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1. 发明申请

US20100019147A1 METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION 有权
标题翻译：充电粒子束检测方法和装置
公开(公告)号：US20100019147A1
公开(公告)日：2010-01-28
申请号：US12506475
申请日：2009-07-21
申请人： Masahiro Hatakeyama , Takumi Ota
发明人： Masahiro Hatakeyama , Takumi Ota
IPC分类号： G01N23/04
CPC分类号： H01J37/26 , G03F1/86 , H01J2237/0047 , H01J2237/2817 , H01L21/67213 , H01L22/12
摘要： A charged particle beam inspection apparatus comprises: an electron gun for irradiating an electron beam onto a sample; a detector for detecting a signal obtained from the sample; an image processor for forming an image from the signal obtained from the detector, and an energy controller for controlling the beam energy of the electron beam to be irradiated onto the sample. An identical charged particle beam inspection apparatus carries out a plurality of types of inspections. An inspection apparatus of a projection type may be applied thereto. A pattern defect inspection, a foreign material inspection, and an inspection for a defect in a multilayer are carried out. Beam energies E1, E2, and E3 in those inspections have a relation E1>E2 and E3>E2. Charge removal is performed in a transport chamber or other vacuum chamber before an inspection.
摘要翻译：带电粒子束检查装置包括：用于将电子束照射到样品上的电子枪; 用于检测从样品获得的信号的检测器; 用于根据从检测器获得的信号形成图像的图像处理器，以及用于控制待照射到样品上的电子束的束能量的能量控制器。相同的带电粒子束检查装置执行多种类型的检查。可以对投影型的检查装置施加。进行图案缺陷检查，异物检查和多层的缺陷检查。这些检查中的能量E1，E2和E3具有E1> E2和E3> E2的关系。在检查之前，在运输室或其他真空室中进行除电。

2. 发明授权

US08368018B2 Method and apparatus for charged particle beam inspection 有权
标题翻译：带电粒子束检查的方法和装置
公开(公告)号：US08368018B2
公开(公告)日：2013-02-05
申请号：US12506475
申请日：2009-07-21
申请人： Masahiro Hatakeyama , Takumi Ota
发明人： Masahiro Hatakeyama , Takumi Ota
IPC分类号： G01N23/00
CPC分类号： H01J37/26 , G03F1/86 , H01J2237/0047 , H01J2237/2817 , H01L21/67213 , H01L22/12
摘要： A charged particle beam inspection apparatus comprises: an electron gun for irradiating an electron beam onto a sample; a detector for detecting a signal obtained from the sample; an image processor for forming an image from the signal obtained from the detector, and an energy controller for controlling the beam energy of the electron beam to be irradiated onto the sample. An identical charged particle beam inspection apparatus carries out a plurality of types of inspections. An inspection apparatus of a projection type may be applied thereto. A pattern defect inspection, a foreign material inspection, and an inspection for a defect in a multilayer are carried out. Beam energies E1, E2, and E3 in those inspections have a relation E1>E2 and E3>E2. Charge removal is performed in a transport chamber or other vacuum chamber before an inspection.
摘要翻译：带电粒子束检查装置包括：用于将电子束照射到样品上的电子枪; 用于检测从样品获得的信号的检测器; 用于根据从检测器获得的信号形成图像的图像处理器，以及用于控制待照射到样品上的电子束的束能量的能量控制器。相同的带电粒子束检查装置执行多种类型的检查。可以对投影型的检查装置施加。进行图案缺陷检查，异物检查和多层的缺陷检查。这些检查中的能量E1，E2和E3具有E1> E2和E3> E2的关系。在检查之前，在运输室或其他真空室中进行除电。

