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    • 31. 发明申请
    • Earth leakage detection device
    • 漏电检测装置
    • US20070053119A1
    • 2007-03-08
    • US11592951
    • 2006-11-03
    • Akihiro Goto
    • Akihiro Goto
    • H02H3/00
    • G01R31/025H01H71/54H01H83/02H05K1/18
    • Disclosed is an earth leakage detection device, which comprises a printed-circuit board incorporating an earth-leakage-detection control circuit, a reset function-equipped switch mounted on the side of one of opposite surfaces of the printed-circuit board, an earth-leakage-detecting current transformer mounted on the side of the other surface of the printed-circuit board, an externally connecting terminal for introducing and outputting an electrical power, and an electrical wire member arranged to penetrate through the earth-leakage-detecting current transformer and connected relative to the externally connecting terminal. In this earth leakage detection device, the reset function-equipped switch is connected to the earth-leakage-detection control circuit with the interposition of the externally connecting terminal therebetween. According to the present invention, components of the earth leakage detection device are arranged above and below the printed-circuit board in a compact manner using a significantly simple mechanisrh. Thus, the earth leakage detection device can be reduced in size and cost, and suitably arranged in a housing for various apparatuses, such as a copier and a printer.
    • 本发明公开了一种漏电检测装置,其包括具有漏电检测控制电路的印刷电路板,安装在印刷电路板的相对面的一侧的复位功能开关的开关, 安装在印刷电路板的另一面一侧的漏电检测电流互感器,用于引入和输出电力的外部连接端子,以及布置成穿过漏电检测电流互感器的电线构件, 相对于外部连接端子连接。 在该漏电检测装置中,复位功能开关通过插入外部连接端子而与漏电检测控制电路连接。 根据本发明,漏电检测装置的部件以紧凑的方式使用显着简单的机构布置在印刷电路板的上方和下方。 因此,可以减小漏电检测装置的尺寸和成本,并适当地布置在诸如复印机和打印机的各种装置的外壳中。
    • 34. 发明授权
    • Charged-particle-beam mapping projection-optical systems and methods for adjusting same
    • 带电粒子束映射投影光学系统及其调整方法
    • US07064339B2
    • 2006-06-20
    • US10816467
    • 2004-03-31
    • Hiroshi NishimuraNaoto KiharaKinya KatoToru TakagiAkihiro GotoJunji IkedaKazuya Okamoto
    • Hiroshi NishimuraNaoto KiharaKinya KatoToru TakagiAkihiro GotoJunji IkedaKazuya Okamoto
    • G01N21/00G21K7/00
    • H01J37/26G01N23/225H01J37/1471H01J37/226H01J37/265H01J2237/0492H01J2237/057H01J2237/1501H01J2237/2482H01J2237/2538H01J2237/262H01J2237/2806H01J2237/2817H01J2237/282H01J2237/2823H01J2237/2826H01J2237/30438
    • Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.
    • 公开了可以快速且准确地执行这种系统的带电粒子束(CPB)映射投影光学系统和调整方法。 在典型的系统中,照射光束从光源发出,通过照射光学系统,并进入维恩滤光片(“ExB”)。 当通过ExB时,照射光束通过物镜光学系统并且入射到物体表面上。 这种冲击产生观察光束,该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准,可以使用为CPB光学系统和离轴光学系统优化的基准标记(例如位于物体表面的平面中)。 理想地,当电压和电流未施加到ExB时,在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”,其不需要调整照射光学系统的光轴,并且发射的调节光束的动能分布从该对准是稳定的。
    • 36. 发明授权
    • Method and device discharging surface treatment
    • 方法和装置排放表面处理
    • US06929829B2
    • 2005-08-16
    • US09872421
    • 2001-05-31
    • Naotake MohriManabu YoshidaAkihiro Goto
    • Naotake MohriManabu YoshidaAkihiro Goto
    • B23H1/04B23H1/06B23H9/00H05H1/48H01T1/22H01T1/24H01T14/00H05H1/52
    • B23H9/008B23H1/04B23H1/06
    • Powder of a simple substance or a combination of a plurality of carbides of metals belonging to the IVa, Va and Via families in the Periodic Table is mixed with a ferrous-family metal powder or non-ferrous metal powder having the same composition as the treatment target (2) as a simple substance or a combination of a plurality of metals, and this is compressed and molded, and incompletely sintered to form an electrode (12) serving as a discharge processing electrode; and said device is provided with a switching unit which alters electrical conditions at the time when the base member of the treatment target (2) is directly subjected to a discharging surface treatment and the electrical conditions at the time when a coating film (13) that has been formed is subjected to a discharging surface treatment according to the characteristics of the treatment target material. Thus, a discharge is continuously generated between the sintered electrode (12) and the treatment target (2) so that the coating film (13) is continuously allowed to deposit on the surface of the treatment target (2) by the discharging energy to form a thick film.
