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21. 发明专利

JP2010153655A Polysiloxane-based reactant for filling trench 有权
标题翻译：用于填充TRENCH的聚硅氧烷基反应剂
公开(公告)号：JP2010153655A
公开(公告)日：2010-07-08
申请号：JP2008331333
申请日：2008-12-25
申请人： Asahi Kasei E-Materials Corp , 旭化成イーマテリアルズ株式会社
发明人： SAITO HIDEO , TAKADA SHOZO , MORIYAMA REIKO
IPC分类号： H01L21/76 , C08G77/04 , C08K3/36 , C08K5/54 , C08L83/05 , H01L21/316
摘要： PROBLEM TO BE SOLVED: To provide a reactant for filling a trench which is used for filling silicon oxide in the trench formed in a substrate, with a long pot life for an appropriate solution, high filling capability for the trench, high HF resistance and high crack resistance.
SOLUTION: Concerning a condensation reactant for filling trench, the condensation reactant includes at least a condensation reactant, composed of polysiloxane compound and silica particles; the polysiloxane compound is set to have not less than 40 mol% of at least one group selected from a HSiO
3/2 group, an MeHSiO group and a H
2 SiO group; the weight-average monocular weight of the polysiloxane is set to be not less than 1,000 and not more than 200,000; and the average first particle diameter of the silica particle is set to be not less than 1 nm and not more than 100 nm.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供用于填充在衬底中形成的沟槽中填充氧化硅的沟槽的反应物，具有适用溶液的长适用期，沟槽高填充能力，高HF 电阻和高抗裂性。解决方案：关于用于填充沟槽的缩合反应物，缩合反应物至少包含由聚硅氧烷化合物和二氧化硅颗粒组成的缩合反应物; 将聚硅氧烷化合物设定为具有不少于40摩尔％的选自HSiO 3/2 / SB>，MeHSiO基和H SiO基团中的至少一个基团 ; 聚硅氧烷的重均单眼重量设定为1000以上20万以下; 将二氧化硅粒子的平均第一粒径设定为1nm以上且100nm以下。版权所有（C）2010，JPO＆INPIT

22. 发明公开

EP2604644A4 PHOTOSENSITIVE SILICONE RESIN COMPOSITION 审中-公开
标题翻译：光敏组合物中硅氧烷树脂
公开(公告)号：EP2604644A4
公开(公告)日：2015-10-28
申请号：EP11816265
申请日：2011-06-15
申请人： ASAHI KASEI E MATERIALS CORP
发明人： TSUGANE NATSUMI , SAITO HIDEO , KUSAKABE TORU , NAKAMICHI MOTONORI
IPC分类号： C08G77/20 , C08F299/08 , C08G77/14 , C08L83/06 , C08L83/07 , G03F7/075
CPC分类号： C08L83/00 , C08F299/08 , C08G77/14 , C08G77/20 , C08K5/0025 , C08K9/06 , G03F7/0047 , G03F7/0757 , C08L83/04 , C08L83/06

