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    • 21. 发明申请
    • WATER-SOLUBLE COPOLYMER HAVING ALKYL-MODIFIED CARBOXYL GROUPS
    • 具有烷基改性羧酸基团的水溶性共聚物
    • US20090227751A1
    • 2009-09-10
    • US12093218
    • 2006-11-13
    • Masatoyo YoshinakaShinji KobayashiYuichiro Morimitsu
    • Masatoyo YoshinakaShinji KobayashiYuichiro Morimitsu
    • C08F220/06
    • C08F220/06C08F220/18
    • The present invention provide a water-soluble copolymer having alkyl-modified carboxyl groups which is able to produce a neutralized viscous liquid in which although its viscosity is very low when no electrolyte exists, the viscosity greatly increases when electrolytes are added, which has a high viscosity and a high transmittance and which has moist textures without stickiness even in the presence of a relatively high concentration of electrolytes, and a thickening agent comprising the same. More specifically, the present invention provides a water-soluble copolymer having alkyl-modified carboxyl groups which is obtained by polymerizing 100 parts by weight of (meth)acrylic acid, 0.5-5 parts by weight of alkyl (meth)acrylate comprising an alkyl group having a carbon number of 18-24, and 0-0.1 parts by weight of a compound having two or more of ethylenic unsaturated groups, wherein a 1 weight %-neutralized viscous liquid shows a viscosity of 1500 mPa·s or lower and a transmittance of 90% or higher, and when 0.25-5 parts by weight of sodium chloride is added to 100 parts by weight of the neutralized viscous liquid, the liquid shows a highest viscosity of 15000-40000 mPa·s and a transmittance of 90% or higher, and a thickening agent comprising the same.
    • 本发明提供具有烷基改性羧基的水溶性共聚物,其能够产生中和的粘性液体,其中当不存在电解质时其粘度非常低,当加入电解质时,粘度大大增加,其具有高 粘度和高透光率,并且即使在存在相对高浓度的电解质的情况下也具有无粘性的湿润纹理,以及包含该电解质的增稠剂。 更具体地说,本发明提供一种具有烷基改性羧基的水溶性共聚物,其通过使100重量份的(甲基)丙烯酸,0.5-5重量份的包含烷基的(甲基)丙烯酸烷基酯 碳原子数为18〜24,0〜0.1重量份具有2个以上烯键式不饱和基团的化合物,其中1重量%中和粘稠液体的粘度为1500mPa.s以下,透射率 为90%以上,当向100重量份中和的粘稠液体中加入0.25-5重量份氯化钠时,液体的粘度最高为15000-40000mPa.s,透光率为90%, 更高,和包含该增稠剂的增稠剂。
    • 23. 发明申请
    • PRODUCTION MANAGEMENT SYSTEM
    • 生产管理系统
    • US20090177307A1
    • 2009-07-09
    • US11910762
    • 2006-04-03
    • Katsuhisa MiyazakiShinji KobayashiYoshio MatsuokaYoshio HataJun Hikoe
    • Katsuhisa MiyazakiShinji KobayashiYoshio MatsuokaYoshio HataJun Hikoe
    • G06F17/00
    • B25J9/1674G05B2219/40197G05B2219/40224Y02P90/14Y02P90/20
    • There is provided a production management system that requires no backup step for performing a backup operation when trouble occurs in a robot, and can increase workability of a repair operation of the robot. The production management system for a production line mixedly including robot operation steps and manual operation steps, including: a monitor that displays the cause of abnormality that occurs in the robot operation step; a warning device that warns of occurrence of abnormality in the robot operation step; and a robot reversing device that reverses the orientation of a robot when abnormality occurs in the robot, wherein production is continued by changing the robot operation step where the abnormality occurs to the manual operation step. Also, a repair operation is performed for the robot reversed by the robot reversing device.
