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1. 发明申请

US20090103061A1 Reticle Protection Member, Reticle Carrying Device, Exposure Device and Method for Carrying Reticle 有权
标题翻译：掩模保护构件，掩模载体装置，曝光装置和携带掩模的方法
公开(公告)号：US20090103061A1
公开(公告)日：2009-04-23
申请号：US12234913
申请日：2008-09-22
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
摘要翻译：位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置，从而测量标线片1的位置。位置测量装置30测量形成在标线片1上的位置测量标记27的位置。下盖2b的下表面，从而测量下盖2b的位置。当掩模版1的位置和下盖2b的位置已知时，标线片1和下盖2b的相对位移是已知的。因此，当装载有标线片1的下盖2b携带携带装置并设置在曝光装置中时，通过考虑该位移来确定下盖2b的停止位置。结果，可以将掩模版1正确地设置在曝光装置中。

2. 发明申请

US20070206173A1 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle 失效
标题翻译：掩模版保护构件，掩模版承载装置，曝光装置和承载掩模版的方法
公开(公告)号：US20070206173A1
公开(公告)日：2007-09-06
申请号：US11235198
申请日：2005-09-27
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： G03B27/62
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
摘要翻译：位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置，从而测量标线1的位置。位置测量装置30测量形成在下盖2b的下表面上的位置测量标记27的位置，从而测量下盖2b的位置。当标线片1的位置和下盖2b的位置已知时，标线片1和下盖2b的相对位移是已知的。因此，当装载有掩模版1的下盖2b被携带携带装置并设置在曝光装置中时，通过考虑该位移来确定下盖2b的停止位置。结果，可以将掩模版1正确地设置在曝光装置中。

3. 发明授权

US06781123B2 Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus 有权
标题翻译：带电粒子束控制元件，带电粒子束控制元件的制造方法和带电粒子束装置
公开(公告)号：US06781123B2
公开(公告)日：2004-08-24
申请号：US10396559
申请日：2003-03-26
申请人： Yukiharu Okubo
发明人： Yukiharu Okubo
IPC分类号： H01J3700
CPC分类号： H01J37/1477
摘要： An inspection method using an electron beam. Emitted charged particles from an electron gun located inside a primary column are accelerated to form a primary beam. A cross section of the primary beam is shaped a desired shape by a primary optical system located inside the primary column. A trajectory of the primary beam is deflected using a primary deflector located inside the primary column. A sample is illuminated using the primary beam, the sample being on a stage to which a retarding voltage is applied. At least one of secondary electrons, reflected electrons or backwardly scattered electrons that are emerging from the sample on the stage are accelerated toward a second column to form a secondary beam. A trajectory of the secondary beam is deflected using a secondary deflector located inside the secondary column. The secondary beam is guided to a detector located inside the secondary column.
摘要翻译：使用电子束的检查方法。来自位于主列内部的电子枪的带电粒子被加速以形成主光束。主梁的横截面通过位于主塔内部的主光学系统成型为期望的形状。主梁的轨迹使用位于主塔内部的主偏转器进行偏转。使用主光束照射样品，样品位于施加有延迟电压的台上。从载物台上的样品出现的二次电子，反射电子或向后散射的电子中的至少一个被加速朝向第二列形成次级光束。使用位于次级柱内部的次级偏转器使次级光束的轨迹偏转。次级束被引导到位于次级柱内的检测器。

