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21. 发明授权

US4491787A Flatness measuring device 失效
标题翻译：平面度测量装置
公开(公告)号：US4491787A
公开(公告)日：1985-01-01
申请号：US292933
申请日：1981-08-14
申请人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa
发明人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa
IPC分类号： G01B5/28 , G01B7/34 , G01B11/30 , G01B21/30 , H01L21/66 , G01N27/00
CPC分类号： G01B7/345 , G01B5/285
摘要： A device for measuring a flatness of a plate such as a silicon wafer, a GGG wafer, a printed circuit board, a ceramic substrate, or the like. The measuring device is provided with a disc which is disposed in parallel with the plate on one of the surfaces of the plate and is driven by a rotating drive source and a plurality of detectors for detecting a distance from the detector to the surface of the plate, the detectors being disposed on the surface closer to the disc. With this arrangement, distance data from the plurality of the detectors to the surface of the plate is obtained during the course of the rotation of the disc, and a flatness of the plate is measured.
摘要翻译：用于测量诸如硅晶片，GGG晶片，印刷电路板，陶瓷基板等的板的平坦度的装置。测量装置设置有盘，该盘在板的一个表面上与板平行设置，并由旋转驱动源和多个检测器驱动，用于检测从检测器到板的表面的距离检测器设置在靠近盘的表面上。利用这种布置，在盘的旋转过程中获得从多个检测器到板的表面的距离数据，并且测量板的平坦度。

22. 外观设计

USD382217S Fire detector 失效
公开(公告)号：USD382217S
公开(公告)日：1997-08-12
申请号：US57775
申请日：1996-07-31
申请人： Nobuyuki Akiyama , Kazuyoshi Sakurai
设计人： Nobuyuki Akiyama , Kazuyoshi Sakurai

23. 发明授权

US5278012A Method for producing thin film multilayer substrate, and method and apparatus for detecting circuit conductor pattern of the substrate 失效
标题翻译：薄膜多层基板的制造方法以及检测基板电路导体图案的方法和装置
公开(公告)号：US5278012A
公开(公告)日：1994-01-11
申请号：US938516
申请日：1992-09-02
申请人： Chie Yamanaka , Toshiaki Ichinose , Takanori Ninomiya , Hisafumi Iwata , Yasuo Nakagawa , Nobuyuki Akiyama
发明人： Chie Yamanaka , Toshiaki Ichinose , Takanori Ninomiya , Hisafumi Iwata , Yasuo Nakagawa , Nobuyuki Akiyama
IPC分类号： G01N21/956 , H01L21/00 , H01L21/48 , H01L21/66 , H05K3/22 , G01N21/88 , G01N21/64
CPC分类号： H01L21/67121 , G01N21/95684 , H01L21/4857 , H01L22/20 , H05K3/225 , G01N2021/8825
摘要： A method for producing a thin film multilayer substrate having a base substrate, and, which a plurality of conductor pattern layers superposed thereon through dielectric layers therebetween comprises the steps of: optically detecting the uppermost conductor pattern layer whenever the conductor pattern layer is formed on the base substrate; inspecting an absence and/or presence of a fault of the conductor pattern layer; and repairing a faulty portion in accordance with fault position data detected by the inspecting. According to this method, it is possible to enhance a production yield of relatively large size of thin film multilayer substrates which needs a relatively small amount of production at a high production cost, for mounting LSI chips thereon.
摘要翻译：一种制造具有基底基板的薄膜多层基板的方法，其中通过介电层叠置在其上的多个导体图案层之间包括以下步骤：每当在导体图案层上形成导体图案层时，光学检测最上面的导体图案层基底; 检查导体图案层的缺陷和/或存在故障; 并根据检查检测到的故障位置数据修复故障部分。根据这种方法，可以提高生产成本较高的相对大尺寸薄膜多层基板的生产成本，以便在其上安装LSI芯片。