    • 提供了一种生产管理系统,当机器人发生故障时,不需要执行备份操作的备份步骤,并且可以提高机器人的修复操作的可操作性。 混合生产线的生产管理系统,包括机器人操作步骤和手动操作步骤,包括:显示机器人操作步骤中出现的异常原因的监视器; 警告装置,其在所述机器人动作步骤中发生异常发生; 以及机器人逆转装置,其在机器人发生异常时使机器人的姿势反转,其中通过将进行异常的机器人操作步骤改变为手动操作步骤来继续生产。 此外,对由机器人反转装置反转的机器人执行修理操作。
    • 24. 发明授权
    • Coating treatment apparatus and coating treatment method
    • 涂层处理装置和涂层处理方法
    • US07553374B2
    • 2009-06-30
    • US11047600
    • 2005-02-02
    • Masahito HamadaFumio HirotaShinji Kobayashi
    • Masahito HamadaFumio HirotaShinji Kobayashi
    • B05C11/06B05C11/00B05C11/02B05C11/10B05B7/06
    • H01L21/6715
    • In the present invention, a gas flow restraining ring facing corner portions of the front face of a substrate horizontally held on a substrate holding unit and movable up and down, is set to a predetermined height in accordance with a coating treatment. Then, a coating solution containing a coating film forming component and a solvent is applied to the front face of the substrate and spread into a thin film state by a so-called spin coating method, and thereafter the substrate is rotated at a high speed so that the coating solution is dried. In this case, it is possible to control fresh gas flow from above the substrate to decrease the difference in evaporation rate of the solvent between the coating solution on the corner portions of the substrate and the coating solution inside them, thus enabling the coating treatment uniform within a plane on the substrate.
    • 在本发明中,根据涂布处理,将水平保持在基板保持单元上并可上下移动的基板的前面的角部的气流限制环设定为规定的高度。 然后,将含有涂膜形成成分和溶剂的涂布溶液涂布在基板的正面,通过所谓的旋涂法扩展成薄膜状态,然后高速旋转基板 使涂层溶液干燥。 在这种情况下,可以控制从基板上方的新鲜气体流动,以减少基板的角部上的涂布液与其内部的涂布液之间的溶剂的蒸发速率差,从而能够使涂布处理均匀 在基板上的平面内。
    • 26. 发明授权
    • Thin film removing device and thin film removing method
    • 薄膜去除装置和薄膜去除方法
    • US07332056B2
    • 2008-02-19
    • US10841548
    • 2004-05-10
    • Shinji KobayashiNorihisa Koga
    • Shinji KobayashiNorihisa Koga
    • H01L21/302
    • H01L21/6708Y10S134/902Y10T156/1111Y10T156/1928Y10T156/1989
    • A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage plates 23 capable of being disposed substantially flush with the surface of a substrate M mounted on a support table 22 is positioned close to the substrate M mounted on the support table 22. Removing nozzles 30 jet a solvent toward edge parts of the substrate M and suck a solution produced by dissolving part of the resist in the solvent while the removing nozzles 30 are moved along side edges of the substrate M and the approach stage 20 disposed close to the substrate M. Thus, the removing nozzles 30 jet the solvent uniformly over the edge parts and corners of the substrate M and suck the solution without changing modes of jetting the solvent and sucking the solution. Consequently, straight parts of a thin film formed on the square substrate M can be removed from the corners of the substrate M, and the formation of mists can be suppressed.