4. 发明授权

US06583597B2 Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same 失效
标题翻译：包括非接触式气体轴承和包括其的微光刻设备的舞台装置
公开(公告)号：US06583597B2
公开(公告)日：2003-06-24
申请号：US09899946
申请日：2001-07-06
申请人： Keiichi Tanaka , Yukiharu Okubo , Hiroaki Narushima , Yukio Kakizaki , Yasushi Yoda
发明人： Keiichi Tanaka , Yukiharu Okubo , Hiroaki Narushima , Yukio Kakizaki , Yasushi Yoda
IPC分类号： G05B1100
CPC分类号： G03F7/70816 , F16C29/025 , F16C32/0618 , G03F7/70716 , G03F7/70725 , G03F7/70758 , H01J37/20 , H01J2237/20278
摘要： Stage apparatus are disclosed for holding an object (e.g., substrate or reticle, for example) in a microlithography system, especially a system for performing microlithography in a vacuum environment. The stage apparatus provides movement of a stage (intended to hold the object) in X and Y directions of a guide plane. The stage is mounted to an arm member having at least first and second ends situated symmetrically relative to the stage. The ends include linear-motor movers that interact with corresponding stators, and include gas bearings on surfaces that slide relative to other surfaces as the stage is moved within the guide plane. The linear-motor movers can be one- or two-dimensional movers and desirably allow &thgr;-direction motion of the stage. Other configurations include guide members and sliders that undergo sliding motion relative to the guide members via non-contacting gas bearings. The sliders can be driven by a combination of a linear motor and a gas cylinder, the latter assisting the driving force by the linear motor during acceleration and deceleration of the stage.
摘要翻译：公开了用于在微光刻系统中保持物体（例如，基板或掩模版）的平台装置，特别是用于在真空环境中执行微光刻的系统。舞台装置提供在导向平面的X和Y方向上的舞台（用于保持物体）的运动。平台安装到臂构件，臂构件具有至少第一和第二端相对于平台对称设置。端部包括与相应的定子相互作用的线性马达驱动器，并且当载物台在引导平面内移动时，包括在相对于其它表面滑动的表面上的气体轴承。线性马达移动器可以是一维或二维移动器，并且期望地允许载物台的θ方向运动。其他构造包括引导构件和滑块，其经由非接触气体轴承相对于引导构件经历滑动运动。滑块可以通过线性马达和气瓶的组合来驱动，后者在加速和减速阶段通过线性马达来辅助驱动力。

5. 发明授权

US08921812B2 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle 有权
标题翻译：掩模版保护构件，掩模版承载装置，曝光装置和承载掩模版的方法
公开(公告)号：US08921812B2
公开(公告)日：2014-12-30
申请号：US13446436
申请日：2012-04-13
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： H01L21/027 , G03F7/20 , G03F1/66 , G03F9/00 , H01L21/673
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.
摘要翻译：位置测量装置测量形成在掩模版的下表面上的位置测量标记的位置，从而测量掩模版的位置。位置测量装置测量形成在下盖的下表面上的位置测量标记的位置，从而测量下盖的位置。当掩模版的位置和下盖的位置是已知的时，标线片和下盖的相对位移是已知的。因此，当将装载有掩模版的下盖带有承载装置并设置在曝光装置中时，通过考虑该位移来确定下盖的停止位置。结果，可以将掩模版正确地设置在曝光装置中。

6. 发明申请

US20080173815A1 Electron beam apparatus and device production method using the electron beam apparatus 审中-公开
公开(公告)号：US20080173815A1
公开(公告)日：2008-07-24
申请号：US12068589
申请日：2008-02-08
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： G01N23/00
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.

7. 发明授权

US06953944B2 Scanning device and method including electric charge movement 有权
标题翻译：包括电荷运动的扫描装置和方法
公开(公告)号：US06953944B2
公开(公告)日：2005-10-11
申请号：US10705497
申请日：2003-11-12
申请人： Yoshiaki Kohama , Akihiro Goto , Muneki Hamashima , Yukiharu Okubo
发明人： Yoshiaki Kohama , Akihiro Goto , Muneki Hamashima , Yukiharu Okubo
IPC分类号： G01Q30/20 , H01J37/28 , G01N21/86
CPC分类号： H01J37/28 , H01J2237/2817
摘要： A scanning device and method includes a movable stage on which a specimen is positioned, an irradiating device for electron beam irradiation of the specimen, a detection device for generating a picture of the irradiation region by detecting a secondary beam including secondary or reflected electrons from the irradiation region, and imaging electron optical system for imaging the secondary beam on a detection surface. A secondary beam detector including a fluorescent unit arranged on the detection surface to convert the secondary beam into light, one-dimensional line sensors for forming electric charge by photoelectric conversion, an array imaging element for accumulating the electric charge in a predetermined line of the line sensors, and a two-dimensional imaging element which emits electric charge by means of photoelectric conversion. A corresponding method is also disclosed.
摘要翻译：一种扫描装置及方法，其特征在于，包括：移动台，其上设有试样;照射装置，用于对试样进行电子束照射;检测装置，用于通过检测包含二次或反射电子照射区域和用于在检测表面上成像次级束的成像电子光学系统。一种辅助光束检测器，包括布置在检测表面上以将次级光束转换为光的荧光单元，用于通过光电转换形成电荷的一维线传感器，用于在线的预定线中累积电荷的阵列成像元件传感器和通过光电转换发射电荷的二维成像元件。还公开了相应的方法。

