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11. 发明申请

WO2005069055A2 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2005069055A2
公开(公告)日：2005-07-28
申请号：PCT/EP2005/000262
申请日：2005-01-13
申请人： CARL ZEISS SMT AG , SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander
发明人： SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander
IPC分类号： G02B17/00
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

12. 发明申请

WO2004010164A3 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
公开(公告)号：WO2004010164A3
公开(公告)日：2004-01-29
申请号：PCT/EP2003/007758
申请日：2003-07-17
申请人： CARL ZEISS SMT AG , EPPLE, Alexander , DODOC, Aurelian
发明人： EPPLE, Alexander , DODOC, Aurelian
IPC分类号： G02B17/08
摘要： A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective whilst generating a real intermediate image has a catadioptric objective part having at least one concave mirror and a beam deflecting device and also a dioptric objective part. The imaging system has a system diaphragm having a variable diaphragm diameter for variably limiting the cross section of the radiation passing through the projection objective. This system diaphragm is arranged in the catadioptric objective part, preferably in direct proximity to the concave mirror. The invention enables a projection objective with a simple construction.

13. 发明申请

WO2004010164A2 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2004010164A2
公开(公告)日：2004-01-29
申请号：PCT/EP0307758
申请日：2003-07-17
申请人： ZEISS CARL SMT AG , EPPLE ALEXANDER , DODOC AURELIAN
发明人： EPPLE ALEXANDER , DODOC AURELIAN
IPC分类号： G02B5/00 , G02B17/00 , G02B17/08 , G03F7/20 , H01L21/027 , G02B
CPC分类号： G02B17/0892 , G02B5/005 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/7025 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective whilst generating a real intermediate image has a catadioptric objective part having at least one concave mirror and a beam deflecting device and also a dioptric objective part. The imaging system has a system diaphragm having a variable diaphragm diameter for variably limiting the cross section of the radiation passing through the projection objective. This system diaphragm is arranged in the catadioptric objective part, preferably in direct proximity to the concave mirror. The invention enables a projection objective with a simple construction.
摘要翻译：将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中同时产生真正的中间图像的反射折射投影物镜具有反射折射物镜部分，其具有至少一个凹面镜和光束偏转装置，并且还具有屈光客观部分。成像系统具有可变光阑直径的系统隔膜，用于可变地限制通过投影物镜的辐射的横截面。该系统隔膜布置在反折射物镜部分中，优选地直接靠近凹面镜。本发明能够实现具有简单结构的投影物镜。

14. 发明申请

WO2003027747A1 CATADIOPTRIC REDUCTION LENS 审中-公开
标题翻译：阴道减光镜
公开(公告)号：WO2003027747A1
公开(公告)日：2003-04-03
申请号：PCT/EP2002/010281
申请日：2002-09-13
申请人： CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG , ULRICH, Wilhelm , SHAFER, David, R. , EPPLE, Alexander , BEIERL, Helmut , DODOC, Aurelian
发明人： ULRICH, Wilhelm , SHAFER, David, R. , EPPLE, Alexander , BEIERL, Helmut , DODOC, Aurelian
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.
摘要翻译：一种反折射投射透镜，用于将布置在物平面中的图案成像到图像平面上，优选地在创建实际中间图像的同时，包括具有凹面镜的反折射第一透镜部分和具有分束表面的物理分束器，以及第二透镜部分优选地折射并且在分束器之间，在其物平面和图像平面之间。物体平面的光学近场被布置在距离投影透镜的第一光学表面的工作距离处。分束器位于低边缘射线高度附近，这允许配置对纵向色差完全校正的投影透镜，同时使用少量材料，特别是制造其分光器所需的材料。

