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21. 发明授权

US07759136B2 Critical dimension (CD) control by spectrum metrology 失效
标题翻译：光谱计量学的关键维度（CD）控制
公开(公告)号：US07759136B2
公开(公告)日：2010-07-20
申请号：US11530164
申请日：2006-09-08
申请人： Chang-Cheng Hung , Hung Chang Hsieh , Shih-Ming Chang , Wen-Chuan Wang , Chi-Lun Lu , Allen Hsia , Yen-Bin Huang
发明人： Chang-Cheng Hung , Hung Chang Hsieh , Shih-Ming Chang , Wen-Chuan Wang , Chi-Lun Lu , Allen Hsia , Yen-Bin Huang
IPC分类号： G01R31/26 , H01L21/66
CPC分类号： H01L22/26 , H01L22/12
摘要： A method for patterning a substrate includes forming a material layer on the substrate; performing a first etching on the material layer to form a pattern; measuring the pattern of the material layer using an optical spectrum metrology tool; determining whether the measuring indicates that the etching step achieved a predefined result; and producing an etching recipe and performing a second etching of the material layer using the etching recipe if the predefined result was not achieved.
摘要翻译：用于图案化衬底的方法包括在衬底上形成材料层; 在所述材料层上进行第一蚀刻以形成图案; 使用光谱计量工具测量材料层的图案; 确定测量是否指示蚀刻步骤达到预定结果; 并且如果未实现预定结果，则使用蚀刻配方产生蚀刻配方并执行材料层的第二蚀刻。

22. 发明申请

US20070075037A1 Dimension monitoring method and system 有权
标题翻译：维度监控方法和系统
公开(公告)号：US20070075037A1
公开(公告)日：2007-04-05
申请号：US11244601
申请日：2005-10-05
申请人： Shih-Ming Chang , Chen-Yuan Hsia , Wen-Chuan Wang , Chi-Lun Lu , Yen-Bin Huang , Chang-Cheng Hung , Chia-Jen Chen , Kai-Chung Liu , Hsin-Chang Lee , Hong Hsieh
发明人： Shih-Ming Chang , Chen-Yuan Hsia , Wen-Chuan Wang , Chi-Lun Lu , Yen-Bin Huang , Chang-Cheng Hung , Chia-Jen Chen , Kai-Chung Liu , Hsin-Chang Lee , Hong Hsieh
IPC分类号： G01L21/30 , H01L21/302 , G01R31/00
CPC分类号： G03F7/70625 , H01L22/12 , H01L22/20
摘要： A system and method are disclosed for monitoring a dimensional change of a pattern for an object having a transparent layer exposed through the pattern and a non-transparent pattern laminated therewith. According to the method, a first beam is projected to the pattern. A second beam resulted from the first beam passing through the transparent layer exposed by the pattern, or from the first beam reflected from the non-transparent layer of the pattern, is detected. A value of a predetermined property from the second beam detected is obtained. A variation of the value is monitored for identifying the dimensional change of the pattern.
摘要翻译：公开了一种用于监测具有通过图案暴露的透明层的物体的图案的尺寸变化和与其层压的不透明图案的系统和方法。根据该方法，将第一光束投影到图案。检测到第一光束通过穿过由图案曝光的透明层，或从图案的不透明层反射的第一光束。获得从所检测的第二光束的预定特性的值。监测该值的变化以识别图案的尺寸变化。

23. 发明授权

US07474788B2 Method and system for enhancing image resolution using a modification vector 有权
标题翻译：使用修改向量增强图像分辨率的方法和系统
公开(公告)号：US07474788B2
公开(公告)日：2009-01-06
申请号：US10935904
申请日：2004-09-08
申请人： Shih-Ming Chang , Wen-Chuan Wang , Jan-Wen You
发明人： Shih-Ming Chang , Wen-Chuan Wang , Jan-Wen You
IPC分类号： G06K9/48
CPC分类号： H01J37/222 , G06T3/403 , H01J2237/28
摘要： An image processing system. An input/output device receives information for pixels in an image corresponding to an object, wherein the information specifies optical properties. A storage device stores the information. A processor determines an image of preliminary contour of the object based on the information. For pixels located on the preliminary contour are assigned as primary pixels, wherein anchor points determined by the location of the primary pixels, and the reference pixels determine modification vectors according to the information corresponding to the primary and reference pixels, and adjusts the positions of the anchor points according to the modification vectors. These processes are applied on every pixels or selected pixels located on the preliminary contour repeatedly to determine the final modified contour with sub-pixel accuracy.
摘要翻译：图像处理系统输入/输出设备接收与对象相对应的图像中的像素的信息，其中信息指定光学特性。存储设备存储信息。处理器基于该信息确定对象的初步轮廓的图像。对于位于预备轮廓上的像素被分配为主像素，其中由主像素的位置确定的定位点和参考像素根据对应于主像素和参考像素的信息来确定修改向量，并且调整根据修改向量的锚点。将这些处理重复地应用于位于初步轮廓上的每个像素或选定像素，以确定具有子像素精度的最终修改轮廓。

