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31. 发明申请

WO2005111689A3 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGES 审中-公开
标题翻译：具有中间图像的目标投影
公开(公告)号：WO2005111689A3
公开(公告)日：2006-06-08
申请号：PCT/EP2005005250
申请日：2005-05-13
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
发明人： DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反射折射投射物镜具有用于对物场进行成像以形成第一实际中间像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二个目标部分是具有凹面镜的反射折射物镜部分。提供了用于使来自物体平面的辐射在凹面镜的方向上偏转的第一折叠镜和用于在像面方向偏转来自凹面镜的辐射的第二折叠镜。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

32. 发明申请

WO2006053751A2 PROJEKTIONSOBJEKTIV EINER MIKROLITHOGRAPHISCHEN PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译：微型投影曝光设备的投影目标
公开(公告)号：WO2006053751A2
公开(公告)日：2006-05-26
申请号：PCT/EP2005/012327
申请日：2005-11-17
申请人： CARL ZEISS SMT AG , BEIERL, Helmut , BLEIDISTEL, Sascha , SINGER, Wolfgang , GRUNER, Toralf , EPPLE, Alexander , WABRA, Norbert , BEDER, Susanne , WEBER, Jochen , FELDMANN, Heiko , SCHWAER, Bärbel , ROGALSKY, Olaf , KAZI, Ari
发明人： BEIERL, Helmut , BLEIDISTEL, Sascha , SINGER, Wolfgang , GRUNER, Toralf , EPPLE, Alexander , WABRA, Norbert , BEDER, Susanne , WEBER, Jochen , FELDMANN, Heiko , SCHWAER, Bärbel , ROGALSKY, Olaf , KAZI, Ari
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： Eine mikrolithographische Projektionsbelichtungsanlage weist ein Projektionsobjektiv (20) auf, das ein Objekt (24) auf eine Bildebene (28) abbildet und eine Linse (L3) mit einer gekrümmten Fläche (S) hat. In dem Projektionsobjektiv (20) befindet sich ein flüssiges oder festes Medium (34), das unmittelbar an die gekrümmte Fläche (S) über einen Bereich hinweg angrenzt, der für die Abbildung des Objekts (24) nutzbar ist. Die Projektionsbelichtungsanlage weist außerdem einen verstellbaren Manipulator (M) zur Verringerung einer Bildfeldwölbung auf, die durch eine Erwärmung des Mediums (34) während des Projektionsbetriebs verursacht wird.
摘要翻译：
的微光刻投射曝光设备包括：一个投影透镜（20）到图像平面（28）的图像的对象（24）和具有一个冠导航中使用的透镜（L3）奈德FL＆AUML;枝（S）具有，在投影透镜20中，存在液体或固体介质34，其在与图像相邻的区域上紧邻曲面S 物体（24）的尺寸是可用的。投影曝光＆害羞;植物具有坳道除了可调节的操纵器（M），以减少一个Bildfeldw＆OUML; lbung，其通过EI＆害羞; NE广告＆AUML;所述介质（34）的变暖W＆AUML; Projektionsbe＆期间害羞;引起驱动。

33. 发明申请

WO2005054956A3 PROJECTION OPTICAL SYSTEM 审中-公开
公开(公告)号：WO2005054956A3
公开(公告)日：2005-06-16
申请号：PCT/EP2004/013519
申请日：2004-11-25
申请人： CARL ZEISS SMT AG , ROSTALSKI, Hans-Jürgen , DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
发明人： ROSTALSKI, Hans-Jürgen , DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
IPC分类号： G03F7/20
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation (1) is fulfilled: (1) wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φ i is a refractive power in mm -1 of the i th lens, k is a total number of lenses of the projection optical system, and wherein V 1 is greater than 0.045.

