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    • 33. 发明授权
    • Lateral double-diffused field effect transistor and integrated circuit having same
    • 横向双扩散场效应晶体管和集成电路相同
    • US07485924B2
    • 2009-02-03
    • US11509717
    • 2006-08-25
    • Takahiro TakimotoHiroki NakamuraToshihiko Fukushima
    • Takahiro TakimotoHiroki NakamuraToshihiko Fukushima
    • H01L29/92
    • H01L29/7816H01L29/0696H01L29/0886H01L29/42368H01L29/66681
    • In a lateral double-diffused field effect transistor of the present invention, a gate insulating film includes a first gate insulating film covering a source diffusion layer up to a region beyond the pattern of a body diffusion layer and a second gate insulating film having a film thickness larger than that of the first gate insulating film and covering a region closer to a drain diffusion layer than the region covered by the first gate insulating film. A boundary between the first gate insulating film and the second gate insulating film is composed of a straight portion parallel to a side of the pattern of the body diffusion layer and a corner portion surrounding an vertex of the pattern of the body diffusion layer from a distance. A distance between the vertex of the pattern of the body diffusion layer and the corner portion of the boundary is equal to or smaller than a distance between the side of the pattern of the body diffusion layer and the straight portion of the boundary.
    • 在本发明的横向双扩散场效应晶体管中,栅极绝缘膜包括覆盖源极扩散层直到超过体漫射层图案的区域的第一栅极绝缘膜和具有膜的第二栅极绝缘膜 厚度大于第一栅极绝缘膜的厚度,并且覆盖比由第一栅极绝缘膜覆盖的区域更靠近漏极扩散层的区域。 第一栅极绝缘膜和第二栅极绝缘膜之间的边界由平行于物体扩散层的图案的一侧的直线部分和从身体扩散层的图案的顶点围绕的角部 。 身体扩散层的图案的顶点与边界的角部之间的距离等于或小于身体扩散层的图案的一侧与边界的直线部分之间的距离。
    • 35. 发明申请
    • Lateral double-diffused field effect transistor and integrated circuit having same
    • 横向双扩散场效应晶体管和集成电路相同
    • US20070063271A1
    • 2007-03-22
    • US11509717
    • 2006-08-25
    • Takahiro TakimotoHiroki NakamuraToshihiko Fukushima
    • Takahiro TakimotoHiroki NakamuraToshihiko Fukushima
    • H01L29/94H01L29/76H01L31/00
    • H01L29/7816H01L29/0696H01L29/0886H01L29/42368H01L29/66681
    • In a lateral double-diffused field effect transistor of the present invention, a gate insulating film includes a first gate insulating film covering a source diffusion layer up to a region beyond the pattern of a body diffusion layer and a second gate insulating film having a film thickness larger than that of the first gate insulating film and covering a region closer to a drain diffusion layer than the region covered by the first gate insulating film. A boundary between the first gate insulating film and the second gate insulating film is composed of a straight portion parallel to a side of the pattern of the body diffusion layer and a corner portion surrounding an vertex of the pattern of the body diffusion layer from a distance. A distance between the vertex of the pattern of the body diffusion layer and the corner portion of the boundary is equal to or smaller than a distance between the side of the pattern of the body diffusion layer and the straight portion of the boundary.
    • 在本发明的横向双扩散场效应晶体管中,栅极绝缘膜包括覆盖源极扩散层直到超过体漫射层图案的区域的第一栅极绝缘膜和具有膜的第二栅极绝缘膜 厚度大于第一栅极绝缘膜的厚度,并且覆盖比由第一栅极绝缘膜覆盖的区域更靠近漏极扩散层的区域。 第一栅极绝缘膜和第二栅极绝缘膜之间的边界由平行于物体扩散层的图案的一侧的直线部分和从身体扩散层的图案的顶点围绕的角部 。 身体扩散层的图案的顶点与边界的角部之间的距离等于或小于身体扩散层的图案的一侧与边界的直线部分之间的距离。
    • 36. 发明授权
    • Light sensitive element and light sensitive element having internal circuitry
    • 具有内部电路的光敏元件和光敏元件
    • US06404029B1
    • 2002-06-11
    • US09656461
    • 2000-09-06
    • Makoto HosokawaNaoki FukunagaTakahiro TakimotoMasaru KuboToshihiko FukushimaIsamu Ohkubo
    • Makoto HosokawaNaoki FukunagaTakahiro TakimotoMasaru KuboToshihiko FukushimaIsamu Ohkubo
    • H01L2714
    • H01L27/1443H01L31/0352
    • A photosensitive device includes a semiconductor substrate and a first semiconductor layer, both of a first conductivity type, with the semiconductor layer being formed on the semiconductor substrate and having a lower impurity concentration than that of the semiconductor substrate. A second semiconductor layer, of a second conductivity type, is formed on the first semiconductor layer and at least one diffusion layer of the first conductivity type is formed from the surface of the second semiconductor layer so as to reach the surface of the first semiconductor layer. The diffusion layer subdivides the second semiconductor layer into a plurality of semiconductor regions At least one photodiode portion for converting signal light into an electrical signal is formed at a junction between at least one of the plurality of semiconductor regions and the first semiconductor layer. A depletion layer which is formed in the first semiconductor layer when a reverse bias voltage is applied to the at least one photodiode portion has a field intensity of about 0.3 V/&mgr;m or more.
    • 光敏器件包括半导体衬底和第一半导体层,它们都是第一导电型,半导体层形成在半导体衬底上,杂质浓度低于半导体衬底的半导体层。 第二导电类型的第二半导体层形成在第一半导体层上,并且从第二半导体层的表面形成至少一个第一导电类型的扩散层,以到达第一半导体层的表面 。 扩散层将第二半导体层细分为多个半导体区域在多个半导体区域和第一半导体层中的至少一个之间的接合处形成至少一个用于将信号光转换成电信号的光电二极管部分。 当向至少一个光电二极管部分施加反向偏置电压时,在第一半导体层中形成的耗尽层具有约0.3V / m 2以上的场强度。