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11. 发明申请

WO2007115597A1 MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, TOOL AND METHOD OF PRODUCTION 审中-公开
标题翻译：微电子投影光学系统，工具和生产方法
公开(公告)号：WO2007115597A1
公开(公告)日：2007-10-18
申请号：PCT/EP2007/000068
申请日：2007-01-05
申请人： CARL ZEISS SMT AG , MANN, Hans-Juergen , ULRICH, Wilhelm
发明人： MANN, Hans-Juergen , ULRICH, Wilhelm
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G02B17/08 , G03F1/62 , G03F7/70058 , G03F7/70233
摘要： A microlithography projection optical system (1100) comprises a plurality of optical elements (1110, 1120, 1130, 1140, 1150, 1160) arranged to image radiation having a wavelength λ from an object field in an object plane (103) to an image field in an image plane (102). The plurality of optical elements (1110, 1120, 1130, 1140, 1150, 1160). has an entrance pupil located more than 2,8 m from the object plane. A path of radiation through the optical system is characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This in particular allows the use of phase shifting masks as objects to be imaged, in particular for EUV wavelengths.
摘要翻译：微光刻投影光学系统（1100）包括多个光学元件（1110,1120,1130,1140,1150,1160），其被布置成对波长λ 从对象平面（103）中的对象字段到图像平面（102）中的图像场。多个光学元件（1110,1120,1130,1140,1150,1160）。有一个距离物体超过2.8米的入口瞳孔。通过光学系统的辐射路径的特征在于主光线相对于物平面的法线具有3°或更大的角度。这特别允许使用相移掩模作为要成像的对象，特别是对于EUV波长。

12. 发明申请

WO2006094729A3 MICROLITHOGRAPHY PROJECTION SYSTEM WITH AN ACCESSIBLE DIAPHRAGM OR APERTURE STOP 审中-公开
标题翻译：具有可接触的膜片或光刻胶的微型投影系统
公开(公告)号：WO2006094729A3
公开(公告)日：2006-12-28
申请号：PCT/EP2006002005
申请日：2006-03-04
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN
发明人： MANN HANS-JUERGEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G02B17/0647 , G03F7/70233 , G03F7/7025 , G03F7/70258 , G03F7/70275 , G03F7/708
摘要： The invention relates to a microlithography projection lens for wavelengths
摘要翻译：本发明涉及用于波长<= 248nm，优选<= 193mm的微光刻投影透镜，特别是用于将物平面（100）中的物体场成像到图像上的范围为1至30nm的EUV光刻在平面（102）中，微光刻投影透镜以为可进入光阑平面（2000）提供的方式展开，其中可以引入例如虹膜光阑。

13. 发明申请

WO2006111319A3 PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCTURED STRUCTURAL MEMBER BY THE AID OF SUCH A PROJECTION EXPOSURE SYSTEM AND POLARIZATION-OPTICAL ELEMENT ADAPTED FOR USE IN SUCH A SYSTEM 审中-公开
公开(公告)号：WO2006111319A3
公开(公告)日：2006-10-26
申请号：PCT/EP2006/003401
申请日：2006-04-12
申请人： CARL ZEISS SMT AG , MANN, Hans-Juergen , SINGER, Wolfgang , GRUNER, Toralf , DITTMANN, Olaf , TOTZECK, Michael
发明人： MANN, Hans-Juergen , SINGER, Wolfgang , GRUNER, Toralf , DITTMANN, Olaf , TOTZECK, Michael
IPC分类号： G03F7/20
摘要： The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source (18) for producing light in the EUV region. The projection exposure system further comprises a first optical system (19, 20, 21, 22, 23, 24) for illuminating a mask (25) by the light of the light source (18) and a second optical system (26, 27, 28, 29, 30, 31) for imaging the mask (25) on a component (32). At least one polarization-optical element (1) is disposed on the beam path between the light source (18) and the component (32).

14. 发明申请

WO2005069055A3 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2005069055A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005000262
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
发明人： SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面（201）中的图案成像到投影物镜的像平面（202）上的反射折射投射物镜（200）包括：第一物镜部分（210），用于对设置在投影物镜物平面成为第一中间图像; 第二目标部分（220），用于将第一中间成像成像成第二中间图像; 用于将所述第二中间成像直接成像到所述图像平面上的第三目标部分（230）其中具有第一连续镜面的第一凹面镜（221）和具有第二连续镜面的至少一个第二凹面镜（222）布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

