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1. 发明专利

NL7204863A 未知
公开(公告)号：NL7204863A
公开(公告)日：1972-10-16
申请号：NL7204863
申请日：1972-04-12
IPC分类号： H01J3/02 , H01J37/073 , H01J37/28 , H01J3/28

2. 发明专利

PT78091B 未知
公开(公告)号：PT78091B
公开(公告)日：1986-03-20
申请号：PT7809184
申请日：1984-02-10
申请人： PHILIPS NV
IPC分类号： H01J29/76 , H01J3/28 , H04N9/18
摘要： An electromagnetic deflection unit for a television display tube has two deflection coils disposed coaxially one within the other and each comprising two diametrically opposed coil units. Each deflection coil is wound against a surface of an associated hollow moulding, which in the case of the inner coil may be the envelope of the display tube. The respective surface of each moulding has a compound curvature which is concave in one direction and convex in a direction transverse thereto. Each coil unit of each deflection coil comprises a number of turns of wire which are laid around each other in a single layer or a plurality of superimposed layers on the respective surface of the respective moulding, the wire turns being held in position by contact adhesive applied to the wire and to the surface of the moulding.

3. 发明专利

NL8603056A 未知
公开(公告)号：NL8603056A
公开(公告)日：1988-07-01
申请号：NL8603056
申请日：1986-12-01
申请人： PHILIPS NV
IPC分类号： H01J9/236 , H01J29/76 , H01J3/28
摘要： The invention relates to a method of manufacturing an electromagnetic deflection unit which comprises at least one pair of saddle-shaped deflection coils. These are wound in a jig and are then assembled with other components. Mechanised assembly becomes simple when, according to the invention, during winding the coil an electrically insulating support having electrically conductive connection points for the coil terminators is used, the terminators being connected to the connection points after winding.

4. 发明专利

GB8325481D0 TRAVELING WAVE PUSH-PULL ELECTRON BEAM DEFLECTOR 未知
公开(公告)号：GB8325481D0
公开(公告)日：1983-10-26
申请号：GB8325481
申请日：1983-09-23
申请人： TEKTRONIX INC
IPC分类号： H01J29/74 , H01J23/24 , H01J29/70 , H01J3/28
摘要： An electron beam deflection structure (10) of the traveling wave type includes first and second deflection members (52 and 58) positioned on opposite sides of and extending along the path of an electron beam (26) to deflect the beam in response to deflection signals applied to the deflection members. In a preferred embodiment, both deflection members are of a meander line type which include a plurality of deflection plate segments (74, 76) connected in series by a plurality of lead portions (78) to form a pair of transmission lines, each transmission line having a characteristic impedance that tends to vary with distance along the path of the electron beam due to a flared spacing between the output portions of the deflection members. Pitch compensation including different pitches for the first and second deflection members increases and maintains substantially uniform the characteristic impedance of each transmission line to prevent reflection of the deflection signal back toward the input end of the line.

5. 发明专利

GB1396209A DEVICES FOR INCREASING THE ACCURACY OF ADDRESSING AN ELECTRN BEAM STRIKING A TARGET 未知
公开(公告)号：GB1396209A
公开(公告)日：1975-06-04
申请号：GB1944873
申请日：1973-04-24
申请人： THOMSON CSF
IPC分类号： G21K1/087 , G09G1/04 , H01J29/70 , H01J37/147 , H01J37/304 , H01J37/305 , H05H7/00 , H01J3/28 , G05D3/00
摘要： 1396209 Automatic control of position THOMSON-CSF 24 April 1973 [25 April 1972] 19448/73 Heading G3N [Also in Division H1] In a discharge tube arrangement which includes a deflection system 10 for controlling the point of impact of an electron beam 50 on a target 1, the accuracy of addressing the beam is increased by the provision of a subsidiary, small amplitude deflection system 9 which may be switched into a servo-circuit Fig. 6, (not shown) fed by signals derived from a pair of orthogonal elements 41, 42 provided with scale marks formed of a material having electron impact properties different from those of the remainder of the element surface. The arrangement may be calibrated, to store the system 9 correcting voltages required to be added to the initial system 10 voltages in order to address any given point of the target, by employing a standard grid as the target, Fig. 5: the accuracy of the main deflection system 10 permits deflection of the beam to the vicinity of that grid point Q o which is associated with the grid square containing the desired point of impact P. Deflection system 9 is then switched into the servo-circuit to accurately position the beam on the edges of the two scale marks defining Q o . The deflection system 9 is then disconnected from the servo-circuit and deflection voltages applied to system 9 to displace the beam to the desired point P.

