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    • 11. 发明授权
    • Device for deflecting light beams
    • 用于偏转光束的装置
    • US08503054B2
    • 2013-08-06
    • US12701717
    • 2010-02-08
    • Christoph Friese
    • Christoph Friese
    • G02B26/08
    • G02B26/103H04N9/3129
    • A device for deflecting light beams is provided, which includes a swing-mounted light exit segment of an optical waveguide and a swing-mounted mirror. The device features a first rotation device that is set up to rotate the light exit segment of the optical waveguide, from which light is able to strike the mirror, in a rotational plane, and a second rotation device that is set up to rotate the mirror around a rotational axis situated in the mirror plane, which deviates from the vertical to the rotational plane.
    • 提供了用于偏转光束的装置,其包括光波导的摆动安装的光出射部分和摆动反射镜。 该装置具有第一旋转装置,该第一旋转装置设置成旋转光学波导的光出射部分,光可以从该光出射部分在旋转平面内撞击反射镜;以及第二旋转装置,其设置成使反射镜旋转 围绕位于镜面中的旋转轴线,其偏离垂直于旋转平面。
    • 13. 发明授权
    • Method for manufacturing a micromechanical component, and micromechanical component
    • 微机械部件的制造方法以及微机电部件
    • US08687255B2
    • 2014-04-01
    • US13057411
    • 2009-07-06
    • Stefan FinkbeinerTjalf PirkChristoph Friese
    • Stefan FinkbeinerTjalf PirkChristoph Friese
    • G02B26/08
    • B81C1/00166B81B2201/033B81C2201/014
    • A method for manufacturing a micromechanical component is described, including the steps of: forming a first etch stop layer on a base substrate, the first etch stop layer being formed in such a way that it has a first pattern of through-cutouts; forming a first electrode-material layer on the first etch stop layer; forming a second etch stop layer on the first electrode-material layer, the second etch stop layer being formed in such a way that it has a second pattern of through-cutouts differing from the first pattern; forming a second electrode-material layer on the second etch stop layer; forming a patterned mask on the second electrode-material layer; and carrying out a first etching step in a first direction and a second etching step in a second direction counter to the first direction in order to etch at least one first electrode unit out of the first electrode-material layer and to etch at least one second electrode unit out of the second electrode-material layer. Also described are micromechanical components.
    • 描述了一种用于制造微机械部件的方法,包括以下步骤:在基底基板上形成第一蚀刻停止层,第一蚀刻停止层以这样的方式形成:其具有第一图形的通孔; 在所述第一蚀刻停止层上形成第一电极材料层; 在所述第一电极材料层上形成第二蚀刻停止层,所述第二蚀刻停止层以这样的方式形成:其具有不同于所述第一图案的通孔的第二图案; 在所述第二蚀刻停止层上形成第二电极材料层; 在所述第二电极材料层上形成图案化掩模; 并且在与第一方向相反的第二方向上沿第一方向和第二蚀刻步骤进行第一蚀刻步骤,以便从第一电极材料层中蚀刻至少一个第一电极单元并蚀刻至少一个第二 电极单元排出第二电极材料层。 还描述了微机械部件。
    • 14. 发明授权
    • Micromechanical assembly having a displaceable component
    • 具有可移位部件的微机械组件
    • US08384975B2
    • 2013-02-26
    • US12893778
    • 2010-09-29
    • Tjalf PirkStefan PinterJoachim FritzChristoph Friese
    • Tjalf PirkStefan PinterJoachim FritzChristoph Friese
    • G02B26/08
    • G02B26/0841B81B3/0059B81B2201/033B81B2201/042B81B2203/0136B81B2203/053H02N1/008
    • A micromechanical assembly having a mounting, at least one stator electrode comb, which is fixedly placed on the mounting, having at least two stator electrode fingers, whose central longitudinal axes are on a central plane of the stator electrode comb, at least one actuator electrode comb having at least two actuator electrode fingers, and a displaceable component, which is coupled to the at least one actuator electrode comb so that the displaceable component is displaceable in relation to the mounting at least in one first displacement direction using a nonzero operating voltage, which is applied between the at least two stator electrode fingers and the at least two actuator electrode fingers, the first displacement direction having one first nonzero directional component perpendicular to the central plane.
    • 具有固定地放置在所述安装件上的至少一个定子电极梳的安装的至少一个定子电极梳的微机械组件具有至少两个定子电极指,其中心纵向轴线位于所述定子电极梳的中心平面上,至少一个致动器电极 梳具具有至少两个致动器电极指,以及可移位部件,其连接到所述至少一个致动器电极梳,使得所述可移位部件可使用非零工作电压至少在一个第一位移方向上相对于所述安装而移位, 其施加在所述至少两个定子电极指和所述至少两个致动器电极指之间,所述第一位移方向具有垂直于所述中心平面的一个第一非零方向分量。