专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US5569501A Diamond-like carbon films from a hydrocarbon helium plasma 失效
标题翻译：来自烃氦等离子体的类金刚石碳膜
公开(公告)号：US5569501A
公开(公告)日：1996-10-29
申请号：US483685
申请日：1995-06-07
申请人： Fredric D. Bailey , Douglas A. Buchanan , Alessandro C. Callegari , Howard M. Clearfield , Fuad E. Doany , Donis G. Flagello , Harold J. Hovel , Douglas C. Latulipe, Jr. , Naftali E. Lustig , Andrew T. S. Pomerene , Sampath Purushothaman , Christopher M. Scherpereel , David E. Seeger , Jane M. Shaw
发明人： Fredric D. Bailey , Douglas A. Buchanan , Alessandro C. Callegari , Howard M. Clearfield , Fuad E. Doany , Donis G. Flagello , Harold J. Hovel , Douglas C. Latulipe, Jr. , Naftali E. Lustig , Andrew T. S. Pomerene , Sampath Purushothaman , Christopher M. Scherpereel , David E. Seeger , Jane M. Shaw
IPC分类号： G03F1/08 , C01B31/06 , C08J7/06 , C23C8/26 , C23C8/50 , C23C16/26 , C23C16/27 , C23C16/50 , C30B29/04 , G02B1/10 , G11B5/255 , H01L21/31 , H01L21/314 , B05D3/06 , H05H1/24
CPC分类号： C23C16/26 , G02B1/105 , G11B5/255 , Y10S427/104 , Y10S427/106 , Y10T428/30
摘要： The present invention relates to an improved method of depositing a diamond-like carbon film onto a substrate by low temperature plasma-enhanced chemical vapor deposition (PECVD) from a hydrocarbon/helium plasma. More specifically, the diamond-like carbon films of the present invention are deposited onto the substrate by employing acetylene which is heavily diluted with helium as the plasma gas. The films formed using the process of the present invention are characterized as being amorphous and having dielectric strengths comparable to those normally observed for diamond films. More importantly, however is that the films produced herein are thermally stable, optically transparent, absorbent in the ultraviolet range and hard thus making them extremely desirable for a wide variety of applications.
摘要翻译：本发明涉及通过来自烃/氦等离子体的低温等离子体增强化学气相沉积（PECVD）将金刚石状碳膜沉积到衬底上的改进方法。更具体地说，本发明的类金刚石碳膜通过采用以氦作为等离子体气体大量稀释的乙炔沉积在基板上。使用本发明的方法形成的膜的特征在于是无定形的并且具有与通常对于金刚石膜观察到的那些相当的介电强度。然而，更重要的是，本文制造的膜是热稳定的，光学透明的，在紫外范围内是吸收性的并且是硬的，因此使得它们对于各种各样的应用是非常需要的。

32. 发明授权

US5534094A Method for fabricating multi-layer thin film structure having a separation layer 失效
标题翻译：具有分离层的多层薄膜结构的制造方法
公开(公告)号：US5534094A
公开(公告)日：1996-07-09
申请号：US314789
申请日：1994-09-29
申请人： Gnanalingam Arjavalingam , Alina Deutsch , Fuad E. Doany , Bruce K. Furman , Donald J. Hunt , Chandrasekhar Narayan , Modest M. Oprysko , Sampath Purushothaman , Vincent Ranieri , Stephen Renick , Jane M. Shaw , Janusz S. Wilczynski , David F. Witman
发明人： Gnanalingam Arjavalingam , Alina Deutsch , Fuad E. Doany , Bruce K. Furman , Donald J. Hunt , Chandrasekhar Narayan , Modest M. Oprysko , Sampath Purushothaman , Vincent Ranieri , Stephen Renick , Jane M. Shaw , Janusz S. Wilczynski , David F. Witman
IPC分类号： B23K26/00 , B32B37/00 , H01L21/68 , H01L23/12 , H01L23/15 , H05K3/00 , H05K3/46 , B32B31/28
CPC分类号： H01L21/6835 , H01L2221/68345 , H01L2221/68359 , H05K3/0011 , H05K3/46 , Y10T156/1158 , Y10T428/12528 , Y10T428/12549 , Y10T428/12569 , Y10T428/12611
摘要： A method and apparatus for releasing a workpiece from a substrate including providing a substrate which is transparent to a predetermined wavelength of electromagnetic radiation; forming, on the substrate, a separation layer which degrades in response to the predetermined radiation; providing the workpiece on the separation layer; and directing the predetermined radiation at the separation layer through the transparent substrate so as to degrade the separation layer and to separate the workpiece from the substrate.
摘要翻译：一种用于从衬底释放工件的方法和装置，包括提供对预定波长的电磁辐射是透明的衬底; 在衬底上形成响应于预定辐射而降解的分离层; 在分离层上提供工件; 并且通过透明基板将分离层处的预定辐射引导，以使分离层退化并将工件与基板分离。