15. 发明申请

WO2008043433A8 COMPACT 3-MIRROR OBJECTIVE 审中-公开
标题翻译： COMPACT 3面镜
公开(公告)号：WO2008043433A8
公开(公告)日：2009-11-05
申请号：PCT/EP2007008315
申请日：2007-09-25
申请人： ZEISS CARL SMT AG , SOHMEN ERIK , MANN HANS-JUERGEN
发明人： SOHMEN ERIK , MANN HANS-JUERGEN
IPC分类号： G02B17/06 , G02B21/04
CPC分类号： G02B17/0652 , G02B21/04 , G03F7/70233
摘要： The invention relates to a catoptric objective for wavelengths below 193 nm for imaging an object in an object plane into an image in an image plane, wherein the objective comprises at least four reflecting mirrored surfaces (Ml, M2, M3, M4) which are constructed on at least three mirrors (Sl, S2, S3), wherein two mirrors (S2, S3) have an opening for the passage of a bundle of rays which passes through the objective from the object plane to the image plane, and one mirror has no opening for the passage of a bundle of rays.
摘要翻译：本发明涉及一种用于193nm以下的波长用于在图像平面中，其中，所述透镜包括至少四个反射镜表面（ML，M2，M3，M4），所述（至少三个反射镜S1成像在物平面中的对象到的图像的反射物镜，S2，S3）中形成，其中两个反射镜（S2，S3）具有用于穿过从物平面到像平面的物镜的光束束通过的开口，和一个反射镜具有用于光束束的通路没有开口。

16. 发明申请

WO2009053023A3 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开
标题翻译：包括这种类型的成像光学系统的用于微刻的成像光学系统和投影曝光设备
公开(公告)号：WO2009053023A3
公开(公告)日：2009-07-09
申请号：PCT/EP2008008886
申请日：2008-10-21
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN
发明人： MANN HANS-JUERGEN
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An imaging optical system (7) with a plurality of mirrors (M1 to M10) images an object field (4) in an object plane (5) into an image field (8) in an image plane (9). In the light path between non-obscured mirrors (M1 to M8), imaging rays (15) pass through at least one multiple pass-through region between spaced-apart planes which are arranged parallel to the object plane (5) and/or parallel to the image plane (9). The imaging optical system has at least one pupil plane (76, 77, 78, 17). Said pupil plane (76, 77, 78, 17) is arranged outside the multiple pass-through region between the non- obscured mirrors (M1 to M6). This results in an imaging optical system which provides for an easier correction of image errors. Other types of imaging optical systems with a correspondingly easier correction of image errors are presented as well.
摘要翻译：具有多个反射镜（M1到M10）的成像光学系统（7）将物平面（5）中的物场（4）成像到成像平面（9）中的像场（8）中。在非遮挡反射镜（M1至M8）之间的光路中，成像光线（15）穿过平行于物平面（5）布置的间隔平面和/或平行于物平面到图像平面（9）。成像光学系统具有至少一个光瞳平面（76,77,78,17）。所述光瞳平面（76,77,78,17）布置在非遮挡反射镜（M1至M6）之间的多个通过区域之外。这导致成像光学系统更容易校正图像错误。其他类型的成像光学系统也具有相应更容易校正图像误差。

17. 发明申请

WO02056114A3 PROJECTION SYSTEM FOR EUV LITHOGRAPHY 审中-公开
标题翻译：投影系统用于EUV地图
公开(公告)号：WO02056114A3
公开(公告)日：2003-12-11
申请号：PCT/EP0200030
申请日：2002-01-04
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN , HUDYMA RUSSELL
发明人： MANN HANS-JUERGEN , HUDYMA RUSSELL
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： G02B17/0657 , G03F7/70233 , G03F7/70275 , G03F7/70308
摘要： An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the mirror (3), a fourth mirror (M4), a fith mirror (M5) and a sith mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
摘要翻译： EUV光学投影系统包括用于将对象（OB）成像到图像（IM）的至少六个反射镜（M1，M2，M3，M4，M5，M6）。优选地，至少一个镜对配置为至少相位补偿镜对。该系统优选地被配置为沿着从物体（OB）到第二反射镜（M2）和第三反射镜（M3）之间的图像（IM）的光路形成中间图像（IMI），使得第一反射镜 M1），第二反射镜（M2）形成第一光学组（G1），反射镜（3），第四反射镜（M4），第二反射镜（M5）和第二反射镜（M6）形成第二光学组 G1）。该系统还优选地包括孔径光阑（APE，沿着从物体（OB）到第一反射镜（M1）和第二反射镜（M2）之间的图像（IM）的光路）定位，第二反射镜（M2）并且第三反射镜（M3）优选是凹形的，该系统优选地形成数值孔径大于0.18的图像（IM）。

