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101. 发明授权

US06007969A Ultra-fine microfabrication method using an energy beam 失效
公开(公告)号：US06007969A
公开(公告)日：1999-12-28
申请号：US610235
申请日：1996-03-04
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , G03C5/00 , B05D3/00 , B44C1/22
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

102. 发明授权

US5894058A Ultra-fine microfabrication method using a fast atomic energy beam 失效
标题翻译：使用快速原子能光束的超微细微细加工方法
公开(公告)号：US5894058A
公开(公告)日：1999-04-13
申请号：US870830
申请日：1997-06-06
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , G03C5/00
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basic technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. The microfabrication method include radiating a Fast Atomic beam through a patterned photoresist Film to fabricate a pattern of 0.1 to 100 nm in a target object.
摘要翻译：使用能量束的超微细微加工方法是基于使用由纳米或微米尺寸的微粒提供的屏蔽来产生通过基本设计的传统光刻技术不可能的各种三维细微结构以产生二维结构。当能量束和屏蔽的辐射的基本技术与使用磁场，电场或激光束的屏蔽定位技术结合使用或不伴随反应气体粒子束或解决方案提供的附加化学效应时，非常高的精细结构纵横比可以精确地生产。微加工方法包括通过图案化的光致抗蚀剂膜辐射快原子束以在目标物体中制造0.1至100nm的图案。

103. 发明授权

US5868952A Fabrication method with energy beam 失效
标题翻译：能量束的制作方法
公开(公告)号：US5868952A
公开(公告)日：1999-02-09
申请号：US617376
申请日：1996-03-18
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , B44C1/22
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen stage. Because the mask member is an independent component, various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing a multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of the flexibility of fabrication method and material of fabrication, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction means for bearing components. Fine groove dimensions of the order of nm are possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused beam is used, a technique of reduced projection imaging can be utilized to produce a fine-structure of the order of nm.
摘要翻译：产生了数量级小于等于30的数量级的三维超细微结构，用于先进的光通信系统和量子效应器件。基本部件是能量束源，掩模构件和样品台。由于掩模构件是独立的部件，所以可以高精度地制造掩模构件相对于射束轴线和/或工件的相对运动的各种组合，以在工件上产生弯曲或倾斜的表面，从而产生多条线或阵列的凸或微型微透镜。精细结构的其他实例包括以多线图案或阵列图案沉积薄膜。由于制造方法和制造材料的灵活性，具有带槽结构的曲面的迷宫式密封件可用作轴承部件的摩擦减小装置。可以使nm的数量级的细槽尺寸。能量束可以是快速原子束，离子束，电子束，激光束，辐射束，X射线束和自由基粒子束中的任何一种。通常使用平行光束，但是当使用聚焦光束时，可以利用降低投影成像的技术来产生大约数量级的精细结构。

104. 发明授权

US5708267A Processing method using fast atom beam 失效
标题翻译：加工方法采用快原子束
公开(公告)号：US5708267A
公开(公告)日：1998-01-13
申请号：US677166
申请日：1996-07-09
申请人： Masahiro Hatakeyama
发明人： Masahiro Hatakeyama
IPC分类号： B23K15/00 , B23K17/00 , B23K26/00 , B23K28/02 , G21K5/00 , H01J37/305 , H05H3/00
CPC分类号： H01J37/3056 , G21K5/00 , H05H3/00
摘要： A processing method using a fast atom beam wherein a surface of a substrate to be processed is covered with a masking member formed with patterned holes and the masking member is irradiated with the fast atom beam from a fast atom beam generator so that substrate is processed by the fast atom beam applied to the surface of the substrate through the patterned holes of the masking member.
摘要翻译：一种使用快速原子束的处理方法，其中待加工的衬底的表面被形成有图案的孔的掩模构件覆盖，并且掩蔽构件被来自快速原子束发生器的快速原子束照射，使得衬底由快速原子束通过掩蔽构件的图案化孔施加到衬底的表面。

