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11. 发明申请

US20070178394A1 RESIST COMPOSITION 有权
标题翻译：耐腐蚀组合物
公开(公告)号：US20070178394A1
公开(公告)日：2007-08-02
申请号：US11621896
申请日：2007-01-10
申请人： Taku Hirayama , Hideo Hada , Satoshi Fujimura , Takeshi Iwai , Mitsuru Sato , Ryoichi Takasu , Toshikazu Tachikawa , Jun Iwashita , Keita Ishiduka , Tomotaka Yamada , Toshikazu Takayama , Masaaki Yoshida
发明人： Taku Hirayama , Hideo Hada , Satoshi Fujimura , Takeshi Iwai , Mitsuru Sato , Ryoichi Takasu , Toshikazu Tachikawa , Jun Iwashita , Keita Ishiduka , Tomotaka Yamada , Toshikazu Takayama , Masaaki Yoshida
IPC分类号： G03C5/00
CPC分类号： G03F7/70616 , G03F7/0382 , G03F7/0397 , G03F7/70341 , Y10S430/106 , Y10S430/111
摘要： A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.
摘要翻译：提供了相对于在浸没式光刻工艺中使用的溶剂是稳定的并且显示出优异的灵敏度和抗蚀剂图案轮廓的抗蚀剂组合物，以及形成使用这种抗蚀剂组合物的抗蚀剂图案的方法。抗蚀剂组合物是根据预定参数，或是包含含有酸解离的溶解抑制基团并在酸的作用下显示增加的碱溶性的树脂组分（A）的阳性抗蚀剂组合物，酸产生剂组分（B）和有机溶剂（C），其中，成分（A）含有来自含有酸解离性，溶解抑制基团但不含结构单元（a0）的（甲基）丙烯酸酯的结构单元（a1）含有二羧酸的酸酐的单元（a0-1）和含有酚羟基的结构单元（a0-2）。

12. 发明申请

US20070164346A1 Semiconductor device 失效
标题翻译：半导体器件
公开(公告)号：US20070164346A1
公开(公告)日：2007-07-19
申请号：US10588479
申请日：2005-12-19
申请人： Masaaki Yoshida
发明人： Masaaki Yoshida
IPC分类号： H01L29/788
CPC分类号： G11C16/30 , G11C16/0433 , H01L21/823462 , H01L27/115 , H01L27/11521 , H01L27/11524
摘要： A semiconductor device is disclosed that includes a nonvolatile memory cell having a memory transistor and a selection transistor, and a peripheral circuit transistor. The memory transistor includes a memory gate oxide film that is arranged on a semiconductor substrate, and a floating gate made of polysilicon that is arranged on the memory gate oxide film. The selection transistor is serially connected to the memory transistor and includes a selection gate oxide film that is arranged on the semiconductor substrate, and a selection gate made of polysilicon that is arranged on the selection gate oxide film. The peripheral circuit transistor includes a peripheral circuit gate oxide film that is arranged on the semiconductor substrate, and a peripheral circuit gate made of polysilicon that is arranged on the peripheral circuit gate oxide film. The memory gate oxide film is arranged to be thinner than the peripheral circuit gate oxide film.
摘要翻译：公开了一种半导体器件，其包括具有存储晶体管和选择晶体管的非易失性存储单元和外围电路晶体管。存储晶体管包括布置在半导体衬底上的存储栅极氧化膜和布置在存储栅极氧化膜上的由多晶硅制成的浮置栅极。选择晶体管串联连接到存储晶体管，并且包括布置在半导体衬底上的选择栅极氧化膜以及布置在选择栅氧化膜上的由多晶硅制成的选择栅极。外围电路晶体管包括布置在半导体衬底上的外围电路栅极氧化膜，以及设置在外围电路栅氧化膜上的由多晶硅制成的外围电路栅极。存储栅氧化膜被布置成比外围电路栅极氧化膜薄。

