专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

KR20100135198A A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus 无效
标题翻译：一种平面设备，一种控制设备的方法和一种使用平面设备制造设备的方法
公开(公告)号：KR20100135198A
公开(公告)日：2010-12-24
申请号：KR20100056706
申请日：2010-06-15
申请人： ASML NETHERLANDS BV
发明人： DIRECKS DANIEL JOZEF MARIA , KEMPER NICOLAAS RUDOLF , PHILIPS DANNY MARIA HUBERTUS , RIEPEN MICHEL , VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS , SCHEPERS MAIKEL ADRIANUS CORNELIS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , H01L21/0274 , G03F7/2041 , G03F7/7085
摘要： PURPOSE: A lithography apparatus, a method for controlling the same, and a method for manufacturing a device using the same are provided to reduce the generation risk of imaging defects by supplying immersing liquid into a space between a projection system and an opposite surface. CONSTITUTION: Patterned radiation beam directs toward a substrate through a projection system. The substrate is supported by a table. A liquid handling system supplies immersing liquid into a space between the projection system and an opposite surface. The structure of an opening(70) affects the influence of a liquid handling structure(12) in which the liquid is contained. A controller controls the operation of the table with respect to the liquid handling system.
摘要翻译：目的：提供一种光刻设备及其控制方法，以及使用该方法的设备的制造方法，以通过将浸入液体供入投影系统与相对面之间的空间来降低成像缺陷的产生风险。构成：图案化的辐射束通过投影系统指向衬底。基板由桌子支撑。液体处理系统将浸入液体提供到投影系统和相对表面之间的空间中。开口（70）的结构影响液体处理结构（12）的含有液体的影响。控制器控制工作台相对于液体处理系统的操作。

