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31. 发明申请

US20080296516A1 METHOD AND APPARATUS FOR SPECIMEN FABRICATION 审中-公开
标题翻译：方法和装置用于样本制造
公开(公告)号：US20080296516A1
公开(公告)日：2008-12-04
申请号：US12168238
申请日：2008-07-07
申请人： Satoshi TOMIMATSU , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi TOMIMATSU , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： G21K5/00
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber with an ion beam; a specimen holder to mount a specimen separated by the irradiation with the ion beam; a holder cassette to hold the specimen holder; a sample stage to hold, the sample and the holder cassette; and a probe to move the specimen to the specimen holder, wherein the holder cassette is transferred to outside of the chamber in a condition of holding the specimen holder with the specimen mounted.
摘要翻译：一种试样制造装置，包括：离子束照射光学系统，用离子束照射放置在腔室中的样品; 用于安装通过用离子束照射分离的样本的样本保持器; 用于保持样品架的保持器盒; 样品台，样品和保持盒; 以及用于将样本移动到样本保持器的探针，其中，在保持样本保持器的状态下，保持器盒被转移到腔室的外部。

32. 发明申请

US20060231776A1 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US20060231776A1
公开(公告)日：2006-10-19
申请号：US11452378
申请日：2006-06-14
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/08
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus including: an ion source, an optical system for irradiating a projection ion beam to a sample, wherein the optical system includes a patterning mask to form a ion beam emitted from the ion source into the projection ion beam, a sample stage to mount the sample, a vacuum specimen chamber to contain the sample stage, a probe for separating a micro-specimen from the sample by irradiation of the projection ion beam, a specimen holder to fix the micro-specimen, wherein the projection ion beam is irradiated to the micro-specimen fixed to the specimen holder and extracted by the probe in the specimen chamber, so that a finish fabrication to the micro-specimen is enabled.
摘要翻译：一种试样制造装置，包括：离子源，用于将投射离子束照射到样品的光学系统，其中所述光学系统包括图案化掩模，以形成从所述离子源发射到所述投影离子束中的离子束;样品台安装样品，用于容纳样品台的真空样本室，用于通过照射投影离子束从样品分离微量样本的探针，固定微型样品的样本保持器，其中投影离子束为照射到固定到样品架上并由探针在样品室中提取的微型样品，使得能够对微型样品进行精加工制造。

33. 发明申请

US20050092922A1 Ion beam apparatus and sample processing method 有权
标题翻译：离子束装置和样品处理方法
公开(公告)号：US20050092922A1
公开(公告)日：2005-05-05
申请号：US10973304
申请日：2004-10-27
申请人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
发明人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
IPC分类号： G01N23/00 , G21K7/00 , H01J37/30
CPC分类号： H01J37/3005 , H01J2237/304 , H01J2237/3114
摘要： For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.
摘要翻译：为了在离子束装置中实现高吞吐量和高处理位置精度，准备两种用于处理的离子束，其中一种是用于高分辨率的聚焦离子束和用于大束流的边缘处理离子束允许边缘部分被尖锐地加工，从而即使用大的电流离子束也能够确保高的加工位置精度。

34. 发明授权

US06538254B1 Method and apparatus for sample fabrication 有权
标题翻译：样品制造方法和装置
公开(公告)号：US06538254B1
公开(公告)日：2003-03-25
申请号：US09202540
申请日：1999-03-22
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J3720
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G01N2001/028 , G01N2001/045 , G01N2001/282 , G01N2001/2886 , H01J2237/31745 , Y10S977/951
摘要： A method and an apparatus for fabrication of a specimen including a semiconductor wafer or a semiconductor device chip and the tip of a probe firmly joined to the vicinity of an area to be observed on the specimen substrate which is mounted on a sample stage. A micro-specimen including the area to be observed is separated from the specimen substrate. Firmly joined to the tip of the probe, the micro-specimen separated from the specimen substrate is then transferred to a specimen holder of an apparatus for carrying out an observation, an analysis and/or a measurement on the micro-specimen to be fixed to the specimen holder. Subsequently, the tip of the probe is separated from the micro-specimen fixed to the specimen holder.
摘要翻译：一种用于制造包括半导体晶片或半导体器件芯片的试样的方法和装置，以及牢固地接合到安装在样品台上的待检测区域附近的探针的尖端。将包含待观察区域的微量试样与试样基板分离。将与试样基板分离的微量试样牢固地接合到样品基板上分离的微量样品，然后转移到用于对要固定的微型试样进行观察，分析和/或测量的装置的试样保持器样品架。随后，将探针的尖端与固定到样品架上的微型样品分离。

35. 发明授权

US08552397B2 Focused ion beam device and focused ion beam processing method 失效
标题翻译：聚焦离子束装置和聚焦离子束处理方法
公开(公告)号：US08552397B2
公开(公告)日：2013-10-08
申请号：US13513256
申请日：2010-11-15
申请人： Yuichi Madokoro , Hirokazu Kaneoya , Tsuyoshi Onishi , Isamu Sekihara
发明人： Yuichi Madokoro , Hirokazu Kaneoya , Tsuyoshi Onishi , Isamu Sekihara
IPC分类号： H01J3/28 , G21K1/00
CPC分类号： G21K1/00 , H01J37/1478 , H01J37/3056 , H01J2237/0458 , H01J2237/31745
摘要： Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused ion beam optical system, an aperture, a tilting deflector, a beam scanner, and an objective lens are controlled so as to irradiate an ion beam tilted to the optical axis of the optical system, thereby achieving thin film processing and a cross section processing without accompanying adjustment and operation for a sample stage. The thin film processing and the cross section processing with a focused ion beam can be automated, and yield can be improved. For example, by applying the present invention to a cross section monitor to detect an end point, the cross section processing can be easily automated.
摘要翻译：公开了一种光学系统的操作，其实现了与样品台机械倾斜的情况相当的聚焦离子束处理的观察。在聚焦离子束光学系统中，控制孔径，倾斜偏转器，光束扫描器和物镜，以照射倾斜到光学系统的光轴的离子束，由此实现薄膜处理和交叉部分处理，而不需要对样品台进行调整和操作。利用聚焦离子束的薄膜处理和横截面加工可以自动化，并且可以提高收率。例如，通过将本发明应用于截面监视器来检测终点，可以容易地自动化横截面处理。

