专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明专利

JP2007208279A Lithographic projection apparatus 有权
标题翻译： LITHOGRAPHIC投影设备
公开(公告)号：JP2007208279A
公开(公告)日：2007-08-16
申请号：JP2007065471
申请日：2007-03-14
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LOF JOERI , BIJLAART ERIK THEODORUS MARIA , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SCHAIK FRANK VAN , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure. SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrate W. Spaces 222, 215 among the middle plate 210, a transmitted image sensor (TIS) 220, and the substrate W are also filled with the liquid 111. This procedure can be performed by two separated space liquid-supply systems via holes 230, 240, or can be performed by the same space liquid-supply system via the holes 230, 240. Therefore, both the space 215 between the substrate W and the middle plate 210, and the space 225 between the transmitted image sensor 220 and the middle plate 210 are filled with the liquid, so that both the substrate W and the transmitted image sensor can be illuminated under the same condition. A part 200 provides one or a plurality of support surfaces with the middle plate 210 which can be held at a predetermined position by a vacuum source. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻投影装置，其在液浸曝光期间在基片的端部曝光期间使供应系统的液体损失最小化。解决方案：液体受位于液体供应系统和基板W之间的中间板210的限制。中间板210中的空间222,215，透射图像传感器（TIS）220和基板W也被填充该过程可以通过两个分离的空间供液系统通孔230,240进行，或者可以经由孔230,240由相同的空间液体供应系统执行。因此，两者之间的空间215 基板W和中间板210以及透射图像传感器220和中间板210之间的空间225被填充液体，从而能够在相同条件下照射基板W和透射图像传感器。部件200提供一个或多个支撑表面，中间板210可由真空源保持在预定位置。版权所有（C）2007，JPO＆INPIT

22. 发明专利

JP2004289126A Lithography system and process for fabricating device 有权
公开(公告)号：JP2004289126A
公开(公告)日：2004-10-14
申请号：JP2003417259
申请日：2003-11-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LOF JOERI , ANTONIUS THEODORUS ANNA MARIA , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MODDERMAN THEODORUS MARINUS , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide a lithography projector in which a space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projector, the space between the final element of the projection system and the substrate table of the lithography projector is surrounded by a sealing member. A gas seal is formed between the sealing member and the plane of the substrate and the liquid is confined in that space. COPYRIGHT: (C)2005,JPO&NCIPI

23. 发明申请

WO2013143777A2 SUBSTRATE TABLE SYSTEM, LITHOGRAPHIC APPARATUS AND SUBSTRATE TABLE SWAPPING METHOD 审中-公开
标题翻译：基板表系统，平面设备和基板表交换方法
公开(公告)号：WO2013143777A2
公开(公告)日：2013-10-03
申请号：PCT/EP2013053084
申请日：2013-02-15
申请人： ASML NETHERLANDS BV
发明人： VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS , DE GROOT ANTONIUS FRANCISCUS JOHANNES , HOOGENDAM CHRISTIAAN ALEXANDER , LOOPSTRA ERIK ROELOF , BUTLER HANS
IPC分类号： G03F7/20
CPC分类号： G03F7/70758 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F9/70 , H02K41/02
摘要： A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement. The plane of movement is defined by a first direction and a second direction perpendicular to the first direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate so as to form a first motor arranged to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure (along the first and second directions), the second pusher structure and the substrate table being arranged to cooperate so as to form a second motor arranged to exert a force between the second pusher structure and the substrate table in the second direction.
摘要翻译：衬底台系统包括衬底台和用于在运动平面中移动衬底台的双向电动机。运动平面由垂直于第一方向的第一方向和第二方向限定。双向电动机包括：沿第一方向延伸的第一推动器结构，衬底台相对于第一推动器结构可移动，第一推动器结构和衬底台被布置成协作以形成布置成在第一方向上在第一推动器结构和基板台之间施加力; 以及沿所述第一方向延伸的第二推动器结构，所述衬底台可相对于所述第二推动器结构（沿着所述第一和第二方向）移动，所述第二推动器结构和所述衬底台被配置为协作以形成第二推动器结构电动机布置成在第二方向上在第二推动器结构和衬底台之间施加力。

