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21. 发明授权

US5747816A Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US5747816A
公开(公告)日：1998-05-05
申请号：US670047
申请日：1996-06-25
申请人： Toshiei Kurosaki
发明人： Toshiei Kurosaki
IPC分类号： H01J37/20 , H01J37/22 , H01J37/28 , H01L21/027
CPC分类号： H01J37/28 , B82Y10/00 , B82Y40/00 , H01J37/226 , H01J37/3174 , H01J2237/2826 , H01J2237/30433
摘要： In a scanning electron microscope, a couple of fiducial patterns which are so laid out on the X-Y stage as to be separated with a distance equivalent to the distance between the optical axis of the optical microscope and the optical axis of the electronic optical system, the image signals of these patterns are captured by the image processing circuit, the position shift of the optical axis of the optical microscope and the position shift of the optical axis of the electronic optical system with respect to the fiducial patterns are obtained by numerical calculation, and then, this position shift is used as an offset value in the actual measurement by the scanning electron microscope, which leads to an accurate positioning.
摘要翻译：在扫描电子显微镜中，将在XY台上布置的距离等于光学显微镜的光轴与电子光学系统的光轴之间的距离分开的两对基准图案，这些图案的图像信号由图像处理电路捕获，通过数值计算获得光学显微镜的光轴的位置偏移和电子光学系统的光轴相对于基准图案的位置偏移，并且那么该位置偏移被用作通过扫描电子显微镜的实际测量中的偏移值，这导致精确的定位。

22. 发明授权

US4504726A Pattern generator 失效
标题翻译：模式生成器
公开(公告)号：US4504726A
公开(公告)日：1985-03-12
申请号：US327627
申请日：1981-12-04
申请人： Sumio Hosaka , Akihiro Takanashi , Toshiei Kurosaki , Shinji Kuniyoshi , Yoshio Kawamura , Tsuneo Terasawa
发明人： Sumio Hosaka , Akihiro Takanashi , Toshiei Kurosaki , Shinji Kuniyoshi , Yoshio Kawamura , Tsuneo Terasawa
IPC分类号： B23K26/08 , B23K26/12 , B41M5/24 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/428
CPC分类号： B23K26/0861 , B23K26/12 , B23K26/1224 , B23K26/123 , B41M5/24 , G03F1/76 , G03F7/704 , G03F7/70875 , H01L21/30
摘要： A pattern generator in which a workpiece to be machined into a desired pattern shape is held in vacuum and is irradiated with a laser beam condensed to be fine, while scanning the laser beam so as to depict the desired pattern shape, whereby the workpiece is directly machined in conformity with the desired pattern shape. As the workpiece, one in which a shading film (for example, chromium film) is deposited on a transparent glass substrate is employed, and it is irradiated with the laser beam in the vacuum, whereby the irradiated parts of the shading film are vaporized to fabricate a shading mask pattern of good quality.
摘要翻译：一种图案发生器，其中待加工成所需图案形状的工件被保持在真空中并且被激光束照射以被精细地聚焦，同时扫描激光束以便描绘所需的图案形状，由此工件直接根据所需的图案形状加工。作为工件，使用在透明玻璃基板上沉积遮光膜（例如，铬膜）的工件，并在真空中照射激光束，使遮光膜的照射部分蒸发至制作质量好的遮光罩图案。

23. 发明授权

US4480910A Pattern forming apparatus 失效
标题翻译：图案形成装置
公开(公告)号：US4480910A
公开(公告)日：1984-11-06
申请号：US358436
申请日：1982-03-15
申请人： Akihiro Takanashi , Tatsuo Harada , Masamoto Akeyama , Yataro Kondo , Toshiei Kurosaki , Shinji Kuniyoshi , Sumio Hosaka , Yoshio Kawamura
发明人： Akihiro Takanashi , Tatsuo Harada , Masamoto Akeyama , Yataro Kondo , Toshiei Kurosaki , Shinji Kuniyoshi , Sumio Hosaka , Yoshio Kawamura
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , G03B27/52 , G03B27/68
CPC分类号： G03F7/70241 , G03F7/2041 , G03F7/70341
摘要： There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).
摘要翻译：公开了一种图案形成装置，用于将形成在掩模版上的图案投影在基板上的光致抗蚀剂层上，该基板包括用于照射用于形成光学图像的图案的照明系统，用于减少光学图案图像的缩小透镜特定的缩小率，并且将减小的光学图案图像投影到形成在用于曝光光致抗蚀剂层的基板上的光致抗蚀剂层上;以及液体维持装置，用于用光学透明液体填充至少一部分还原透镜和光致抗蚀剂层之间的间隙折射率大于1（1）。

