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91. 发明申请

US20100266939A1 Lithographic Mask and Method of Forming a Lithographic Mask 有权
标题翻译：平版印刷掩模和形成平版印刷掩模的方法
公开(公告)号：US20100266939A1
公开(公告)日：2010-10-21
申请号：US12761876
申请日：2010-04-16
申请人： Haiko Rolff , Carla Byloos , Christoph Noelscher , Nicolo Morgana , Roderick Koehle , Molela Moukara , Ralf Neubauer , Rainer Pforr , Dominique Savignac
发明人： Haiko Rolff , Carla Byloos , Christoph Noelscher , Nicolo Morgana , Roderick Koehle , Molela Moukara , Ralf Neubauer , Rainer Pforr , Dominique Savignac
IPC分类号： G03F1/00
CPC分类号： G03F1/40 , G03F1/26 , G03F1/30 , G03F1/32
摘要： A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer.
摘要翻译：平版印刷掩模包括包括凹槽的第一层，包含区域的第二层和包围区段的凹槽状结构。形成第一层和第二层以便减小第二层内的电位差。形成光刻掩模的方法包括形成第一层和第二层以将第二层设置在第一层上，将第二层图案化以包括封闭这些区段的区段，区域和沟槽状结构，以及在第一层中形成凹槽层在未被第二层覆盖的部分。形成第一层和第二层，以在形成第一层中的槽的步骤期间减小第二层内的电位差。

92. 发明授权

US07327013B2 Stencil mask with charge-up prevention and method of manufacturing the same 失效
标题翻译：具有防止充电的模板面罩及其制造方法
公开(公告)号：US07327013B2
公开(公告)日：2008-02-05
申请号：US10743522
申请日：2003-12-23
申请人： Takeshi Shibata , Kyoichi Suguro
发明人： Takeshi Shibata , Kyoichi Suguro
IPC分类号： H01L29/06
CPC分类号： G03F1/20 , G03F1/40
摘要： A drive unit is described for switching circuit breakers on and off, in particular disconnecting switches and/or grounding switches of medium-voltage switchgear. The drive unit includes a reversible d.c. motor and a switching device containing two separately drivable and interlocked reversing switches, one assigned to each direction of rotation of the d.c. motor, their contacts performing the current reversal on the windings of the d.c. motor as required to reverse the direction of rotation. The drive unit further includes power contactors whose contacts have the required switching capacity for load switching. The all-or-nothing relays and safety switches are implemented by uniform low-power relays representing the direction of rotation, each having at least two electrically isolated relay contacts connected in parallel and also having an equalizing capacitor connected in parallel to each. Such drive units are used in connection with switchgear for power transmission and distribution.
摘要翻译：在模板掩模中，导电薄膜在其中具有第一开口。在除了第一开口之外的导电薄膜的区域中形成绝缘膜。在绝缘膜上形成导电支撑。第二个开口穿过导电支撑和绝缘膜并到达导电薄膜的表面。导电构件形成在第二开口中。导电构件电连接导电支撑件和导电薄膜。

93. 发明授权

US07074526B2 Photomask covered with light-transmissive and electrically-conductive polymer material 有权
标题翻译：光掩模覆盖有透光和导电的聚合物材料
公开(公告)号：US07074526B2
公开(公告)日：2006-07-11
申请号：US10456667
申请日：2003-06-05
申请人： Yoji Hata
发明人： Yoji Hata
IPC分类号： G03F9/00
CPC分类号： G03F1/48 , G03F1/40
摘要： A photomask by which no electrostatic damage or damage of a mask pattern due to electrification is produced. The photomask has a substrate; mask patterns formed on the substrate, which are made of a light blocking material and are covered with a light-transmissive and electrically conductive polymer material. Even the mask patterns which are isolated from each other on the substrate are electrically conductive with each other. Typically, the mask patterns are covered with an electrically conductive film made of the light-transmissive and electrically conductive polymer material. The electrically conductive film may have a thickness by which when foreign particles land on the electrically conductive film, an optical image of the foreign particles is defocused on a sample to be exposed in the exposure process, so that shapes of the foreign particles are not transferred. In this case, a pellicle, which is conventionally provided on the substrate, is unnecessary.
摘要翻译：不产生静电损伤或由于带电导致的掩模图案损坏的光掩模。光掩模具有基板; 形成在基板上的掩模图案，其由遮光材料制成并且被透光和导电的聚合物材料覆盖。即使在基板上彼此隔离的掩模图案彼此导电。通常，掩模图案被由透光和导电聚合物材料制成的导电膜覆盖。导电膜可以具有当外来颗粒落在导电膜上时的厚度，外来颗粒的光学图像在曝光过程中在要暴露的样品上散焦，使得外来颗粒的形状不被转印。在这种情况下，通常设置在基板上的防护薄膜组件是不必要的。