33. 发明授权

US5340914A Microwave processing 失效
公开(公告)号：US5340914A
公开(公告)日：1994-08-23
申请号：US78732
申请日：1993-06-16
申请人： Jerome J. Cuomo , Jeffrey D. Gelorme , Michael Hatzakis, Jr. , David A. Lewis , Jane M. Shaw , Stanley J. Whitehair
发明人： Jerome J. Cuomo , Jeffrey D. Gelorme , Michael Hatzakis, Jr. , David A. Lewis , Jane M. Shaw , Stanley J. Whitehair
IPC分类号： B01J19/12 , C08G73/10 , G01N22/00 , H01L21/312 , H05B6/68 , H05B6/80 , H05K1/03 , H05K3/46 , C08F2/46 , C08G69/26
CPC分类号： H05B6/705 , B01J19/126 , C08G73/1025 , G01N22/00 , H05B6/68 , B01J2219/00191 , B01J2219/1215 , H05K1/0346 , H05K3/4644 , Y02B40/143 , Y10T428/31681 , Y10T428/31721
摘要： A method and apparatus are disclosed for conducting a physical process and a chemical reaction by exposing a material containing a volatile substance to microwave radiation where the morphology of said material will change when exposed to such radiation. The power of said radiation is adjusted over time as the morphology of the material changes to maximize the effect of the radiation in order to produce a product in a minimum amount of time that is substantially free of said volatile substance.The method and apparatus can also be used to conduct such a process or reaction with materials that do not contain a volatile material.In one embodiment a method and apparatus are disclosed for manufacturing a polyimide from a precursor in a solvent by exposing the precursor to microwave radiation in a tuneable microwave resonant cavity that is tuned during imidization to achieve critical coupling of the system. Microwave power is controlled to remove the solvent and obtain the desired level of reaction. Processing time has been reduced thirty fold as compared to conventional thermal methods.