36. 发明申请

US20110309245A1 SPECIMEN PREPARATION DEVICE, AND CONTROL METHOD IN SPECIMEN PREPARATION DEVICE 失效
标题翻译：样品制备装置，以及样品制备装置中的控制方法
公开(公告)号：US20110309245A1
公开(公告)日：2011-12-22
申请号：US13203807
申请日：2009-10-23
申请人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： G21K5/10 , G01N23/02
CPC分类号： G01N1/286
摘要： Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
摘要翻译：自动进行切片样品与试样的分离等。在成为试样和除了所述区域以外的区域的切除试样的区域中，或者在用于转移切除的试样的转移装置和能够保持切除的试样的试样保持器的区域中提供用于提高图像识别精度的标记，通过图像识别以高精度识别切除的样本和样本的相对运动等。在使用聚焦离子束对分钟标本的取样中，自动执行用于将切出的样品与试样分离的处理终点的检测等。因此，例如，无人标本切除成为可能，并且可以制备大量标本。

37. 发明申请

US20110297826A1 CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CORRECTING POSITION WITH RESPECT TO CHARGED PARTICLE BEAM 失效
标题翻译：充电颗粒光束装置和相对于充电颗粒光束校正位置的方法
公开(公告)号：US20110297826A1
公开(公告)日：2011-12-08
申请号：US13202498
申请日：2009-10-23
申请人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/153 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/15 , H01J2237/1536 , H01J2237/20207 , H01J2237/221 , H01J2237/30483 , H01J2237/31745
摘要： An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
摘要翻译：本发明的目的是消除图像中的变形，即使在带电粒子束的偏转方向与试样的倾斜轴之间存在角度差，也能够精确地观察和处理试样。当带电粒子束的偏转方向与试样的倾斜轴不平行时，确定与带电粒子束的观察方向的偏转旋转角度，改变偏转图案。从而校正图像中的失真。偏转图案变为平行四边形。即使样品倾斜，也能获得无变形的图像，能够高精度地观察和加工样品。这允许在校正位置关系之后自动识别位置校正标记以执行观察和处理。

38. 发明授权

US07804073B2 Liquid metal ion gun 有权
标题翻译：液态金属离子枪
公开(公告)号：US07804073B2
公开(公告)日：2010-09-28
申请号：US12076481
申请日：2008-03-19
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
IPC分类号： H01J49/10 , H01J27/02
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
摘要翻译： Ga液体金属离子源的发射极构成为包括基材的W12和覆盖表面的离子源元素的Ga9作为构造材料。通过使反溅射的颗粒成为Ga液态金属离子源的元素（W和Ga），如果反溅射的颗粒附着到Ga液态金属离子源，则不会发生可能改变Ga9的物理特性的污染物。使用W光圈作为光束限制（GUN）光圈来放置大约的Ga。在束发射区域（Ga储存）中包含的部分的表面上25mg（熔点为30℃））。当将离子发射到光束限制（GUN）孔径时，发射区域中的Ga在W光阑的束发射区域的表面上熔化并扩散。

39. 发明申请

US20090008578A1 METHOD AND APPARATUS FOR SPECIMEN FABRICATION 有权
标题翻译：方法和装置用于样本制造
公开(公告)号：US20090008578A1
公开(公告)日：2009-01-08
申请号：US12168241
申请日：2008-07-07
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/08
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber, with an ion beam; a specimen holder to mount a specimen separated by the irradiation with the ion beam; a holder cassette to hold the specimen holder; a sample stage to hold the sample and the holder cassette; and a probe to move the specimen to the specimen holder, wherein the holder cassette is transferred to outside of the chamber in a condition of holding the specimen holder with the specimen mounted.
摘要翻译：一种标本制造装置，包括：离子束照射光学系统，用离子束照射放置在室中的样品; 用于安装通过用离子束照射分离的样本的样本保持器; 用于保持样品架的保持器盒; 用于保持样品和保持器盒的样品台; 以及用于将样本移动到样本保持器的探针，其中，在保持样本保持器的状态下，保持器盒被转移到腔室的外部。

40. 发明申请

US20080296497A1 METHOD AND APPARATUS FOR SPECIMEN FABRICATION 有权
标题翻译：方法和装置用于样本制造
公开(公告)号：US20080296497A1
公开(公告)日：2008-12-04
申请号：US12168232
申请日：2008-07-07
申请人： Satoshi TOMIMATSU , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi TOMIMATSU , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： G01N23/00
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.
摘要翻译：一种用于分析半导体器件的系统，包括：第一离子束装置，包括：样品台，用于安装样品基板; 其中放置样品台的真空室; 离子束照射光学系统照射样品基板; 样本保持器，其容纳通过离子束的照射与样品基板分离的多个样本; 以及从所述样品基材中提取分离出的试样并将分离的试样转移到所述试样保持器的探针。对样品进行精加工的第二离子束装置; 以及用于分析成品样品的分析器，其中所述第一离子束装置在真空条件下分离所述样品和所述探针。

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