专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20030187128A1 Aqueous polyolefin resin dispersion 有权
标题翻译：水性聚烯烃树脂分散体
公开(公告)号：US20030187128A1
公开(公告)日：2003-10-02
申请号：US10343334
申请日：2003-01-28
发明人： Kenjin Shiba , Shoji Okamoto , Hayami Onishi
IPC分类号： B05D003/02 , C08K003/34 , B32B009/06 , C08K011/00
CPC分类号： C09D123/0869 , C08L23/0869 , C08L75/04 , Y10T428/31678 , Y10T428/31692 , Y10T428/31699 , Y10T428/3175 , Y10T428/31797 , Y10T428/31855 , Y10T428/31928 , C08L2666/20
摘要： An aqueous dispersion that comprises: (A) a polyolefin terpolymer resin obtained from (a) an unsaturated carboxylic acid or anhydride thereof, (b) an ethylenic hycrocarbon, and (c) a specific compound, the proportion of (a) being 0.01 to 5 wt %, excluding 5 wt %, and the ratio of (b) to (c) being from 55/45 to 99/1 (wt %); (B) a basic compound; and (C) an aqueous medium, that the polyolefin terpolymer resin (A) dispersed in the aqueous medium has a number-average particle diameter of 1 nullm or smaller, and that the dispersion contains substantially no nonvolatile water-compatibilizing agent. Also provided are a coated film obtained by applying this aqueous dispersion to a thermoplastic resin and a coated metal material obtained by applying this aqueous dispersion to a metal material.
摘要翻译：一种水分散体，其包含：（A）由（a）不饱和羧酸或其酸酐获得的聚烯烃三元共聚物树脂，（b）乙烯基环烷烃，和（c）特定化合物，（a）的比例为0.01〜 5重量％，不包括5重量％，（b）与（c）的比例为55/45至99/1（重量％）; （B）碱性化合物; 和（C）水性介质，分散在水性介质中的聚烯烃三元共聚物树脂（A）的数均粒径为1μm以下，分散体基本上不含非挥发性水相溶剂。还提供了通过将该水性分散体施加到热塑性树脂上获得的涂膜和通过将该水性分散体施加到金属材料而获得的涂覆金属材料。

2. 发明申请

US20030073756A1 Radiation curable compositions with enhanced adhesion 有权
标题翻译：具有增强附着力的可辐射固化组合物
公开(公告)号：US20030073756A1
公开(公告)日：2003-04-17
申请号：US10243013
申请日：2002-09-13
发明人： Miguel A. Dones , Anbazhagan Natesh , Daniel Haile , Ramesh L. Narayan
IPC分类号： C08F020/34 , C08F022/38 , B32B027/34 , B32B009/06 , C08F026/00 , C08J003/28
CPC分类号： C08G81/024 , C08F283/04 , C08F290/065 , Y10T428/31623 , Y10T428/31681 , Y10T428/31725 , Y10T428/31772 , Y10T428/31775
摘要： A radiation-curable composition is comprised of the reaction product of an amine-terminated (poly)aminoamide and a mono-(meth)acrylate or a poly-(meth)acrylate. The radiation-curable composition is a liquid at room temperature and does not undergo substantial volume contraction upon curing and exhibit excellent adhesion to porous and non porous substrates alike.
摘要翻译：可辐射固化组合物由胺封端（聚）氨基酰胺和单 - （甲基）丙烯酸酯或聚（甲基）丙烯酸酯的反应产物组成。辐射固化组合物在室温下为液体，并且在固化时不会承受相当大的体积收缩，并且对多孔和非多孔基材表现出优异的粘合性。