24. 发明申请

US20060050965A1 Method and system for enhancing image resolution 有权
标题翻译：增强图像分辨率的方法和系统
公开(公告)号：US20060050965A1
公开(公告)日：2006-03-09
申请号：US10935904
申请日：2004-09-08
申请人： Shih-Ming Chang , Wen-Chuan Wang , Jan-Wen You
发明人： Shih-Ming Chang , Wen-Chuan Wang , Jan-Wen You
IPC分类号： G06K9/48
CPC分类号： H01J37/222 , G06T3/403 , H01J2237/28
摘要： An image processing system. An input/output device receives information for pixels in an image corresponding to an object, wherein the information specifies optical properties. A storage device stores the information. A processor determines an image of preliminary contour of the object based on the information. For pixels located on the preliminary contour are assigned as primary pixels, wherein anchor points determined by the location of the primary pixels, and the reference pixels determine modification vectors according to the information corresponding to the primary and reference pixels, and adjusts the positions of the anchor points according to the modification vectors. These processes are applied on every pixels or selected pixels located on the preliminary contour repeatedly to determine the final modified contour with sub-pixel accuracy.
摘要翻译：图像处理系统输入/输出设备接收与对象相对应的图像中的像素的信息，其中信息指定光学特性。存储设备存储信息。处理器基于该信息确定对象的初步轮廓的图像。对于位于预备轮廓上的像素被分配为主像素，其中由主像素的位置确定的定位点和参考像素根据对应于主像素和参考像素的信息来确定修改向量，并且调整根据修改向量的锚点。将这些处理重复地应用于位于初步轮廓上的每个像素或选定像素，以确定具有子像素精度的最终修改轮廓。

25. 发明申请

US20120235063A1 Systems and Methods Providing Electron Beam Writing to a Medium 有权
标题翻译：提供电子束写入介质的系统和方法
公开(公告)号：US20120235063A1
公开(公告)日：2012-09-20
申请号：US13051507
申请日：2011-03-18
申请人： Wen-Chuan Wang , Shy-Jay Lin , Jaw-Jung Shin , Burn Jeng Lin
发明人： Wen-Chuan Wang , Shy-Jay Lin , Jaw-Jung Shin , Burn Jeng Lin
IPC分类号： G21K5/00
CPC分类号： G03F7/2059 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/317 , H01J37/3177 , H01J2237/31761 , H01J2237/31774
摘要： A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams.
摘要翻译：用于电子束写入介质的方法包括将介质定位在电子束写入机内，使得介质由载物台支撑并暴露于电子束源。该方法还包括使用电子束源的多个可独立控制的光束将介质写入介质，其中图案包括多个平行条带。使用多个可独立控制的光束来写入每个平行条带。

26. 发明授权

US07824316B2 Punching bag 失效
标题翻译：出气筒
公开(公告)号：US07824316B2
公开(公告)日：2010-11-02
申请号：US12499105
申请日：2009-07-08
申请人： Yu-Hsiang Wang , Wen-Chuan Wang
发明人： Yu-Hsiang Wang , Wen-Chuan Wang
IPC分类号： A63B21/00
CPC分类号： A63B69/32 , A63B69/201 , A63B2220/53
摘要： A punching bag is provided. The punching bag is positioned on a fixed pillar, and comprises a supporting frame, a foam layer, a force-bearing plate, and a punch pad. The supporting frame is attached and fastened to the fixed pillar. The foam layer is disposed on the supporting frame, and at least a sensing element is positioned on a surface of the foam layer for measuring an external punch force. The force-bearing plate is disposed on the foam layer and utilized for covering the foam layer, wherein at least an elastic element correspondingly attached to the at least a sensing element is positioned on an inner side of the force-bearing plate. The punch pad is utilized for covering and attaching to the force-bearing plate to bear the external punch force.
摘要翻译：提供一个冲压袋。冲压袋位于固定支柱上，包括支撑框架，泡沫层，承力板和冲压垫。支撑框架固定在固定支柱上。泡沫层设置在支撑框架上，并且至少一个感测元件位于泡沫层的表面上，用于测量外部冲压力。承载板设置在泡沫层上并用于覆盖泡沫层，其中至少一个相应地连接到至少一个感测元件的弹性元件位于承力板的内侧。冲压垫用于覆盖并附着在承力板上以承受外部冲压力。

