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    • 22. 发明授权
    • Indexing apparatus and method for controlling the indexing apparatus
    • 用于控制分度装置的分度装置和方法
    • US5960676A
    • 1999-10-05
    • US945339
    • 1997-10-27
    • Wolfgang PfeiferKenji SugimotoHiroshi Shinohara
    • Wolfgang PfeiferKenji SugimotoHiroshi Shinohara
    • B23B3/16B23Q16/10B23Q16/00
    • B23Q16/10B23B3/168Y10T74/14Y10T74/1412Y10T74/1488
    • An indexing device comprising a base table (10), a turret (11) which indexes about a given rotary center relative to the base table (10), a pair of positioning engaging members (27) provided between the base table (10) and the turret (11), wherein at least one of the positioning engaging members (27) has an inclined tooth profile, and the positioning engaging members (27) are engageable with and disengageable from each other relative to the tooth profiles when they move in axial directions thereof relative to each other. The meshing of the tooth profiles are maintained by applying a pressing force to at least one of the positioning engaging members (27). When the turret (11) receives a load, a positioning displacement which occurs between the pair of positioning engaging members (27) is detected, and the pressing force applied to the positioning engaging members (27) is adjusted based on the result of detection.
    • PCT No.PCT / JP96 / 03661 Sec。 371日期1997年10月27日第 102(e)日期1997年10月27日PCT 1996年12月13日PCT公布。 公开号WO98 / 25730 日期1998年6月18日一种分度装置,包括基座台(10),相对于基台(10)指定给定旋转中心的转台(11),设置在基座之间的一对定位接合构件 台(10)和转台(11),其中定位接合构件(27)中的至少一个具有倾斜的齿形,并且定位接合构件(27)能够相对于齿廓彼此接合和分离 当它们相对于彼此的轴向方向移动时。 通过对至少一个定位接合构件(27)施加压力来保持齿廓的啮合。 当转台(11)接收到负载时,检测出在一对定位接合构件(27)之间发生的定位位移,并且基于检测结果来调整施加到定位接合构件(27)的按压力。
    • 23. 发明授权
    • Substrate spin treating method and apparatus
    • 底物旋转处理方法和装置
    • US5788773A
    • 1998-08-04
    • US731245
    • 1996-10-11
    • Seiichiro OkudaKenji SugimotoHiroshi Yoshii
    • Seiichiro OkudaKenji SugimotoHiroshi Yoshii
    • B05C11/08H01L21/00B05B13/04B08B3/00
    • H01L21/6715B05C11/08Y10S134/902
    • A baffle is placed in a position opposed to discharge openings of a treating solution supply nozzle and between the discharge openings and the surface of a substrate. The baffle intercepts a treating solution discharged from the discharge openings, whereby the treating solution is supplied evenly to the surface of the substrate by flowing over a surface of the baffle and falling from an edge of the baffle to the substrate, instead of falling from the discharge openings directly to the substrate. No microbubbles are formed in the treating solution on the substrate, which would cause an unevenness of treatment. The discharge openings may be defined by a plurality of circular bores formed in the supply nozzle. Each circular bore may have a diameter at least equal to a spacing between an adjacent pair of circular bores.
