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31. 发明授权

US06746544B2 Apparatus for cleaning and drying substrates 失效
公开(公告)号：US06746544B2
公开(公告)日：2004-06-08
申请号：US10046423
申请日：2001-10-25
申请人： Boris Fishkin , Michael Sherrard
发明人： Boris Fishkin , Michael Sherrard
IPC分类号： B08B300
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.

32. 发明授权

US06358124B1 Pad conditioner cleaning apparatus 有权
标题翻译：垫调节剂清洗装置
公开(公告)号：US06358124B1
公开(公告)日：2002-03-19
申请号：US09222180
申请日：1998-12-29
申请人： Raijiro Koga , Hiromi Tsuruta , Takashi Kumagai , Gee Hoey , Brian J. Brown , Boris Fishkin , Fred C. Redeker , Bruce Lu , Rex Lu , K. Y. Wang , Roland Shu
发明人： Raijiro Koga , Hiromi Tsuruta , Takashi Kumagai , Gee Hoey , Brian J. Brown , Boris Fishkin , Fred C. Redeker , Bruce Lu , Rex Lu , K. Y. Wang , Roland Shu
IPC分类号： B24B100
CPC分类号： B08B1/007 , B24B53/005 , B24B53/017 , H01L21/67051
摘要： A chemical mechanical polishing apparatus includes a pad conditioner having a conditioner head, a cleaning cup for receiving and cleaning the conditioner head of the pad conditioner, and a fluid dispenser for dispensing a cleaning fluid onto the conditioner head.
摘要翻译：化学机械抛光装置包括具有调节头的垫调节器，用于接收和清洁垫调节器的调节头的清洁杯，以及用于将清洁流体分配到调节头上的流体分配器。

33. 发明授权

US5697750A Controlled environment enclosure and mechanical interface 失效
标题翻译：受控环境机柜和机械接口
公开(公告)号：US5697750A
公开(公告)日：1997-12-16
申请号：US515787
申请日：1995-08-16
申请人： Boris Fishkin , Seiji Sato , Robert B. Lowrance
发明人： Boris Fishkin , Seiji Sato , Robert B. Lowrance
IPC分类号： B65G1/00 , B65G49/07 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67757 , H01L21/67772 , H01L21/67775 , Y10S414/139
摘要： A system for vacuum-processing objects such as electronic integrated circuit wafers comprises (a) a carrier for transporting the wafers under vacuum in a cassette, the cassette being supported on a movable wall that serves as a bottom cover member of the carrier; and (b) a processing machine having a transfer chamber that is also maintained under vacuum, the transfer chamber having a movable wall in the form of an elevatable stage that sealingly closes the transfer chamber in its outermost position. There is a small sealingly closed interface chamber extending between the movable walls when the cassette is mounted onto the machine. A vacuum pump evacuates the interface chamber in preparation for lowering of the cassette into the transfer chamber by an elevator mechanism.
摘要翻译：用于诸如电子集成电路晶片的真空处理物体的系统包括（a）用于在盒中真空地传送晶片的载体，该盒被支撑在用作载体的底盖构件的可动壁上; 和（b）具有还保持在真空下的传送室的加工机器，所述传送室具有呈可升降台形式的可移动壁，所述可移动壁在其最外侧位置密封地封闭传送室。当盒子安装到机器上时，在可移动壁之间延伸有一个小的密封闭合的界面室。真空泵抽出接口室，准备通过电梯机构将盒子下降到传送室中。

