分离之后,将散射光分支成至少第一检测光路和 第二检测光路。 检测光学系统还在第一检测光路上包括第一传感器,并且在第二检测光路上还包括第二传感器。 提供了一种信号处理器,其根据从第一传感器获得的第一信号和从第二传感器获得的第二信号中的至少一个识别存在于样品表面上的缺陷或缺陷候选物。
    • 5. 发明申请
    • Method and apparatus for observing and inspecting defects
    • 观察和检查缺陷的方法和装置
    • US20060238760A1
    • 2006-10-26
    • US11475667
    • 2006-06-26
    • Yukihiro ShibataShunji MaedaKazuo YamaguchiMinoru YoshidaAtsushi YoshidaKenji OkaKenji Watanabe
    • Yukihiro ShibataShunji MaedaKazuo YamaguchiMinoru YoshidaAtsushi YoshidaKenji OkaKenji Watanabe
    • G01J4/00
    • G01N21/21G01N21/9501G01N21/956G01N21/95607G02B21/0016
    • A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
    • 公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置,并且使得半导体器件的细线图案之间的对比度差异更大。 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置,用于照亮安装在安装件上的图案样品,并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置,用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置,用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。
    • 7. 发明申请
    • Method and apparatus for inspecting defects of patterns
    • 检查图案缺陷的方法和装置
    • US20050110988A1
    • 2005-05-26
    • US10981721
    • 2004-11-05
    • Hidetoshi NishiyamaMinoru YoshidaYukihiro ShibataShunji Maeda
    • Hidetoshi NishiyamaMinoru YoshidaYukihiro ShibataShunji Maeda
    • G01N21/956G01N21/88
    • G01N21/95684
    • Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
    • 公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。 从脉冲激光光源发出的光通过伪连续波形成光学系统传输,该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量,光束形成光学系统和 相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。 该装置被配置为使得来自晶片的衍射光被物镜聚焦,透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像,以及 那么由信号处理单元检测到缺陷。
    • 8. 发明授权
    • Method and apparatus for observing and inspecting defects
    • 观察和检查缺陷的方法和装置
    • US06690469B1
    • 2004-02-10
    • US09397334
    • 1999-09-14
    • Yukihiro ShibataShunji MaedaKazuo YamaguchiMinoru YoshidaAtsushi YoshidaKenji OkaKenji Watanabe
    • Yukihiro ShibataShunji MaedaKazuo YamaguchiMinoru YoshidaAtsushi YoshidaKenji OkaKenji Watanabe
    • G01J400
    • G01N21/21G01N21/9501G01N21/956G01N21/95607G02B21/0016
    • A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
    • 公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置,并且使得半导体器件的细线图案之间的对比度差异更大。 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置,用于照亮安装在安装件上的图案样品,并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置,用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置,用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。