    • 元素周期表中IVa,Va和Via族金属的单一物质或多种金属碳化物的组合粉末与具有与处理相同组成的铁族金属粉末或有色金属粉末混合 目标(2)作为单一物质或多种金属的组合,并且被压缩和模制,并且不完全烧结以形成用作放电处理电极的电极(12); 并且所述装置设置有切换单元,其在处理对象物(2)的基底部件直接进行放电表面处理时和电气条件改变电气条件时,涂膜(13) 已经形成的根据处理对象材料的特性进行排出表面处理。 因此,在烧结电极(12)和处理对象(2)之间连续产生放电,使得涂膜(13)被连续地通过放电能量沉积在处理对象物(2)的表面上以形成 一个厚膜。
    • 38. 发明授权
    • Method and apparatus for electrodischarge wire machining
    • 放电电线加工方法及装置
    • US06744002B1
    • 2004-06-01
    • US10181210
    • 2002-07-15
    • Akihiro Goto
    • Akihiro Goto
    • B23H702
    • B23H7/04B23H7/02B23H7/34B23H7/36B23H2600/12
    • In wire electric discharge machining in which electric discharge energy is supplied between a wire electrode (1a) and a workpiece (2) by a machining electric power supply means (16) so as to machine the workpiece (2) when the wire electrode (1a) and the workpiece (2) are relatively traveled with each other by a positioning means, there are provided a first process in which rough machining is conducted in a working solution (4a) and a second process in which finish-machining is conducted in gas (7) such as air, oxygen, nitrogen or inert gas, and the positioning means is controlled by a control means (17) so that a relative traveling speed of the wire electrode (1a) with the workpiece (2) in the second process can be set at a constant rate not lower than a predetermined rate at which a short circuit can not continue between the electrodes for a predetermined period of time and more which has been previously set according to a required specification. It is possible to realize a high accuracy and quality of wire electric discharge machining and also it is possible to realize an enhancement of productivity.
    • 在电线放电加工中,其中通过加工电源装置(16)在线电极(1a)和工件(2)之间提供放电能量,以便当线电极(1a)加工工件 )和工件(2)通过定位装置相对移动,提供了在工作溶液(4a)中进行粗加工的第一工序和在气体中进行精加工的第二工序 (7),诸如空气,氧气,氮气或惰性气体,并且定位装置由控制装置(17)控制,使得在第二过程中线电极(1a)与工件(2)的相对行进速度 可以以不低于电极之间的短路不能持续预定时间段的预定速率的恒定速率设定,并且根据所需规格预先设定的预定速率。 可以实现电火花线切割加工的高精度和高质量,并且可以实现生产率的提高。
    • 39. 发明授权
    • Scanning device and scanning method
    • 扫描装置和扫描方法
    • US06670602B1
    • 2003-12-30
    • US09324896
    • 1999-06-03
    • Yoshiaki KohamaAkihiro GotoMuneki HamashimaYukiharu Okubo
    • Yoshiaki KohamaAkihiro GotoMuneki HamashimaYukiharu Okubo
    • H01J314
    • H01J37/28H01J2237/2817
    • New and improved scanning device and corresponding method that include and involve a movable stage on which a specimen is positioned, irradiation means which irradiates an electron beam onto an irradiation region of the specimen, secondary beam detection means used in generating a picture of the irradiation region by detecting a secondary beam which consists of at least one of secondary electrons or reflected electrons from the irradiation region of the electron beam, an imaging electron optical system which causes imaging of the secondary beam on a detection surface of the secondary beam detection means, and which is arranged between the specimen and the secondary beam detection means. The secondary beam detection means is equipped with a fluorescent unit which is arranged on the detection surface, and which converts the secondary beam into light, and one-dimensional line sensors which have a structure arrayed in two dimensions forming electric charge by photoelectric conversion, an array imaging element which continuously adds up the electric charge of the accumulated image in a predetermined line of the line sensors, and the electric charge of the line of the image which moves accompanying the movement of the stage, and a two-dimensional imaging element which emits electric charge by means of photoelectric conversion. The scanning device and corresponding method further include and involve changeover means for selectively irradiating the light converted by means of the fluorescent unit to an imaging element which is either one of the array imaging elements and the two-dimensional imaging element.
    • 新的改进的扫描装置及其相应的方法,其包括并涉及其上放置试样的可移动台,将电子束照射到试样的照射区域上的照射装置,用于产生照射区域的图像的二次束检测装置 通过检测由来自电子束的照射区域的二次电子或反射电子中的至少一种构成的次级光束,使次光束在二次光束检测装置的检测表面上成像的成像电子光学系统,以及 其布置在样本和次级束检​​测装置之间。 二次光束检测装置配备有布置在检测表面上并将次光束转换为光的荧光单元和具有通过光电转换形成电荷的二维排列的结构的一维线传感器, 阵列成像元件,其连续地将累积图像的电荷累积在行传感器的预定线中,以及伴随舞台移动移动的图像线的电荷,以及二维成像元件 通过光电转换发射电荷。 扫描装置和相应的方法还包括并包括切换装置,用于选择性地将通过荧光单元转换的光照射到作为阵列成像元件和二维成像元件之一的成像元件。