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1. 发明申请

US20050052642A1 Method and its apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法及其装置
公开(公告)号：US20050052642A1
公开(公告)日：2005-03-10
申请号：US10893988
申请日：2004-07-20
申请人： Yukihiro Shibata , Shunji Maeda , Hitoshi Kubota
发明人： Yukihiro Shibata , Shunji Maeda , Hitoshi Kubota
IPC分类号： G01B11/30 , G01N21/13 , G01N21/15 , G01N21/88 , G01N21/95 , G01N21/956 , G06K9/00 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/13 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/154 , G01N2021/8825 , G01N2021/9513
摘要： The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens 30 and a sample 1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.
摘要翻译：本发明涉及一种适用于图案精细化的高灵敏度检测方法和装置，其中使用以下技术提高了缺陷检查灵敏度：通过填充物镜30与物镜30之间的间隙来提高检测光学系统的分辨率。样品1，具有液体，并且增加有效NA（数值孔径）; 并且当在样品的表面上形成透明的层间绝缘膜时，抑制液体与绝缘膜之间的界面处的振幅分裂，以减少由于薄膜的干扰引起的光学图像在亮度上的不均匀性，由将物镜与样品之间的间隙浸入折射率接近于透明膜的液体。

2. 发明授权

US07599545B2 Method and its apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法及其装置
公开(公告)号：US07599545B2
公开(公告)日：2009-10-06
申请号：US10893988
申请日：2004-07-20
申请人： Yukihiro Shibata , Shunji Maeda , Hitoshi Kubota
发明人： Yukihiro Shibata , Shunji Maeda , Hitoshi Kubota
IPC分类号： G06K9/00 , H04N7/18
CPC分类号： G01N21/9501 , G01N21/13 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/154 , G01N2021/8825 , G01N2021/9513
摘要： The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens 30 and a sample 1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.
摘要翻译：本发明涉及一种适用于图案精细化的高灵敏度检测方法和装置，其中使用以下技术提高了缺陷检查灵敏度：通过填充物镜30与物镜30之间的间隙来提高检测光学系统的分辨率。样品1，具有液体，并且增加有效NA（数值孔径）; 并且当在样品的表面上形成透明的层间绝缘膜时，抑制液体与绝缘膜之间的界面处的振幅分裂，以减少由于薄膜的干扰引起的光学图像在亮度上的不均匀性，由将物镜与样品之间的间隙浸入折射率接近于透明膜的液体。

3. 发明授权

US08681328B2 Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus 有权
标题翻译：暗场缺陷检查方法，暗场缺陷检查装置，像差分析方法和像差分析装置
公开(公告)号：US08681328B2
公开(公告)日：2014-03-25
申请号：US13142328
申请日：2010-01-20
申请人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
发明人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/4788 , G01N21/93 , G01N21/94 , G01N21/956 , G01N2021/8822
摘要： By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.
摘要翻译：通过包括照明系统和检测系统，监视诸如温度和大气压力之类的环境的信息收集功能，以及具有比较监视结果和设计值的反馈功能的设备状态管理功能，理论计算值或者从模拟结果导出的理想值，并且对设备进行校准，使得监视结果接近理想值，提供用于保持设备状态和设备灵敏度恒定的单元。控制单元800被配置为包括记录单元801，比较单元802，灵敏度预测单元803和反馈控制单元804.在比较单元802中，从记录单元801发送的监视结果和理想值存储在数据库805中进行比较。当理想值与监视结果之间的差异超过预定阈值时，反馈控制单元804校正照明系统和检测系统。

4. 发明申请

US20120128230A1 DEFECT INSPECTION METHOD AND APPARATUS 审中-公开
标题翻译：缺陷检查方法和装置
公开(公告)号：US20120128230A1
公开(公告)日：2012-05-24
申请号：US13362151
申请日：2012-01-31
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： An inspection method, including: illuminating a light on a wafer on which plural chips having identical patterns are formed; imaging corresponding areas of two chips formed on the wafer to obtain inspection images and reference images with an image sensor; and processing the obtained inspection image and the reference image to produce a difference image which indicates a difference between the inspection image and the reference image and detect a defect by comparing the difference image with a threshold, wherein a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging peripheral portion of the wafer is different from a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging central portion of the wafer.
摘要翻译：一种检查方法，包括：在其上形成有多个具有相同图案的芯片的晶片上照射光; 对形成在晶片上的两个芯片的对应区域进行成像，以获得具有图像传感器的检查图像和参考图像; 并且处理所获得的检查图像和参考图像以产生指示检查图像和参考图像之间的差异的差异图像，并且通过将差异图像与阈值进行比较来检测缺陷，其中应用于差分图像的阈值是通过比较检查图像和通过对晶片的周边部分进行成像获得的参考图像而产生的参考图像与通过比较检查图像和通过对晶片的中心部分进行成像而获得的参考图像而产生的差分图像的阈值不同。

