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1. 发明申请

US20100032566A1 SUBSTRATE SURFACE INSPECTION METHOD AND INSPECTION APPARATUS 有权
标题翻译：基板表面检查方法和检查装置
公开(公告)号：US20100032566A1
公开(公告)日：2010-02-11
申请号：US12537414
申请日：2009-08-07
申请人： Yoshihiko Naito , Norio Kimura , Kenji Terao , Masahiro Hatakeyama , Masamitsu Itoh
发明人： Yoshihiko Naito , Norio Kimura , Kenji Terao , Masahiro Hatakeyama , Masamitsu Itoh
IPC分类号： G01N23/00
CPC分类号： G01N23/203 , G01N2223/652
摘要： A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.
摘要翻译：基板表面检查方法检查在其表面上包括多种材料的基板上的缺陷。检查方法包括：用电子束照射基板的表面，电子束的着陆能量设定为使得多种材料中的至少两种类型的材料之间的对比度在预定范围内; 检测由所述基板产生的电子以获得所述基板的表面图像，其中从所述至少两种类型的材料形成在其上的图案被消除或削弱; 并且通过将所述对象图像与所述表面图像中的背景图像区分开来的对比度检测作为缺陷来检测来自所获取的表面图像的缺陷。通过使用细胞检查，可以容易且准确地检测出存在于基板表面上的缺陷。

2. 发明授权

US08274047B2 Substrate surface inspection method and inspection apparatus 有权
标题翻译：基板表面检查方法和检查装置
公开(公告)号：US08274047B2
公开(公告)日：2012-09-25
申请号：US12537414
申请日：2009-08-07
申请人： Yoshihiko Naito , Norio Kimura , Kenji Terao , Masahiro Hatakeyama , Masamitsu Itoh
发明人： Yoshihiko Naito , Norio Kimura , Kenji Terao , Masahiro Hatakeyama , Masamitsu Itoh
IPC分类号： G01N23/00
CPC分类号： G01N23/203 , G01N2223/652
摘要： A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.
摘要翻译：基板表面检查方法检查在其表面上包括多种材料的基板上的缺陷。检查方法包括：用电子束照射基板的表面，电子束的着陆能量设定为使得多种材料中的至少两种类型的材料之间的对比度在预定范围内; 检测由所述基板产生的电子以获得所述基板的表面图像，其中从所述至少两种类型的材料形成在其上的图案被消除或削弱; 并且通过将所述对象图像与所述表面图像中的背景图像区分开来的对比度检测作为缺陷来检测来自所获取的表面图像的缺陷。通过使用细胞检查，可以容易且准确地检测出存在于基板表面上的缺陷。

3. 发明授权

US08624182B2 Electro-optical inspection apparatus and method with dust or particle collection function 有权
标题翻译：电光检测装置及方法，具有灰尘或颗粒收集功能
公开(公告)号：US08624182B2
公开(公告)日：2014-01-07
申请号：US13195927
申请日：2011-08-02
申请人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Tatsuya Kohama , Kenji Terao , Takeshi Murakami , Takehide Hayashi , Kiwamu Tsukamoto , Hiroshi Sobukawa , Norio Kimura
发明人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Tatsuya Kohama , Kenji Terao , Takeshi Murakami , Takehide Hayashi , Kiwamu Tsukamoto , Hiroshi Sobukawa , Norio Kimura
IPC分类号： H01J37/244 , H01J37/285 , H01J37/29
CPC分类号： H01J37/22 , H01J37/265 , H01J37/29 , H01J2237/004 , H01J2237/022 , H01J2237/24495 , H01J2237/24564 , H01J2237/2817
摘要： An electro-optical inspection apparatus prevents adhesion of dust or particles to a sample surface, wherein a stage on which a sample is placed is disposed inside a vacuum chamber that can be evacuated, and a dust collecting electrode is disposed to surround a periphery of the sample. The dust collecting electrode is applied with a voltage having the same polarity as a voltage applied to the sample and an absolute value that is the same or larger than an absolute value of the voltage. Because dust or particles adhere to the dust collecting electrode, adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.
摘要翻译：电光检查装置防止灰尘或颗粒附着到样品表面，其中放置样品的阶段设置在可以抽真空的真空室内，并且集尘电极被设置成围绕样品。集尘电极施加与施加到样品的电压极性相同的电压，绝对值等于或大于电压的绝对值。由于灰尘或颗粒附着在集尘电极上，所以可以减少灰尘或颗粒附着到样品表面。代替使用集尘电极，可以在真空室的壁上形成凹部，或者在壁上设置具有施加了预定电压的网状结构的金属板。

