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1. 发明授权

US5641054A Magnetic levitation conveyor apparatus 失效
标题翻译：磁悬浮输送装置
公开(公告)号：US5641054A
公开(公告)日：1997-06-24
申请号：US362451
申请日：1995-03-07
申请人： Satoshi Mori , Masao Matsumura , Yoichi Kanemitsu , Takeshi Yoshioka , Masaaki Kajiyama , Fumio Kondo , Yuji Shirao , Masato Eguchi , Hiroyuki Shinozaki , Yukio Ikeda , Masayoshi Hirose , Masaru Nakaniwa , Norio Kimura , Katsuaki Usui , Katsuyuki Aoki
发明人： Satoshi Mori , Masao Matsumura , Yoichi Kanemitsu , Takeshi Yoshioka , Masaaki Kajiyama , Fumio Kondo , Yuji Shirao , Masato Eguchi , Hiroyuki Shinozaki , Yukio Ikeda , Masayoshi Hirose , Masaru Nakaniwa , Norio Kimura , Katsuaki Usui , Katsuyuki Aoki
IPC分类号： H01L21/00 , H01L21/677 , B65G35/00
CPC分类号： H01L21/67167 , H01L21/67184 , H01L21/67709 , H01L21/67736
摘要： A magnetic levitation conveyor apparatus has levitation electromagnets, linear motors, and displacement sensors which are disposed outside of a tunnel, and a carriage of simple structure which is movable in the tunnel. The carriage is of canned structure for preventing gases from being generated. The carriage of canned structure allows the tunnel to have a reduced cross-sectional area and to be filled with a highly purified atmosphere such as of a high vacuum. The tunnel has substantially orthogonal branches at a branched point. In the branched point, the carriage can move, while being lifted out of contact with the tunnel partition, with a directional change from a main conveyor passage into a branched conveyor passage. The magnetic levitation conveyor apparatus is highly practical as it can control the carriage to be lifted and moved as described above.
摘要翻译： PCT No.PCT / JP93 / 00930 Sec。 371日期：1995年3月7日 102（e）1995年3月7日PCT PCT 1993年7月6日PCT公布。第WO94 / 01354号公报日期1994年1月20日磁悬浮输送装置具有设置在隧道外部的悬浮电磁体，线性电动机和位移传感器，以及可在隧道中移动的简单结构的滑架。滑架是用于防止产生气体的罐头结构。罐头结构的支架允许隧道具有减小的横截面积，并且填充有高度净化的气氛，例如高真空。隧道在分支点处具有大致正交的分支。在分支点，托架可以在与主输送机通道分支输送通道的方向改变的同时被提升而不与隧道隔板接触。磁悬浮输送装置是高度实用的，因为它可以如上所述地控制滑架被提升和移动。

2. 发明授权

US5515618A Substrate transportation system 失效
标题翻译：基板运输系统
公开(公告)号：US5515618A
公开(公告)日：1996-05-14
申请号：US284569
申请日：1994-08-09
申请人： Masao Matsumura , Masaaki Kajiyama , Takeshi Yoshioka
发明人： Masao Matsumura , Masaaki Kajiyama , Takeshi Yoshioka
IPC分类号： B65G49/07 , H01L21/677 , F26B13/30
CPC分类号： H01L21/67772 , H01L21/67173 , H01L21/67757
摘要： A substrate transporting system is presented which can prevent contamination within a sealed box, and which does not bring in contaminants from the outside environment when installing substrates in a processing apparatus connected to a clean tunnel. The substrate transporting apparatus according to the present invention includes a box for installing one or more substrates in a clean sealed atmosphere, and a box transporting apparatus for transporting the box by loading it on a carrier and through a clean sealed space of a tunnel shape, and further includes a box transfer apparatus arranged in the tunnel-shaped sealed space for transferring the box from the exterior of the sealed space to the carrier, and a substrate transfer apparatus for transferring substrates installed within the box to a substrate processing apparatus connected to the sealed space. It has a cleaning apparatus arranged within the tunnel-shaped sealed space for cleaning the outer surface of the box.
摘要翻译： PCT No.PCT / JP93 / 01804 Sec。 371日期1994年8月9日 102（e）日期1994年8月9日PCT 1993年12月13日PCT PCT。 WO94 / 14191 PCT出版物日期：1994年6月3日。提供了一种可以防止密封箱内的污染的衬底输送系统，并且当将衬底安装在连接到清洁隧道的处理设备中时不会从外部环境中引起污染物。根据本发明的基板输送装置包括用于在清洁的密封气氛中安装一个或多个基板的箱体，以及箱体输送装置，其通过将其装载在载体上并通过隧道形状的干净的密封空间来运送箱体，并且还包括布置在隧道状密封空间中用于将盒从密封空间的外部传送到载体的箱传送装置，以及用于将安装在箱内的基板传送到连接到该基板处理装置的基板处理装置的基板传送装置密封空间。它具有布置在隧道形密封空间内的清洁装置，用于清洁盒的外表面。