3. 发明申请

US20020039639A1 Ink-jet recording material 有权
标题翻译：喷墨记录材料
公开(公告)号：US20020039639A1
公开(公告)日：2002-04-04
申请号：US09773520
申请日：2001-02-02
发明人： Noboru Kondo , Teiichi Otani , Atsushi Ono , Hiroyuki Onishi , Masaya Shibatani
IPC分类号： B32B003/00 , B32B009/06 , B32B029/06 , B32B027/14
CPC分类号： B41M5/52 , B41M5/5218 , B41M5/5254 , Y10T428/24802
摘要： An ink-jet recording material having on at least one surface of a base paper at least one ink-receiving layer comprising pigment and binder, with the ink-receiving layer having a rough texture specified by a surface roughness of at least 9.0 nullm when measured with a PARKER PRINT-SURF measurement device (PPS) under a soft packing condition of 5 kgf/cm2, a surface roughness of at least 7.0 nullm when measured with PPS under a soft packing condition of 10 kgf/cm2, a center-line average roughness (Ra) of at least 3.0 nullm and an Oken-type smoothness of at most 30 seconds, thereby creating an atmosphere of paintings or calligraphic works in the images printed thereon.
摘要翻译：一种喷墨记录材料，其在原纸的至少一个表面上具有包含颜料和粘合剂的至少一个油墨接受层，其中所述油墨接收层具有粗糙纹理，当测量时表面粗糙度为至少9.0μm 在5kgf / cm2的软包装条件下使用PARKER PRINT-SURF测量装置（PPS），当在10kgf / cm 2的软包装条件下用PPS测量时，表面粗糙度为至少7.0μm，中心线平均至少3.0μm的粗糙度（Ra）和至多30秒的欧肯型平滑度，从而在其上印刷的图像中形成绘画或书法作品的气氛。

4. 发明申请

US20030035966A1 Damper and process thereof 有权
标题翻译：阻尼器及其过程
公开(公告)号：US20030035966A1
公开(公告)日：2003-02-20
申请号：US09936538
申请日：2001-09-13
发明人： Seiichi Tagawa , Mikihito Ogawa
IPC分类号： B32B009/06
CPC分类号： F16F15/126 , F16F2226/02 , F16F2226/042 , F16H55/36 , F16H2055/366 , Y10T74/2131 , Y10T428/12 , Y10T428/12049 , Y10T428/12562 , Y10T428/21 , Y10T428/24355 , Y10T428/24405 , Y10T428/24413 , Y10T428/31663 , Y10T428/31696
摘要： A fitting type damper and a process thereof being capable of increasing largely slipping torque in strength are ones that the large slipping torque can be increased not only when the damper is a new product but also after a heat aging test and/or a durability test are performed. And, the damper is one that null-mercaptopropyltrimethoxysilane 4, which is an organosilane used as a non-slip agent, is adhered and fitted between a hub 1 formed by some metal parts and a rubber elastic body 3, and between a inertia mass body 2 formed by some metal parts and the rubber elastic body 3.
摘要翻译：能够大幅度提高强度的滑动扭矩的装配式阻尼器及其制造方法，不仅在阻尼器为新品时，而且在热老化试验和/或耐久试验之后也可以增大大滑动扭矩执行。并且，阻尼器是将作为防滑剂使用的有机硅烷的γ-巯基丙基三甲氧基硅烷4粘合并配合在由一些金属部件形成的轮毂1与橡胶弹性体3之间，并且配合在惯性质量体 2由一些金属部件和橡胶弹性体3形成。