94. 发明申请

US20050186488A1 Reticle with antistatic coating 有权
标题翻译：带防静电涂层的光罩
公开(公告)号：US20050186488A1
公开(公告)日：2005-08-25
申请号：US11092734
申请日：2005-03-28
申请人： Wei-Yu Su , Dong-Hsu Cheng , Li-Kong Turn
发明人： Wei-Yu Su , Dong-Hsu Cheng , Li-Kong Turn
IPC分类号： A47G1/12 , B44F1/00 , G03F1/14 , G03F9/00 , G03G16/00
CPC分类号： G03F1/40 , G03F1/62 , G03F1/64
摘要： A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl−. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.
摘要翻译：防静电标线片包括基材和图案化层，并被季胺（R 4 N N）的抗静电导电膜覆盖。 >。包括在框架上紧密拉伸的光学透明膜的防护薄膜组件也用类似材料的抗静电导电膜涂覆。具有防护薄膜的掩模版形成将掩模版与ESD隔离的屏蔽结构。

95. 发明申请

US20050008943A1 Partial edge bead removal to allow improved grounding during e-beam mask writing 失效
标题翻译：部分边缘珠去除以允许在电子束掩模写入期间改进接地
公开(公告)号：US20050008943A1
公开(公告)日：2005-01-13
申请号：US10614529
申请日：2003-07-07
申请人： J. Rolfson
发明人： J. Rolfson
IPC分类号： G03C3/02 , G03C5/00 , G03F1/14 , G03F9/00
CPC分类号： G03F1/40 , G03F1/86
摘要： A method to provide a ground point for second, or subsequent, e-beam mask-writing steps by selectively removing the photoresist edge bead of a photomask substrate to expose the underlying chrome layer. The selective removal leaves at least one tab of photoresist edge bead over the chrome layer. After the first e-beam mask writing step and subsequent etch, the tab can be removed to expose a portion of the chromium layer that can act as a new ground point for a second e-beam etch. Also, a nozzle for use in selectively removing the edge bead to leave a tab of photoresist edge bead.
摘要翻译：通过选择性地去除光掩模衬底的光致抗蚀剂边缘以暴露下面的铬层来为第二或随后的电子束掩模写入步骤提供接地点的方法。选择性去除在铬层上留下光致抗蚀剂边缘珠的至少一个突片。在第一电子束掩模写入步骤和随后的蚀刻之后，可以去除突片以暴露可以充当第二电子束蚀刻的新接地点的铬层的一部分。而且，用于选择性地去除边缘珠以留下光致抗蚀剂边缘珠的突片的喷嘴。

96. 发明申请

US20040229129A1 Reducing charging effects in photolithography reticle manufacturing 审中-公开
标题翻译：降低光刻掩模版制造中的充电效果
公开(公告)号：US20040229129A1
公开(公告)日：2004-11-18
申请号：US10437587
申请日：2003-05-14
发明人： Gary Allen , Richard Schenker , Wen-Hao Cheng
IPC分类号： G03F009/00 , G03C005/00 , G03B027/42
CPC分类号： G03F1/40
摘要： Reticle charging effects during the manufacturing process may be reduced. A reticle, including a peripheral outer region and a central inner conductive region separated by an intervening non-conductive region, may be electrically coupled to reduce differential charge effects in one embodiment. For example, a conductive bridge may be formed between the inner and outer regions to electrically neutralize any charge distribution.
摘要翻译：可以减少制造过程中的掩模版充电效果。在一个实施例中，包括周边外部区域和由中间非导电区域分隔的中心内部导电区域的掩模版可以电耦合以减小差分电荷效应。例如，可以在内部和外部区域之间形成导电桥，以电中和任何电荷分布。

97. 发明申请

US20040197675A1 Stencil mask with charge-up prevention and method of manufacturing the same 失效
标题翻译：具有防止充电的模板面罩及其制造方法
公开(公告)号：US20040197675A1
公开(公告)日：2004-10-07
申请号：US10743522
申请日：2003-12-23
发明人： Takeshi Shibata , Kyoichi Suguro
IPC分类号： G03F009/00 , B32B009/06 , G03C005/00 , G21K005/00 , B32B009/00 , B05C011/11
CPC分类号： G03F1/20 , G03F1/40
摘要： In a stencil mask, a conductive thin film has first openings in it. An insulating film is formed in the region of the conductive thin film excluding the first openings. A conductive support is formed on the insulating film. A second opening goes through the conductive support and insulating film and reaches the surface of the conductive thin film. A conducting member is formed in the second opening. The conducting member connects the conductive support and conductive thin film electrically.
摘要翻译：在模板掩模中，导电薄膜在其中具有第一开口。在除了第一开口之外的导电薄膜的区域中形成绝缘膜。在绝缘膜上形成导电支撑。第二个开口穿过导电支撑和绝缘膜并到达导电薄膜的表面。导电构件形成在第二开口中。导电构件电连接导电支撑件和导电薄膜。