34. 发明申请

WO2005015283A1 PROJECTION OBJECTIVES INCLUDING A PLURALITY OF CURVED MIRRORS WITH LENSES AHEAD OF THE LAST BUT ONE MIRROR 审中-公开
标题翻译：投影目标包括多余的弯曲镜与前一个镜子之前的一个镜子
公开(公告)号：WO2005015283A1
公开(公告)日：2005-02-17
申请号：PCT/EP2004/007910
申请日：2004-07-16
申请人： CARL ZEISS SMT AG , MANN, Hans-Jürgen , EPPLE, Alexander , HUDYMA, Russell
发明人： MANN, Hans-Jürgen , EPPLE, Alexander , HUDYMA, Russell
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/0844 , G02B17/0856 , G03F7/70225
摘要： According to one exemplary embodiment, a projection objective (100, 200) is provided and includes at least two non-planar (curved) mirrors (M1-M4), wherein an axial distance between a next to last non-planar mirror (M3) and a last non-planar mirror (M4), as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.
摘要翻译：根据一个示例性实施例，提供了一个投影物镜（100,200）并且包括至少两个非平面（弯曲）反射镜（M1-M4），其中下一个至最后的非平面镜（M3）并且沿着光路限定的最后的非平面镜（M4）大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。在一个示例性实施例中，第一折射表面与单遍型透镜相关联。当前目标形成具有至少约0.80或更高（例如0.95）的数值孔径的图像。优选地，该目的不包括折叠反射镜，并且在两个反射镜之间不存在中间图像，以及物镜的瞳孔没有遮蔽。

35. 发明申请

WO2004090600A2 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2004090600A2
公开(公告)日：2004-10-21
申请号：PCT/EP2004/003708
申请日：2004-04-07
申请人： CARL ZEISS SMT AG , EPPLE, Alexander , DODOC, Aurelian
发明人： EPPLE, Alexander , DODOC, Aurelian
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging a pattern arranged in the object plane (102) of the projection objective into the image plane (104) of the projection objective has a catadioptric first objective part (105) having at least one concave mirror (106), and a dioptric second objective part (108) in which there is situated a pupil surface (111) near the image. At least one concave lens (140, 145) with a concave surface (140', 145') directed towards the pupil surface (111) is arranged in a near zone (160) of the pupil surface. There are no lenses with a strongly curved concave surface directed towards the image plane between the pupil surface and the image plane. Such projection objectives can be produced in a way which saves material in conjunction with good optical correction, and are relatively insensitive to production-induced deviations from the ideal de sign.
摘要翻译：用于将布置在投影物镜的物平面（102）中的图案成像到投影物镜的像平面（104）中的反射折射投射物镜具有反射折射的第一物镜部分（105），其具有至少一个凹面镜（106），以及其中在图像附近设置瞳孔表面（111）的屈光度第二目标部分（108）。具有指向瞳孔表面（111）的凹表面（140'，145'）的至少一个凹透镜（140,145）布置在瞳孔表面的近区（160）中。没有透镜具有朝向瞳孔表面和图像平面之间的图像平面的强烈弯曲的凹面。这样的投影物镜可以以与光学校正良好相结合的方式产生，并且对生产诱导的理想偏差的偏差相对不敏感。

36. 发明申请

WO2006053751A3 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：投影镜头的微光刻投射曝光设备
公开(公告)号：WO2006053751A3
公开(公告)日：2006-10-12
申请号：PCT/EP2005012327
申请日：2005-11-17
申请人： ZEISS CARL SMT AG , BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARI
发明人： BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARIF
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure installation comprises a projection lens system (20), which projects an object (24) onto a focal plane (28) and which has a lens (L3) with a curved surface (S). A liquid or solid medium (34) is located in the projection lens system (20) and directly abuts against the curved surface (S) over an area that can be used for the projection of the object (24). The projection exposure installation also comprises an adjustable manipulator (M) for reducing a curvature of field that is caused by a heating of the medium (34) during the projection operation.
摘要翻译：微光刻投射曝光设备包括：一个投影透镜（20），该图像的对象（24）到图像平面（28）和具有弯曲表面（S）的透镜（L3）。在投影透镜（20）是液体或固体培养基（34），紧邻所述弯曲表面（S）在一定范围内作为用于所述对象（24）的成像。的投影曝光装置还包括一个可调节的操纵器（M），以减少的场曲，这是由投影操作期间介质（34）的加热而引起的。