5. 发明申请

US20030008505A1 Method to grow self-assembled epitaxial nanowires 失效
标题翻译：生长自组装外延纳米线的方法
公开(公告)号：US20030008505A1
公开(公告)日：2003-01-09
申请号：US10008058
申请日：2001-11-13
发明人： Yong Chen , R. Stanley Williams , Douglas A. A. Ohlberg
IPC分类号： H01L021/302 , B32B009/06 , B32B003/00 , B32B007/00 , H01L021/461 , B32B015/00 , B32B015/04
CPC分类号： C30B23/02 , C30B25/02 , C30B29/605 , Y10S977/763 , Y10T428/12674 , Y10T428/24802 , Y10T428/24917 , Y10T428/24942 , Y10T428/249921
摘要： Self-assembled nanowires are provided, comprising nanowires of a first crystalline composition formed on a substrate of a second crystalline composition. The two crystalline materials are characterized by an asymmetric lattice mismatch, in which in the interfacial plane between the two materials, the first material has a close lattice match (in any direction) with the second material and has a large lattice mismatch in all other major crystallographic directions with the second material. This allows the unrestricted growth of the epitaxial crystal in the first direction, but limits the width in the other. The nanowires are grown by first selecting the appropriate combination of materials that fulfill the foregoing criteria. The surface of the substrate on which the nanowires are to be formed must be cleaned in order (1) to ensure that the surface has an atomically flat, regular atomic structure on terraces and regular steps and (2) to remove impurities. Finally, epitaxial deposition of the first crystalline material on the cleaned surface is performed, thereby forming the self-assembled nanowires. Thus, one-dimensional epitaxial crystals are obtained with widths and heights at the nanometer scale, and lengths at the micrometer scale, which are aligned along certain crystallographic directions with high crystal quality.
摘要翻译：提供了自组装的纳米线，其包括在第二结晶组合物的基底上形成的第一晶体组合物的纳米线。两种结晶材料的特征在于不对称晶格失配，其中在两种材料之间的界面中，第一种材料与第二种材料具有紧密的晶格匹配（在任何方向上），并且在所有其它主要材料中具有大的晶格失配晶体方向与第二种材料。这允许外延晶体在第一方向上的不受限制的生长，但是限制另一方的宽度。通过首先选择满足上述标准的材料的适当组合来生长纳米线。要在其上形成纳米线的基板的表面必须按顺序（1）清洁，以确保表面在梯田和规则台阶上具有原子平坦的规则原子结构，和（2）去除杂质。最后，执行第一结晶材料在清洁表面上的外延沉积，从而形成自组装的纳米线。因此，以纳米级的宽度和高度获得一维外延晶体，并且以一定的晶体方向对准具有高晶体质量的微米尺度的长度。

6. 发明申请

US20020061648A1 Method for producing high quality heteroepitaxial growth using stress engineering and innovative substrates 审中-公开
标题翻译：使用应力工程和创新底物生产高品质异质外延生长的方法
公开(公告)号：US20020061648A1
公开(公告)日：2002-05-23
申请号：US09887666
申请日：2001-06-06
申请人： Nova Crystals Inc.
发明人： Yu-Hwa Lo , Felix Ejeckam
IPC分类号： H01L021/302 , B32B009/06 , H01L021/461 , B32B015/04
CPC分类号： H01L33/0066 , H01L21/02381 , H01L21/0245 , H01L21/02461 , H01L21/02505 , H01L21/02543 , H01L21/02546 , H01L31/1852 , Y02E10/544 , Y02P70/521 , Y10T428/12674 , Y10T428/12681
摘要： A method for producing a stress-engineered substrate includes selecting first and second materials for forming the substrate. An epitaxial material for forming a heteroepitaxial layer is then selected. If the lattice constant of the heteroepitaxial layer (aepi) is greater than that (asub) of the immediate substrate layer the epitaxial layer is deposited on, then the epitaxial layer is kept under nullcompressive stressnull (negative stress) at all temperatures of concern. On the other hand, if the lattice constant of the heteroepitaxial layer (aepi) is less than that (asub) of the immediate substrate layer the epitaxial layer is deposited on, then the epitaxial layer is kept under nulltensile stressnull (positive stress). The temperatures of concern range from the annealing temperature to the lowest temperature where dislocations are still mobile.
摘要翻译：用于生产应力工程衬底的方法包括选择用于形成衬底的第一和第二材料。然后选择用于形成异质外延层的外延材料。如果异质外延层（aepi）的晶格常数大于直立衬底层的（asub），则外延层被沉积，则外延层在所关注的所有温度下都保持在“压应力”（负应力）。另一方面，如果异质外延层（aepi）的晶格常数小于即刻衬底层的（asub），则沉积外延层，则外延层保持在“拉伸应力”（正应力）。关注的温度范围从退火温度到位错仍然移动的最低温度。