24. 发明授权

US4441206A Pattern detecting apparatus 失效
标题翻译：图案检测装置
公开(公告)号：US4441206A
公开(公告)日：1984-04-03
申请号：US330778
申请日：1981-12-14
申请人： Shinji Kuniyoshi , Akihiro Takanashi , Toshiei Kurosaki , Sumio Hosaka , Yoshio Kawamura , Tsuneo Terasawa
发明人： Shinji Kuniyoshi , Akihiro Takanashi , Toshiei Kurosaki , Sumio Hosaka , Yoshio Kawamura , Tsuneo Terasawa
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G06K9/20 , G06K9/00 , H04N7/00
CPC分类号： G03F9/7088 , H01L21/30
摘要： A pattern detecting apparatus is disclosed which comprises, in order to detect the center of a positioning pattern on a sample with high accuracy in a wide range, means for illuminating the positioning pattern, means for defining an illumination range in which the positioning pattern is illuminated, means for focusing reflected light from the positioning pattern on a predetermined image plane, means for electrically detecting a bright and dark image on the image plane in accordance with positions on the image plane, means for removing a signal corresponding to the outside of the illumination range from the output signal of the detecting means and for holding, in place of the removed signal, a level of the output signal produced within the illumination range, and means for detecting a position of the center of the positioning pattern from the output signal of the holding means.
摘要翻译：公开了一种图案检测装置，其包括为了在宽范围内高精度地检测样品上的定位图案的中心，用于照亮定位图案的装置，用于限定定位图案被照亮的照明范围的装置用于将来自定位图案的反射光聚焦在预定图像平面上的装置，用于根据图像平面上的位置电学检测图像平面上的亮和暗图像的装置，用于去除对应于照明外部的信号的装置范围从检测装置的输出信号，并且代替去除的信号，保持在照明范围内产生的输出信号的电平，以及用于从位置图的输出信号中检测定位图案的中心的位置的装置持有手段。

25. 发明授权

US4317383A Proportional linear output system 失效
标题翻译：比例线性输出系统
公开(公告)号：US4317383A
公开(公告)日：1982-03-02
申请号：US125095
申请日：1980-02-27
申请人： Toshiei Kurosaki , Akihiro Takanashi
发明人： Toshiei Kurosaki , Akihiro Takanashi
IPC分类号： G01D5/02 , F16H21/44 , F16H35/16 , G01D5/04 , G05G7/02 , F16H21/54
CPC分类号： F16H35/16 , G01D5/04 , Y10T74/18992 , Y10T74/20582
摘要： A proportional linear output system in which a second link mechanism consisting of a link and a slider is coupled to a portion of a link of a first link mechanism consisting of a link and a slider, so that the individual link mechanisms describe geometrically similar figures, and in which an input displacement fed to one slider is converted into an output displacement and is produced by another slider, the quantity of output displacement being reduced according to a ratio of similar figures of the first link mechanism to the second link mechanism.
摘要翻译：一种比例线性输出系统，其中由链路和滑块组成的第二连杆机构联接到由链接和滑块组成的第一连杆机构的连杆的一部分，使得各个连杆机构描述几何相似的图形，并且其中馈送到一个滑动器的输入位移被转换为输出位移并且由另一个滑块产生，输出位移量根据第一连杆机构与第二连杆机构的类似图形的比例而减小。