2. 发明专利

JP2009044196A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2009044196A
公开(公告)日：2009-02-26
申请号：JP2008298670
申请日：2008-11-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS RUDOLF , SMEULERS JOHANNES PETRUS MARIA , VOLKER ARNO WILLEM FREDERIK , RENE BREEUWER , KATE NICOLAAS TEN , BELFROID STEFAN PHILIP CHRISTI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925
摘要： PROBLEM TO BE SOLVED: To remove thin film-like residual liquid accompanying the movement of a substrate in an immersion lithography apparatus. SOLUTION: An ultrasonic transducer 24 emits an ultrasonic beam 25 through a gas present under a liquid confinement structure 22. The ultrasonic beam 25 atomizes a liquid layer 11a and removes liquid from the surface of the substrate. The ultrasonic transducer 24 comprises two transmission parts 24a and 24b, the amplitude, frequency and phase of the respective radiated beams can be controlled, and atomization is accelerated utilizing an interference effect between the beams. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：在浸没式光刻设备中除去伴随基板运动的薄膜状残留液体。解决方案：超声波换能器24通过存在于液体限制结构22下方的气体发射超声波束25.超声波束25雾化液体层11a并从基底表面去除液体。超声波换能器24包括两个发送部分24a和24b，可以控制相应的辐射波束的振幅，频率和相位，并且利用波束之间的干扰效应来加速雾化。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2006140501A Lithography equipment and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2006140501A
公开(公告)日：2006-06-01
申请号：JP2005327629
申请日：2005-11-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KEMPER NICOLAAS RUDOLF , SMEULERS JOHANNES PETRUS MARIA , VOLKER ARNO WILLEM FREDERIK , RENE BREEUWER , KATE NICOLAAS TEN , BELFROID STEFAN PHILIP CHRISTI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925
摘要： PROBLEM TO BE SOLVED: To remove a remaining film-like liquid remaining accompanied by the movement of a substrate in immersion type lithography equipment. SOLUTION: An ultrasonic transducer 24 emits ultrasonic beams 25 through gas which exists under a liquid-confining structure 22. The ultrasonic beam 25 atomizes a liquid layer 11a and removes its liquid from the surface of the substrate. The ultrasonic transducer 24 is composed of two originating portions 24a, 24b, and can control amplitudes, frequencies, and phases of the individual radiated beams, and can promote the atomization by utilizing an interference between the beams. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了去除残留的与浸渍型光刻设备中的基板的移动相伴的膜状液体。解决方案：超声波换能器24通过存在于液体限制结构22下方的气体发射超声波束25.超声波束25雾化液体层11a并从基底表面去除其液体。超声波换能器24由两个起始部分24a，24b组成，并且可以控制各个辐射波束的幅度，频率和相位，并且可以通过利用波束之间的干扰来促进雾化。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2004343078A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2004343078A
公开(公告)日：2004-12-02
申请号：JP2004102926
申请日：2004-03-31
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： COX HENRIKUS HERMAN MARIE , FRANKEN DOMINICUS JACOBUS PETR , KEMPER NICOLAAS RUDOLF , VAN DER PASCH ENGELBERTUS ANTO , VERBUNT MARTIJN JOHANNES , VAN DEN WILDENBERG LAMBERTUS A
IPC分类号： G21K5/00 , G03F7/20 , G21K5/02 , H01L21/027
CPC分类号： G03F7/70141 , G03F7/70233 , G03F7/70258 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide a projecting system which can keep optical elements at correct positions with extremely high accuracy.
SOLUTION: In a projecting system using EUV, the position of a mirror is not measured and controlled relative to a reference holder but are measured and controlled relative to each other. A relative position can be measured by an interferometer or a capacitive sensor which is mounted on the fixed/extended portion of the mirror.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种可以以非常高的精度将光学元件保持在正确位置的投影系统。
解决方案：在使用EUV的投影系统中，镜子的位置不是相对于参考保持器测量和控制的，而是相对于彼此进行测量和控制。可以通过安装在反射镜的固定/延伸部分上的干涉仪或电容传感器来测量相对位置。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2010109395A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2010109395A
公开(公告)日：2010-05-13
申请号：JP2010032113
申请日：2010-02-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS RUDOLF , DONDERS SJOERD NICOLAAS LAMBERTUS , CHRISTIAAN ALEXANDER HOOGENDAM , TEN KATE NICOLAAS , VAN DER MEULEN FRITS
IPC分类号： H01L21/027
CPC分类号： G03F7/70866 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus improved from a liquid supply system configured to supply immersion liquid into interspace between a terminal element of a projection system and a substrate, so as to efficiently remove the liquid from the vicinity of the substrate. SOLUTION: The liquid supply system includes a sealing member for forming a seal between its own undersurface and the substrate to substantially store the liquid in the space. A recess is formed in the undersurface and connected to a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source has lower pressure than the second pressure source, gas flow generated from the second pressure source to the first pressure source, and the liquid and/or gas extracted by the flow. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种从液体供应系统改进的光刻设备，其配置为将浸没液体供应到投影系统的端子元件和基板之间的间隙中，以便有效地从液体供应系统基质。解决方案：液体供应系统包括用于在其自身的下表面和基底之间形成密封的密封构件，以将液体基本上储存在空间中。凹槽形成在下表面中并连接到第一压力源和用于抽出液体和/或气体的第二压力源。第一压力源具有比第二压力源低的压力，从第二压力源产生的气流到第一压力源，以及由流提取的液体和/或气体。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2006196905A Lithography apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2006196905A
公开(公告)日：2006-07-27
申请号：JP2006005636
申请日：2006-01-13
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KEMPER NICOLAAS RUDOLF , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , TEN KATE NICOLAAS , VAN DER MEULEN FRITS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus, having a liquid feed system configured to supply immersion liquid to spacing between the final element and substrate of the projection system, for which the improvement is made so that the liquid from the near-by area of the substrate can be removed efficiently. SOLUTION: This liquid feed system comprises a seal component for forming a sealing between the lower surface of the system and the substrate that virtually accommodates the liquid in the spacing. A concave section is formed on the lower surface, and the concave section is connected with a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source is set to be at a lower pressure level than that of the second pressure source so that the gas flow is produced, from the second pressure source to the first pressure source. The liquid and/or gas can be extracted due to this flow. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻设备，其具有液体供给系统，该液体供给系统构造成将浸没液体供应到投影系统的最终元件和基板之间的间隔，其中进行改进使得来自近处的液体可以有效地去除衬底的面积。解决方案：该液体供给系统包括用于在系统的下表面和基本上容纳间隔的液体的基底之间形成密封的密封部件。在下表面上形成凹部，凹部与用于取出液体和/或气体的第一压力源和第二压力源连接。第一压力源设定在比第二压力源低的压力水平，从而从第二压力源到第一压力源产生气体流。由于这种流动，液体和/或气体可以被提取。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2011211235A Lithographic apparatus and method for manufacturing the device 审中-公开
标题翻译：平面设备及其制造方法
公开(公告)号：JP2011211235A
公开(公告)日：2011-10-20
申请号：JP2011142755
申请日：2011-06-28
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS RUDOLF , SMEULERS JOHANNES PETRUS MARIA , VOLKER ARNO WILLEM FREDERIK , RENE BREEUWER , KATE NICOLAAS TEN , BELFROID STEFAN PHILIP CHRISTIAAN
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03F7/70925
摘要： PROBLEM TO BE SOLVED: To remove a film-like liquid remaining associated with the movement of a substrate in an immersion lithography apparatus.SOLUTION: An ultrasonic transducer 24 emits ultrasonic beams 25 through a gas which exists under a liquid confinement structure 22. The ultrasonic beam 25 atomizes a liquid layer 11a to remove the liquid from a surface of the substrate. The ultrasonic transducer 24 including two originating portions 24a, 24b, can control amplitudes, frequencies, and phases of the individual radiated beams, and can promote the atomization by utilizing an interference effect between the beams.
摘要翻译：要解决的问题：去除在浸没式光刻设备中与衬底移动相关的膜状液体。解决方案：超声波换能器24通过存在于液体限制结构22下方的气体发射超声波束25.超声波光束25雾化液体层11a以从基板的表面去除液体。包括两个起始部分24a，24b的超声波换能器24可以控制各个辐射束的幅度，频率和相位，并且可以通过利用光束之间的干涉效应来促进雾化。

