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21. 发明授权

US08477412B2 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus 有权
标题翻译：用于极紫外光源装置的集光镜交换装置和方法
公开(公告)号：US08477412B2
公开(公告)日：2013-07-02
申请号：US11979513
申请日：2007-11-05
申请人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
发明人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
IPC分类号： G02B15/14
CPC分类号： G21K1/06 , B82Y10/00 , G02B7/18 , G02B7/183 , G02B13/14 , G02B15/14 , G02B15/173 , G03F1/146 , G03F1/22 , G03F7/70175 , G03F7/702 , G03F7/70975 , G21K1/10 , G21K2201/067 , H05G2/001 , Y10T29/49895 , Y10T29/53087 , Y10T29/53539
摘要： A collector mirror exchanging apparatus is capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
摘要翻译：集光镜交换装置能够安全且容易地交换收集器反射镜，用于收集从极紫外光源装置的室内产生的等离子体发出的极紫外光。集电镜更换装置包括：支撑集电镜或收集镜结构的支撑基座; 以及导轨，其设置在所述支撑基座上并且调节所述集光镜或所述集光镜结构的移动方向; 其特征在于，通过使所述集光镜或所述集光镜结构沿着所述支撑基座上的导轨移动，至少将所述集光镜从所述室取出。

22. 发明申请

US20080104828A1 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus 有权
标题翻译：用于极紫外光源装置的集光镜交换装置和方法
公开(公告)号：US20080104828A1
公开(公告)日：2008-05-08
申请号：US11979513
申请日：2007-11-05
申请人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
发明人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
IPC分类号： B23P21/00
CPC分类号： G21K1/06 , B82Y10/00 , G02B7/18 , G02B7/183 , G02B13/14 , G02B15/14 , G02B15/173 , G03F1/146 , G03F1/22 , G03F7/70175 , G03F7/702 , G03F7/70975 , G21K1/10 , G21K2201/067 , H05G2/001 , Y10T29/49895 , Y10T29/53087 , Y10T29/53539
摘要： A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
摘要翻译：一种集电镜交换装置，能够安全且容易地交换用于收集从极紫外光源装置的室内产生的等离子体发出的极紫外光的集光镜。集电镜更换装置包括：支撑集电镜或收集镜结构的支撑基座; 以及导轨，其设置在所述支撑基座上并且调节所述集光镜或所述集光镜结构的移动方向; 其特征在于，通过使所述集光镜或所述集光镜结构沿着所述支撑基座上的导轨移动，至少将所述集光镜从所述室取出。

23. 发明授权

US08324601B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08324601B2
公开(公告)日：2012-12-04
申请号：US12943090
申请日：2010-11-10
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： H05H1/00 , G01J3/10
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

24. 发明授权

US07842937B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07842937B2
公开(公告)日：2010-11-30
申请号：US12071352
申请日：2008-02-20
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： H01J27/24 , A61N5/06
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

25. 发明授权

US08476609B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置和用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08476609B2
公开(公告)日：2013-07-02
申请号：US13306358
申请日：2011-11-29
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

26. 发明申请

US20080197299A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20080197299A1
公开(公告)日：2008-08-21
申请号：US12071352
申请日：2008-02-20
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： G21K5/00
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained by using a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：通过使用能够以基本均匀的强度实现期望的脉冲宽度的驱动激光可以有效地获得EUV光的极端紫外光源装置。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

27. 发明授权

US08093571B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置及用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08093571B2
公开(公告)日：2012-01-10
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

28. 发明申请

US20100078580A1 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置及用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US20100078580A1
公开(公告)日：2010-04-01
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02 , G21K1/00
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

29. 发明授权

US08238392B2 Temperature controller for gas laser 有权
标题翻译：气体激光器温度控制器
公开(公告)号：US08238392B2
公开(公告)日：2012-08-07
申请号：US12710722
申请日：2010-02-23
申请人： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
发明人： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
IPC分类号： H01S3/00 , H01S3/04 , H01S3/22 , H01S3/223
CPC分类号： H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
摘要： A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
摘要翻译：一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统，以及连接第二回火的第二管道系统所述控制部分和每个第二温度控制部分并联。

30. 发明授权

US08498317B2 Temperature controller for gas laser 有权
标题翻译：气体激光器温度控制器
公开(公告)号：US08498317B2
公开(公告)日：2013-07-30
申请号：US13543510
申请日：2012-07-06
申请人： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
发明人： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
IPC分类号： H01S3/04 , H01S3/22
CPC分类号： H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
摘要： A temperature controller for a gas laser which controls temperatures of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
摘要翻译：一种气体激光器的温度控制器，其控制包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分的温度控制装置的温度，与第一温度控制部分相比，具有低或高温度的控制包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂，第二温度控制部分产生冷却剂或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统和将第二温度控制部分和第二个温度受控部分平行

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