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    • 1. 发明授权
    • Solid-state area imaging apparatus
    • 固态区域成像装置
    • US4566037A
    • 1986-01-21
    • US451599
    • 1982-12-20
    • Norihiko TakatsuAtsushi KawaharaMasaki Isogai
    • Norihiko TakatsuAtsushi KawaharaMasaki Isogai
    • H01L27/148H04N5/335H04N5/341H04N5/3725H04N5/3728C08J7/10
    • H01L27/14831
    • There is disclosed a solid-state area imaging apparatus suitable for photographing a still picture. The apparatus comprises a plurality of vertical transfer electrodes and a pair of horizontal read CCDs, and the vertical transfer electrodes are vertically continuously arranged such that each electrode alternately crosses vertically adjoining two of a plurality of imaginary horizontal scanning lines thereby providing a plurality of photosensitive elements distributed in a checkered pattern on the imaging surface of the apparatus. This distribution of the photosensitive elements has the effect of applying the video signal to all the horizontal scanning lines. Thus, by using the existing integrated circuit technique, it is possible to realize a solid-state area imaging apparatus whose vertical resolution of reproduced still pictures is two times the vertical resolution obtained previously.
    • 公开了一种适用于拍摄静止图像的固态成像装置。 该装置包括多个垂直传送电极和一对水平读取CCD,并且垂直传输电极垂直连续地布置,使得每个电极交替地跨越多个虚拟水平扫描线的垂直相邻的两个,从而提供多个感光元件 分布在装置的成像表面上的方格图案中。 感光元件的这种分布具有将视频信号施加到所有水平扫描线的效果。 因此,通过使用现有的集成电路技术,可以实现其再现静止图像的垂直分辨率是先前获得的垂直分辨率的两倍的固态区域成像装置。
    • 2. 发明授权
    • Polymerizable coating composition containing polymerizable epoxide
compound and vinyl chloride dispersion polymer and method of coating
utilizing same and coated articles produced thereby
    • 含可聚合环氧化合物和氯乙烯分散体聚合物的可聚合涂料组合物及其制备方法以及由此制备的涂覆制品
    • US4250006A
    • 1981-02-10
    • US21914
    • 1979-03-19
    • Joseph M. GuarneryDennis E. Kester
    • Joseph M. GuarneryDennis E. Kester
    • C08L27/00B05D3/06C08G59/00C08G59/18C08J3/24C08L1/00C08L63/00C09D5/00C09D163/00C08L27/22C08J7/10
    • C08J3/24C08G59/18C09D163/00C08J2363/00
    • A polymerizable coating composition comprises 35-80 parts of an epoxy prepolymer material and 20-65 parts of a vinyl chloride dispersion polymer together with 0.5-10 percent by weight, based upon the weight of the epoxy prepolymer material, of an onium salt photoinitiator which decomposes upon exposure to electromagnetic radiation to initiate polymerization of the epoxy prepolymer material. The vinyl chloride polymer has a high molecular weight represented by an inherent viscosity of 0.60-1.60 and a particle size of 0.5-20.0 microns. The coating is applied to the surface of a substrate and then exposed to a source of electromagnetic radiation to decompose the photoinitiator and initiate polymerization of the epoxy prepolymer material to a tack-free surface condition in which the vinyl chloride polymer is dispersed within the epoxy polymer. This is desirably effected by maintaining the coating at a temperature of about 50.degree.-90.degree. C. for a limited time following exposure to radiation. After the coating has been cured to a tack-free condition, it is desirably baked at a temperature of at least 150.degree. C. to effect substantial fusion of the vinyl chloride polymer and cross-linking of the epoxy polymer.