24. 发明专利

SG171646A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：SG171646A1
公开(公告)日：2011-06-29
申请号：SG2011031127
申请日：2006-04-03
申请人： ASML NETHERLANDS BV
发明人： BECKERS MARCEL , DONDERS SJOERD NICOLAAS LAMBERTUS , HOOGENDAM CHRISTIAAN ALEXANDER , JACOBS JOHANNES HENRICUS WILHELMUS , TEN KATE NICOLAAS , KEMPER NICOLAAS RUDOLF , MIGCHELBRINK FERDY , EVERS ELMAR
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]

25. 发明专利

DE602004025893D1 未知
公开(公告)号：DE602004025893D1
公开(公告)日：2010-04-22
申请号：DE602004025893
申请日：2004-10-26
申请人： ZEISS CARL SMT AG , ASML NETHERLANDS BV
发明人： HOOGENDAM CHRISTIAAN ALEXANDER , LOOPSTRA ERIK ROELOF , STREEFKERK BOB , GELLRICH BERNARD , WURMBRAND ANDREAS
IPC分类号： G03F7/20 , H01L21/027

26. 发明专利

SG156572A1 POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：SG156572A1
公开(公告)日：2009-11-26
申请号：SG2009023359
申请日：2009-04-03
申请人： ASML NETHERLANDS BV
发明人： BUTLER HANS , CUIJPERS MARTINUS AGNES WILLEM , HOOGENDAM CHRISTIAAN ALEXANDER , DE JONGH ROBERTUS JOHANNES MARINUS , RENKENS MICHAEL JOZEF MATHIJS , VAN DER WIJST MARC WILHELMUS MARIA , WIJCKMANS MAURICE WILLEM JOZEF ETIENNE , TOUSAIN ROBERTUS LEONARDUS , FAASSEN RONALD PETRUS HENDRICUS , KOEVOETS ADRIANUS HENDRIK
摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including: a first actuator to exert an actuation force on the table, the first actuator being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, wherein the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass.

27. 发明专利

DE602005003082T2 未知
公开(公告)号：DE602005003082T2
公开(公告)日：2008-08-14
申请号：DE602005003082
申请日：2005-09-07
申请人： ASML NETHERLANDS BV
发明人： HOOGENDAM CHRISTIAAN ALEXANDER , JACOBS JOHANNES HENRICUS WILHE , TEN KATE NICOLAAS , VAN DER MEULEN FRITS
IPC分类号： G03F7/20 , H01L21/027
摘要： In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction.

28. 发明专利

DE602005000696D1 未知
公开(公告)号：DE602005000696D1
公开(公告)日：2007-04-26
申请号：DE602005000696
申请日：2005-04-04
申请人： ASML NETHERLANDS BV
发明人： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS , DONDERS SJOERD NICOLAAS , HOOGENDAM CHRISTIAAN ALEXANDER , MERTENS JEROEN JOHANNES , MULKENS JOHANNES CATHARINUS , PEETERS FELIX GODFRIED , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR , JANSEN HANS
IPC分类号： G03F7/20 , H01L21/027

29. 发明专利

SG126135A1 Lithographic apparatus and device manufacturing method 未知
公开(公告)号：SG126135A1
公开(公告)日：2006-10-30
申请号：SG200602210
申请日：2006-04-03
申请人： ASML NETHERLANDS BV
发明人： BECKERS MARCEL , DONDERS SJOERD NICOLAAS LAMBER , HOOGENDAM CHRISTIAAN ALEXANDER , JACOBS JOHANNES HENRICUS WILHE , KATE TEN NICOLAAS , KEMPER NICOLAAS RUDOLF , MIGCHELBRINK FERDY , EVERS ELMAR

30. 发明专利

SG171645A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：SG171645A1
公开(公告)日：2011-06-29
申请号：SG2011031119
申请日：2006-04-03
申请人： ASML NETHERLANDS BV
发明人： BECKERS MARCEL , DONDERS SJOERD NICOLAAS LAMBERTUS , HOOGENDAM CHRISTIAAN ALEXANDER , JACOBS JOHANNES HENRICUS WILHELMUS , TEN KATE NICOLAAS , KEMPER NICOLAAS RUDOLF , MIGCHELBRINK FERDY , EVERS ELMAR
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式