    • 挡板被放置在与处理溶液供应喷嘴的排放口相对的位置和排放口与基板的表面之间。 挡板拦截从排出口排出的处理溶液,由此通过流过挡板的表面并从挡板的边缘落到基板而将处理溶液均匀地供给到基板的表面,而不是从 将开口直接排放到基板。 在基材上的处理溶液中不会形成微泡,这会导致处理不均匀。 排出口可以由形成在供给喷嘴中的多个圆形孔限定。 每个圆形孔可以具有至少等于相邻的一对圆形孔之间的间距的直径。
    • 24. 发明授权
    • Substrate spin treating method and apparatus
    • 底物旋转处理方法和装置
    • US5677000A
    • 1997-10-14
    • US699728
    • 1996-08-19
    • Katsushi YoshiokaYoshiteru FukutomiTsuyoshi MitsuhashiKenji Sugimoto
    • Katsushi YoshiokaYoshiteru FukutomiTsuyoshi MitsuhashiKenji Sugimoto
    • B05C11/08G03F7/16H01L21/00H01L21/027H01L21/304B05D3/12B05C11/00
    • H01L21/6715G03F7/162
    • A substrate spin treating method and apparatus having a cup cleaner device for cleaning a scatter preventive cup, which cleaner device does not require attaching and/or detaching of a cleaning jig. The cleaner device is driven through engagement with a spin chuck which operates at a low torque that is provided for normal substrate spin treating operation. During the normal spin treating operation, only the spin chuck is driven by a rotary shaft, with the cup cleaner device being disengaged from the spin chuck and its driving rotary shaft. For a cup cleaning operation, the spin chuck and scatter preventive cup are vertically moved relative to each other to place the cup cleaner device at a cup cleaning height and to drivingly connect the cup cleaner device to the rotary shaft through a torque transmitter. In this state, the cup cleaner device is rotated to establish a centrifugal force that scatters a cleaning solution supplied to a cleaning solution guide of the cup cleaner device from cleaning solution supply nozzles, thereby cleaning inner surfaces of the scatter preventive cup.
    • 一种具有用于清洁散射防止杯的杯子清洁器装置的衬底旋转处理方法和装置,该清洁装置不需要附着和/或拆卸清洁夹具。 清洁器装置通过与旋转卡盘啮合而被驱动,旋转卡盘以为正常的基底旋转处理操作提供的低扭矩操作。 在正常的旋转处理操作期间,只有旋转卡盘由旋转轴驱动,杯子清洁器装置与旋转卡盘及其驱动旋转轴脱离。 对于杯子清洁操作,旋转卡盘和防散射杯相对于彼此垂直移动,以将杯清洁器设备放置在杯清洁高度处,并且通过扭矩传递器驱动地将杯清洁器装置连接到旋转轴。 在这种状态下,杯子清洁器装置被旋转以建立离心力,该离心力将供应到杯清洁器装置的清洁溶液引导件的清洁溶液从清洁溶液供应喷嘴分散,从而清洁防散射杯的内表面。
    • 25. 发明授权
    • Developing method and apparatus
    • 开发方法和装置
    • US5555234A
    • 1996-09-10
    • US379811
    • 1995-01-27
    • Kenji Sugimoto
    • Kenji Sugimoto
    • G03F7/30G03F7/38H01L21/027G03D3/02G03D5/00
    • G03F7/3021
    • A desired pattern is exposed to a substrate surface having a photosensitive resin film formed thereon, and thereafter a prewetting liquid and a developer are successively supplied to the substrate surface. A diaphragm mounted in a prewetting liquid supply nozzle applies ultrasonic vibration to the prewetting liquid to be supplied to the substrate surface. The ultrasonic vibration applied vibrates minute bubbles of several micrometers in size which are generated when the prewetting liquid is supplied to the substrate surface, thereby causing the bubbles to float to the surface of the prewetting liquid and disappear therefrom. As a result, the substrate surface is modified to be hydrophilic and becomes free of the bubbles. The developer subsequently supplied through a developer supply nozzle uniformly spreads over the entire substrate surface without being obstructed by the bubbles, to avoid non-uniform development.