98. 发明授权

US06569584B1 Methods and structures for protecting reticles from electrostatic damage 失效
标题翻译：保护掩模版免受静电损伤的方法和结构
公开(公告)号：US06569584B1
公开(公告)日：2003-05-27
申请号：US09895538
申请日：2001-06-29
申请人： Jonathan J. Ho , Xin X. Wu
发明人： Jonathan J. Ho , Xin X. Wu
IPC分类号： G03F900
CPC分类号： G03F1/40
摘要： A reticle (mask) that is modified to prevent bridging of the masking material (e.g., chrome) between long mask lines of a lithographic mask pattern during an integrated circuit fabrication process. A dummy mask pattern is provided on the reticle adjacent to long mask lines that causes the large charge collected on the long mask line to be distributed along its length, thereby minimizing voltage potentials across a gap separating the long mask line from an adjacent mask line.
摘要翻译：在集成电路制造工艺期间，被修改以防止掩模材料（例如，铬）在光刻掩模图案的长掩模线之间桥接的掩模版（掩模）。伪掩模图案设置在与长掩模线相邻的掩模版上，使得长长掩模线上收集的大电荷沿其长度分布，从而使隔离长掩模线与相邻掩模线的间隙的电压电位最小化。

99. 发明授权

US5906912A Processes for forming resist pattern and for producing semiconductor device 失效
标题翻译：用于形成抗蚀剂图案和用于制造半导体器件的工艺
公开(公告)号：US5906912A
公开(公告)日：1999-05-25
申请号：US834044
申请日：1997-04-11
申请人： Keiji Watanabe , Miwa Igarashi , Ei Yano , Keiko Yano , Takashi Maruyama , Eiichi Hoshino , Kotaro Shirabe , Masafumi Nakaishi
发明人： Keiji Watanabe , Miwa Igarashi , Ei Yano , Keiko Yano , Takashi Maruyama , Eiichi Hoshino , Kotaro Shirabe , Masafumi Nakaishi
IPC分类号： G03F7/038 , C23F1/00 , G03F7/075 , G03F7/09 , G03F7/11 , G03F7/26 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/311 , H01L21/768 , G03C5/00
CPC分类号： G03F7/093 , G03F1/40 , H01L21/31138 , H01L21/76838
摘要： An electroconductive pattern is formed by coating a substrate with a solution comprising 100 parts by weight of a soluble electroconductive polymer containing an organic radical capable of cross-linking with a cross-linking agent, 5 to 1,000 parts by weight of a cross-linking agent, and 100 to 100,000 parts by weight of a solvent; effecting cross-linking of the resultant coated film to obtain a cured electroconductive film having a sheet resistance of 10.sup.10 .OMEGA./.quadrature. or less; forming a pattern as an upper layer on the cured electroconductive layer; and transferring the pattern of the upper layer to the cured electroconductive layer.
摘要翻译：通过用包含100重量份的含有能够与交联剂交联的有机基团的可溶性导电聚合物的溶液涂布基材来形成导电图案，5至1,000重量份的交联剂和100〜100,000重量份的溶剂; 实现所得涂膜的交联，得到薄膜电阻为1010Ω/□以下的固化导电膜; 在固化的导电层上形成上层的图案; 并将上层的图案转印到固化的导电层上。

100. 发明授权

US4453086A Electron beam system with reduced charge buildup 失效
标题翻译：具有减少电荷积累的电子束系统
公开(公告)号：US4453086A
公开(公告)日：1984-06-05
申请号：US336465
申请日：1981-12-31
申请人： Warren D. Grobman
发明人： Warren D. Grobman
IPC分类号： H01L21/66 , G01N23/18 , G01N23/203 , G03F1/40 , G03F1/86 , H01L21/027 , C08J7/10
CPC分类号： G03F1/86 , G01N23/18 , G01N23/203 , G03F1/40
摘要： In electron beam testing systems wherein high energy, high resolution electron beams are used to test lithographic masks, a technique and apparatus are described for discharging electrons which are left on the surface of the mask, and which alter the input trajectory of the electron beam. The materials used in these masks are such that induced photoconductivity and photoemissivity are extremely low and are incapable of providing sufficient electron discharge. A thin, low work function coating is applied over the entire mask surface, the coating being transparent to the radiation which will later be incident upon the mask when it is used in a fabrication process. Due to induced photoemission in the thin coating layer, enough photoemitted electrons will be produced to balance the buildup of electrons from the electron beam, thereby discharging the surface of the mask. The electron beam is a high energy beam, having energies greater than about 5000 eV, and a resolution less than about 1 micrometer.
摘要翻译：在其中使用高能量，高分辨率电子束来测试光刻掩模的电子束测试系统中，描述了放置在掩模表面上并且改变电子束的输入轨迹的电子的技术和装置。这些掩模中使用的材料使得感应的光电导率和光电散率极低，并且不能提供足够的电子放电。在整个掩模表面上施加薄的低功函数涂层，所述涂层对于在制造过程中使用时将随后入射到掩模上的辐射是透明的。由于在薄涂层中的诱导光电子发射，将产生足够的光电子以平衡来自电子束的电子的积累，从而排出掩模的表面。电子束是能量大于约5000eV的能量束，分辨率小于约1微米。

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