27. 发明申请

US20090063074A1 Mask Haze Early Detection 有权
标题翻译：面具阴霾早期检测
公开(公告)号：US20090063074A1
公开(公告)日：2009-03-05
申请号：US11866514
申请日：2007-10-03
申请人： Wen-Chuan Wang , Shy-Jay Lin , Te-Chih Huang , Chih-Ming Ke , Wei-Yu Su , Heng-Hsin Liu , Tsai-Sheng Gau , Chin-Hsiang Lin
发明人： Wen-Chuan Wang , Shy-Jay Lin , Te-Chih Huang , Chih-Ming Ke , Wei-Yu Su , Heng-Hsin Liu , Tsai-Sheng Gau , Chin-Hsiang Lin
IPC分类号： G06F19/00 , G03F1/00
CPC分类号： G03F1/84 , G03F1/82
摘要： Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.
摘要翻译：通过获得掩模的光学特性并基于获得的光学性质来确定雾度形成的进展来检测掩模上的雾度形成。

28. 发明申请

US20060269345A1 RIBBON CARTRIDGE CAPABLE OF PROVIDING A TENSION FORCE TO A RIBBON AT ONE END OF A RIBBON-FEEDING BAY 审中-公开
标题翻译： RIBBON CARTRIDGE能够在RIBBON-FEEDING BAY一端向RIBBON提供张力
公开(公告)号：US20060269345A1
公开(公告)日：2006-11-30
申请号：US11162604
申请日：2005-09-16
申请人： Chui-Chien Chiu , Wen-Chuan Wang
发明人： Chui-Chien Chiu , Wen-Chuan Wang
IPC分类号： B41J17/24
CPC分类号： B41J17/32
摘要： A ribbon cartridge provides a tension mechanism to a ribbon inside the cartridge. By installing a frictional piece on one end of a ribbon-feeding bay of the ribbon cartridge, a feeding roller contacts the frictional piece and the frictional piece provides a frictional force for applying sufficient tension on the ribbon.
摘要翻译：色带盒为墨盒内的色带提供张力机构。通过在色带盒的色带供给槽的一端安装摩擦片，馈送辊接触摩擦片，并且摩擦片提供摩擦力以在带上施加足够的张力。

29. 发明授权

US06721939B2 Electron beam shot linearity monitoring 失效
标题翻译：电子束射线线性监测
公开(公告)号：US06721939B2
公开(公告)日：2004-04-13
申请号：US10080323
申请日：2002-02-19
申请人： Wen-Chuan Wang , Tyng-Hao Hsu , Chin-Hsiang Lin
发明人： Wen-Chuan Wang , Tyng-Hao Hsu , Chin-Hsiang Lin
IPC分类号： G06F1750
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/30438 , H01J2237/30477 , H01J2237/3175
摘要： Electron beam (e-beam) shot linearity monitoring is disclosed. A pattern is written that has a predetermined size and a predetermined form in a predetermined position on a substrate, such as a semiconductor wafer, a reticle, or a photomask. The pattern writing fixes the e-beam shot size, as located along one or more critical dimensions of the pattern. The critical dimensions are then measured, where their variations reflect the e-beam shot size linearity. Thereafter, deficiencies in the e-beam shot size linearity can be compensated for, to allow for properly produced semiconductor patterns.
摘要翻译：公开了电子束（e-beam）射线线性度监测。写入在诸如半导体晶片，掩模版或光掩模的基板上的预定位置中具有预定尺寸和预定形式的图案。图案写入固定沿着图案的一个或多个关键尺寸定位的电子束拍摄尺寸。然后测量临界尺寸，其中它们的变化反映电子束射出尺寸线性。此后，可以补偿电子束投射尺寸线性度的缺陷，以允许适当地产生的半导体图案。

30. 发明申请

US20130232455A1 ERROR DIFFUSION AND GRID SHIFT IN LITHOGRAPHY 有权
标题翻译：误差扩展和网格移位在LITHOGRAPHY
公开(公告)号：US20130232455A1
公开(公告)日：2013-09-05
申请号：US13409765
申请日：2012-03-01
申请人： Pei-Yi Liu , Shy-Jay Lin , Wen-Chuan Wang , Jaw-Jung Shin , Burn Jeng Lin
发明人： Pei-Yi Liu , Shy-Jay Lin , Wen-Chuan Wang , Jaw-Jung Shin , Burn Jeng Lin
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： The present disclosure involves a method of data preparation in lithography processes. The method of data preparation includes providing an integrated circuit (IC) layout design in a graphic database system (GDS) grid, and converting the IC layout design GDS grid to a second exposure grid by applying an error diffusion and a grid shift technique to a sub-pixel exposure grid.
摘要翻译：本公开涉及在光刻工艺中的数据准备方法。数据准备的方法包括在图形数据库系统（GDS）网格中提供集成电路（IC）布局设计，并且通过向第二曝光网格应用误差扩散和网格移位技术将IC布局设计GDS网格转换为第二曝光网格子像素曝光网格。

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