专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明申请

WO2006093781A3 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
公开(公告)号：WO2006093781A3
公开(公告)日：2006-09-08
申请号：PCT/US2006/006408
申请日：2006-02-24
申请人： CYMER, INC. , BOWERING, Norbert, R. , HANSSON, Bjorn, A., M. , BYKANOV, Alexander, N. , KHODYKIN, Oleh , ERSHOV, Alexander, I. , PARTLO, William, N.
发明人： BOWERING, Norbert, R. , HANSSON, Bjorn, A., M. , BYKANOV, Alexander, N. , KHODYKIN, Oleh , ERSHOV, Alexander, I. , PARTLO, William, N.
IPC分类号： G01J1/00
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

22. 发明申请

WO2006093781A2 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
标题翻译：用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
公开(公告)号：WO2006093781A2
公开(公告)日：2006-09-08
申请号：PCT/US2006006408
申请日：2006-02-24
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
发明人： BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

23. 发明申请

WO2006049886A2 EUV COLLECTOR DEBRIS MANAGEMENT 审中-公开
标题翻译： EUV收集器破产管理
公开(公告)号：WO2006049886A2
公开(公告)日：2006-05-11
申请号：PCT/US2005/037725
申请日：2005-10-20
申请人： CYMER, INC. , PARTLO, William, N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , OLDHAM, William , HEMBERG, Oscar , MARX, William, F.
发明人： PARTLO, William, N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , OLDHAM, William , HEMBERG, Oscar , MARX, William, F.
IPC分类号： H01L21/306 , B08B6/00 , B44C1/22
CPC分类号： B08B7/00
摘要： A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
摘要翻译：一种方法和装置，其可以包括利用EUV等离子体源材料的EUV光产生机构，其包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许蚀刻化合物从反射表面蚀刻的蒸气压。蚀刻剂源材料可以包含卤素或卤素化合物。蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。还可以存在离子加速剂将离子朝向反射表面加速。离子可以包括蚀刻剂源材料。该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

24. 发明申请

WO2006009905A1 LASER OUTPUT BEAM WAVEFRONT SPLITTER FOR BANDWIDTH SPECTRUM CONTROL 审中-公开
标题翻译：激光输出波束分波器用于带宽频谱控制
公开(公告)号：WO2006009905A1
公开(公告)日：2006-01-26
申请号：PCT/US2005/021585
申请日：2005-06-17
申请人： CYMER, INC. , SANDSTROM, Richard, L. , BROWN, Daniel, J., W. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , PARTLO, William, N.
发明人： SANDSTROM, Richard, L. , BROWN, Daniel, J., W. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , PARTLO, William, N.
IPC分类号： H01S3/22
CPC分类号： H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
摘要： An apparatus and method for providing bandwidth control in a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, is disclosed which may comprise a dispersive bandwidth selection optic (Fig. 1, character 120) selecting at least one center wavelength for each pulse determined at least in part by the angle (of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle ( Δα L)of incidence of the a laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each portion having one of at least two different selected center wavelengths. The tuning mechanism may comprise a temporal angle ( Δα L) of incidence selection element defining an angle of incidence for different temporally separated portions of the pulse to return from the dispersive bandwidth selection optic a laser beam comprising a plurality of temporally separated portions of each pulse, each temporally separated portion of each pulse having one of at least two different selected center wavelengths. The tuning mechanism may comprise a plurality of spatial incidence angle selection elements each defining an angle of incidence for a spatially separated but not temporally separated portion of the laser light pulse, and a plurality of temporal angle of incidence selection elements each defining at least a first angle of incidence for at least a first temporally separated portion of each spatially separated but not temporally separated portion of the pulse and a second angle of incidence for a second temporally separated but not spatially separated portion of each spatially separated portion of the pulse.
摘要翻译：公开了一种用于在窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统中提供带宽控制的装置和方法，其产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括色散带宽选择光学器件（图1，字符120）为每个脉冲选择至少一个中心波长，所述至少一个中心波长至少部分地由在分散波长选择光学器件上包含相应脉冲的激光束脉冲光束的入射角度确定;调谐机构，选择至少一个角度（

25. 发明申请

WO2005046011A3 RELAX GAS DISCHARGE LASER LITHOGRAPHY LIGHT SOURCE 审中-公开
标题翻译：放电气体放电激光光刻光源
公开(公告)号：WO2005046011A3
公开(公告)日：2005-12-22
申请号：PCT/US2004035671
申请日：2004-10-27
申请人： CYMER INC , SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ERSHOV ALEXANDER I , RAFAC ROBERT J , RYLOV GERMAN E
发明人： SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ERSHOV ALEXANDER I , RAFAC ROBERT J , RYLOV GERMAN E
IPC分类号： B23K26/06 , B23K26/40 , G01J1/42 , G01J9/02 , G02B26/00 , G02B26/08 , G03F7/20 , H01S20060101 , H01S3/00 , H01S3/1055 , H01S3/22 , H01S3/225
CPC分类号： G01J1/429 , B23K26/0622 , B23K2201/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
摘要翻译：公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在分散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置脉冲光束在可变折射光学元件上。可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。脉冲参数测量和脉冲调制控制的其他方面包括响应于来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