105. 发明授权

US5563416A Processing apparatus using fast atom beam 失效
标题翻译：使用快原子束的加工装置
公开(公告)号：US5563416A
公开(公告)日：1996-10-08
申请号：US267741
申请日：1994-07-05
申请人： Masahiro Hatakeyama
发明人： Masahiro Hatakeyama
IPC分类号： B23K15/00 , B23K15/06 , B23K17/00 , B23K26/12 , B23K28/02 , G21K5/00 , H05H3/00
CPC分类号： H05H3/00 , G21K5/00
摘要： A processing apparatus using a fast atom beam which has at least one source selected from among a light energy source, a laser beam source, a radical source, an electron beam source, an X-ray or radiation (alpha rays, beta rays, or gamma rays) source, and an ion source, in addition to the fast atom beam source, so that an object to be processed which is disposed in a vacuum container or outside a vacuum is irradiated with a fast atom beam in combination with at least one selected from among the light energy, laser beam, electron beam, X-rays or radiation, radical particles and ion beam, to thereby increase processing speed.
摘要翻译：一种使用快原子束的处理装置，其具有选自光能源，激光束源，自由基源，电子束源，X射线或辐射中的至少一种源（α射线，β射线或伽马射线）源和离子源，以及除了快速原子束源之外的离子源，使得设置在真空容器中或真空外的被处理物体与快速原子束一起照射至少一个选自光能，激光束，电子束，X射线或辐射，自由基粒子和离子束，从而提高处理速度。

106. 发明授权

US08368018B2 Method and apparatus for charged particle beam inspection 有权
标题翻译：带电粒子束检查的方法和装置
公开(公告)号：US08368018B2
公开(公告)日：2013-02-05
申请号：US12506475
申请日：2009-07-21
申请人： Masahiro Hatakeyama , Takumi Ota
发明人： Masahiro Hatakeyama , Takumi Ota
IPC分类号： G01N23/00
CPC分类号： H01J37/26 , G03F1/86 , H01J2237/0047 , H01J2237/2817 , H01L21/67213 , H01L22/12
摘要： A charged particle beam inspection apparatus comprises: an electron gun for irradiating an electron beam onto a sample; a detector for detecting a signal obtained from the sample; an image processor for forming an image from the signal obtained from the detector, and an energy controller for controlling the beam energy of the electron beam to be irradiated onto the sample. An identical charged particle beam inspection apparatus carries out a plurality of types of inspections. An inspection apparatus of a projection type may be applied thereto. A pattern defect inspection, a foreign material inspection, and an inspection for a defect in a multilayer are carried out. Beam energies E1, E2, and E3 in those inspections have a relation E1>E2 and E3>E2. Charge removal is performed in a transport chamber or other vacuum chamber before an inspection.
摘要翻译：带电粒子束检查装置包括：用于将电子束照射到样品上的电子枪; 用于检测从样品获得的信号的检测器; 用于根据从检测器获得的信号形成图像的图像处理器，以及用于控制待照射到样品上的电子束的束能量的能量控制器。相同的带电粒子束检查装置执行多种类型的检查。可以对投影型的检查装置施加。进行图案缺陷检查，异物检查和多层的缺陷检查。这些检查中的能量E1，E2和E3具有E1> E2和E3> E2的关系。在检查之前，在运输室或其他真空室中进行除电。