15. 发明申请

WO2012013241A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开
标题翻译：成像光学系统和投影曝光安装与这种类型的成像光学系统的微型计算
公开(公告)号：WO2012013241A1
公开(公告)日：2012-02-02
申请号：PCT/EP2010/061089
申请日：2010-07-30
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Jürgen , EPPLE, Alexander
发明人： MANN, Hans-Jürgen , EPPLE, Alexander
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/70191 , G02B17/0663 , G03F7/70233
摘要： An imaging optical system (7) has a plurality of mirrors (M1 to M8), which image an object field (4) in an object plane (5) in an image field (8) in an image plane (9). The imaging optical system (7) has a pupil obscuration. The last mirror (M8) in the beam path of the imaging light (3) between the object field (4) and the image field (8) has a through-opening (18) for the passage of the imaging light (3). A penultimate mirror (M7) of the imaging optical system (7) in the beam path of the imaging light (3) between the object field (4) and the image field (8) has no through-opening for the passage of the imaging light (3). The imaging optical system (7) has precisely eight mirrors (M1 to M8). The result is an imaging optical system with which a handleable combination of small imaging errors, manageable production and a good throughput for the imaging light are achieved.
摘要翻译：成像光学系统（7）具有多个反射镜（M1至M8），其对图像平面（9）中的图像场（8）中的物体平面（5）中的物体场（4）进行成像。成像光学系统（7）具有光瞳遮蔽。在物场（4）和图像场（8）之间的成像光（3）的光束路径中的最后一个镜（M8）具有用于成像光（3）通过的通孔（18）。在物场（4）和图像场（8）之间的成像光（3）的光束路径中的成像光学系统（7）的倒数第二反射镜（M7）没有用于成像通过的通孔光（3）。成像光学系统（7）具有精确的八个反射镜（M1至M8）。结果是成像光学系统，其具有小成像误差，可管理生产和成像光的良好吞吐量的可处理组合。

16. 发明申请

WO2006037444A2 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微型投影曝光装置
公开(公告)号：WO2006037444A2
公开(公告)日：2006-04-13
申请号：PCT/EP2005/009966
申请日：2005-09-16
申请人： CARL-ZEISS SMT AG , FELDMANN, Heiko , EPPLE, Alexander , BLAHNIK, Vladan
发明人： FELDMANN, Heiko , EPPLE, Alexander , BLAHNIK, Vladan
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70341
摘要： A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element (TE; TE2; TE3) that has no refractive power and is designed for dry operation of the projection objective (20; 220; 320). According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element (TE’; TE2’; TE3’) that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element (TE’; TE2’; TE3’) is replaceable with the dry terminating element (TE; TE2; TE3). Preferably, the dry terminating element (TE; TE2; TE3) and/or the immersion terminating element (TE’; TE2’; TE3’) is composed of a plurality of plates (TP1, TP2; TP31’, TP32’), which are made of materials having different refractive indices.
摘要翻译：微光刻投影曝光设备包含投影物镜，其图像侧的最后一个光学元件是没有折射光焦度的干式终端元件（TE; TE2; TE3），并被设计用于投影物镜（20; 220; 320）。根据本发明，投影曝光设备还包含不具有屈光力且设计用于投影物镜的浸入式操作的浸没式终端元件（TE'; TE2'; TE3'）。浸入式终端元件（TE'; TE2'; TE3'）可以用干式终端元件（TE; TE2; TE3）代替。优选地，干终端元件（TE; TE2; TE3）和/或浸没终端元件（TE'; TE2'; TE3'）由多个板（TP1，TP2; TP31'，TP32'）组成，由具有不同折射率的材料制成。

17. 发明申请

WO2005069055A3 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2005069055A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005000262
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
发明人： SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面（201）中的图案成像到投影物镜的像平面（202）上的反射折射投射物镜（200）包括：第一物镜部分（210），用于对设置在投影物镜物平面成为第一中间图像; 第二目标部分（220），用于将第一中间成像成像成第二中间图像; 用于将所述第二中间成像直接成像到所述图像平面上的第三目标部分（230）其中具有第一连续镜面的第一凹面镜（221）和具有第二连续镜面的至少一个第二凹面镜（222）布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

18. 发明申请

WO2006005547A1 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2006005547A1
公开(公告)日：2006-01-19
申请号：PCT/EP2005/007431
申请日：2005-07-08
申请人： CARL ZEISS SMT AG , SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
发明人： SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
IPC分类号： G03F7/00 , G02B17/00 , G02B17/08
CPC分类号： G02B17/0892 , G02B17/0828 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D max , a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1 = D max / (Y' • NA 2 ) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径D