24. 发明授权

US4647196A Surface flaw detection method 失效
标题翻译：表面探伤法
公开(公告)号：US4647196A
公开(公告)日：1987-03-03
申请号：US695231
申请日：1985-01-28
申请人： Asahiro Kuni , Kazuo Yamaguchi , Nobuyuki Akiyama , Juro Endo
发明人： Asahiro Kuni , Kazuo Yamaguchi , Nobuyuki Akiyama , Juro Endo
IPC分类号： G01B9/02 , G01N21/88
CPC分类号： G01N21/88 , G01B9/02021 , G01B9/02032
摘要： A flaw detection method for detecting flaw existing in the surface of a substantially plate-shaped examination object by making use of an interference of light. A coherent light is applied to the surface of the examination object and also to a reference mirror surface. The light reflected by the surface of the examination object and the light reflected by the reference mirror surface are made to interfere with each other to form an interference image from which the flaw is detected. The reference mirror surface is disposed at an optical inclination to the surface of the examination object. The reference mirror surface may be the reverse surface of the examination object while the obserse side of the same is being examined. Infrared coherent ray is preferably used as the coherent light.
摘要翻译：一种用于通过利用光的干涉来检测存在于基本上板状的检查对象的表面中的缺陷的探伤方法。相干光被施加到检查对象的表面，并且也被施加到参考镜表面。由检查对象的表面反射的光和由参考镜面反射的光被相互干涉，形成检测出缺陷的干涉图像。参考镜面设置在与检查对象表面成光学倾斜度。参考镜面可以是检查对象的反面，同时正在检查异物侧。红外相干光线优选用作相干光。

25. 发明授权

US4508453A Pattern detection system 失效
标题翻译：模式检测系统
公开(公告)号：US4508453A
公开(公告)日：1985-04-02
申请号：US397900
申请日：1982-07-13
申请人： Yasuhiko Hara , Nobuyuki Akiyama , Satoru Fushimi , Yoshimasa Oshima , Nobuhiko Aoki
发明人： Yasuhiko Hara , Nobuyuki Akiyama , Satoru Fushimi , Yoshimasa Oshima , Nobuhiko Aoki
IPC分类号： G01N21/956 , G01R31/308 , G03F7/20 , G01M11/00
CPC分类号： G03F7/70616 , G01N21/956 , G01R31/308 , G03F7/7065
摘要： A pattern detection system for inspecting defects in fine or minute patterns such as photomask patterns at a fast speed is disclosed. The system comprises an illuminator, a device for moving objects with the patterns to be inspected with being illuminated by the illuminator, an optical system for imaging the objects, a scanner for scanning the objects in a direction intersected at a given angle with respect to direction of the objects moved by the moving device and arrays of photosensors arranged linearly in a direction perpendicular to that of images on the objects scanned by the scanner, on the surface of which the images are formed by the optical system and for producing respective outputs parallelly on the time basis.
摘要翻译：公开了一种用于以高速度检查诸如光掩模图案的精细或微小图案中的缺陷的图案检测系统。该系统包括照明器，用于利用照明器照亮要检查的图案来移动物体的装置，用于对物体进行成像的光学系统，用于沿相对于方向以给定角度相交的方向扫描物体的扫描仪由移动装置移动的物体和由扫描仪扫描的物体上垂直于图像的方向线性布置的光敏器件的阵列，其表面上由光学系统形成图像并且平行地产生相应的输出时间基础。

26. 发明授权

US4447731A Exterior view examination apparatus 失效
标题翻译：外观检查装置
公开(公告)号：US4447731A
公开(公告)日：1984-05-08
申请号：US327191
申请日：1981-12-03
申请人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
发明人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
IPC分类号： G01B11/02 , G01B21/00 , G01Q20/02 , G01Q20/04 , G01Q30/02 , G01Q30/04 , H01J37/20 , H01J37/22 , H01J37/28
CPC分类号： H01J37/226 , H01J37/20
摘要： An exterior view examination apparatus comprising a movable sample stage provided in a sample chamber of a scanning type electron microscope; a sample mounted on the stage; and an optical microscope which can observe the sample from an exterior of the chamber, mounted on the chamber in parallel with the scanning type electron microscope, the position of a surface part of the sample (mounted on the sample stage) to be observed, measured or analyzed being preliminary defined by the optical microscope, and the sample stage being moved by a certain amount thereby to bring the sample at the center of the visual field of the electron microscope.
摘要翻译：一种外观检查装置，包括设置在扫描型电子显微镜的样品室中的可移动样品台; 样品安装在舞台上; 和可以与扫描型电子显微镜平行地安装在室上的室外观察样品的光学显微镜，测量样品表面部分（安装在样品台上）的位置，测量或者通过光学显微镜进行初步定义，并且将样品台移动一定量，从而将样品置于电子显微镜的视野的中心。