34. 发明授权

US5317081A Microwave processing 失效
标题翻译：微波处理
公开(公告)号：US5317081A
公开(公告)日：1994-05-31
申请号：US799378
申请日：1991-11-27
申请人： Jeffrey D. Gelorme , David A. Lewis , Jane M. Shaw
发明人： Jeffrey D. Gelorme , David A. Lewis , Jane M. Shaw
IPC分类号： B01J19/12 , C08G73/10 , G01N22/00 , H01L21/312 , H05B6/68 , H05B6/80 , H05K1/03 , H05K3/46 , C08G69/26 , B05D5/12
CPC分类号： H05B6/705 , B01J19/126 , C08G73/1025 , G01N22/00 , H05B6/68 , B01J2219/00191 , B01J2219/1215 , H05K1/0346 , H05K3/4644 , Y02B40/143 , Y10T428/31681 , Y10T428/31721
摘要： A method and apparatus are disclosed for conducting a physical process and a chemical reaction by exposing a material containing a volatile substance to microwave radiation where the morphology of said material will change when exposed to such radiation. The power of said radiation is adjusted over time as the morphology of the material changes to maximize the effect of the radiation in order to produce a product in a minimum amount of time that is substantially free of said volatile substance.The method and apparatus can also be used to conduct such a process or reaction with materials that do not contain a volatile material.In one embodiment a method and apparatus are disclosed for manufacturing a polyimide from a precursor in a solvent by exposing the precursor to microwave radiation in a tuneable microwave resonant cavity that is tuned during imidization to achieve critical coupling of the system. Microwave power is controlled to remove the solvent and obtain the desired level of reaction. Processing time has been reduced thirty fold as compared to conventional thermal methods.
摘要翻译：公开了一种用于通过将含有挥发性物质的材料暴露于微波辐射进行物理过程和化学反应的方法和装置，其中当暴露于这种辐射时所述材料的形态将改变。随着材料的形态发生变化，随着时间的推移调整所述辐射的功率以最大化辐射的影响，以便在基本上不含所述挥发性物质的最小时间内产生产物。该方法和装置也可用于对不含挥发性物质的材料进行这种处理或反应。在一个实施方案中，公开了一种用于通过在可调谐的微波谐振腔中将前体暴露于微波辐射中的溶剂中的前体制造聚酰亚胺的方法和装置，其在亚胺化期间被调谐以实现系统的临界耦合。控制微波功率以除去溶剂并获得所需的反应水平。与常规热法相比，处理时间减少了三十倍。

35. 发明授权

US5202061A Electrically conductive polymeric materials and uses thereof 失效
标题翻译：导电聚合材料及其用途
公开(公告)号：US5202061A
公开(公告)日：1993-04-13
申请号：US717968
申请日：1991-06-20
申请人： Marie Angelopoulos , Wu-Song Huang , Richard D. Kaplan , Marie-Annick Le Corre , Stanley E. Perreault , Jane M. Shaw , Michel R. Tissier , George F. Walker
发明人： Marie Angelopoulos , Wu-Song Huang , Richard D. Kaplan , Marie-Annick Le Corre , Stanley E. Perreault , Jane M. Shaw , Michel R. Tissier , George F. Walker
IPC分类号： C08G61/12 , H01B1/12 , H01J29/86 , H01L23/498 , H01L23/60 , H05K9/00
CPC分类号： H05K9/0079 , C08G61/12 , H01B1/125 , H01B1/127 , H01B1/128 , H01J29/868 , H01L23/49894 , H01L23/60 , H05K9/0081 , H01L2924/0002
摘要： Structures containing conducting polymers and methods of fabrication thereof. Electrical conductivity can be induced in polymers selected from the group of substituted and unsubstituted polyanilines, polyparaphenylenvinyles, substituted and unsubstituted polythiophenes substituted and unsubstituted poly-p-phenylene sulfides, substituted polyfuranes, substituted polypyrroles, substituted polyselenophene, polyacetylines formed from soluble precursors, combinations thereof and blends thereof with other polymers. The polymer contains a doping precursor, selected from the group of onium salts, iodonium salts, triflate salts, borate salts and tosylate salts and sulfonoxylimides. Conductivity can be selectively induced in the polymer by selectively doping upon selective exposure to a source of energy such as electromagnetic radiation, an electron beam and heat. The electrically conductive polymers of the present invention are useful as electron discharge layers for electron beam applications, such as, SEM observations, as electromagnetic interference coatings on dielectric surfaces and as electron beam resist which acts as a discharge layer.
摘要翻译：含有导电聚合物的结构及其制造方法。可以在选自取代和未取代的聚苯胺，聚对苯二烯基乙烯基，取代和未取代的聚噻吩，取代和未取代的聚对苯硫醚，取代的聚呋喃，取代的聚吡咯，取代的聚硒酚，由可溶性前体形成的聚乙炔，其组合及其与其它聚合物的共混物。聚合物含有选自鎓盐，碘鎓盐，三氟甲磺酸盐，硼酸盐和甲苯磺酸盐和磺酰氧基酰亚胺的掺杂前体。通过在选择性地暴露于诸如电磁辐射，电子束和热能的能量源上选择性掺杂，可以在聚合物中选择性地诱导电导率。本发明的导电聚合物可用作用于电子束应用的电子放电层，例如SEM观察，作为电介质表面上的电磁干扰涂层和用作放电层的电子束抗蚀剂。

