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    • 21. 发明授权
    • Apparatus and method for connecting optical waveguides
    • 光波导连接装置及方法
    • US07330247B2
    • 2008-02-12
    • US11213559
    • 2005-08-26
    • Masaki Hasegawa
    • Masaki Hasegawa
    • G01B11/26G02B6/26
    • G02B6/30G02B6/4221G02B6/4227
    • Apparatus and method which adjusts an optical connection between a waveguide and an optical interconnection component that launches light into the waveguide or receives light emitted from the waveguide. The apparatus includes: an excitation light element emitting light that causes the waveguide to fluoresce into the waveguide via the optical interconnection component; an observation unit that observes the waveguide from a side face, different from the end face into which light is launched into the waveguide or light having propagated through the waveguide is emitted, and which receives fluorescent light emitted by the waveguide; and a connection adjusting component that adjusts the optical connection between the optical interconnection component and the waveguide based on the intensity of the fluorescent light received at the light observing section.
    • 调整波导和光互连部件之间的光学连接的装置和方法,其将光发射到波导中或接收从波导发射的光。 该装置包括:发射光的激发光元件,其使得波导经由光互连部件发光到波导中; 观察单元,其从侧面观察波导,不同于发射到波导中的光的端面或者通过波导传播的光,并且其接收由波导发射的荧光; 以及连接调整部件,其基于在所述光观察部接收的荧光的强度来调整所述光互连部件与所述波导管的光连接。
    • 22. 发明申请
    • Electron microscope and electron bean inspection system.
    • 电子显微镜和电子豆检查系统。
    • US20070181808A1
    • 2007-08-09
    • US11701386
    • 2007-02-02
    • Hisaya MurakoshiHideo TodokoroHiroyuki ShinadaMasaki HasegawaMomoyo Enyama
    • Hisaya MurakoshiHideo TodokoroHiroyuki ShinadaMasaki HasegawaMomoyo Enyama
    • G21K7/00
    • H01J37/29H01J2237/057H01J2237/1508H01J2237/24592H01J2237/2538H01J2237/2817
    • While an image obtained by a general electron microscope is affected by the shape and material of an object specimen, an image obtained from mirror electrons is affected by the shape of an equipotential surface on which the mirror electrons are reflected, thereby the image interpretation is complicated. A mirror electron microscope of the present invention is provided with the following means for controlling a reflecting plane of the mirror electrons according to the structure of an object pattern to be measured or a concerned defect.1) Means for controlling a potential difference between a specimen and an electron source equivalent to a height of a reflecting plane of a mirror electron beam according to a type, an operation condition of an electron source, and a type of a pattern on a specimen. 2) Means for controlling an energy distribution of an illuminating beam with an energy filter 9 disposed in an illuminating system. It is thus possible to inspect a specimen according to a size and a potential of a pattern, which are distinguished from others.
    • 当通过一般电子显微镜获得的图像受目标样本的形状和材料的影响时,由镜电子获得的图像受到反射镜电子反射的等电位面的形状的影响,从而图像解释复杂 。 本发明的镜电子显微镜具备以下用于根据被测量对象图案的结构或相关缺陷来控制镜电子的反射面的装置。 1)根据类型,电子源的操作条件和样品上的图案的类型来控制样品和电子源之间的电位差与电子束的反射面的高度的电位差的装置 。 2)用于通过设置在照明系统中的能量过滤器9来控制照明光束的能量分布的装置。 因此,可以根据区别于其他图案的尺寸和电位来检查样本。
    • 28. 发明授权
    • Electron beam inspection method and electron beam inspection apparatus
    • 电子束检查方法和电子束检查装置
    • US08288722B2
    • 2012-10-16
    • US12926489
    • 2010-11-22
    • Masaki HasegawaHiroya Ohta
    • Masaki HasegawaHiroya Ohta
    • H01J37/26
    • G01N23/225H01J37/026H01J37/285H01J37/29H01J2237/0047H01J2237/221H01J2237/2446H01J2237/24495H01J2237/2482H01J2237/2855
    • An electron beam inspection apparatus images reflected electrons and cancels negative charging derived from electron-beam irradiation. Ultraviolet rays are irradiated and an irradiated area of ultraviolet rays is displayed as a photoelectron image. The photoelectron image and a reflected-electron image are displayed on a monitor while being superposed on each other, to easily grasp the positional relationship between the images and the difference in size between them. Specifically, the shape of the irradiated area of an electron beam includes the shape of the irradiated area of ultraviolet rays on a display screen. The intensity of the ultraviolet rays in the irradiated area of the electron beam is adjusted while the reflected-electron imaging conditions for the reflected-electron image are sustained. Moreover, an amount-of-ultraviolet ray adjustment mechanism is controlled on the monitor so that an amount of the ultraviolet rays is adjusted while observing a reflected-electron image obtained during ultraviolet irradiation.
    • 电子束检查装置对反射电子进行成像并消除由电子束照射产生的负电荷。 照射紫外线,照射紫外线的区域作为光电子图像显示。 光电子图像和反射电子图像在彼此重叠的状态下显示在监视器上,以容易地掌握图像之间的位置关系和它们之间的尺寸差异。 具体地,电子束的照射区域的形状包括在显示屏上照射的紫外线区域的形状。 调整电子束的照射区域中的紫外线的强度,同时维持反射电子图像的反射电子成像条件。 此外,在监视器上控制紫外线量调节机构,使得在观察紫外线照射期间获得的反射电子图像的同时调节紫外线的量。