4. 发明授权

US09194826B2 Electron beam apparatus and sample observation method using the same 有权
标题翻译：电子束装置和使用其的样品观察方法
公开(公告)号：US09194826B2
公开(公告)日：2015-11-24
申请号：US12103354
申请日：2008-04-15
申请人： Toru Kaga , Kenji Terao , Masahiro Hatakeyama , Kenji Watanabe , Yoshihiko Naito , Takeshi Murakami , Norio Kimura
发明人： Toru Kaga , Kenji Terao , Masahiro Hatakeyama , Kenji Watanabe , Yoshihiko Naito , Takeshi Murakami , Norio Kimura
IPC分类号： G21K5/04 , G01N23/203 , G01N23/225 , H01J37/28
CPC分类号： G01N23/203 , G01N23/2251 , G01N2223/6116 , H01J37/28 , H01J2237/004 , H01J2237/022 , H01J2237/2446 , H01J2237/2817
摘要： The electron beam apparatus is provided with a stage for mounting a sample thereon, a primary optical system for generating an electron beam having an irradiation area and irradiating the electron beam onto the sample, a secondary optical system for detecting electrons which have been generated through the irradiation of the electron beam onto the sample and have acquired structural information of the sample and acquiring an image of the sample about a viewing area and an irradiation area changing section for changing the position of the irradiation area with respect to the viewing area.
摘要翻译：电子束装置设置有用于在其上安装样品的载物台，用于产生具有照射区域并将电子束照射到样品上的电子束的主光学系统，用于检测通过将电子束照射到样品上并获取样品的结构信息并获取关于观察区域的样品的图像和用于改变照射区域相对于观察区域的位置的照射区域改变部分。

5. 发明授权

US08937283B2 Specimen observation method and device using secondary emission electron and mirror electron detection 有权
标题翻译：使用二次发射电子和镜电子检测的样本观察方法和装置
公开(公告)号：US08937283B2
公开(公告)日：2015-01-20
申请号：US12937145
申请日：2009-04-10
申请人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
发明人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
IPC分类号： H01J37/29 , H01J37/28 , H01J37/244 , H01L21/66
CPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , H01J37/29 , H01J2237/24475 , H01J2237/24585 , H01J2237/24592 , H01J2237/2805 , H01J2237/2806 , H01J2237/2817 , H01L22/12
摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.
摘要翻译：提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级发射电子和镜电子作为待观察的电子进行混合。要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。对于100nm以下的细小异物和图案，可以快速进行观察和检查。

6. 发明申请

US20110155905A1 SPECIMEN OBSERVATION METHOD AND DEVICE, AND INSPECTION METHOD AND DEVICE USING THE METHOD AND DEVICE 有权
标题翻译：标本观察方法和装置，以及使用方法和装置的检查方法和装置
公开(公告)号：US20110155905A1
公开(公告)日：2011-06-30
申请号：US12937145
申请日：2009-04-10
申请人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
发明人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
IPC分类号： G01N23/225 , G01N23/00
CPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , H01J37/29 , H01J2237/24475 , H01J2237/24585 , H01J2237/24592 , H01J2237/2805 , H01J2237/2806 , H01J2237/2817 , H01L22/12
摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.
摘要翻译：提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级发射电子和镜电子作为待观察的电子进行混合。要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。对于100nm以下的细小异物和图案，可以快速进行观察和检查。

7. 发明授权

US08525127B2 Method and apparatus for inspecting sample surface 有权
标题翻译：检测样品表面的方法和装置
公开(公告)号：US08525127B2
公开(公告)日：2013-09-03
申请号：US13398112
申请日：2012-02-16
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： G21K5/10
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
摘要翻译：提供了一种用于以高精度检查样品表面的方法和装置。提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得样品表面的电位根据照射到样品表面上的电子束的量而变化。

8. 发明申请

US20120145921A1 METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE 有权
标题翻译：检测样品表面的方法和装置
公开(公告)号：US20120145921A1
公开(公告)日：2012-06-14
申请号：US13398112
申请日：2012-02-16
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： G21K5/10
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
摘要翻译：提供了一种用于以高精度检查样品表面的方法和装置。提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得样品表面的电位根据照射到样品表面上的电子束的量而变化。

9. 发明授权

US07829853B2 Sample surface observation method 有权
标题翻译：样品表面观察法
公开(公告)号：US07829853B2
公开(公告)日：2010-11-09
申请号：US12244139
申请日：2008-10-02
申请人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Kenji Terao
发明人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Kenji Terao
IPC分类号： G01N23/00 , G01N23/225 , H01J37/26
CPC分类号： G01N23/2251
摘要： A surface of a sample is observed by acquiring an image of the surface of the sample. An electron beam I irradiated onto the surface of the sample in which wiring including an insulation material and an electrically conductive material is formed. Electrons that acquired structure information regarding a structure of the surface of the sample are detected. An image of the surface of the sample is acquired by a result of the detection of electrons. The surface of the sample is observed using the acquired image of the surface of the sample. The electron beam is irradiated onto the surface of the sample in a state where a brightness of the insulation material and a brightness of the electrically conductive material in the image of the surface of the sample are set equal to each other.
摘要翻译：通过获取样品表面的图像来观察样品的表面。辐射到样品表面上的电子束I，其中形成了包括绝缘材料和导电材料的布线。检测获取关于样品表面结构的结构信息的电子。通过电子检测的结果获得样品表面的图像。使用获取的样品表面的图像观察样品的表面。在将样品表面的图像中的绝缘材料的亮度和导电材料的亮度设定为相等的状态下，将电子束照射在样品的表面上。

10. 发明申请

US20130313429A1 METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE 有权
公开(公告)号：US20130313429A1
公开(公告)日：2013-11-28
申请号：US13954425
申请日：2013-07-30
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： H01J37/26
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

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