    • 将期望的图案暴露于其上形成有感光性树脂膜的基板表面,然后将预润湿液体和显影剂依次供给到基板表面。 安装在预润湿液体供给喷嘴中的隔膜对要供给到基板表面的预润湿液体施加超声波振动。 施加的超声振动振动了将预润湿液体供给到基板表面时产生的几微米的微小气泡,从而使气泡浮在预润湿液体的表面并从其中消失。 结果,基板表面被改性为亲水的并且没有气泡。 随后通过显影剂供应喷嘴提供的显影剂均匀地铺展在整个基板表面上,而不被气泡阻挡,以避免不均匀的显影。
    • 27. 发明授权
    • Method of producing a thin film magnetic head
    • 薄膜磁头的制造方法
    • US4841624A
    • 1989-06-27
    • US142696
    • 1988-01-11
    • Eisei TogawaSaburo SuzukiKenji SugimotoShunichiro Kuwatsuka
    • Eisei TogawaSaburo SuzukiKenji SugimotoShunichiro Kuwatsuka
    • G11B5/31
    • G11B5/3163Y10T29/49044Y10T29/49064
    • A method of producing a thin film magnetic head by successively depositing on a substrate a first magnetic material, a gap material, an electrically conductive material consisting of a coil, an insulating film, a second magnetic material and a protecting film, wherein the improvement comprises a step for forming a recessed portion in the insulating film at a portion corresponding to a gap portion on the air bearing surface side, the bottom surface of said recessed portion serving as an exposed portion on the upper surface of the gap material and the side surfaces of said recessed portion being tapered, a step for forming a recessed portion in the gap material by etching using the insulating film with the recessed portion as a mask and making the thickness thereof equal to the gap length, and a step for depositing a second magnetic material on the whole surface, so that the recessed portion formed in the gap material will have a rectangular shape with its one side being equal to a gap depth and its another side being equal to a track width. Unlike the conventional art, no thick photoresist film is used in a step for determining the gap depth and the track width, making it possible to obtain a thin film magnetic head having a small gap depth and a narrow track width maintaining high precision.
    • 一种通过在基板上依次沉积第一磁性材料,间隙材料,由线圈,绝缘膜,第二磁性材料和保护膜组成的导电材料制造薄膜磁头的方法,其中改进包括 在与空气轴承面侧的间隙部对应的部分,在绝缘膜上形成凹部的工序,作为上述间隙材料的上表面的露出部的上述凹部的底面, 所述凹陷部分是锥形的,通过使用具有凹陷部分作为掩模的绝缘膜进行蚀刻并使其厚度等于间隙长度来形成间隙材料中的凹陷部分的步骤,以及用于沉积第二磁体 材料在整个表面上,使得形成在间隙材料中的凹陷部分将具有矩形形状,其一侧等于间隙d epth,另一边等于轨道宽度。 与传统技术不同,在用于确定间隙深度和轨道宽度的步骤中不使用厚的光致抗蚀剂膜,使得可以获得具有小间隙深度和窄轨道宽度的薄膜磁头,从而保持高精度。
    • 28. 发明授权
    • Numerical control machine
    • 数控机
    • US4831906A
    • 1989-05-23
    • US934903
    • 1986-11-25
    • Kenji SugimotoYouji TakeuchiShuichiro Yamashita
    • Kenji SugimotoYouji TakeuchiShuichiro Yamashita
    • B23B7/06G05B19/18
    • B23B7/06G05B19/182G05B2219/41249G05B2219/50015Y10T82/25Y10T82/2502Y10T82/2541Y10T82/2543
    • A numerical control machine comprises a headstock rotatably supporting a spindle for a workpiece and a tool rest assembly in front of the headstock. The tool rest assembly includes a first pair of tool rests which are disposed on both sides of the longitudinal axis of the headstock spindle and are simultaneously movable in a first direction perpendicular to the spindle axis, and a second tool rest which is movable in both second and third directions perpendicular to the spindle axis. Either the headstock or the tool rest assembly is movable in a fourth direction along the spindle axis. The movement of the first pair of tool rests in the first direction, the movement of the second tool rest in the second and third directions, and the movement of either the headstock or the tool rest assembly in the fourth direction are carried out under the control of a numerical control unit.