27. 发明授权

US4403336A X-Ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US4403336A
公开(公告)日：1983-09-06
申请号：US367996
申请日：1982-04-13
申请人： Motoya Taniguchi , Minoru Ikeda , Nobuyuki Akiyama
发明人： Motoya Taniguchi , Minoru Ikeda , Nobuyuki Akiyama
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , H01L21/30 , G03B41/16
CPC分类号： G03F7/70691 , H01L21/30
摘要： An X-ray exposure apparatus making use of a soft X-ray. An atmospheric chamber charged with a gas having a high permeability to X-ray is disposed between the X-ray source and the mask having the pattern to be replicated, such that the mask is supported by the atmospheric chamber. A part or the whole of an alignment optical system is disposed in the atmospheric chamber. According to this arrangement, it is possible to decrease the rate of attenuation of the X-ray between the source and the mask to attain higher ratio of utilization of the generated X-ray, thereby to shorten the replicating time and to improve the through put (amount of replication per unit time).
摘要翻译：使用软X射线的X射线曝光装置。在X射线源和具有要复制的图案的掩模之间设置充满了对X射线具有高磁导率的气体的大气室，使得掩模由大气室支撑。对准光学系统的一部分或全部设置在大气室中。根据该结构，可以降低源极与掩模之间的X射线的衰减率，以获得更高的X射线利用率，从而缩短复制时间并改善透视（单位时间的复制量）。

28. 发明授权

US4362389A Method and apparatus for projection type mask alignment 失效
标题翻译：用于投影型掩模对准的方法和装置
公开(公告)号：US4362389A
公开(公告)日：1982-12-07
申请号：US122484
申请日：1980-02-19
申请人： Mituyoshi Koizumi , Nobuyuki Akiyama , Yoshimasa Oshima
发明人： Mituyoshi Koizumi , Nobuyuki Akiyama , Yoshimasa Oshima
IPC分类号： G03F9/00 , G01B11/27 , H05K13/00
CPC分类号： G03F9/70
摘要： A mask alignment method of the projection type is disclosed which is based upon a fact that the exit pupil of a projection lens is actually positioned at a finite distance, and wherein a first wafer alignment pattern including a line segment and a second wafer alignment pattern including another line segment are formed on a wafer in those radial directions from the optical axis of a projection lens which intersect with each other approximately at a right angle. A first mask alignment pattern including a line segment and a second mask alignment pattern including another line segment are formed respectively at those positions on a mask which optically correspond to respective positions of the first and second wafer alignment patterns through the projection lens. The optical image of the first wafer alignment pattern superposed on the optical image of the first mask alignment pattern by the action of the projection lens falls on an image pickup device or element, the optical image of the second wafer alignment pattern superposed on the optical image of the second mask alignment pattern by the action of the projection lens falls on another image pickup device or element, the relative displacement between the wafer and the mask is determined by the video signals delivered from the image pickup devices or elements, and the wafer and the mask are aligned with each other so as to reduce the relative displacement to zero.
摘要翻译：公开了一种突起型掩模对准方法，其基于投影透镜的出射光瞳实际上位于有限距离的事实，并且其中包括线段和第二晶片对准图案的第一晶片对准图案包括在距离投影透镜的光轴大致直角相交的那些径向方向的晶片上形成另一线段。分别在掩模上的这些位置分别形成包括线段和包括另一线段的第二掩模对准图案的第一掩模对准图案，光掩模对应于通过投影透镜的第一和第二晶片对准图案的各个位置。通过投影透镜的作用叠加在第一掩模对准图案的光学图像上的第一晶片对准图案的光学图像落在图像拾取器件或元件上，第二晶片对准图案的光学图像叠加在光学图像上通过投影透镜的作用使第二掩模对准图案落在另一图像拾取装置或元件上，晶片和掩模之间的相对位移由从图像拾取装置或元件传送的视频信号确定，并且晶片和掩模彼此对准，以便将相对位移减小到零。

