专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06963789B2 Substrate processing apparatus control system and substrate processing apparatus 失效
标题翻译：基板处理装置控制系统和基板处理装置
公开(公告)号：US06963789B2
公开(公告)日：2005-11-08
申请号：US10253010
申请日：2002-09-23
申请人： Tamihiro Bun , Kinya Murata , Kenji Hashinoki , Kenji Kamei , Noriaki Yokono , Kenji Sugimoto , Tsuyoshi Mitsuhashi
发明人： Tamihiro Bun , Kinya Murata , Kenji Hashinoki , Kenji Kamei , Noriaki Yokono , Kenji Sugimoto , Tsuyoshi Mitsuhashi
IPC分类号： H01L21/66 , H01L21/00 , G06F19/00
CPC分类号： H01L21/67253
摘要： A controller is connected to a substrate processing apparatus and an exposure apparatus. A pilot substrate subjected to a series of processing as preprocessing is transported to an inspection unit. An inspection result determination part compares inspection results received from the inspection unit with substrate condition data so that a condition change instruction part changes the processing condition of each processing unit when no requirement is satisfied. This operation is so repeated that a processing control part executes actual processing according to recipe data when the inspection results satisfy the requirement. Thus, the efficiency a step of changing the processing condition of each processing part in response to the inspection results in the inspection part is improved in preprocessing executed in the substrate processing apparatus.
摘要翻译：控制器连接到基板处理装置和曝光装置。经过一系列处理作为预处理的先导基板被输送到检查单元。检查结果确定部分将从检查单元接收的检查结果与基板条件数据进行比较，使得条件改变指示部分在不要求满足时改变每个处理单元的处理条件。该操作如此重复，使得当检查结果满足要求时，处理控制部分根据配方数据执行实际处理。因此，在基板处理装置中执行的预处理中，提高了响应于检查结果的检查结果改变各处理部的处理条件的效率。

2. 发明授权

US5687085A Substrate processing apparatus and method 失效
标题翻译：基板加工装置及方法
公开(公告)号：US5687085A
公开(公告)日：1997-11-11
申请号：US418512
申请日：1995-04-07
申请人： Toru Morimoto , Kenji Hashinoki , Tetsuya Hamada , Kenji Kamei
发明人： Toru Morimoto , Kenji Hashinoki , Tetsuya Hamada , Kenji Kamei
IPC分类号： B65G49/07 , G05B19/418 , G06F19/00
CPC分类号： G05B19/4189 , G05B2219/31013 , G05B2219/34388 , G05B2219/45026 , Y02P90/083 , Y02P90/28 , Y02P90/285
摘要： Transport robot circulates in a predetermined order among a plurality of substrate processing parts while holds substrates, thereby to perform circulating transportation of the substrates. Controller calculates a minimum wait cycle which corresponds to the number of circulating transportation during time from first circulating of a first substrate to first circulating of a second substrate under the condition that interference between the first and second substrates is prohibited. When the minimum wait cycle is shorter than a standard wait cycle which corresponds to the number of circulating transportation for processing of the first substrate, starting of the circulating transportation of the second substrate is delayed in the range of the minimum wait cycle to a standard wait cycle. Hence, the processing of the second substrate can be started without waiting for completion of the processing of the first substrate, resulting in that through put is improved.
摘要翻译：运送机器人在保持基板的同时在多个基板处理部中以预定顺序循环，从而进行基板的循环输送。控制器计算最小等待周期，其对应于在禁止第一和第二基板之间的干扰的条件下，从第一基板的第一循环到第二基板的第一循环的时间期间的循环输送次数。当最小等待周期短于与第一基板的处理循环输送次数对应的标准等待周期时，第二基板的循环输送的开始在最小等待周期的范围内延迟到标准等待周期。因此，可以在不等待第一基板的处理完成的情况下开始第二基板的处理，从而提高了投入。