3. 发明授权

US08624182B2 Electro-optical inspection apparatus and method with dust or particle collection function 有权
标题翻译：电光检测装置及方法，具有灰尘或颗粒收集功能
公开(公告)号：US08624182B2
公开(公告)日：2014-01-07
申请号：US13195927
申请日：2011-08-02
申请人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Tatsuya Kohama , Kenji Terao , Takeshi Murakami , Takehide Hayashi , Kiwamu Tsukamoto , Hiroshi Sobukawa , Norio Kimura
发明人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Tatsuya Kohama , Kenji Terao , Takeshi Murakami , Takehide Hayashi , Kiwamu Tsukamoto , Hiroshi Sobukawa , Norio Kimura
IPC分类号： H01J37/244 , H01J37/285 , H01J37/29
CPC分类号： H01J37/22 , H01J37/265 , H01J37/29 , H01J2237/004 , H01J2237/022 , H01J2237/24495 , H01J2237/24564 , H01J2237/2817
摘要： An electro-optical inspection apparatus prevents adhesion of dust or particles to a sample surface, wherein a stage on which a sample is placed is disposed inside a vacuum chamber that can be evacuated, and a dust collecting electrode is disposed to surround a periphery of the sample. The dust collecting electrode is applied with a voltage having the same polarity as a voltage applied to the sample and an absolute value that is the same or larger than an absolute value of the voltage. Because dust or particles adhere to the dust collecting electrode, adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.
摘要翻译：电光检查装置防止灰尘或颗粒附着到样品表面，其中放置样品的阶段设置在可以抽真空的真空室内，并且集尘电极被设置成围绕样品。集尘电极施加与施加到样品的电压极性相同的电压，绝对值等于或大于电压的绝对值。由于灰尘或颗粒附着在集尘电极上，所以可以减少灰尘或颗粒附着到样品表面。代替使用集尘电极，可以在真空室的壁上形成凹部，或者在壁上设置具有施加了预定电压的网状结构的金属板。

4. 发明授权

US08497476B2 Inspection device 有权
标题翻译：检查装置
公开(公告)号：US08497476B2
公开(公告)日：2013-07-30
申请号：US13420731
申请日：2012-03-15
申请人： Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
发明人： Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
IPC分类号： G01N23/225
CPC分类号： H01J37/073 , G01N23/22 , G01N23/223 , G01N23/2251 , G01N2223/611 , H01J1/34 , H01J37/09 , H01J37/10 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/28 , H01J37/29 , H01J2237/0048 , H01J2237/022 , H01J2237/032 , H01J2237/038 , H01J2237/045 , H01J2237/0458 , H01J2237/0473 , H01J2237/0492 , H01J2237/061 , H01J2237/06333 , H01J2237/166 , H01J2237/186 , H01J2237/2002 , H01J2237/2007 , H01J2237/2008 , H01J2237/2448 , H01J2237/2482 , H01J2237/2485 , H01J2237/2817 , H01J2237/2855 , H01J2237/2857
摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.
摘要翻译：用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

5. 发明授权

US08431892B2 Detector and inspecting apparatus 有权
标题翻译：检测仪和检查仪器
公开(公告)号：US08431892B2
公开(公告)日：2013-04-30
申请号：US12899270
申请日：2010-10-06
申请人： Masahiro Hatakeyama , Shoji Yoshikawa , Kenichi Suematsu , Tsutomu Karimata , Nobuharu Noji
发明人： Masahiro Hatakeyama , Shoji Yoshikawa , Kenichi Suematsu , Tsutomu Karimata , Nobuharu Noji
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/261 , H01J37/244 , H01J37/28 , H01J2237/2441 , H01J2237/2446
摘要： An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12 for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.
摘要翻译：用于减少与用于改变检测器的工作相关联的时间损失的检查装置的特征在于包括用于接收从样本W发射的电子束以捕获表示样本W的图像数据的多个检测器11,12，以及切换机构M，用于使电子束入射到多个检测器11,12中的一个上，其中多个检测器11,12设置在同一室MC中。多个检测器11,12可以是检测器的任意组合，该检测器包括用于将电子束转换为电信号的电子传感器，该检测器包括用于将电子束转换成光并将光转换成电信号的光学传感器。切换机构M可以是机械移动机构或电子束偏转器。