3. 发明授权

US5398481A Vacuum processing system 失效
标题翻译：真空加工系统
公开(公告)号：US5398481A
公开(公告)日：1995-03-21
申请号：US62853
申请日：1993-05-18
申请人： Noriyuki Takeuchi , Masaaki Kajiyama , Fumio Kondo , Masao Matsumura , Takeshi Yoshioka
发明人： Noriyuki Takeuchi , Masaaki Kajiyama , Fumio Kondo , Masao Matsumura , Takeshi Yoshioka
IPC分类号： H01L21/677 , H01L21/00 , B65B49/05
CPC分类号： H01L21/67772
摘要： Several vacuum process steps are applied to substrates such as a wafer using a vacuum container for storing and transporting the substrates under vacuum. The vacuum container comprises a container body having a main opening for inserting a substrate and taking out the substrate, a lid engageable with the container body for closing and sealing the main opening of the container body, and a gate provided on one of the container body and the lid for performing at least one of evacuating an interior of the vacuum container and raising the pressure of the interior of the vacuum container to ambient.
摘要翻译：将几个真空处理步骤应用于诸如使用真空容器的晶片等基板，以在真空下储存和输送基板。真空容器包括容器本体，其具有用于插入基板的主开口和取出基板，与容器主体接合的盖子，用于封闭和密封容器主体的主开口;以及门，其设置在容器主体中的一个上以及用于执行至少一个抽真空容器的内部并将真空容器内部的压力提高到环境的盖子。

4. 发明授权

US5852298A Micro-processing apparatus and method therefor 失效
标题翻译：微处理装置及其方法
公开(公告)号：US5852298A
公开(公告)日：1998-12-22
申请号：US621990
申请日：1996-03-26
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Masaaki Kajiyama , Takashi Tsuzuki , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Masaaki Kajiyama , Takashi Tsuzuki , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/20 , H01J37/30 , H01J37/00
CPC分类号： H01J37/3005 , H01J37/20
摘要： A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while progress of operations is observed in real-time by at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions. This offers spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to enable production of micron-sized parts for use in advanced applications of optical and electronic devices.
摘要翻译：微加工设备对微米/纳米尺寸的物体执行制造和组装任务，同时通过至少一对光学或电子显微镜实时观察操作的进展，从而提供来自至少两个方向的同时视图。这提供了关于微型工作特别关键的工作空间的空间视觉信息。通过使用特别设计用于该设备的微型托盘装置，还提供其他应用的可能性，进一步促进了微加工。微型托盘提供的旋转和平行平移运动与该装置的微加工能力相结合，可用于生产用于光学和电子设备的先进应用的微米级部件。

5. 发明申请

US20060068173A1 Methods for forming and patterning of metallic films 审中-公开
标题翻译：金属膜的形成和图案化方法
公开(公告)号：US20060068173A1
公开(公告)日：2006-03-30
申请号：US11113244
申请日：2005-04-25
申请人： Masaaki Kajiyama , Osamu Horita
发明人： Masaaki Kajiyama , Osamu Horita
IPC分类号： B32B15/04 , B41M5/00 , B05D1/36 , B05D1/18 , C23C16/00 , B05B5/025 , B21D39/00
CPC分类号： B05C3/10 , C23C18/14 , C23C18/1608 , C23C18/1612 , C23C18/165 , C23C18/1692 , C23C18/206 , C23C18/2066 , C23C18/30 , C25D7/123 , C25D17/001 , H05K3/185 , H05K3/387 , H05K2201/0129 , H05K2203/092 , H05K2203/107 , Y10T428/12556 , Y10T428/24802 , Y10T428/31678
摘要： A solvent containing an organic or inorganic metal compound containing a metal catalyst that serves as a plating seed is applied to a plastic substrate and dried, thereby forming a metal compound film, and then, the metal compound film is irradiated with an energy beam, such as an electron beam, to precipitate the metal catalyst. By irradiating a local area of the metal compound film with the energy beam, the chemical reaction of metal catalyst precipitation can be caused locally in the irradiated area, and thus, a patterned metal catalyst film can be formed. Once the substrate is irradiated with the energy beam, the surface may be molten to trap the metal catalyst to an extremely shallow depth, so that the bonding between the substrate and the metal catalyst is enhanced. Thus, the metal catalyst film becomes harder to peel off the substrate.
摘要翻译：将含有含有作为电镀种子的金属催化剂的有机或无机金属化合物的溶剂涂布在塑料基板上并干燥，形成金属化合物膜，然后用能量束照射金属化合物膜作为电子束，以沉淀金属催化剂。通过用能量束照射金属化合物膜的局部区域，可以在照射区域局部引起金属催化剂沉淀的化学反应，从而可以形成图案化的金属催化剂膜。一旦基板被能量束照射，表面可以被熔化，以将金属催化剂捕获到非常浅的深度，从而增强了基板和金属催化剂之间的结合。因此，金属催化剂膜变得难以从基板剥离。

6. 发明授权

US5904301A Spraying device 失效
标题翻译：喷涂装置
公开(公告)号：US5904301A
公开(公告)日：1999-05-18
申请号：US822690
申请日：1997-03-24
申请人： Masaaki Kajiyama , Mitsunao Shibasaki
发明人： Masaaki Kajiyama , Mitsunao Shibasaki
IPC分类号： B05B1/14 , B08B3/02 , B08B3/04 , H01L21/00 , H01L21/304
CPC分类号： H01L21/67051 , B08B3/02 , B08B3/04
摘要： A spraying device for conveniently spraying a plurality of cleaning liquids, e.g., a chemical solution and pure water, over a workpiece, includes sprayer body defining therein a plurality of fluid passages. The fluid passages are separate from each other, and each of the fluid passages is communicated to a respective nozzle portion having a nozzle outlet at a nozzle surface defined on an outer surface of the sprayer body. The nozzle portions communicating each of the different fluid passages have substantially the same distribution in the nozzle surface.
摘要翻译：用于在工件上方便地喷射多种清洁液体（例如化学溶液和纯水）的喷涂装置包括在其中限定多个流体通道的喷雾器主体。流体通道彼此分离，并且每个流体通道连通到在喷嘴表面上限定的喷嘴表面处具有喷嘴出口的相应喷嘴部分。连通每个不同流体通道的喷嘴部分在喷嘴表面中具有基本相同的分布。

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