34. 发明授权

US5287725A Surface volatile material detector 失效
标题翻译：表面挥发性物质检测器
公开(公告)号：US5287725A
公开(公告)日：1994-02-22
申请号：US082142
申请日：1993-06-23
申请人： Jun Zhao , Laszlo Szalai , Boris Fishkin , Terry Francis
发明人： Jun Zhao , Laszlo Szalai , Boris Fishkin , Terry Francis
IPC分类号： G01N1/22 , G01N1/00 , G01N15/00 , G01N21/37 , H01L21/66
CPC分类号： G01N1/4022
摘要： Surface Volatile Material Detector including a vacuum chamber that is adapted to hold a silicon wafer for testing. The surface of the wafer is exposed to a heat source which evaporates the volatile contaminants on the surface of the wafer. A gas composition analyzer samples the atmosphere within the chamber to detect the evaporated contaminants. The device is designed such that the wafer is thermally insulated from the chamber, whereby the wafer is heated while the chamber walls remain cool, and any contaminants which might exist on the walls of the chamber are not evaporated. In the preferred embodiment, the wafer is heated by infrared light illumination.
摘要翻译：表面挥发性物质检测器，包括适于保持硅晶片进行测试的真空室。晶片的表面暴露于蒸发晶片表面上的挥发性污染物的热源。气体成分分析仪对室内的气氛进行采样，以检测蒸发的污染物。设备被设计成使得晶片与腔室隔热，由此在室壁保持冷却的同时加热晶片，并且可能存在于腔室壁上的任何污染物都不会蒸发。在优选实施例中，通过红外光照明来加热晶片。

35. 发明授权

US06332470B1 Aerosol substrate cleaner 失效
标题翻译：气溶胶基材清洁剂
公开(公告)号：US06332470B1
公开(公告)日：2001-12-25
申请号：US09000518
申请日：1997-12-30
申请人： Boris Fishkin , Kyle A. Brown
发明人： Boris Fishkin , Kyle A. Brown
IPC分类号： B08B302
CPC分类号： H01L21/02052 , B08B3/00 , B08B5/00 , H01L21/67051 , Y10S134/902
摘要： An apparatus for cleaning a substrate includes a source of pressurized carrier gas and a body of cleaning agent in liquid form. A first conduit directs the pressurized carrier gas from the carrier gas source to the body of cleaning agent. A second conduit carries a flow of the carrier gas away from the body of the cleaning agent. The carrier gas flow carried by the second conduit includes cleaning agent in vapor form acquired from the body of cleaning agent. A nozzle is coupled to the second conduit to cause droplets of the cleaning agent to impinge upon a first face of the substrate to be cleaned.
摘要翻译：用于清洁衬底的装置包括加压载气源和液体形式的清洁剂体。第一导管将来自载气源的加压载气引导至清洁剂主体。第二导管将载气的流动远离清洁剂的主体。由第二导管承载的载气流包括从清洁剂主体获得的蒸汽形式的清洁剂。喷嘴连接到第二导管以使清洁剂的液滴撞击待清洁的基底的第一面。

36. 发明授权

US06220941B1 Method of post CMP defect stability improvement 有权
公开(公告)号：US06220941B1
公开(公告)日：2001-04-24
申请号：US09164860
申请日：1998-10-01
申请人： Boris Fishkin , Charles C. Garretson , Peter McKeever , Thomas H. Osterheld , Gopalakrishna B. Prabhu , Doyle E. Bennett , Benjamin A. Bonner , Sidney Huey
发明人： Boris Fishkin , Charles C. Garretson , Peter McKeever , Thomas H. Osterheld , Gopalakrishna B. Prabhu , Doyle E. Bennett , Benjamin A. Bonner , Sidney Huey
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B37/04 , B24B57/02
摘要： The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.

37. 发明授权

US06217430B1 Pad conditioner cleaning apparatus 有权
标题翻译：垫调节剂清洗装置
公开(公告)号：US06217430B1
公开(公告)日：2001-04-17
申请号：US09184786
申请日：1998-11-02
申请人： Raijiro Koga , Hiromi Tsuruta , Takashi Kumagai , Gee Hoey , Brian J. Brown , Boris Fishkin , Fred C. Redeker
发明人： Raijiro Koga , Hiromi Tsuruta , Takashi Kumagai , Gee Hoey , Brian J. Brown , Boris Fishkin , Fred C. Redeker
IPC分类号： B24B2118
CPC分类号： H01L21/67051 , B08B1/007 , B24B53/005 , B24B53/017
摘要： A cleaning cup for holding and cleaning a pad conditioner having a conditioner head, the cleaning cup includes a spray nozzle for spraying a cleaning solution on a top side of the conditioner head. The cleaning cup further includes a plurality of support pins extending upwards from a base of the cleaning cup to receive the conditioner head thereon.
摘要翻译：一种用于保持和清洁具有调节头的垫调节器的清洁杯，所述清洁杯包括用于在所述调理头的顶侧上喷射清洁溶液的喷嘴。清洁杯还包括从清洁杯的底部向上延伸的多个支撑销，以在其上接收调节头。