    • 薄膜去除装置和薄膜去除方法能够从基板的角部去除在正方形基板上形成的薄膜的直线部分,并且抑制雾的形成。 具有能够与安装在支撑台22上的基板M的表面基本上齐平的平坦台板23的接近台20靠近安装在支撑台22上的基板M定位。 去除喷嘴30将溶剂喷射到基板M的边缘部分,并且吸取通过将抗蚀剂的一部分溶解在溶剂中而产生的溶液,同时移除喷嘴30沿着基板M的侧边缘移动,接近台20靠近 因此,除去喷嘴30将溶剂均匀地喷射在基板M的边缘部分和拐角上,并且吸取溶液而不改变喷射溶剂的方式并吸取溶液。 因此,可以从基板M的角部去除在正方形基板M上形成的薄膜的直线部分,并且可以抑制雾的形成。
    • 27. 发明授权
    • Driving method of variable resistance element and memory device
    • 可变电阻元件和存储器件的驱动方法
    • US07236388B2
    • 2007-06-26
    • US11169535
    • 2005-06-28
    • Yasunari HosoiYukio TamaiKazuya IshiharaShinji KobayashiNobuyoshi Awaya
    • Yasunari HosoiYukio TamaiKazuya IshiharaShinji KobayashiNobuyoshi Awaya
    • G11C11/00
    • G11C29/50G11C13/0007G11C13/0069G11C29/50008G11C2013/009G11C2213/31
    • A variable resistance element is configured to be provided with a perovskite-type oxide between a first electrode and a second electrode, of which electric resistance between the first electrode and the second electrode is changed by applying a voltage pulse of a predetermined polarity between the first electrode and the second electrode, and the variable resistance element has a resistance hysteresis characteristic, in which a changing rate of a resistance value is changed from positive to negative with respect to increase of a cumulative pulse applying time in the application of the voltage pulse. The voltage pulse is applied to the variable resistance element so that the cumulative pulse applying time is not longer than a specific cumulative pulse applying time, in which the changing rate of the, resistance value is changed from positive to negative with respect to increase of the cumulative pulse applying time in the resistance hysteresis characteristic.
    • 可变电阻元件被配置为在第一电极和第二电极之间设置有钙钛矿型氧化物,其中通过在第一电极和第二电极之间施加预定极性的电压脉冲来改变第一电极和第二电极之间的电阻 电极和第二电极,并且可变电阻元件具有电阻滞后特性,其中电阻值的变化率相对于施加电压脉冲的累积脉冲施加时间的增加而从正变化到负。 电压脉冲被施加到可变电阻元件,使得累积脉冲施加时间不长于特定的累积脉冲施加时间,其中电阻值的变化率相对于增加的电阻值从正变化到负 累积脉冲施加时间在电阻滞后特性。
    • 28. 发明授权
    • Apparatus and method for drying under reduced pressure, and coating film forming apparatus
    • 减压干燥装置及方法,以及涂膜成膜装置
    • US07205025B2
    • 2007-04-17
    • US11212725
    • 2005-08-29
    • Shinji KobayashiTakahiro KitanoShinichi Sugimoto
    • Shinji KobayashiTakahiro KitanoShinichi Sugimoto
    • B05D3/00
    • H01L21/67034B05D3/0254B05D3/0493
    • In drying a coating liquid such as a resist applied to a substrate under reduced pressure, a coating film in a peripheral portion tends to lose good shape regardless of duration of a drying period, and it is difficult to set an appropriate exhaust flow rate. After the substrate is loaded in an airtight container, a pressure is reduced from atmospheric pressure to a pressure slightly higher than the vapor pressure of a solvent, for example. Then, the solvent actively evaporates from the coating liquid. Here, evacuation is performed initially based on a first flow rate set value Q1, and thereafter, it is performed based on a second flow rate set value larger than Q1. Rounding of the surface in the peripheral portion is corrected by evacuation based on Q1, and more active evaporation of a solvent component is attained by switching to Q2.
    • 在减压下涂布抗蚀剂等涂布液的干燥中,不管干燥时间长短如何,周边部分的涂膜容易失去良好的形状,难以设定合适的排气流量。 在将基板装载到气密容器中之后,例如将压力从大气压降至略高于溶剂蒸气压的压力。 然后,溶剂从涂布液中主动蒸发。 这里,首先基于第一流量设定值Q 1进行排气,之后,基于大于Q 1的第二流量设定值进行排气。 通过基于Q 1的排气来校正周边部分的表面的四舍五入,并且通过切换到Q 2来获得更有效的溶剂成分的蒸发。