6. 发明授权

US07928382B2 Detector and inspecting apparatus 有权
标题翻译：检测仪和检查仪器
公开(公告)号：US07928382B2
公开(公告)日：2011-04-19
申请号：US12063604
申请日：2006-08-10
申请人： Masahiro Hatakeyama , Shoji Yoshikawa , Kenichi Suematsu , Tsutomu Karimata , Nobuharu Noji
发明人： Masahiro Hatakeyama , Shoji Yoshikawa , Kenichi Suematsu , Tsutomu Karimata , Nobuharu Noji
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/261 , H01J37/244 , H01J37/28 , H01J2237/2441 , H01J2237/2446
摘要： An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12 for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.
摘要翻译：用于减少与用于改变检测器的工作相关联的时间损失的检查装置的特征在于包括用于接收从样本W发射的电子束以捕获表示样本W的图像数据的多个检测器11,12，以及切换机构M，用于使电子束入射到多个检测器11,12中的一个上，其中多个检测器11,12设置在同一室MC中。多个检测器11,12可以是包括用于将电子束转换为电信号的电子传感器的检测器的任意组合，该检测器包括用于将电子束转换成光并将该光转换成电信号的光学传感器。切换机构M可以是机械移动机构或电子束偏转器。

7. 发明授权

US07888642B2 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 有权
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US07888642B2
公开(公告)日：2011-02-15
申请号：US12188567
申请日：2008-08-08
申请人： Mamoru Nakasuji , Nabuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nabuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： H01J49/48 , G21K5/04
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

8. 发明申请

US20090101816A1 Testing apparatus using charged particles and device manufacturing method using the testing apparatus 有权
标题翻译：使用带电粒子的测试装置和使用该测试装置的装置制造方法
公开(公告)号：US20090101816A1
公开(公告)日：2009-04-23
申请号：US12073892
申请日：2008-03-11
申请人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
发明人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
IPC分类号： G01N23/00 , A61N5/00
CPC分类号： H01J37/20 , G01N23/2204 , G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/202 , H01J2237/2441 , H01J2237/2446 , H01J2237/2801 , H01J2237/2817 , H01L21/6833 , H01L2223/54466
摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.
摘要翻译：提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。用于检查基板的表面的检查装置产生从电子束源25.1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。产生电子束，使照度不均匀为10％以下。由检测器25.11检测从样品W发射的电子。

9. 发明授权

US07521692B2 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus 有权
标题翻译： TDI检测装置，馈通装置，使用这些装置和设备的电子束装置，以及使用该电子束装置的半导体装置的制造方法
公开(公告)号：US07521692B2
公开(公告)日：2009-04-21
申请号：US11896519
申请日：2007-09-04
申请人： Masahiro Hatakeyama , Tohru Satake , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
发明人： Masahiro Hatakeyama , Tohru Satake , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
IPC分类号： G01K1/08 , H01J3/14 , H01J3/26
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.
摘要翻译：电子束装置包括TDI传感器64和馈通装置50.馈通装置具有插座触点54，用于互连连接到凸缘51的引脚52，用于分离不同的环境，而另一个引脚53与销52，销52，另一销53和插座接触54一起构成连接块，插座触头54具有弹性构件61.因此，即使设置了大量的连接块，连接力可以保持在如此低的水平，以防止传感器中的破损。引脚53与TDI传感器64连接，其中像素阵列已经基于图像投影光学系统的光学特性被自适应地配置。该传感器具有可以将图像投影光学系统的视野尽可能地减小的多个积分级，使得视野内的最大可接受失真可以被设定得更大。此外，可以确定积分级的数量，使得TDI传感器的数据速率不会降低，但是引脚的数量不会尽可能多地增加。优选地，行计数的数量可以几乎等于积分级数。

10. 发明授权

US07423267B2 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 失效
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US07423267B2
公开(公告)日：2008-09-09
申请号：US11528673
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G01N23/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

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