13. 发明申请

US20070031755A1 Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protec- ting film 审中-公开
标题翻译：用于形成浸渍曝光工艺的抗蚀保护膜的材料，由这种材料制成的抗蚀保护膜，以及使用这种抗蚀保护膜形成抗蚀剂图案的方法
公开(公告)号：US20070031755A1
公开(公告)日：2007-02-08
申请号：US10568951
申请日：2004-08-25
申请人： Taku Hirayama , Kotaro Endo , Masaaki Yoshida , Kazumasa Wakiya
发明人： Taku Hirayama , Kotaro Endo , Masaaki Yoshida , Kazumasa Wakiya
IPC分类号： G03C1/00
CPC分类号： G03F7/2041 , G03F7/11
摘要： The resist protective film forming material for liquid immersion lithography is provided, which is suitable when the non-aqueous solution with a high transparency and high refractive index exemplified by the fluorinated liquid is used. The resist protective film forming material includes at least one component selected from water-soluble and alkali-soluble film forming components. The liquid immersion lithography process improves the resolution of resist patterns by irradiating a light beam on a resist film interposing a given thickness of the non-aqueous solution with a refractive index higher than that of the air at least on the resist film in a path, along where the lithography exposing light beam passes to the resist film.
摘要翻译：提供了用于液浸光刻的抗蚀剂保护膜形成材料，当使用以氟化液体为例说明的具有高透明度和高折射率的非水溶液时，这是合适的。抗蚀剂保护膜形成材料包括选自水溶性和碱溶性成膜组分中的至少一种成分。液浸式光刻工艺通过至少在路径上的抗蚀剂膜上照射介于非空气的折射率高于非水溶液的给定厚度的抗蚀剂膜上的光束来提高抗蚀剂图案的分辨率，沿着光刻曝光光束到达抗蚀剂膜的方向。

14. 发明申请

US20060210913A1 Photoresist composition and, used in the photoresist composition, low-molecular compound and high-molecular compound 有权
标题翻译：光致抗蚀剂组合物，用于光致抗蚀剂组合物中的低分子化合物和高分子化合物
公开(公告)号：US20060210913A1
公开(公告)日：2006-09-21
申请号：US10553315
申请日：2004-04-15
申请人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida , Mitsuru Sato , Syogo Matsumaru , Hideo Hada
发明人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida , Mitsuru Sato , Syogo Matsumaru , Hideo Hada
IPC分类号： G03C1/76
CPC分类号： C07C43/126 , C07C43/162 , C07C43/1747 , C07C69/96 , C07C2601/14 , C07C2602/42 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/0757 , Y10S430/108
摘要： A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen atom-containing acetal type acid-dissociative, dissolution inhibiting group, as well as a photoresist composition comprising the same. The photoresist composition is highly stable during storage and can give a resist pattern excellent in sectional rectangular shape and having high transparency to an exposure light, particularly a light having a wavelength of 300 nm or less.
摘要翻译：具有碱溶性部位（i）的高分子化合物和低分子化合物或二者，其中至少一部分碱溶性部位（i）用（ⅱ）含卤原子的缩醛型酸 - 解离，溶解抑制基团，以及包含其的光致抗蚀剂组合物。光致抗蚀剂组合物在保存期间高度稳定，并且可以得到截面矩形形状优异并且对曝光光，特别是波长为300nm以下的光具有高透明度的抗蚀剂图案。

15. 发明授权

US06336054B1 Interlock apparatus for a transfer machine 失效
标题翻译：用于转印机的联锁装置
公开(公告)号：US06336054B1
公开(公告)日：2002-01-01
申请号：US09291045
申请日：1999-04-14
申请人： Yoshiharu Ota , Masaaki Yoshida , Shinya Tanoue , Tatsuya Iwasaki
发明人： Yoshiharu Ota , Masaaki Yoshida , Shinya Tanoue , Tatsuya Iwasaki
IPC分类号： G06F1900
CPC分类号： H01L21/67748 , H01L21/67242 , H01L21/67259
摘要： A processing system for processing a substrate. The processing system includes a plurality of processing machines, a machine movable along a transfer path for transferring the substrate to the machines, a drive unit for driving the machine, and a control unit. The control unit includes a memory for storing a teaching threshold in a teaching mode and a practical operation threshold in a practical operation mode that is higher than the teaching threshold when a moving parameter of the drive unit exceeds a given value. The control unit also includes a controller monitoring a parameter representing a moving state of the drive unit to stop the drive unit when the parameter exceeds the practical operation threshold in the practical operation mode or when the parameter exceeds the teaching threshold in the teaching mode.
摘要翻译：一种用于处理衬底的处理系统。处理系统包括多个处理机器，沿着用于将基板传送到机器的传送路径移动的机器，用于驱动机器的驱动单元和控制单元。控制单元包括存储器，用于在实际操作模式中存储教学阈值和实际操作阈值，该实际操作模式当驱动单元的移动参数超过给定值时高于教学阈值。控制单元还包括控制器，当在实践操作模式中参数超过实际操作阈值时或者当教学模式中参数超过教学阈值时，监控表示驱动单元的移动状态的参数以停止驱动单元。