3. 发明授权

US5668733A Substrate processing apparatus and method 失效
标题翻译：基板加工装置及方法
公开(公告)号：US5668733A
公开(公告)日：1997-09-16
申请号：US417800
申请日：1995-04-06
申请人： Toru Morimoto , Kenji Hashinoki , Tetsuya Hamada , Kenji Kamei
发明人： Toru Morimoto , Kenji Hashinoki , Tetsuya Hamada , Kenji Kamei
IPC分类号： G02F1/13 , H01L21/00 , H01L21/02 , H01L21/677 , G06F19/00
CPC分类号： H01L21/67173 , H01L21/67178 , H01L21/67276 , H01L21/67778
摘要： Substrates of a precedent lot are transported among first processing parts while being processed by the first processing parts. The circulating transportation for the precedent lot is interrupted after starting of the circulating transportation of the first substrate of the precedent lot before starting of the circulating transportation of the last substrate of the precedent lot. Thereafter, a substrate of a subsequent lot is transported among second processing parts while being processed by the second processing parts. Hence, processing of the substrates of the precedent and subsequent lots are concurrently processed, resulting in improving a through put.
摘要翻译：先有批次的基板在由第一处理部件处理的同时在第一处理部件之间传送。在先前批次的最后一个基板的循环运输开始之前，先期批次的循环运输开始循环运送先验批次的第一基板。此后，随后的批次的基板在被第二处理部件处理的同时在第二处理部件之间传送。因此，对先行后续批次的基板的处理同时进行处理，从而改善了投入。

4. 发明授权

US06837632B2 Substrate treating apparatus 有权
标题翻译：底物处理装置
公开(公告)号：US06837632B2
公开(公告)日：2005-01-04
申请号：US10646902
申请日：2003-08-22
申请人： Yasufumi Koyama , Kenji Kamei , Toru Kitamoto , Kenji Hashinoki , Satoshi Yamamoto , Toshiaki Dainin
发明人： Yasufumi Koyama , Kenji Kamei , Toru Kitamoto , Kenji Hashinoki , Satoshi Yamamoto , Toshiaki Dainin
IPC分类号： B65G49/07 , H01L21/00 , H01L21/027 , H01L21/677 , H01L21/68 , G03D5/00 , B05C13/00
CPC分类号： H01L21/67173 , H01L21/67178 , H01L21/67184 , Y10S414/135
摘要： A substrate treating apparatus has an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition, each of these blocks including treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block, and transfers the substrates between the blocks through inlet substrate rests and outlet substrate rests provided as separate components. This construction realizes improved throughput of the substrate treating apparatus.

5. 发明授权

US07069099B2 Method of transporting and processing substrates in substrate processing apparatus 有权
标题翻译：在基板处理装置中输送和处理基板的方法
公开(公告)号：US07069099B2
公开(公告)日：2006-06-27
申请号：US10769390
申请日：2004-01-30
申请人： Kenji Hashinoki , Yasufumi Koyama , Takaharu Yamada
发明人： Kenji Hashinoki , Yasufumi Koyama , Takaharu Yamada
IPC分类号： G06F19/00
CPC分类号： H01L21/67276
摘要： A substrate processing apparatus includes a plurality of cells each including a predetermined processing unit, a transport mechanism, and a cell controller. The cell controller independently controls operations in each cell in accordance with transport setting and processing condition setting for each cell described in recipe data determined for each substrate unit to be processed. Because the processing and transport are performed independently of the operations of adjacent cells, substrates belonging to different substrate units are received through a feed inlet or the same substrate inlet, are processed while being present in the same cell, and are transported to a feed outlet and a return outlet which are different substrate outlets. This allows the presence of different process flows in parallel.
摘要翻译：衬底处理装置包括多个单元，每个单元包括预定的处理单元，传送机构和单元控制器。单元控制器根据为要处理的每个基板单元确定的配方数据中描述的每个单元的传输设置和处理条件设置独立地控制每个单元中的操作。由于处理和运输是独立于相邻电池的操作执行的，属于不同基板单元的基板通过进料入口或相同的基板入口被接收，在存在于同一电池中的同时进行处理，并被运送到进料口以及作为不同基板出口的返回出口。这允许并行存在不同的工艺流程。