29. 发明授权

US4343553A Shape testing apparatus 失效
标题翻译：形状检测仪
公开(公告)号：US4343553A
公开(公告)日：1982-08-10
申请号：US181768
申请日：1980-08-27
申请人： Yasuo Nakagawa , Hiroshi Makihira , Yoshitada Oshida , Nobuyuki Akiyama
发明人： Yasuo Nakagawa , Hiroshi Makihira , Yoshitada Oshida , Nobuyuki Akiyama
IPC分类号： G01B11/25 , G01B11/00
CPC分类号： G01B11/2545
摘要： A shape detecting apparatus comprises a slit projecting means for projecting a slit image on a three-dimensional object such as a soldered area, a positioning means for positioning the three-dimensional object relative to the slit projecting means, an image pickup means for two-dimensionally scanning the slit image projected by the slit projecting means to pickup the image, a light segment extracting circuit including a center position extracting means for extracting a mean position (Z.sub.1 +Z.sub.2)/2 of two position signals Z.sub.1 and Z.sub.2 at which a video signal derived by transversely scanning the slit image by the image pickup means corresponds, to a first higher reference V.sub.1 when the video signal exceeds the first higher reference V.sub.1, a maximum value position extracting circuit for extracting a position Z corresponding to a maximum value of the video signal when the maximum value of the video signal is no higher than the first higher reference V.sub.1 and exceeds a second lower reference V.sub.2 and an erasing means for erasing the position signal when the maximum value of the video signal is no higher than the second lower reference V.sub.2, and a detecting means for detecting undersoldered condition and oversoldered condition by analyzing and evaluating the three-dimensional object based on the light segment position information derived from the light segment extracting circuit.
摘要翻译：一种形状检测装置，包括：狭缝突出装置，用于将缝合图像投射在诸如焊接区域的三维物体上;定位装置，用于相对于狭缝突出装置定位三维物体;图像拾取装置，对由狭缝投影装置投影的狭缝图像进行二维扫描以拾取图像;光段提取电路，包括中心位置提取装置，用于提取两个位置信号Z1和Z2的平均位置（Z1 + Z2）/ 2，通过图像拾取装置横向扫描狭缝图像导出的信号对应于当视频信号超过第一较高参考值V1时的第一较高参考V1，最大值位置提取电路，用于提取对应于最大值的位置Z 当视频信号的最大值不高于第一较高参考V1并且超过第二较低参考值V2和呃时，视频信号当视频信号的最大值不高于第二较低参考值V2时，用于擦除位置信号的灰度装置;以及检测装置，用于通过基于光段对三维物体进行分析和评估来检测底部状态和过弯状态从光段提取电路得到的位置信息。

30. 发明申请

US20120160325A1 METHOD OF MANUFACTURING SILICON THIN FILM, METHOD OF MANUFACTURING SILICON THIN-FILM PHOTOVOLTAIC CELL, SILICON THIN FILM, AND SILICON THIN-FILM PHOTOVOLTAIC CELL 审中-公开
标题翻译：制造硅薄膜的方法，制造硅薄膜光伏电池的方法，硅薄膜和硅薄膜光伏电池
公开(公告)号：US20120160325A1
公开(公告)日：2012-06-28
申请号：US13263956
申请日：2011-01-31
申请人： Nobuyuki Akiyama
发明人： Nobuyuki Akiyama
IPC分类号： H01L31/0264 , H01L31/18 , B32B3/30 , H01L21/20 , C30B25/02
CPC分类号： H01L21/02639 , C23C16/01 , C30B25/02 , C30B29/06 , H01L21/02381 , H01L21/0245 , H01L21/02502 , H01L21/02532 , H01L21/0262 , H01L21/02647 , H01L31/1804 , H01L31/1892 , Y02E10/547 , Y02P70/521 , Y10T428/24479
摘要： Disclosed is a method of manufacturing a silicon thin film, a method of manufacturing a silicon thin-film photovoltaic cell, and a silicon thin film. There is provided a method of manufacturing a silicon thin film in a form in which an inert face formed by an exposed face of a silicon substrate and an inert layer is formed by selectively forming the inert layer on the silicon substrate in which growth of a silicon crystal is inactive for a raw material gas of the silicon crystal, and the silicon crystal is grown from the exposed face such that the silicon crystal covers the silicon substrate by supplying a raw material gas, of which a surface decomposition reaction on the silicon substrate is dominant, out of the raw material gas to the silicon substrate. By forming a width of the exposed face in a range of 0.001 μm to 1 μm, the silicon thin film is formed in a state that the silicon thin film can be peeled off from the silicon substrate.
摘要翻译：公开了一种硅薄膜的制造方法，硅薄膜光伏电池的制造方法以及硅薄膜。提供一种制造硅薄膜的方法，其中通过在硅衬底上选择性地形成惰性层，形成由硅衬底和惰性层的暴露面形成的惰性表面，其中生长硅晶体对于硅晶体的原料气体是无效的，并且硅晶体从暴露面生长，使得硅晶体通过提供原料气体覆盖硅衬底，其中硅衬底上的表面分解反应为优势，从原料气中排出到硅衬底。通过在0.001μm〜1μm的范围内形成曝光面的宽度，可以使硅薄膜从硅衬底剥离的状态形成硅薄膜。

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