    • 数控机器包括可旋转地支撑用于工件的主轴的主轴箱和在主轴箱前面的工具组件。 刀架组件包括第一对工具架,其设置在主轴箱主轴的纵向轴线的两侧,并且可以在垂直于主轴轴线的第一方向上同时移动;以及第二工具架,其可在两个第二工作台中移动 和垂直于主轴的第三个方向。 头架或刀架组件可沿主轴轴线沿第四方向移动。 第一对工具的运动在第一方向上移动,第二刀架在第二和第三方向上的运动以及头架或工具架在第四方向上的运动在控制下进行 的数字控制单元。
    • 29. 发明授权
    • Remote control system
    • 遥控系统
    • US08280532B2
    • 2012-10-02
    • US12446208
    • 2007-05-30
    • Kiminao KogisoKenji SugimotoKenji Hirata
    • Kiminao KogisoKenji SugimotoKenji Hirata
    • G05B13/02G05B19/18G05D3/12
    • G08C19/00G05B2219/25409G08C2201/42G08C2201/50
    • Providing a remote control technique capable of realizing the achievement of constraints and the certain following of a target value even with a network in which delay, loss, distortion, or the like may occur. In a remote control system, an area setting unit of a client-side control unit sets at least two areas representative of a group of states of an target object, which changes over time by feedback control. A state-evaluation information sending unit sends, to the host-side control unit, state evaluation information obtained by evaluating the state of the target object based on the area set by the area setting unit. A target value setting unit of the host-side control unit sets a target value such that the state of the target object changes in the area set by the area setting units. Moreover, a target value updating unit updates the target value based on the state evaluation information received from the client-side control unit.
    • 提供即使对于可能发生延迟,丢失,失真等的网络,也能够实现约束的实现和目标值的特定追随的远程控制技术。 在遥控系统中,客户侧控制单元的区域设定单元设定表示通过反馈控制随时间而变化的目标对象的一组状态的至少两个区域。 状态评价信息发送单元根据由区域设定单元设定的区域,向主机侧控制单元发送通过评价目标对象的状态而获得的状态评价信息。 主机侧控制单元的目标值设定单元设定目标值,使得目标对象的状态在由区域设定单元设定的区域中变化。 此外,目标值更新单元基于从客户端控制单元接收到的状态评估信息来更新目标值。
    • 30. 发明授权
    • Indexing device
    • 索引设备
    • US06609441B1
    • 2003-08-26
    • US09647601
    • 2000-10-03
    • Kenji SugimotoHiroshi ShinoharaWolfgang Pfeifer
    • Kenji SugimotoHiroshi ShinoharaWolfgang Pfeifer
    • B23B2900
    • B23B29/242B23B3/168B23Q16/06B23Q16/065B23Q16/10Y10T29/5155Y10T74/14Y10T74/1476Y10T74/1494Y10T82/2506Y10T82/2508Y10T82/2587
    • A turret tool rest (14) includes a turret (24) movably supported on a base (22), on which desired tools can be mounted at predetermined indexable angled positions. A pair of coupling elements (66, 68), which can be engaged with each other, are arranged between the base (22) and the turret (24). The coupling elements (66, 68) are moved between an engaged position at which they are mutually engaged to fixedly hold the turret at respective indexed positions on the base, and a disengaged position at which they are mutually disengaged to permit the turret to be rotationally indexed. A spring-loaded plunger unit (80) serves to prevent the turret (24) from freely rotating on the base (22),until the coupling elements (66, 68) are fully engaged with each other, during the moving operation of the coupling elements between the engaged and disengaged positions. The plunger unit (80) includes a plunger (84) retractably provided on the turret, a countersink (90) fixedly provided on the base to be engaged with the plunger when the turret is located at the engaged position, and a coil spring (86) or biasing the plunger to maintain the engagement between the plunger and the countersink.
    • 转台刀架(14)包括可移动地支撑在基座(22)上的转台(24),在所述转台(24)上可以预定的可转位的倾斜位置安装所需的工具。 可以在基座(22)和转台(24)之间布置有可以彼此接合的一对联接元件(66,68)。 联接元件(66,68)在它们相互接合的接合位置之间移动,以将转台固定地保持在基座上的相应的分度位置处,以及在它们相互脱开的分离位置以允许转台旋转 索引。 弹簧加载的柱塞单元(80)用于防止转台(24)在基座(22)上自由旋转,直到联接元件(66,68)在联接器的移动操作期间彼此完全接合 接合位置和脱离位置之间的元件。 柱塞单元(80)包括可伸缩地设置在转台上的柱塞(84),当转台位于接合位置时,固定地设置在基座上以与柱塞接合的埋头孔(90)和螺旋弹簧 )或偏压柱塞以保持柱塞和埋头孔之间的接合。