6. 发明申请

US20050061242A1 Substrate processing apparatus for performing photolithography 有权
标题翻译：用于进行光刻的基板处理装置
公开(公告)号：US20050061242A1
公开(公告)日：2005-03-24
申请号：US10945014
申请日：2004-09-20
申请人： Masayoshi Shiga , Kenji Hashinoki , Yasufumi Koyama
发明人： Masayoshi Shiga , Kenji Hashinoki , Yasufumi Koyama
IPC分类号： G03F7/30 , B05C11/00 , H01L21/00 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67236 , H01L21/67173 , H01L21/67178 , H01L21/67184
摘要： A substrate processing apparatus for performing a resist coating process and a development process includes an inspection block for making an inspection on a substrate having undergone the development process. The inspection block has an inspection unit for making a predetermined inspection and a transport robot for transferring a substrate to and from the inspection unit. When a substrate to be inspected is transported to the inspection block, the transport robot transports the substrate to the inspection unit. When a substrate not to be inspected is transported to the inspection block, the transport robot transports the substrate directly to the outlet of the inspection block. At this time, a substrate not to be inspected is allowed to pass a preceding substrate to be inspected, at the inspection block. Thus provided is a substrate processing apparatus capable of improving the transport efficiency, to thereby achieve a higher throughput.
摘要翻译：用于进行抗蚀剂涂布处理和显影处理的基板处理装置包括用于对经过显影处理的基板进行检查的检查块。检查块具有用于进行预定检查的检查单元和用于将检查单元的基板传送到检查单元的传送机器人。当要检查的基板被运送到检查块时，运输机器人将基板运送到检查单元。当不检查的基板被运送到检查块时，运输机器人将基板直接运送到检查块的出口。此时，在检查块处允许未检查的基板通过待检查的前面的基板。由此，能够提高输送效率的基板处理装置，从而实现更高的生产量。

7. 发明申请

US20050061240A1 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20050061240A1
公开(公告)日：2005-03-24
申请号：US10947480
申请日：2004-09-22
申请人： Kenji Hashinoki , Yasufumi Koyama , Takaharu Yamada
发明人： Kenji Hashinoki , Yasufumi Koyama , Takaharu Yamada
IPC分类号： B08B3/02 , H01L21/00 , H01L21/027 , H01L21/304 , H01L21/677 , B65G1/00
CPC分类号： H01L21/67748 , H01L21/67253 , H01L21/67276 , Y10S414/135
摘要： When the processing temperature in a heater should be changed between lots, for example, a foremost substrate in a subsequent lot is transported to a position close to the heater such as a substrate holding part, and is held in standby thereat until adjustment of a processing environment (namely, change of the processing temperature) is completed. The substrate held in standby is thereafter transported to the heater. As compared with the case in which substrates are placed in standby in an indexer, substrates can be fed faster to the heater after change of the processing temperature, thereby suppressing throughput reduction.
摘要翻译：当加热器中的加工温度应当在批次之间改变时，例如，后续批次中的最前面的基板被运送到靠近加热器的位置，诸如基板保持部分，并且被保持在待机状态，直到调整处理环境（即处理温度的变化）完成。保持待机的基板此后被输送到加热器。与在分度器中放置基板的情况相比，在处理温度变化之后，可以将基板更快地供给加热器，从而抑制生产率的降低。

8. 发明授权

US06790287B2 Substrate processing apparatus, substrate inspection method and substrate processing system 有权
标题翻译：基板加工装置，基板检查方法及基板处理系统
公开(公告)号：US06790287B2
公开(公告)日：2004-09-14
申请号：US09942153
申请日：2001-08-29
申请人： Masayoshi Shiga , Kenji Hashinoki , Masami Ohtani , Joichi Nishimura
发明人： Masayoshi Shiga , Kenji Hashinoki , Masami Ohtani , Joichi Nishimura
IPC分类号： C23C1600
CPC分类号： H01L21/67207 , H01L21/67253
摘要： An inspection unit is provided in a substrate processing apparatus performing resist coating processing and development processing on a substrate. In the inspection unit, a film thickness measuring device, a line width measuring device, an overlay measuring device and a macro defect inspection device are successively stacked and arranged from below. The inspection unit is provided on an intermediate portion of a substrate transport path formed in the substrate processing apparatus. The substrate processed in the substrate processing apparatus is selectively introduced into each inspection part. Therefore, the apparatus can properly inspect the substrate at need while suppressing reduction of the throughput. Thus provided are a substrate processing apparatus and a substrate inspection method capable of properly inspecting a substrate while suppressing reduction of the throughput.
摘要翻译：在基板上进行抗蚀剂涂布处理和显影处理的基板处理装置中设置有检查单元。在检查单元中，从下方依次堆叠并布置膜厚测量装置，线宽测量装置，覆盖测量装置和宏观缺陷检查装置。检查单元设置在形成在基板处理装置中的基板输送路径的中间部。将在基板处理装置中处理的基板选择性地导入各检查部。因此，能够在抑制生产量的降低的同时适当地检查需要的基板。这样提供了能够在抑制生产量降低的同时适当地检查基板的基板处理装置和基板检查方法。