8. 发明授权

US06735867B2 Method of making a static pressure air bearing 有权
标题翻译：制造静压空气轴承的方法
公开(公告)号：US06735867B2
公开(公告)日：2004-05-18
申请号：US10205200
申请日：2002-07-26
申请人： Takuma Tsuda , Shinji Shinohara , Shinobu Tokushima , Yukiharu Okubo , Toshimasa Shimoda , Douglas C. Watson , W. Thomas Novak
发明人： Takuma Tsuda , Shinji Shinohara , Shinobu Tokushima , Yukiharu Okubo , Toshimasa Shimoda , Douglas C. Watson , W. Thomas Novak
IPC分类号： B21D5310
CPC分类号： F16C32/06 , B23Q1/0027 , B23Q1/38 , B23Q1/621 , F16C29/025 , F16C32/0603 , F16C33/748 , F16C2300/62 , F16C2322/39 , G03F7/70816 , Y10T29/49639 , Y10T29/49641
摘要： In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.
摘要翻译：为了提供一种具有两个轴的静压空气轴承，该真空环在真空环境中可以使支撑排气管的连接不会对轴承机构的运动产生不利影响，排气管仅与固定部分）。从上轴排出的排气通过形成在上下轴的固定部内的内部排气管（通路）进行排气，不需要将排气管与可动部连接。

9. 发明申请

US20120200835A1 RETICLE PROTECTION MEMBER, RETICLE CARRYING DEVICE, EXPOSURE DEVICE AND METHOD FOR CARRYING RETICLE 审中-公开
标题翻译：防伪部件，携带装置，曝光装置及其携带方法
公开(公告)号：US20120200835A1
公开(公告)日：2012-08-09
申请号：US13446436
申请日：2012-04-13
申请人： Motoko SUZUKI , Yukiharu Okubo
发明人： Motoko SUZUKI , Yukiharu Okubo
IPC分类号： G03B27/52
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.
摘要翻译：位置测量装置测量形成在掩模版的下表面上的位置测量标记的位置，从而测量掩模版的位置。位置测量装置测量形成在下盖的下表面上的位置测量标记的位置，从而测量下盖的位置。当掩模版的位置和下盖的位置是已知的时，标线片和下盖的相对位移是已知的。因此，当将装载有掩模版的下盖带有承载装置并设置在曝光装置中时，通过考虑该位移来确定下盖的停止位置。结果，可以将掩模版正确地设置在曝光装置中。

10. 发明授权

US07453549B2 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle 失效
标题翻译：掩模版保护构件，掩模版承载装置，曝光装置和承载掩模版的方法
公开(公告)号：US07453549B2
公开(公告)日：2008-11-18
申请号：US11235198
申请日：2005-09-27
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： H01L21/027
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
摘要翻译：位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置，从而测量标线1的位置。位置测量装置30测量形成在下盖2b的下表面上的位置测量标记27的位置，从而测量下盖2b的位置。当标线片1的位置和下盖2b的位置已知时，标线片1和下盖2b的相对位移是已知的。因此，当装载有掩模版1的下盖2b被携带携带装置并设置在曝光装置中时，通过考虑该位移来确定下盖2b的停止位置。结果，可以将掩模版1正确地设置在曝光装置中。

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