19. 发明申请

WO2005098505A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH MIRROR GROUP 审中-公开
标题翻译：目标与镜子集团的目标投影
公开(公告)号：WO2005098505A1
公开(公告)日：2005-10-20
申请号：PCT/EP2005/003645
申请日：2005-04-07
申请人： CARL ZEISS SMT AG , EPPLE, Alexander , ULRICH, Wilhelm , DODOC, Aurelian
发明人： EPPLE, Alexander , ULRICH, Wilhelm , DODOC, Aurelian
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. The mirror group entry is positioned in a region where radiation exiting the front lens group has an entry chief ray height. A second reflecting area is positioned in a region where radiation impinging on the second mirror has a second chief ray height deviating from the entry chief ray height in a first direction; and a fourth reflecting area is positioned in a region where radiation impinging on the fourth mirror has a fourth chief ray height deviating from the entry chief ray height in a second direction opposite to the first direction.
摘要翻译：用于将布置在投影物镜的物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场的反射折射投影物镜具有前透镜组，包括四个反射镜的镜组和具有物体侧反射镜组入口，图像侧反射镜组出口和反射镜组平面，其横向于光轴对准并且几何地布置在反射镜组入口和反射镜组出口之间; 和后透镜组。反射镜组的镜子被布置成使得至少一个中间图像位于反射镜组入口和反射镜组出口之间的反射镜组内，并且来自镜组入口的辐射至少穿过镜组平面四次，在镜组出口处离开镜组之前，在镜组的凹面镜面上反射至少两次。反射镜组入口位于离开前透镜组的辐射具有入射主光线高度的区域中。第二反射区域位于辐射入射在第二反射镜上的第一主光线高度偏离第一方向上的入射光线高度的区域中; 并且第四反射区域位于与第一反射镜相反的第二方向上具有偏离入射光线高度的第四主光线高度的入射在第四反射镜上的辐射区域。

20. 发明申请

WO2005098504A1 IMAGING SYSTEM WITH MIRROR GROUP 审中-公开
标题翻译：成像系统与镜像组
公开(公告)号：WO2005098504A1
公开(公告)日：2005-10-20
申请号：PCT/EP2005/003032
申请日：2005-03-22
申请人： CARL ZEISS SMT AG , SHAFER, David , DODOC, Aurelian , EPPLE, Alexander , MANN, Hans-Jürgen
发明人： SHAFER, David , DODOC, Aurelian , EPPLE, Alexander , MANN, Hans-Jürgen
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： An imaging system for imaging an off-axis object field arranged in an object surface of the imaging system onto an off-axis image field arranged in an image surface of the imaging system while creating at least one intermediate image has: an optical axis; an in-line mirror group having an object side mirror group entry, an image side mirror group exit and a mirror group plane aligned transversly to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit, the mirror group including: a first mirror having a first mirror surface for receiving radiation coming from the object surface in a first reflecting area asymmetric to the optical axis; at least one second mirror having a second mirror surface facing the first mirror surface for receiving radiation coming from the first mirror in a second reflecting area asymmetric to the optical axis; at least one of the first and second mirrors being a concave mirror having a concave mirror surface defining a mirror axis on the optical axis; wherein the mirrors of the mirror group are arranged such that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. A strong overcorrection of image field curvature can be effected in an axially compact design.
摘要翻译：用于将布置在成像系统的物体表面中的离轴对象场成像到设置在成像系统的图像表面中的离轴图像场同时创建至少一个中间图像的成像系统具有：光轴; 具有对象侧反射镜组入口的直列式反射镜组，横向对准轴对准的像侧反射镜组出射口和反射镜组平面，并且几何地布置在反射镜组入口与反射镜组出口之间，镜组包括：第一反射镜，具有第一反射镜表面，用于在与光轴不对称的第一反射区域中接收来自物体表面的辐射; 至少一个第二反射镜，具有面向第一镜面的第二镜面，用于在不对称于光轴的第二反射区域中接收来自第一反射镜的辐射; 所述第一和第二反射镜中的至少一个是凹面镜，所述凹面镜具有在光轴上限定反射镜轴的凹面镜面; 其中反射镜组的反射镜被布置成使得来自反射镜组入口的辐射通过镜组平面至少四次，并且在离开镜组之前在镜组的凹面镜表面上反射至少两次镜组退出。可以在轴向紧凑的设计中实现图像场曲率的强过度校正。

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