9. 发明授权

US07525650B2 Substrate processing apparatus for performing photolithography 有权
标题翻译：用于进行光刻的基板处理装置
公开(公告)号：US07525650B2
公开(公告)日：2009-04-28
申请号：US10945014
申请日：2004-09-20
申请人： Masayoshi Shiga , Kenji Hashinoki , Yasufumi Koyama
发明人： Masayoshi Shiga , Kenji Hashinoki , Yasufumi Koyama
IPC分类号： G01N21/00 , G01R31/26 , H01L21/66
CPC分类号： H01L21/67236 , H01L21/67173 , H01L21/67178 , H01L21/67184
摘要： A substrate processing apparatus for performing a resist coating process and a development process includes an inspection block for making an inspection on a substrate having undergone the development process. The inspection block has an inspection unit for making a predetermined inspection and a transport robot for transferring a substrate to and from the inspection unit. When a substrate to be inspected is transported to the inspection block, the transport robot transports the substrate to the inspection unit. When a substrate not to be inspected is transported to the inspection block, the transport robot transports the substrate directly to the outlet of the inspection block. At this time, a substrate not to be inspected is allowed to pass a preceding substrate to be inspected, at the inspection block. Thus provided is a substrate processing apparatus capable of improving the transport efficiency, to thereby achieve a higher throughput.
摘要翻译：用于进行抗蚀剂涂布处理和显影处理的基板处理装置包括用于对经过显影处理的基板进行检查的检查块。检查块具有用于进行预定检查的检查单元和用于将检查单元的基板传送到检查单元的传送机器人。当要检查的基板被运送到检查块时，运输机器人将基板运送到检查单元。当不检查的基板被运送到检查块时，运输机器人将基板直接运送到检查块的出口。此时，在检查块处允许未检查的基板通过待检查的前面的基板。由此，能够提高输送效率的基板处理装置，从而实现更高的生产量。

10. 发明授权

US07497912B2 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US07497912B2
公开(公告)日：2009-03-03
申请号：US10947000
申请日：2004-09-22
申请人： Yasufumi Koyama , Kenji Hashinoki , Takaharu Yamada
发明人： Yasufumi Koyama , Kenji Hashinoki , Takaharu Yamada
IPC分类号： C23C16/00 , H01L21/306 , C23F1/00 , B05C11/00
CPC分类号： H01L21/67178 , H01L21/67184 , H01L21/67276 , H01L21/67742 , Y10S414/135
摘要： A cell controller controls the operation of a transport robot to keep a substrate belonging to a succeeding lot carried into a heating part in the fourth transport cycle from being transported out of the heating part in the next or fifth transport cycle, thereby preventing interference between the transport of substrates belonging to the succeeding lot and the transport of substrates belonging to a preceding lot. If interference is likely to occur between the transport of the substrates belonging to the succeeding lot and the transport of the substrates belonging to the preceding lot, the cell controller causes the substrates belonging to the succeeding lot not to be transported but to remain in processing units. This allows the transport of the substrates belonging to the succeeding lot in consideration of only the next transport cycle.
摘要翻译：电池控制器控制运输机器人的操作，以将属于第四运输周期中的加热部件的后续批次的基板保持在下一个或第五个运输周期中被运送出加热部件，从而防止在运输属于后续批次的基板和运输属于前一批次的基板。如果在属于后续批次的基板的输送和属于前一批次的基板的输送之间容易发生干涉，则单元控制器使得属于后续批次的基板不被运输，而是保留在处理单元。考虑到下一个运输周期，这允许属于后续批次的基板的运输。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式