38. 发明授权

US6139406A Combined slurry dispenser and rinse arm and method of operation 失效
标题翻译：组合浆液分配器和冲洗臂及操作方法
公开(公告)号：US6139406A
公开(公告)日：2000-10-31
申请号：US879447
申请日：1997-06-24
申请人： Daniel Kennedy , Boris Fuksshimov , Victor Belitsky , Boris Fishkin , Kyle Brown , Tom Osterheld , Jeff Beeler , Ginetto Addiego
发明人： Daniel Kennedy , Boris Fuksshimov , Victor Belitsky , Boris Fishkin , Kyle Brown , Tom Osterheld , Jeff Beeler , Ginetto Addiego
IPC分类号： B24B37/04 , B24B53/007 , B24B57/02 , H01L21/304 , B24B7/00
CPC分类号： B24B53/017 , B24B37/04 , B24B57/02
摘要： The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.
摘要翻译：本发明提供了一种用于将一种或多种漂洗剂递送到诸如抛光垫表面，优选一种或多种抛光流体的表面的方法和装置。本发明还提供了一种通过将一种或多种漂洗剂的喷雾递送到表面来清洁一个或多个表面（例如抛光垫表面和基材表面）的方法，并且优选地使冲洗剂流过表面从中心区域到外部区域，其中收集有不需要的碎屑和材料。

39. 发明授权

US5565985A Particle monitoring sensor 失效
公开(公告)号：US5565985A
公开(公告)日：1996-10-15
申请号：US486169
申请日：1995-06-06
申请人： Boris Fishkin , Phil Salzman
发明人： Boris Fishkin , Phil Salzman
IPC分类号： G01J9/02 , G01N15/00 , G01N15/02 , G01N15/14 , G01N21/15 , G01N21/21 , G01N21/49 , G01N21/53 , H01L21/02 , G01N21/03
CPC分类号： G01N21/15 , G01N21/53
摘要： An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.

40. 发明授权

US07252098B2 Apparatus for cleaning and drying substrates 有权
标题翻译：用于清洁和干燥基材的设备
公开(公告)号：US07252098B2
公开(公告)日：2007-08-07
申请号：US10667855
申请日：2003-09-22
申请人： Boris Fishkin , Michael Sherrard
发明人： Boris Fishkin , Michael Sherrard
IPC分类号： B08B7/04 , B08B3/04 , B08B3/10
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.
摘要翻译：提供了一种用于清洗，漂洗和马兰戈尼干燥基材的方法和设备。沿着形成空气/流体界面线的基底表面喷射流体线，并且将一线干燥蒸气供应到界面线以实现马兰戈尼干燥。因此，大部分基板被同时干燥。优选的装置采用清洁和/或冲洗流体箱。在罐体流体上方，当衬底从清洁流体提升时，漂洗流体源将冲洗流体引导到在衬底表面上形成弯液面的衬底的表面，并且干燥蒸汽源将干燥蒸气引导到弯液面。干燥蒸汽降低了弯液面的表面张力，引起从基材表面冲洗流体的马兰戈尼流，从而干燥基材。清洗液槽具有基板接收和清洁部分和基板漂洗部分。冲洗流体源和干燥蒸气源由在罐的漂洗部分上方的干燥箱包围。因此，在时间上至少部分重叠地执行基板装载，清洁，漂洗，干燥和卸载。

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