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1. 发明授权

US4396705A Pattern forming method and pattern forming apparatus using exposures in a liquid 失效
标题翻译：图案形成方法和使用液体中的曝光的图案形成装置
公开(公告)号：US4396705A
公开(公告)日：1983-08-02
申请号：US303400
申请日：1981-09-18
申请人： Masamoto Akeyama , Yoshifumi Tomita , Saburo Nonogaki
发明人： Masamoto Akeyama , Yoshifumi Tomita , Saburo Nonogaki
IPC分类号： G03F7/20 , G03F7/30 , H01L21/027 , H01L21/30 , G03C5/04 , G03C5/00 , G03C5/06 , G03D3/08
CPC分类号： G03F7/70866 , G03F7/2041 , G03F7/30 , H01L21/30
摘要： A pattern forming method comprising a step of disposing a substrate with a coated film of photosensitive composition and a mask having a predetermined pattern in a first liquid which does not dissolve said coated film of photosensitive composition, and a step of exposing said coated film to light through said mask. An apparatus for attaining this method is also disclosed. The influence of dust can be readily avoided and an image with high resolution is obtained.
摘要翻译：一种图案形成方法，包括以下步骤：将具有感光性组合物的涂膜和具有预定图案的掩模的基板设置在不溶解感光性组合物的所述涂膜的第一液体中，以及将所述涂膜曝光通过面罩。还公开了一种用于实现该方法的装置。可以容易地避免灰尘的影响，并获得高分辨率的图像。

2. 发明授权

US4200217A Method of manufacturing an article having a press-worked member inwardly of a cylindrical member 失效
标题翻译：制造在筒状部件内侧具有加压部件的制品的方法
公开(公告)号：US4200217A
公开(公告)日：1980-04-29
申请号：US819056
申请日：1977-07-26
申请人： Kuninori Imai , Soji Takahashi , Masamoto Akeyama
发明人： Kuninori Imai , Soji Takahashi , Masamoto Akeyama
IPC分类号： B23K20/00 , B23K20/02 , B23P11/00 , B23P15/00 , H01J23/16 , B23K31/02
CPC分类号： B23P15/00 , H01J23/165 , Y10T29/4902 , Y10T29/49938
摘要： This invention relates to a method of manufacturing an article having a press-worked member inwardly of a cylindrical member, which comprises a first step for removing stain and oxidation film on the inner surface of a cylindrical member and on the peripheral side surface of a blank, a second step for arranging the blank inwardly of the cylindrical member so that the purified side surface of the blank may be faced toward the purified internal surface of the cylindrical member, a third step for subjecting the blank to a cold press-working inside the cylindrical member to thereby closely combine the blank with the cylindrical member, a fourth step for further subjecting the cold-worked blank to a hot press-working inside the cylindrical member to thereby form the blank into a desired shape within the cylindrical member, and a fifth step for annealing the combined members at a temperature for diffusion to thereby join the blank with the cylindrical member by diffusion. After that, a machining step such as cutting, milling or so on, is followed to provide a finished product of a desired shape. Also, such a machining step can be carried out between the fourth step and the fifth step.
摘要翻译：本发明涉及一种制造在圆柱形构件内部具有加压构件的制品的方法，该方法包括用于除去圆柱形构件的内表面上的污渍和氧化膜的第一步骤和空白的外周侧表面第二步骤，用于将坯料向内布置成圆柱形构件，使得坯料的净化侧表面可面向圆柱形构件的净化内表面;第三步骤，用于使坯件在内部进行冷压加工从而将坯料与圆柱形构件紧密结合，第四步骤，用于进一步对冷加工的坯料进行圆柱形构件内的热压加工，从而在圆柱形构件内形成所需形状的坯料，以及用于在扩散的温度下退火组合的构件，从而通过扩散将坯料与圆柱形构件接合的第五步骤。之后，进行诸如切割，铣削等的加工步骤，以提供所需形状的成品。此外，这样的加工步骤可以在第四步骤和第五步骤之间进行。

3. 发明授权

US4480910A Pattern forming apparatus 失效
标题翻译：图案形成装置
公开(公告)号：US4480910A
公开(公告)日：1984-11-06
申请号：US358436
申请日：1982-03-15
申请人： Akihiro Takanashi , Tatsuo Harada , Masamoto Akeyama , Yataro Kondo , Toshiei Kurosaki , Shinji Kuniyoshi , Sumio Hosaka , Yoshio Kawamura
发明人： Akihiro Takanashi , Tatsuo Harada , Masamoto Akeyama , Yataro Kondo , Toshiei Kurosaki , Shinji Kuniyoshi , Sumio Hosaka , Yoshio Kawamura
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , G03B27/52 , G03B27/68
CPC分类号： G03F7/70241 , G03F7/2041 , G03F7/70341
摘要： There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).
摘要翻译：公开了一种图案形成装置，用于将形成在掩模版上的图案投影在基板上的光致抗蚀剂层上，该基板包括用于照射用于形成光学图像的图案的照明系统，用于减少光学图案图像的缩小透镜特定的缩小率，并且将减小的光学图案图像投影到形成在用于曝光光致抗蚀剂层的基板上的光致抗蚀剂层上;以及液体维持装置，用于用光学透明液体填充至少一部分还原透镜和光致抗蚀剂层之间的间隙折射率大于1（1）。

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