26. 发明申请

WO03100826A8 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
标题翻译：光束传输和光束控制的光刻激光器
公开(公告)号：WO03100826A8
公开(公告)日：2004-11-25
申请号：PCT/US0314387
申请日：2003-05-05
申请人： CYMER INC , DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
发明人： DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
IPC分类号： H01L21/027 , G02B26/08 , G02B27/09 , G03F7/20 , H01L20060101 , H01L21/00 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/0971 , H01S3/10 , H01S3/13 , H01S3/134 , H01S3/136 , H01S3/137 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种模块化的高重复频率紫外线气体放电激光光源（图1），光束传输到生产线机器（2）。该系统包括具有光束指向控制器（40A）（40B）（6）的封闭（4）和清洗光束路径（14C），用于将激光束传送到期望位置，例如生产线机器的入口 2）。在优选实施例中，生产线机器是光刻机器（2），并且提供两个单独的放电室（8）（10），其中一个是主振荡器（8）的一部分，产生非常窄带的种子束在第二放电室（10）中被放大。该MOPA系统的输出脉冲能量大约是可比较的单腔激光系统的两倍，大大改善了光束质量。

27. 发明申请

WO2003100826A2 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
标题翻译：光束激光与光束输送和光束点控制
公开(公告)号：WO2003100826A2
公开(公告)日：2003-12-04
申请号：PCT/US2003/014387
申请日：2003-05-05
申请人： CYMER, INC. , WEBB, R, Kyle , DAS, Palash P. , GIOVANARDI, Marco , FRANCIS, Gregory , DORN, Huckleberry B. , ERLANDSEN, Kyle P. , NELSON, John W. , SANDSTROM, Richard L. , ERSHOV, Alexander I.
发明人： DAS, Palash P. , GIOVANARDI, Marco , FRANCIS, Gregory , DORN, Huckleberry B. , ERLANDSEN, Kyle P. , NELSON, John W. , SANDSTROM, Richard L. , ERSHOV, Alexander I.
IPC分类号： H01L
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.
摘要翻译：本发明提供了一种向生产线机器输送光束的模块化高重复率紫外线气体放电激光光源。该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。优选实施例包括用于光束衰减的设备，用于自动反馈光束对准的设备和用于在安装和维护期间精确的光学模块定位的设备。在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

28. 发明申请

WO2003096492A3 AUTOMATIC GAS CONTROL SYSTEM FOR A GAS DISCHARGE LASER 审中-公开
公开(公告)号：WO2003096492A3
公开(公告)日：2003-11-20
申请号：PCT/US2003/013939
申请日：2003-05-05
申请人： CYMER, INC. , RULE, John, A. , HOFMANN, Thomas , MORTON, Richard, G. , BROWN, Daniel, J., W. , FLEUROV, Vladimir, B. , TRINTCHOUK, Fedor , ISHIHARA, Toshihiko , ERSHOV, Alexander, I. , WITTAK, Christian, J.
发明人： RULE, John, A. , HOFMANN, Thomas , MORTON, Richard, G. , BROWN, Daniel, J., W. , FLEUROV, Vladimir, B. , TRINTCHOUK, Fedor , ISHIHARA, Toshihiko , ERSHOV, Alexander, I. , WITTAK, Christian, J.
IPC分类号： H01S3/22
摘要： An automatic F 2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor (604) for monitoring the F 2 consumption rates through the operating life of the laser system (4). These consumption rates are used by a processor (604) programmed with an algorithm to determine F 2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F 2 controls for a two-chamber MOPA laser system (5).

29. 发明申请

WO2003078940A3 HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE 审中-公开
公开(公告)号：WO2003078940A3
公开(公告)日：2003-09-25
申请号：PCT/US2003/002052
申请日：2003-01-15
申请人： CYMER, INC. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , SMITH, Scott, T. , BROWN, Daniel, J., W.
发明人： SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , SMITH, Scott, T. , BROWN, Daniel, J., W.
IPC分类号： G01J3/18
摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser (D) illuminates an etalon (ET). A portion of its light exiting the etalon (ET) is collected and directed into a slit (S1) positioned at a fringe pattern of the etalon (ET). Light passing through the slit (S1) is collimated and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon (ET) and the grating (GR1) are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array (PDA) and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array (PDA). Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer (50), and the etalon (ET) can be scanned.

30. 发明申请

WO2003049241A1 TIMING CONTROL FOR TWO-CHAMBER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：两台气体放电激光系统的时序控制
公开(公告)号：WO2003049241A1
公开(公告)日：2003-06-12
申请号：PCT/US2002/034045
申请日：2002-10-23
申请人： CYMER INC. , ERSHOV, Alexander, I. , NESS, Richard, M.
发明人： ERSHOV, Alexander, I. , NESS, Richard, M.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308 , H01S3/2333 , H01S3/2366
摘要： Feedback timing control equipment and process for an injection seeded modular gas discharge laser (11). A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no-output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber.
摘要翻译：反馈定时控制设备和注射种子模块化气体放电激光器的工艺（11）。优选的实施方案是能够以大约4,000Hz或更大的脉冲速率产生高质量脉冲激光束并且在约20至40瓦或更大的集成输出的脉冲能量为约5至10mJ或更大的系统。反馈定时控制被编程为允许在某些情况下放电定时，使得不会从系统输出显着的激光能量。使用这种技术允许突发模式操作，其中突发的第一次放电是无输出放电，使得可以在突发的第一激光输出脉冲之前监视两个室中的每一个的定时参数。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许在主振荡器中优化波长参数并优化放大室中的脉冲能量参数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式