    • 可聚合涂料组合物包含35-80份环氧预聚物材料和20-65份氯乙烯分散体聚合物以及基于环氧预聚物材料重量的0.5-10重量%的鎓盐光引发剂,其中 在暴露于电磁辐射下分解以引发环氧预聚物材料的聚合。 氯乙烯聚合物具有由特性粘度为0.60-1.60和粒径为0.5-20.0微米的高分子量。 将涂层施加到基材的表面,然后暴露于电磁辐射源以分解光引发剂并引发环氧预聚物材料的聚合到无粘性表面状态,其中氯乙烯聚合物分散在环氧聚合物 。 这是希望通过在暴露于辐射后的有限时间内将涂层保持在约50-90℃的温度来实现的。 在涂层已经固化到无粘性条件之后,理想地在至少150℃的温度下烘烤以实现氯乙烯聚合物的显着熔融和环氧聚合物的交联。
    • 4. 发明授权
    • Electron beam system with reduced charge buildup
    • 具有减少电荷积累的电子束系统
    • US4453086A
    • 1984-06-05
    • US336465
    • 1981-12-31
    • Warren D. Grobman
    • Warren D. Grobman
    • H01L21/66G01N23/18G01N23/203G03F1/40G03F1/86H01L21/027C08J7/10
    • G03F1/86G01N23/18G01N23/203G03F1/40
    • In electron beam testing systems wherein high energy, high resolution electron beams are used to test lithographic masks, a technique and apparatus are described for discharging electrons which are left on the surface of the mask, and which alter the input trajectory of the electron beam. The materials used in these masks are such that induced photoconductivity and photoemissivity are extremely low and are incapable of providing sufficient electron discharge. A thin, low work function coating is applied over the entire mask surface, the coating being transparent to the radiation which will later be incident upon the mask when it is used in a fabrication process. Due to induced photoemission in the thin coating layer, enough photoemitted electrons will be produced to balance the buildup of electrons from the electron beam, thereby discharging the surface of the mask. The electron beam is a high energy beam, having energies greater than about 5000 eV, and a resolution less than about 1 micrometer.
    • 在其中使用高能量,高分辨率电子束来测试光刻掩模的电子束测试系统中,描述了放置在掩模表面上并且改变电子束的输入轨迹的电子的技术和装置。 这些掩模中使用的材料使得感应的光电导率和光电散率极低,并且不能提供足够的电子放电。 在整个掩模表面上施加薄的低功函数涂层,所述涂层对于在制造过程中使用时将随后入射到掩模上的辐射是透明的。 由于在薄涂层中的诱导光电子发射,将产生足够的光电子以平衡来自电子束的电子的积累,从而排出掩模的表面。 电子束是能量大于约5000eV的能量束,分辨率小于约1微米。
    • 8. 发明授权
    • Novel compounds and process
    • 新型化合物和工艺
    • US3911164A
    • 1975-10-07
    • US39723773
    • 1973-09-14
    • UPJOHN CO
    • SAYIGH ADNAN A RSTUBER FRED AULRICH HENRI
    • C08F8/34D06P1/642D06P5/22G03F7/012B05D3/06C08J7/04C08J7/10
    • G03F7/012C08F8/34D06P1/6423D06P5/22Y10T428/31786Y10T428/31859Y10T428/31942C08F222/06C08F222/08
    • Radiation (thermal and light)-sensitive polymers are provided which are characterized by the recurring unit of the formula:

      wherein R'' is lower-alkoxy or phenyl; one of R2 and R3 is hydrogen and the other is

      WHEREIN A alkylene from 2 to 10 carbon atoms having 2 to 6 carbon atoms between valencies, R'''' lower-alkyl or halogen, x is 1 to 2, y is 0 to 2, and x + y 1 to 3. Water soluble salts also disclosed. The polymers are useful for chemically bonding basic dyestuffs to non-dyereceptive substrates (e.g. polyethylene) by coating the substrate with radiation sensitive polymer and exposing the coated substrate to irradiation. The treated substrate is then contacted with a basic dyestuff which bonds thereto via the free carboxylic groups in the coating. The irradiation can be carried out imagewise to produce an appropriate image on the substrate which image is developed by dissolving out unexposed radiation-sensitive polymer prior to application of the dye. Bonding of the radiation-sensitive polymers of the invention to substrates in the above manner can also be employed as a means of rendering hydrophilic a variety of substrates which are hydrophobic.
    • 提供了辐射(热和光)敏感聚合物,其特征在于下式的重复单元:R'| - CH --- CH --- CH - CH2 - | COOR2COOR3其中R' 烷氧基或苯基; R 2和R 3中的一个是氢,另一个是O(SO 2 N 3)x并联-AOC-NH-角“R”,其中A是2价之间碳原子数2至10个的碳原子之间的亚芳基,R“= 低级烷基或卤素,x为1至2,y为0至2,x + y = 1至3.还公开了水溶性盐。 聚合物可用于通过用辐射敏感聚合物涂覆基底并将涂覆的基底暴露于照射来将碱性染料化学键合到非感染性底物(例如聚乙烯)。 然后将经处理的基材与经由涂层中的游离羧基与其键合的碱性染料接触。 照射可以成像进行,以在衬底上产生合适的图像,该图像通过在施加染料之前溶解未曝光的辐射敏感聚合物来显影。 本发明的辐射敏感性聚合物以上述方式粘合到基材上也可以用作亲水性的使疏水性的各种底物的方法。