26. 发明申请

US20050122508A1 Method and apparatus for reviewing defects 审中-公开
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20050122508A1
公开(公告)日：2005-06-09
申请号：US10975450
申请日：2004-10-29
申请人： Sachio Uto , Yoshimasa Ohshima , Minori Noguchi , Toshiei Kurosaki
发明人： Sachio Uto , Yoshimasa Ohshima , Minori Noguchi , Toshiei Kurosaki
IPC分类号： G01N21/956 , G01N23/225 , G01N21/88
CPC分类号： H01J37/226 , G01N21/956 , G01N23/2251 , H01J2237/2482
摘要： The present invention provides an apparatus capable of, and a method for, inspecting at high speed and with high accuracy the super minute foreign particles and pattern defects occurring during device-manufacturing processes in which circuit patterns are to be formed on a sample such as a substrate of semiconductor devices and other elements: in the invention, the sample is illuminated in a dark field from multiple directions each of a different incident angle, the light scattered from the sample during the dark-field illumination is detected in each of the multiple directions, and the signals obtained by detecting the scattered light in each direction; thus, defects present on the surface of an optically transparent film of the sample, and defects present in or under the transparent film are discriminated from each other and both types of defects are discriminatively reviewed using a scanning electron microscope.
摘要翻译：本发明提供了一种能够以高精度，高精度地检查在器件制造过程中发生的超微小异物和图案缺陷的装置，其中电路图形将被形成在诸如半导体器件的衬底和其他元件：在本发明中，样品在来自不同入射角的多个方向的暗场中照射，在暗场照明期间从样品散射的光在多个方向中的每一个中被检测以及通过检测各方向的散射光而获得的信号; 因此，存在于样品的光学透明膜的表面上的缺陷以及存在于透明膜中或其下的缺陷彼此区分，并且使用扫描电子显微镜来区分地区分两种类型的缺陷。

27. 发明授权

US06792359B2 Method for inspecting defect and system therefor 有权
标题翻译：检查缺陷的方法和系统
公开(公告)号：US06792359B2
公开(公告)日：2004-09-14
申请号：US09794532
申请日：2001-02-27
申请人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
发明人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
IPC分类号： G01B528
CPC分类号： H01L21/67288 , G01N21/9501 , G01N23/22 , G01N2021/8861 , G06T7/0004 , G06T7/73 , G06T2207/30148 , H01J37/28 , H01J2237/24592
摘要： Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.
摘要翻译：基于检查装置检测到的多个缺陷的位置坐标和属性，选择由观察装置容易检测的缺陷。利用这些选择的缺陷作为指标，观察装置检测并观察缺陷。此外，创建用于表示两个装置之间的缺陷位置坐标中的相关关系的坐标变换公式，观察装置转换缺陷位置坐标以观察缺陷。

28. 发明授权

US06553323B1 Method and its apparatus for inspecting a specimen 有权
标题翻译：检测样本的方法及其装置
公开(公告)号：US06553323B1
公开(公告)日：2003-04-22
申请号：US09661182
申请日：2000-09-13
申请人： Kenji Obara , Yuji Takagi , Toshifumi Honda , Ryo Nakagaki , Toshiei Kurosaki , Yasuhiko Ozawa
发明人： Kenji Obara , Yuji Takagi , Toshifumi Honda , Ryo Nakagaki , Toshiei Kurosaki , Yasuhiko Ozawa
IPC分类号： G01B528
CPC分类号： H01L22/20 , G01N21/88 , G01N2021/8861
摘要： The present invention improves inspection efficiency in detailed inspections of defects performed based on inspection information from a defect inspection. Particles and defects are detected by a defect inspection device 1. If the cause of the particles and defects are to be determined by performing a detailed inspection with a details inspection device 3 using an SEM or the like, attributes are determined on the particles and defects detected by the defects inspection device 1 before the detailed inspection is performed. The attributes are determined with an attribute inspection device using an optical microscope or the like. Based on these attributes, the defects and particles are separated into those that require detailed inspection and those that do not require detailed inspection or that cannot be inspected in detail. A details inspection device 3 is used to inspect the particles and defects requiring detailed inspection.
摘要翻译：本发明基于来自缺陷检查的检查信息进行的缺陷的详细检查，提高了检查效率。通过缺陷检查装置1检测颗粒和缺陷。如果通过使用SEM等的细节检查装置3进行详细检查来确定颗粒和缺陷的原因，则根据颗粒和缺陷确定属性在执行详细检查之前由缺陷检查装置1检测到。属性由使用光学显微镜等的属性检查装置确定。基于这些属性，缺陷和颗粒被分成需要详细检查的那些和不需要详细检查或者不能被详细检查的那些。细节检查装置3用于检查需要详细检查的颗粒和缺陷。