36. 发明授权

US4975079A Connector assembly for chip testing 失效
标题翻译：连接器组件用于芯片测试
公开(公告)号：US4975079A
公开(公告)日：1990-12-04
申请号：US485016
申请日：1990-02-23
申请人： Brian S. Beaman , Keith E. Fogel , Jungihl Kim , Wolfgang Mayr , Jane M. Shaw , George F. Walker
发明人： Brian S. Beaman , Keith E. Fogel , Jungihl Kim , Wolfgang Mayr , Jane M. Shaw , George F. Walker
IPC分类号： G01R1/067 , G01R1/04 , G01R1/073 , G01R31/26 , H01R4/26 , H01R13/24
CPC分类号： G01R1/0483 , G01R1/07314 , H01R12/714 , H01R13/2485 , H01L2224/13021 , H01R2201/20
摘要： An electrical connector is described for making contact with a plurality of convex and deformable contacts on an electronic device. The electrical connector comprises a substrate having a plurality of conductors which extend above its surface. A polymeric material is disposed on the surface of the substrate and has openings which expose the conductors, each opening sized to receive one of the convex, deformable contacts, and to enable electrical connection between the exposed conductors and the deformable contacts. A mechanism is provided for urging the deformable contacts on the electronic device against the exposed conductors. The mechanism exerts sufficient force between the device and the conductors to cause some deformation of the convex contact areas by the conductors.

37. 发明授权

US4693960A Photolithographic etching process using organosilicon polymer composition 失效
标题翻译：使用有机硅聚合物组合物的光刻蚀刻工艺
公开(公告)号：US4693960A
公开(公告)日：1987-09-15
申请号：US928680
申请日：1986-11-07
申请人： Edward D. Babich , Michael Hatzakis , John J. Liutkis , Juri R. Parasczak , Jane M. Shaw
发明人： Edward D. Babich , Michael Hatzakis , John J. Liutkis , Juri R. Parasczak , Jane M. Shaw
IPC分类号： C08K5/07 , G03F7/075 , G03C5/00
CPC分类号： G03F7/0757 , C08K5/07 , Y10S430/119
摘要： A composition containing a polysiloxane having a polymerizable ethylenically unsaturated group, and 2,2-dimethoxy-2-phenyl acetophenone as an ultraviolet light sensitizer; and use thereof in lithography.
摘要翻译：含有聚合性烯属不饱和基团的聚硅氧烷和2,2-二甲氧基-2-苯基苯乙酮作为紫外线敏化剂的组合物; 并在光刻中使用。

38. 发明授权

US4212935A Method of modifying the development profile of photoresists 失效
标题翻译：修改光致抗蚀剂发展特征的方法
公开(公告)号：US4212935A
公开(公告)日：1980-07-15
申请号：US880926
申请日：1978-02-24
申请人： Benjamin J. Canavello , Michael Hatzakis , Jane M. Shaw
发明人： Benjamin J. Canavello , Michael Hatzakis , Jane M. Shaw
IPC分类号： G03C1/72 , G03F7/00 , G03F7/022 , G03F7/30 , G03F7/32 , G03F7/38 , G03F7/40 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/30 , G03F7/022 , G03F7/38
摘要： The cross-sectional profile which is produced upon development of a layer of alkali soluble resin-diazo ketone photoresist is modified by treating the layer with a solvent or solvent mixture which is different from but miscible with the solvent or solvent mixture used to form the resist layer. The treating solvent is believed to dilute the resist solvent in a surface layer portion of the resist thereby modifying the alkaline developer solubility of this portion. Undercut resist profiles may be obtained by this method with normal optical exposure of the resist.
摘要翻译：在开发一种碱溶性树脂 - 重氮酮光致抗蚀剂层时产生的横截面轮廓是通过用与形成抗蚀剂的溶剂或溶剂混合物不同但可混溶的溶剂或溶剂混合物进行处理来改性的层。认为处理溶剂在抗蚀剂的表面层部分中稀释抗蚀剂溶剂，从而改变该部分的碱性显影剂溶解度。通过该方法可以通过抗蚀剂的正常光学曝光来获得底切抗蚀剂图案。