5. 发明申请

US20100208249A1 Apparatus For Inspecting Defects 有权
标题翻译：检查缺陷的仪器
公开(公告)号：US20100208249A1
公开(公告)日：2010-08-19
申请号：US12771216
申请日：2010-04-30
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/62
CPC分类号： G01N21/94 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/9513
摘要： A defect inspection apparatus and method includes a darkfield illumination optical system which conducts darkfield illumination upon the surface of a sample with irradiation light having at least one of wavelength band, a darkfield detection optical system which includes a reflecting objective lens for converging the light scattered from the surface of the sample that has been darkfield-illuminated with the irradiation light having the at least one wavelength band, and imaging optics for imaging onto a light-receiving surface of an image sensor the scattered light that the reflecting objective lens has converged, and an image processor which, in accordance with an image signal obtained from the image sensor of the darkfield detection optical system, discriminates defects or defect candidates present on the surface of the sample.
摘要翻译：缺陷检查装置和方法包括：暗场照明光学系统，其使用具有波长带中的至少一个的照射光对样品的表面进行暗场照明，暗视场检测光学系统包括用于会聚来自已经用具有至少一个波长带的照射光进行暗场照射的样品的表面，以及用于在图像传感器的光接收表面上成像以用于反射物镜会聚的散射光的成像光学器件;以及根据从暗场检测光学系统的图像传感器获得的图像信号，鉴别存在于样品表面上的缺陷或缺陷候选物的图像处理器。

6. 发明申请

US20090141264A1 Method and Apparatus for Observing and Inspecting Defects 审中-公开
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US20090141264A1
公开(公告)日：2009-06-04
申请号：US12363856
申请日：2009-02-02
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01N21/21 , G01J4/00
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

7. 发明授权

US07499162B2 Method and apparatus for observing and inspecting defects 有权
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US07499162B2
公开(公告)日：2009-03-03
申请号：US11475667
申请日：2006-06-26
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J4/00
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

8. 发明授权

US07463350B2 Method and apparatus for detecting defects of a sample using a dark field signal and a bright field signal 失效
标题翻译：使用暗场信号和亮场信号来检测样本的缺陷的方法和装置
公开(公告)号：US07463350B2
公开(公告)日：2008-12-09
申请号：US10981721
申请日：2004-11-05
申请人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
发明人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译：公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及那么由信号处理单元检测到缺陷。

9. 发明授权

US07440092B2 Method and apparatus for detecting defects 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07440092B2
公开(公告)日：2008-10-21
申请号：US11602247
申请日：2006-11-21
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G01N21/9501 , G01N21/21
摘要： A method and apparatus for detecting a defect in which image signals of a same area of a sample are obtained by imaging the sample under different optical conditions, and the obtained image signals are analyzed and optical conditions are selected which modify a contrast in the image signal. Image signals of the sample under the selected optical conditions are obtained by imaging the sample with an inspection system, and the images under the selected optical conditions are evaluated to adjust optical conditions for inspection including an inspection threshold, which is greater than a maximum contrast difference among false defects detected at the step of obtaining and with which a maximum number of actual defects can be detected. A defect of the sample is detected by processing the image signals of the sample obtained through the inspection system under the adjusted optical conditions.
摘要翻译：一种检测缺陷的方法和装置，其中通过在不同光学条件下对样本进行成像而获得样品的相同区域的图像信号，并且分析所获得的图像信号，并且选择修改图像信号中的对比度的光学条件。通过用检查系统对样品进行成像获得样品的图像信号，并且在所选择的光学条件下评估图像以调整检查的光学条件，包括大于最大对比差的检查阈值在获取步骤中检测到的虚假缺陷中，可以检测到最大数量的实际缺陷。通过在调整光学条件下处理通过检查系统获得的样品的图像信号来检测样品的缺陷。

10. 发明授权

US07400393B2 Method and apparatus for detecting defects in a specimen utilizing information concerning the specimen 有权
标题翻译：用于利用关于样本的信息来检测样本中的缺陷的方法和装置
公开(公告)号：US07400393B2
公开(公告)日：2008-07-15
申请号：US11478617
申请日：2006-07-03
申请人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
发明人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N2021/8822
摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.
摘要翻译：本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。

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