29. 发明授权

US5392115A Method of detecting inclination of a specimen and a projection exposure device as well as method of detecting period of periodically varying signal 失效
标题翻译：检测试样和投影曝光装置的倾斜度的方法以及检测周期性变化信号周期的方法
公开(公告)号：US5392115A
公开(公告)日：1995-02-21
申请号：US936661
申请日：1992-08-28
申请人： Yoshitada Oshida , Taku Ninomiya , Toshiei Kurosaki
发明人： Yoshitada Oshida , Taku Ninomiya , Toshiei Kurosaki
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/7026 , G03F9/7049
摘要： A method for detecting a period of a periodically varying signal and/or an inclination of a specimen utilizing an exposure apparatus wherein a coherent light is divided into first and second lights and the first light is irradiated onto the specimen at a predetermined angle, and a reflected light thereof and a reference light as the second light interfere with each other so as to form interference fringes, the interference fringes are detected, and the inclination of the specimen is detected from a pitch representing a period of the interference fringes. The method includes detecting a spectrum of a signal intensity obtained from the detected interference fringes or the periodically varying signal, subjecting the detected spectrum data to a fast complex Fourier transformation, calculating a true spectrum peak position j.sub.R in accordance with a relationship j.sub.R =j.sub.0 +.DELTA., where j.sub.0 is a detected spectrum peak position and .DELTA. is a correcting value estimated from the Fourier transformed spectrum data adjacent to j.sub.0, and calculating the pitch P of the period of the signal intensity information in accordance with a relationship P=N/j.sub.R, where N is the number of sample data points for the complex Fourier transformation. Further, the method includes calculating the inclination of the specimen from the pitch P.
摘要翻译：一种用于检测周期性变化信号的周期和/或利用曝光装置的样本的倾斜的方法，其中相干光被分成第一和第二光，并且第一光以预定角度照射到样本上，并且其反射光和作为第二光的参考光彼此干涉以形成干涉条纹，则检测干涉条纹，并且从表示干涉条纹周期的间距检测样本的倾斜度。该方法包括检测从检测到的干涉条纹或周期性变化信号获得的信号强度的频谱，对所检测的频谱数据进行快速复数傅立叶变换，根据关系jR = j0 + DELTA计算真正的频谱峰值位置jR ，其中j0是检测到的频谱峰值位置，并且DELTA是从与j0相邻的傅立叶变换频谱数据估计的校正值，并且根据关系P = N / jR计算信号强度信息的周期的间距P，其中N是复数傅里叶变换的采样数据点的数量。此外，该方法包括从间距P计算样本的倾斜度。

30. 发明授权

US5247329A Projection type exposure method and apparatus 失效
标题翻译：投影式曝光方法及装置
公开(公告)号：US5247329A
公开(公告)日：1993-09-21
申请号：US813002
申请日：1991-12-24
申请人： Yoshitada Oshida , Toshiei Kurosaki , Akira Inagaki , Yoshihiko Aiba
发明人： Yoshitada Oshida , Toshiei Kurosaki , Akira Inagaki , Yoshihiko Aiba
IPC分类号： G03F1/44 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7023 , G03F7/70241
摘要： A projection type exposure apparatus and method comprising an exposure illumination light source, an exposure illumination system, a mask or reticle on which an original pattern to be projected on the exposed matter is drawn, an optical projection system, a stage for retaining the exposed matter and a mechanism for finely moving the stage along the exposure optical axis. The apparatus is provided with an exposure detection pattern area on the mask, detection illumination means for projecting on the exposure detection pattern area a light ray which is the same or almost the same in wavelength as exposure light having a desired directivity, exposure detection means for detecting the transmitted or reflected light diffracted by 1 degree after the light carrying the image formed on the exposed matter by the light passed through the above-noted optical projection system after projection by the detection illumination means onto the exposure pattern and then diffracted goes in reverse through the above-noted optical projection system and forms an image again on the exposure pattern on the above-noted mask and a control circuit for driving and controlling the above-noted fine movement mechanism by using the signal obtained by the exposure detection means.
摘要翻译：一种投影式曝光装置和方法，包括曝光照明光源，曝光照明系统，掩模或掩模版，其上将要投射在暴露物体上的原始图案被拉出，光学投影系统，用于保持暴露物质的台以及用于沿着曝光光轴精细地移动台的机构。该设备在掩模上设置曝光检测图案区域，检测照明装置用于在曝光检测图案区域上投射与具有所需方向性的曝光光相同或几乎相同的波长的光线，曝光检测装置在通过检测照明装置投影到曝光图案上之后，在通过上述光学投影系统的光在携带在曝光物体上形成的图像的光之后，将被发射或反射的光衍射1度，然后衍射反向通过上述光学投影系统并在上述掩模上的曝光图案上再次形成图像，以及通过使用由曝光检测装置获得的信号来驱动和控制上述微动机构的控制电路。

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