107. 发明授权

US08274047B2 Substrate surface inspection method and inspection apparatus 有权
标题翻译：基板表面检查方法和检查装置
公开(公告)号：US08274047B2
公开(公告)日：2012-09-25
申请号：US12537414
申请日：2009-08-07
申请人： Yoshihiko Naito , Norio Kimura , Kenji Terao , Masahiro Hatakeyama , Masamitsu Itoh
发明人： Yoshihiko Naito , Norio Kimura , Kenji Terao , Masahiro Hatakeyama , Masamitsu Itoh
IPC分类号： G01N23/00
CPC分类号： G01N23/203 , G01N2223/652
摘要： A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.
摘要翻译：基板表面检查方法检查在其表面上包括多种材料的基板上的缺陷。检查方法包括：用电子束照射基板的表面，电子束的着陆能量设定为使得多种材料中的至少两种类型的材料之间的对比度在预定范围内; 检测由所述基板产生的电子以获得所述基板的表面图像，其中从所述至少两种类型的材料形成在其上的图案被消除或削弱; 并且通过将所述对象图像与所述表面图像中的背景图像区分开来的对比度检测作为缺陷来检测来自所获取的表面图像的缺陷。通过使用细胞检查，可以容易且准确地检测出存在于基板表面上的缺陷。

108. 发明授权

US6010831A Ultra-fine microfabrication method using an energy beam 失效
标题翻译：使用能量束的超细微细加工方法
公开(公告)号：US6010831A
公开(公告)日：2000-01-04
申请号：US274341
申请日：1999-03-23
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , G03C5/00 , H01L21/302
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.
摘要翻译：使用能量束的超微细微加工方法是基于使用由纳米或微米尺寸的微粒提供的屏蔽来产生通过基本设计的传统光刻技术不可能的各种三维细微结构以产生二维结构。当能量束和屏蔽的辐射的基础技术与使用磁场，电场或激光束的屏蔽定位技术结合使用或不存在由反应性气体粒子束或解决方案提供的附加化学效应时，具有非常高的精细结构纵横比可以精确地生产。通过该方法制造的具有精细结构的器件的应用包括光通信中的波长偏移，量子效应器件和强激光器件。

109. 发明授权

US5852298A Micro-processing apparatus and method therefor 失效
标题翻译：微处理装置及其方法
公开(公告)号：US5852298A
公开(公告)日：1998-12-22
申请号：US621990
申请日：1996-03-26
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Masaaki Kajiyama , Takashi Tsuzuki , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Masaaki Kajiyama , Takashi Tsuzuki , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/20 , H01J37/30 , H01J37/00
CPC分类号： H01J37/3005 , H01J37/20
摘要： A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while progress of operations is observed in real-time by at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions. This offers spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to enable production of micron-sized parts for use in advanced applications of optical and electronic devices.
摘要翻译：微加工设备对微米/纳米尺寸的物体执行制造和组装任务，同时通过至少一对光学或电子显微镜实时观察操作的进展，从而提供来自至少两个方向的同时视图。这提供了关于微型工作特别关键的工作空间的空间视觉信息。通过使用特别设计用于该设备的微型托盘装置，还提供其他应用的可能性，进一步促进了微加工。微型托盘提供的旋转和平行平移运动与该装置的微加工能力相结合，可用于生产用于光学和电子设备的先进应用的微米级部件。

110. 发明授权

US5770123A Method and apparatus for energy beam machining 失效
标题翻译：能量束加工方法和装置
公开(公告)号：US5770123A
公开(公告)日：1998-06-23
申请号：US531698
申请日：1995-09-21
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Masayuki Nakao , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Masayuki Nakao , Yotaro Hatamura
IPC分类号： H01J37/305 , B29C59/16
CPC分类号： H01J37/3056 , H01J2237/3114
摘要： An energy beam is irradiated to a workpiece through a beam transmission hole defined in a mask. At that time, a relative position between an energy beam source and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which correspond to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths very easily can be made and further the product can be machined to desired depths with high accuracy by a single machining operation in a short time.
摘要翻译：能量束通过限定在掩模中的光束传播孔照射到工件。此时，能量束源与掩模或掩模和工件之间的相对位置改变，使得工件的加工深度根据工件的加工部分而变化，其对应于能量的照射量光束。通过这种方法，可以非常容易地形成具有局部不同深度的加工产品，并且通过在短时间内的单个加工操作，可以高精度地将产品加工成期望的深度。

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