16. 发明授权

US6161932A Visual axis input and decision transfer device and method 有权
标题翻译：视轴输入和决策传输装置及方法
公开(公告)号：US6161932A
公开(公告)日：2000-12-19
申请号：US265587
申请日：1999-03-10
申请人： Hironori Goto , Masaaki Yoshida
发明人： Hironori Goto , Masaaki Yoshida
IPC分类号： G06F3/048 , A61F4/00 , G06F3/00 , G06F3/01 , A61B3/14
CPC分类号： G06F3/013 , A61F4/00
摘要： A visual axis input and decision transfer device operates so that when a detection-result condition, such as a visual-axis-detection success or failure, blinking, selecting of the same choice, or the like is judged based on visual-point-position data, and a user is notified of detection-result information indicating the detection-result condition in response to a judgment result by changing a selection frame color of characters, the user can confirm the detection result of the visual axis, and is prevented from repeating wasteful operations many times.
摘要翻译：视轴输入和判定传送装置的操作使得当诸如视觉轴检测成功或失败的检测结果条件闪烁，基于视点位置判断相同选择等的选择时数据，并且通过改变字符的选择帧颜色来响应于判断结果向用户通知指示检测结果条件的检测结果信息，用户可以确认视轴的检测结果，并且防止重复多次浪费行动。

17. 发明授权

US6005596A Method for recording color image, apparatus for recording color image, and method for controlling recording of color image 失效
标题翻译：用于记录彩色图像的方法，用于记录彩色图像的装置，以及用于控制彩色图像记录的方法
公开(公告)号：US6005596A
公开(公告)日：1999-12-21
申请号：US926893
申请日：1997-09-10
申请人： Masaaki Yoshida , Tomoaki Kasugaya , Shoji Naramoto , Masafumi Kobayashi , Norio Takahashi
发明人： Masaaki Yoshida , Tomoaki Kasugaya , Shoji Naramoto , Masafumi Kobayashi , Norio Takahashi
IPC分类号： B41J2/525 , B41J2/325 , B41J2/355 , B41J2/36 , H04N1/23 , H04N1/405 , H04N1/52 , H04N1/60 , H04N1/40
CPC分类号： H04N1/4056 , H04N1/52
摘要： To suppress color moire in a color image recording apparatus, a method for recording a color image by forming record dots of at least first through third colors on a recording medium in a plurality of lines of record dots each extending in a main scan direction and a plurality of rows of record dots each extending in a sub-scan direction, includes the step of forming the record dots of first through third colors with a different disposition pattern effective to avoid the occurrence of color moire. In a preferred embodiment, the disposition pattern of the record dots of one of the three colors comprises an ordinary zigzag printing pattern in which selected ones of the record dots in each line of record dots are shifted in the sub-scan direction by a uniform amount, the disposition pattern of the record dots of another one of the three colors comprises a modified ordinary zigzag pattern in which a dot pitch between lines of record dots in the sub-scan direction is a non-integer multiple of the dot pitch of the ordinary zigzag printing pattern, and the disposition pattern of the remaining one of the three colors comprises a modified ordinary zigzag pattern in which corresponding record dots in adjacent lines of record dots are closer to each other than are the record dots in adjacent rows.
摘要翻译：为了抑制彩色图像记录装置中的彩色莫尔条纹，通过在主扫描方向上延伸的多行记录点的记录介质上形成至少第一至第三颜色的记录点来记录彩色图像的方法，以及多个沿副扫描方向延伸的记录点列包括以不同的配置图案形成第一至第三颜色的记录点的步骤，以有效避免色莫尔的出现。在一个优选实施例中，三种颜色之一的记录点的配置图案包括常规的之字形打印模式，其中每行记录点中的所选记录点在副扫描方向上以均匀的量移位三种颜色中的另一种的记录点的配置图案包括修正的普通之字形图案，其中副扫描方向上的记录点线之间的点间距是普通的点间距的非整数倍锯齿形印刷图案，并且三种颜色中的剩余颜色的配置图案包括修改的普通之字形图案，其中记录点的相邻行中的相应记录点比相邻行中的记录点更接近。