6. 发明专利

PT78152B 未知
公开(公告)号：PT78152B
公开(公告)日：1986-03-20
申请号：PT7815284
申请日：1984-02-24
申请人： PHILIPS NV
IPC分类号： H01J29/70 , H01J29/76 , H01J3/28 , H04N9/18
摘要： An electromagnetic deflection unit is disposed around a portion of a display tube and comprises a first deflection coil for producing, when energized, a frame deflection field and a second deflection coil for producing, when energized, a line deflection field the second deflection coil and being located coaxially within the first deflection coil, each deflection coil having two diametrically oppositely located deflection coil units. The first deflection coil has a winding distribution for generating, upon energization, a dipole deflection field in combination with a positive sixpole deflection field on the side of the gun system, generating a dipole field in combination with a negative sixpole field in the central area, and generating a dipole field in combination with a positive sixpole on the side facing the display screen, the first and the second deflection coils being positioned axially with respect to each other in such manner that upon energization the magnetic field generated by the first deflection coil extends further towards the display screen than the magnetic field generated by the second deflection coil so that the device shows a minimum east-west raster error.

7. 发明专利

DE3339015A1 未知
公开(公告)号：DE3339015A1
公开(公告)日：1984-05-03
申请号：DE3339015
申请日：1983-10-27
申请人： TEKTRONIX INC
发明人： CORRELL RONALD E
IPC分类号： H01J29/74 , H01J23/24 , H01J29/70 , H01J3/28 , H01J29/72 , G01R13/20
摘要： An electron beam deflection structure (10) of the traveling wave type includes first and second deflection members (52 and 58) positioned on opposite sides of and extending along the path of an electron beam (26) to deflect the beam in response to deflection signals applied to the deflection members. In a preferred embodiment, both deflection members are of a meander line type which include a plurality of deflection plate segments (74, 76) connected in series by a plurality of lead portions (78) to form a pair of transmission lines, each transmission line having a characteristic impedance that tends to vary with distance along the path of the electron beam due to a flared spacing between the output portions of the deflection members. Pitch compensation including different pitches for the first and second deflection members increases and maintains substantially uniform the characteristic impedance of each transmission line to prevent reflection of the deflection signal back toward the input end of the line.

8. 发明专利

JPS5718666B2 JPS5718666B2 - 失效
公开(公告)号：JPS5718666B2
公开(公告)日：1982-04-17
申请号：JP2713274
申请日：1974-03-11
IPC分类号： H01J3/28 , H01J29/64 , H01J29/76 , H04N9/07

9. 发明专利

JPS50120916A 失效
公开(公告)号：JPS50120916A
公开(公告)日：1975-09-22
申请号：JP2713274
申请日：1974-03-11
IPC分类号： H01J3/28 , H01J29/64 , H01J29/76 , H04N9/07

10. 发明授权

US08552397B2 Focused ion beam device and focused ion beam processing method 失效
标题翻译：聚焦离子束装置和聚焦离子束处理方法
公开(公告)号：US08552397B2
公开(公告)日：2013-10-08
申请号：US13513256
申请日：2010-11-15
申请人： Yuichi Madokoro , Hirokazu Kaneoya , Tsuyoshi Onishi , Isamu Sekihara
发明人： Yuichi Madokoro , Hirokazu Kaneoya , Tsuyoshi Onishi , Isamu Sekihara
IPC分类号： H01J3/28 , G21K1/00
CPC分类号： G21K1/00 , H01J37/1478 , H01J37/3056 , H01J2237/0458 , H01J2237/31745
摘要： Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused ion beam optical system, an aperture, a tilting deflector, a beam scanner, and an objective lens are controlled so as to irradiate an ion beam tilted to the optical axis of the optical system, thereby achieving thin film processing and a cross section processing without accompanying adjustment and operation for a sample stage. The thin film processing and the cross section processing with a focused ion beam can be automated, and yield can be improved. For example, by applying the present invention to a cross section monitor to detect an end point, the cross section processing can be easily automated.
摘要翻译：公开了一种光学系统的操作，其实现了与样品台机械倾斜的情况相当的聚焦离子束处理的观察。在聚焦离子束光学系统中，控制孔径，倾斜偏转器，光束扫描器和物镜，以照射倾斜到光学系统的光轴的离子束，由此实现薄膜处理和交叉部分处理，而不需要对样品台进行调整和操作。利用聚焦离子束的薄膜处理和横截面加工可以自动化，并且可以提高收率。例如，通过将本发明应用于截面监视器来检测终点，可以容易地自动化横截面处理。

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