23. 发明公开

EP2447303A4 PRODUCT OF POLYSILOXANE CONDENSATION 审中-公开
标题翻译：聚硅氧烷的凝聚产物
公开(公告)号：EP2447303A4
公开(公告)日：2012-10-10
申请号：EP10792179
申请日：2010-06-24
申请人： ASAHI KASEI E MATERIALS CORP
发明人： MORIYAMA REIKO , SAITO HIDEO , TAKADA SYOUZOU , DOI ICHIROU
IPC分类号： C08G77/44 , C08L83/04 , C09D183/10 , H01L21/312 , H01L21/76
CPC分类号： C08L83/04 , C08G77/02 , C08G77/04 , C08K3/36 , C08K2201/016 , H01L21/02123 , H01L21/02208 , H01L21/02282 , H01L21/3121 , H01L51/448 , Y10T428/31663 , C08L83/00
摘要： Provided is a condensation reaction product solution which is particularly suitable for filling a trench formed on a substrate having a narrow width and a high aspect ratio. The condensation reaction product solution has a long pot life, superior trench-filling when used for trench-filling, and a low cure shrinkage, an excellent crack resistance and a HF resistance when cured and converted into silicon oxide. The condensation reaction product solution comprises (I) a condensation reaction product obtained by condensation reaction from a condensation component comprising (i) 40% by mass or more and 99% by mass or less in equivalent of condensate of polysiloxane compound derived from silane compounds represented by the general formula (1) : R 1 n SiX 1 4-n (wherein n is an integer of 0 to 3, R 1 is hydrogen atom or a C 1-10 hydrocarbon group, and X 1 is a halogen atom, a C 1-6 alkoxy group or acetoxy group) and (ii) 1% by mass or more and 60% by mass or less of silica particles, and (II) a solvent, wherein the silane compounds represented by the general formula (1) are two or more types of silane compounds comprising a tetrafunctional silane compound which corresponds to the case of n = 0 in the general formula (1) and a trifunctional silane compound which corresponds to the case of n = 1 in the general formula (1).
摘要翻译：提供了一种缩合反应产物溶液，其特别适于填充形成在具有窄宽度和高纵横比的基底上的沟槽。缩合反应产物溶液具有长的适用期，用于沟槽填充时具有优异的沟槽填充性，并且固化和转化为氧化硅时具有低固化收缩率，优异的抗裂性和耐HF性。缩合反应产物溶液包含（I）缩合反应产物，该缩合反应产物由缩合组分缩合反应得到，该缩合反应产物包含（i）40质量％以上且99质量％以下，相当于来源于硅烷化合物的聚硅氧烷化合物的缩合物通式（1）表示：R 1 n SiX 1 4-n（n为0〜3的整数，R 1为氢原子或C 1-10烃基，X 1为卤素原子， C 1-6烷氧基或乙酰氧基）和（ii）1质量％以上且60质量％以下的二氧化硅粒子，和（II）溶剂，其中由通式（1）表示的硅烷化合物是通式（1）中与n = 0的情况相对应的四官能性硅烷化合物和通式（1）中n = 1的情况下的三官能性硅烷化合物的两种以上的硅烷化合物，。

24. 发明专利

SG191313A1 INSULATION STRUCTURE AND METHOD FOR MANUFACTURING SAME 未知
公开(公告)号：SG191313A1
公开(公告)日：2013-08-30
申请号：SG2013048491
申请日：2011-12-22
申请人： ASAHI KASEI E MATERIALS CORP
发明人： DOI ICHIRO , TAKADA SHOZO , MISHIMA REIKO , SAITO HIDEO
摘要： INSULATING STRUCTURE AND PRODUCTION METHOD OF SAME TECHNICAL FIELDAn insulating structure is formed that favorably maintains gap-fill capability of a narrow width pattern 5 in a memory cell while also preventing the formation of cracks in an insulator in a peripheral circuit, and has the memory cell and peripheral circuit within the same layer. The present invention provides an insulating structure comprising a substrate and a circuit pattern 10 formed on the substrate, wherein the circuit pattern has a narrow width region having a narrow width pattern of a width of 30 nm or less and a wide width region having a wide width pattern of a width of greater than 100 nm in the same layer, and the same insulating composition is 15 formed within the narrow width pattern and within the wide width pattern.Figure 1

25. 发明专利

SG187800A1 PHOTOSENSITIVE SILICONE RESIN COMPOSITION 未知
公开(公告)号：SG187800A1
公开(公告)日：2013-04-30
申请号：SG2013010046
申请日：2011-06-15
申请人： ASAHI KASEI E MATERIALS CORP
发明人： TSUGANE NATSUMI , SAITO HIDEO , KUSAKABE TORU , NAKAMICHI MOTONORI
摘要： PHOTOSENSITIVE SILICONE RESIN COMPOSITIONProvided is a resin composition which gives a cured product of a photocurable resin having excellent crackresistance even when formed into a thick film, and capable of maintaining a low coefficient of linear thermal expansion, low thermal weight loss, and a low cure shrinkage. This photosensitive silicone resin composition comprises (A) a silica particle-containing10 condensation reaction product and (B) a photopolymerization initiator, and is characterized inthat the silica particle- containing condensation reaction product (A) is a condensation reaction product of a polysiloxane compound (a) comprising a hydrolytic15 condensation product of one or more silane compoundsrepresented by the following general formula (1): RI,IISiX141 (wherein Rl, n1 and X1 are defined in the claims) and/or the silane compound, and silica particles (b), and has a terminal structure Si-O-Y (wherein Y is20 defined in the claims) which satisfies the followingformula (2): 0

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