18. 发明授权

US5410173A Semiconductor integrated circuit device 失效
标题翻译：半导体集成电路器件
公开(公告)号：US5410173A
公开(公告)日：1995-04-25
申请号：US20793
申请日：1993-02-22
申请人： Ken'ichi Kikushima , Masaaki Yoshida , Shinobu Yabuki
发明人： Ken'ichi Kikushima , Masaaki Yoshida , Shinobu Yabuki
IPC分类号： H01L23/485 , H01L23/528 , H01L23/532 , H01L27/02 , H01L29/78 , H01L33/00
CPC分类号： H01L23/53257 , H01L23/485 , H01L23/5286 , H01L24/06 , H01L27/0207 , H01L2224/05554 , H01L2924/10253 , H01L2924/12036 , H01L2924/1305 , H01L2924/1306 , H01L2924/13091 , H01L2924/14
摘要： In a semiconductor integrated circuit device having cells comprising circuit elements including MISFETs, and a multi-layer wiring structure, wirings of a first layer connected to semiconductor regions of the MISFETs (source and drain regions) are formed almost in the entire area over the regions to shunt the regions. Power supply wiring are formed of second layer wirings. First layer wirings and the semiconductor regions are connected through a plurality of contact holes. The power supply wirings are formed to cover at least part of the semiconductor regions. In accordance with another aspect, macro-cells are formed by basic cells, including a plurality of MISFETs with the direction of gate length aligned in a first direction, regularly arranged in the first direction and in a second intersecting direction. The MISFETs in each basic cell are interconnected by a first-layer signal wiring, basic cells adjacently arranged in the second direction are interconnected by a first-layer signal wiring extending in the second direction, and basic cells adjacently arranged in the first direction are interconnected by a second-layer signal wiring extending in the first direction. The MISFETs in basic cells adjacently arranged in the first direction receive power from a second-layer power wiring located in the same layer of the second-layer signal wiring and extended in the same first direction. A fourth-layer power supply wiring and a fourth-layer signal wiring, both extending in the first direction, are also provided.
摘要翻译：在具有包括MISFET和多层布线结构的电路元件的单元的半导体集成电路器件中，连接到MISFET（源极和漏极区域）的半导体区域的第一层的布线几乎在该区域的整个区域中形成分流区域。电源布线由第二层布线形成。第一层布线和半导体区域通过多个接触孔连接。形成电源布线以覆盖半导体区域的至少一部分。根据另一方面，宏单元由基本单元形成，包括多个MISFET，其栅极长度方向在第一方向上对齐，在第一方向和第二相交方向上规则地排列。每个基本单元中的MISFET通过第一层信号布线互连，在第二方向上相邻布置的基本单元通过沿第二方向延伸的第一层信号布线互连，并且在第一方向上相邻布置的基本单元互连通过沿第一方向延伸的第二层信号线。在第一方向上相邻布置的基本单元中的MISFET从位于第二层信号布线的同一层的第二层电力布线接收电力并沿相同的第一方向延伸。还提供了沿第一方向延伸的第四层电源布线和第四层信号布线。

19. 发明授权

US5041847A Thermal head 失效
标题翻译：热头
公开(公告)号：US5041847A
公开(公告)日：1991-08-20
申请号：US570397
申请日：1990-08-21
申请人： Shoji Matsumoto , Daisuke Kosaka , Masaaki Yoshida , Hidehito Kitakado , Kenji Fujita
发明人： Shoji Matsumoto , Daisuke Kosaka , Masaaki Yoshida , Hidehito Kitakado , Kenji Fujita
IPC分类号： B41J2/335
CPC分类号： B41J2/3353 , B41J2/33535 , B41J2/3355 , B41J2/3357
摘要： A thermal head comprising a substrate, a heat-resistant dielectric resin layer disposed on the substrate, a resistor layer disposed on the resin layer for forming a plurality of heating elements and an electrode layer disposed on the resistor layer for forming electrodes connecting to the heating elements. A protection film covers an end of the substrate and each end of the layers which is substantially in the same plane as the substrate end.
摘要翻译：一种热敏头，包括基底，设置在基底上的耐热电介质树脂层，设置在用于形成多个加热元件的树脂层上的电阻层和设置在电阻层上的电极层，用于形成连接到加热的电极元素。保护膜覆盖基板的端部，并且层的每个端部基本上在与基板端部相同的平面中。

20. 发明授权

US4465353A Electronic flash device 失效
标题翻译：电子闪光装置
公开(公告)号：US4465353A
公开(公告)日：1984-08-14
申请号：US448744
申请日：1982-12-10
申请人： Masaaki Yoshida , Hiroyuki Kataoka
发明人： Masaaki Yoshida , Hiroyuki Kataoka
IPC分类号： G03B7/16 , G03B15/05
CPC分类号： G03B15/05 , G03B7/16 , G03B2215/0528 , G03B2215/0553
摘要： An electronic flash device including a main light part, a pre-emission light part, an illumination direction changing mechanism for changing the illumination directions of the main light part and the pre-emission light at the same time in the case of bounced light photography, and a control mechanism for deciding the aperture value of the photographing lens in accordance with the light measuring level of the reflected pre-emission light and controlling the main light part with the light adjusting level corresponding to the aperture value.
摘要翻译：一种电子闪光装置，其包括主光部分，预发光部分，用于在反射光摄影的情况下同时改变主光部分的照明方向和预发光的照明方向改变机构，以及控制机构，用于根据反射的预发射光的光测量水平来决定拍摄镜头的光圈值，并且以与光圈值对应的调光电平来控制主光部分。

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