37. 发明申请

WO2005096098A3 PROJECTION OBJECTIVE, PROJECTION EXPOSURE APPARATUS AND REFLECTIVE RETICLE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标，投影曝光装置和反射镜
公开(公告)号：WO2005096098A3
公开(公告)日：2006-07-06
申请号：PCT/EP2005002898
申请日：2005-03-18
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , ULRICH WILHELM , BADER DIETER , EPPLE ALEXANDER
发明人： DODOC AURELIAN , ULRICH WILHELM , BADER DIETER , EPPLE ALEXANDER
IPC分类号： G03F7/20 , G03F1/00
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective (120) for microlithography serves for imaging a pattern of a mask (130) arranged in its object surface into an image field (104) arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis (121) of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an image side numerical aperture NA > 0.85 and a demagnifying imaging scale where IßI
摘要翻译：用于微光刻的投影物镜（120）用于将布置在其物体表面中的掩模（130）的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场（104）。它具有沿着投影物镜的光轴（121）布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有像侧数值孔径NA> 0.85和缩小成像刻度， IΦI<0.05，并且具有适合于大于1mm的微光刻的最小图像场直径的平面图像场（104）。

38. 发明申请

WO2005081067A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置投影目标
公开(公告)号：WO2005081067A1
公开(公告)日：2005-09-01
申请号：PCT/EP2004/014727
申请日：2004-12-27
申请人： CARL ZEISS SMT AG , KNEER, Bernhard , WABRA, Norbert , GRUNER, Toralf , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
发明人： KNEER, Bernhard , WABRA, Norbert , GRUNER, Toralf , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection objective of a microlithographic projection exposure apparatus (110) is designed for immersion operation in which an immersion liquid (134) adjoins a photosensitive layer (126). The refractive index of the immersion liquid is greater than the refractive index of a medium (L5; 142; L205; LL7; LL8; LL9). that adjoins the immersion liquid on the object side of the projection objective (120; 120'; 120"). The projection objective is designed such that the immersion liquid (134) is convexly curved towards the object plane (122) during immersion operation.
摘要翻译：微光刻投影曝光装置（110）的投影物镜被设计用于浸没操作，其中浸没液体（134）邻接感光层（126）。浸没液的折射率大于介质的折射率（L5; 142; L205; LL7; LL8; LL9）。在所述投影物镜（120; 120'; 120“）的物体侧邻接所述浸没液体，所述投影物镜被设计为使得所述浸没液体（134）在浸入操作期间朝向所述物体平面（122）凸形弯曲。

39. 发明申请

WO2005040890A3 CATADIOPTRIC PROJECTION OBJECTIVE WITH REAL INTERMEDIATE IMAGES 审中-公开
标题翻译：具有真实中间图像的目标投影目标
公开(公告)号：WO2005040890A3
公开(公告)日：2005-06-30
申请号：PCT/EP2004011587
申请日：2004-10-15
申请人： ZEISS CARL SMT AG , SHAFER DAVID , DODOC AURELIAN , EPPLE ALEXANDER , ULRICH WILHELM , SCHUSTER KARL-HEINZ
发明人： SHAFER DAVID , DODOC AURELIAN , EPPLE ALEXANDER , ULRICH WILHELM , SCHUSTER KARL-HEINZ
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
摘要翻译：一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将位于物平面中的物场投影到第一实际中间图像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。

40. 发明申请

WO2005054956A2 PROJECTION OPTICAL SYSTEM 审中-公开
标题翻译：投影光学系统
公开(公告)号：WO2005054956A2
公开(公告)日：2005-06-16
申请号：PCT/EP2004013519
申请日：2004-11-25
申请人： ZEISS CARL SMT AG , ROSTALSKI HANS-JUERGEN , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
发明人： ROSTALSKI HANS-JUERGEN , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
IPC分类号： G02B13/14 , G03F7/20
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation (1) is fulfilled: (1) wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, phii is a refractive power in mm of the i lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译：投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可分为正和负折射光焦度的四个不重叠的透镜组，其中满足以下关系式（1）：（1）其中：y是成像的最大图像场的直径的一半直径（mm）通过投影光学系统，NA是第二物体一侧的最大数值孔径，phii是第i个透镜的折射力，单位为mm -1，k是投影光学透镜的总数系统，其中V1大于0.045。

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