8. 发明专利

JP2009158976A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2009158976A
公开(公告)日：2009-07-16
申请号：JP2009094993
申请日：2009-04-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS RUDOLF , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , TEN KATE NICOLAAS , VAN DER MEULEN FRITS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus, having a liquid feed system configured to supply immersion liquid to spacing between a final element of a projection system and a substrate, for which the improvement is made so that the liquid from the near-by area of the substrate can be removed efficiently. SOLUTION: This liquid feed system comprises a seal member for forming a seal between the undersurface of itself and the substrate to virtually store the liquid in the spacing. A recessed section is formed on the undersurface, and the recessed section of the undersurface is connected with a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source is set at a lower pressure level than that of the second pressure source so that the gas flow is produced, from the second pressure source to the first pressure source, and the liquid and/or gas can be extracted by this flow. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其具有配置成将浸没液体供应到投影系统的最终元件与基板之间的间隔的液体供给系统，其中进行改进，使得来自可以有效地除去基板的近区域。解决方案：该液体供给系统包括用于在其本身的下表面和基底之间形成密封件的密封构件，以在间隔中虚拟存储液体。在下表面上形成凹部，下表面的凹部与第一压力源和用于抽出液体和/或气体的第二压力源连接。第一压力源被设定在比第二压力源低的压力水平，使得从第二压力源到第一压力源产生气流，并且可以通过该流来提取液体和/或气体。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2005079585A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2005079585A
公开(公告)日：2005-03-24
申请号：JP2004247637
申请日：2004-08-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： DANSBERG MICHEL PIETER , CORNELISSEN SEBASTIAAN MARIA J , COX HENRIKUS HERMAN MARIE , VAN DIESEN ROBERT JOHANNES PET , KEMPER NICOLAAS RUDOLF , MUNNIG-SCHMIDT ROBERT-HAN , VEN DER SCHOOT HARMEN KLAAS , JANSEN ROB
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can perform reliable position measurements.
SOLUTION: The lithographic apparatus is comprised of a radiation system for providing a projection beam of radiation, a first support structure for supporting patterning means which serves to pattern the projection beam according to a desired pattern, a second support structure for supporting a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the first and second support structures is comprised of a planar base, a movable stage for supporting the patterning means or the substrate that can be moved over said planar base, and an actuator for providing said movement of the stage. A lithographic projection apparatus is further comprised of a contactless position measuring device for performing the position measurement of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and said stage for improving the position measurement. The base comprises a plurality of gas channels provided in the base in order to provide a gas flow path of the gas flow through the gas channels in the base.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供可执行可靠位置测量的光刻设备。解决方案：光刻设备由用于提供投影辐射束的辐射系统组成，用于支撑图案化装置的第一支撑结构，其用于根据期望的图案图案化投影光束;第二支撑结构，用于支撑基板和用于将图案化的光束投影到基板的目标部分上的投影系统。第一和第二支撑结构中的至少一个包括平面基座，用于支撑图案化装置的可移动台架或可在所述平面基座上移动的基板，以及用于提供台架运动的致动器。光刻投影装置还包括用于执行台的位置测量的非接触位置测量装置和用于在测量装置和所述台之间产生调节气流的第一泵，用于改善位置测量。基部包括设置在基座中的多个气体通道，以便提供通过基座中的气体通道的气流的气体流动路径。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2003086504A LITHOGRAPHY APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED BY THE SAME METHOD 审中-公开
公开(公告)号：JP2003086504A
公开(公告)日：2003-03-20
申请号：JP2002235856
申请日：2002-08-13
申请人： ASML NETHERLANDS BV
发明人： KEMPER NICOLAAS RUDOLF , JACOBS HERNES , BUIS EDWIN JOHAN
IPC分类号： H01L21/027 , F16J3/04 , F16L11/15 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a bellows for a lithography device which can separate torsional vibrations, force or moments. SOLUTION: The bellows for use in connecting two airtight regions of the lithography device or connecting a region and a pump has a first region having a smooth spiral undulation and a second region capable of absorbing movement in the vertical direction caused by the relative rotation of ends of the first region. The second region can be used as an mirror image of the first region, one of circumferential undulations or as a plurality of subregions.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式