39. 发明授权

US06686539B2 Tamper-responding encapsulated enclosure having flexible protective mesh structure 有权
公开(公告)号：US06686539B2
公开(公告)日：2004-02-03
申请号：US09753932
申请日：2001-01-03
申请人： Donald S. Farquhar , Claudius Feger , Voya Markovich , Konstantinos I. Papathomas , Mark D. Poliks , Jane M. Shaw , George Szeparowycz , Steve H. Weingart
发明人： Donald S. Farquhar , Claudius Feger , Voya Markovich , Konstantinos I. Papathomas , Mark D. Poliks , Jane M. Shaw , George Szeparowycz , Steve H. Weingart
IPC分类号： H05K506
CPC分类号： H01L23/57 , G06F21/87 , H01L2924/0002 , H05K1/0275 , H05K1/0393 , H05K1/095 , H05K1/167 , H05K2201/0352 , H05K2201/10151 , H05K2203/1572 , H01L2924/00
摘要： A structure and method for forming a tamper respondent electronic circuit enclosure that includes an integrated circuit structure, a mesh structure surrounding the integrated circuit structure, and a sealed enclosure surrounding the mesh structure. The mesh structure includes a layer of flexible dielectric having a first side and a second side, a screen-printed pattern of flexible electrically conductive first circuit lines forming a first resistor network on the first side, and a photo lithographically-formed pattern of flexible electrically conductive second circuit lines forming a second resistor network on the second side.

40. 发明授权

US06383415B1 Methods of fabrication of cross-linked electrically conductive polymers and precursors thereof 有权
标题翻译：交联导电聚合物及其前体的制备方法
公开(公告)号：US06383415B1
公开(公告)日：2002-05-07
申请号：US09444985
申请日：1999-11-22
申请人： Marie Angelopoulos , Jeffrey D. Gelorme , Yun Hsin Liao , Jane M. Shaw
发明人： Marie Angelopoulos , Jeffrey D. Gelorme , Yun Hsin Liao , Jane M. Shaw
IPC分类号： H01B112
CPC分类号： H01B1/128 , H01B1/125 , H01B1/127
摘要： Cross-linked electrically conductive polymers, in particular electrically conductive, polyaniline are described. Dopants and substituents having pendant cross-linkable functionality are used which form a cross-linked conducting polymer network. The cross-linking functionality can be hydrogen-bonding as well as chemically polymerizable or cross-linkable. A conjugated path between chains can also be incorporated. The resulting cross-linked conducting polymers have enhanced thermal and environmental stability. The dopant cannot readily be washed out with solvents or diffuse out upon exposure to heat. In addition, the cross-linked polymers have enhanced electrical conductivity.
摘要翻译：描述了交联的导电聚合物，特别是导电的聚苯胺。使用具有侧链可交联官能团的掺杂剂和取代基，其形成交联的导电聚合物网络。交联官能团可以是氢键合以及化学上可聚合的或可交联的。还可以并入链之间的共轭路径。所得的交联导电聚合物具有增强的热和环境稳定性。掺杂剂不容易用溶剂洗涤或在暴露于热量时扩散出来。此外，交联聚合物具有增强的导电性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式