18. 发明申请

WO2012059537A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC EXPOSURE APPARATUS 审中-公开
标题翻译：微观曝光装置的投影目标
公开(公告)号：WO2012059537A1
公开(公告)日：2012-05-10
申请号：PCT/EP2011/069308
申请日：2011-11-03
申请人： CARL ZEISS SMT GMBH , ENKISCH, Hartmut , MUELLENDER, Stephan , MANN, Hans-Juergen , FREIMANN, Rolf
发明人： ENKISCH, Hartmut , MUELLENDER, Stephan , MANN, Hans-Juergen , FREIMANN, Rolf
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G02B7/198 , G03F7/70233 , G03F7/70308
摘要： The invention concerns a projection objective of a microlithographic projection exposure apparatus designed for EUV, for imaging an object plane illuminated in operation of the projection exposure apparatus into an image plane, wherein the projection objective has at least one mirror segment arrangement (160, 260, 280, 310, 410, 500) comprising a plurality of separate mirror segments (161 -163; 261-266, 281 -284; 31 1, 312; 41 1, 412; 510-540); and wherein associated with the mirror segments of the same mirror segment arrangement are partial beam paths which are different from each other and which respectively provide for imaging of the object plane (OP) into the image plane (IP), wherein said partial beam paths are superposed in the image plane (IP) and wherein at least two partial beams which are superposed in the same point in the image plane (IP) were reflected by different mirror segments of the same mirror segment arrangement.
摘要翻译：本发明涉及一种用于EUV设计的微光刻投影曝光装置的投影目标，用于将在投影曝光装置的操作中照亮的物体成像成像面，其中投影物镜具有至少一个镜片段布置（160,260，包括多个分离的镜片段（161-163; 261-266,281-284; 31 1，312; 41 1，412; 510-540）; 并且其中与相同镜片段布置的镜片段相关联的部分光束路径彼此不同并且分别提供用于将物平面（OP）成像到图像平面（IP）中的部分光束路径，其中所述部分光束路径为叠加在图像平面（IP）中，并且其中叠加在图像平面（IP）中的相同点上的至少两个部分光束被相同镜像段布置的不同镜像段反射。

19. 发明申请

WO2009036975A1 PROJECTION OBJECTIVE WITH OBSCURATED PUPIL FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标用于微观计算的PIPIL
公开(公告)号：WO2009036975A1
公开(公告)日：2009-03-26
申请号：PCT/EP2008/007807
申请日：2008-09-18
申请人： CARL ZEISS SMT AG , KRAEHMER, Daniel , DODOC, Aurelian , MANN, Hans-Juergen , GRUNER, Toralf
发明人： KRAEHMER, Daniel , DODOC, Aurelian , MANN, Hans-Juergen , GRUNER, Toralf
IPC分类号： G03F7/20 , G02B5/00 , G02B17/06
CPC分类号： G02B5/003 , G02B5/005 , G02B17/0657 , G02B27/0018 , G03F7/70233
摘要： A projection objective (10) with obscurated pupil for microlithography has a first optical surface (S4), which has a first region provided for application of useful light, and at least one second optical surface (S5), which has a second region provided for application of useful light, a beam envelope (SH) of the useful light extending between the first region and the second region. At least one tube (12) open on the input side and on the output side in the light propagation direction and serving for screening scattered light is arranged between the first optical surface (S4) and the second optical surface (S5), the wall of said tube being opaque in the wavelength range of the useful light, and said tube extending in the propagation direction of the useful light over at least a partial length of the beam envelope (SH) and circumferentially surrounding the beam envelope (SH).
摘要翻译：具有用于微光刻的遮蔽光瞳的投影物镜（10）具有第一光学表面（S4），其具有用于施加有用光的第一区域和至少一个第二光学表面（S5），该第二光学表面具有第二区域施加有用的光，在第一区域和第二区域之间延伸的有用光的束包络（SH）。在第一光学表面（S4）和第二光学表面（S5）之间布置有至少一个在光传播方向上的输入侧和输出侧上开放并用于屏蔽散射光的管（12），所述管在有用光的波长范围内是不透明的，并且所述管在有效光的传播方向上延伸到束包络（SH）的至少部分长度上并且周向地围绕束包络（SH）。

20. 发明申请

WO2006111319A2 PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCTURED STRUCTURAL MEMBER BY THE AID OF SUCH A PROJECTION EXPOSURE SYSTEM AND POLARIZATION-OPTICAL ELEMENT ADAPTED FOR USE IN SUCH A SYSTEM 审中-公开
标题翻译：投影曝光系统，通过这种投影曝光系统的辅助制造微结构结构构件的方法和适用于这种系统的偏光光学元件
公开(公告)号：WO2006111319A2
公开(公告)日：2006-10-26
申请号：PCT/EP2006003401
申请日：2006-04-12
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN , SINGER WOLFGANG , GRUNER TORALF , DITTMANN OLAF , TOTZECK MICHAEL
发明人： MANN HANS-JUERGEN , SINGER WOLFGANG , GRUNER TORALF , DITTMANN OLAF , TOTZECK MICHAEL
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70058
摘要： The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source (18) for producing light in the EUV region. The projection exposure system further comprises a first optical system (19, 20, 21, 22, 23, 24) for illuminating a mask (25) by the light of the light source (18) and a second optical system (26, 27, 28, 29, 30, 31) for imaging the mask (25) on a component (32). At least one polarization-optical element (1) is disposed on the beam path between the light source (18) and the component (32).
摘要翻译：本发明涉及一种投影曝光系统，特别涉及微光刻技术。根据本发明的投影曝光系统包括用于在EUV区域中产生光的光源（18）。投影曝光系统还包括用于通过光源（18）的光照射掩模（25）的第一光学系统（19,20,21,22,23,24）和第二光学系统（26,27,24） 28,29,30,31），用于将所述掩模（25）成像在部件（32）上。至少一个偏振光学元件（1）设置在光源（18）和部件（32）之间的光束路径上。

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