7. 发明申请

US20040242768A1 Silicone based flame retardant systems for textiles 失效
标题翻译：用于纺织品的硅酮基阻燃体系
公开(公告)号：US20040242768A1
公开(公告)日：2004-12-02
申请号：US10449893
申请日：2003-06-02
发明人： Matthew David Butts , Kathryn Ann Shaffer
IPC分类号： C08L083/04 , B05D003/02 , B32B009/06
CPC分类号： D06M15/6436 , C09D183/08 , D06M13/207 , D06M2101/06 , D06M2200/30 , Y10S8/01 , C08L2666/28
摘要： A silicone composition is provided which comprises at least one polysiloxane or siloxane oligomer functionalized with at least one amino group and at least three functional groups capable of cross-linking wherein the polysiloxane or siloxane oligomer imparts flame retardancy on a cellulose-containing substrate. Further embodiments of the present invention include a method for making and a cellulose-substrate comprising the aforementioned silicone composition.
摘要翻译：提供一种硅氧烷组合物，其包含至少一种具有至少一个氨基官能化的聚硅氧烷或硅氧烷低聚物和至少三个能够交联的官能团，其中所述聚硅氧烷或硅氧烷低聚物对含纤维素的基材赋予阻燃性。本发明的其它实施方案包括制备方法和包含上述有机硅组合物的纤维素基材。

8. 发明申请

US20040035822A1 Plated substrate for hard disk medium and manufacturing method thereof 失效
标题翻译：用于硬盘介质的镀覆基片及其制造方法
公开(公告)号：US20040035822A1
公开(公告)日：2004-02-26
申请号：US10646500
申请日：2003-08-22
发明人： Toshihiro Tsumori , Masatoshi Ishii , Naofumi Shinya , Yu Hamaguchi , Yukimi Jyoko
IPC分类号： B32B009/06
CPC分类号： G11B5/7315 , G11B5/8404 , Y10T428/12847 , Y10T428/12854 , Y10T428/12931
摘要： In plating on an Si substrate, it has been strongly demanded to apply a treatment for providing an excellent adhesion so as to resist a post-processing such as polishing and for facilitating plating. Then, provided is a plated substrate adapted for hard disk medium comprising an Si single crystal; an amorphous layer on the substrate, the amorphous layer having thickness of 2 to 200 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag; a multicrystal layer on the amorphous layer, the multicrystal layer having thickness of 5 to 1000 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag. Moreover, provided is a method for manufacturing a plated substrate adapted for hard disk medium comprising steps of applying a chemical etching treatment of a natural oxide film and a surface Si portion on an Si single crystal substrate; and forming a film on the etched surface of the substrate in a sulfate or hydrochloride bath containing no reductant within a pH range of 7.2 to 12.8 at liquid temperature of 70 to 100null C.
摘要翻译：在Si衬底上的电镀中，强烈要求施加用于提供优异的粘附性的处理，以便抵抗诸如抛光的后处理和便于电镀。然后，提供适于包含Si单晶的硬盘介质的电镀基板; 在所述基板上的非晶层，所述非晶层的厚度为2〜200nm，并且含有Si和选自Ni，Cu和Ag中的一种以上的金属; 在所述非晶层上的多晶层，所述多晶层的厚度为5〜1000nm，并含有Si和选自Ni，Cu和Ag中的一种以上的金属。此外，提供一种适用于硬盘介质的电镀基板的制造方法，包括以下步骤：在Si单晶基板上施加天然氧化膜和表面Si部分的化学蚀刻处理; 并在70至100℃的液体温度下，在7.2至12.8的pH范围内，在不含还原剂的硫酸盐或盐酸浴中，在基板的蚀刻表面上形成薄膜。

9. 发明申请

US20030129423A1 Method for the manufacture of electromagnetic radiation reflecting devices 有权
标题翻译：制造电磁辐射反射装置的方法
公开(公告)号：US20030129423A1
公开(公告)日：2003-07-10
申请号：US10295767
申请日：2002-11-14
发明人： Ubaldo Mastromatteo , Pietro Corona , Flavio Villa , Gabriele Barlocchi
IPC分类号： B44C001/22 , B32B009/06
CPC分类号： G11B7/1362 , G02B5/08 , G02B6/4214 , G11B7/123 , Y10T428/12528
摘要： Method for manufacturing electromagnetic radiation reflecting devices, said method comprising the steps of: a) providing a silicon substrate defined by at least one first free surface, b) forming on said first surface a layer of protective material provided with an opening which exposes a region of the first free surface, and c)etching the region of the free surface by means of an anisotropic agent to remove at least one portion of the substrate and define a second free surface of the substrate inclined in relation to said first surface. Furthermore, said first free surface is parallel to the crystalline planes null110null of silicon substrate and said step (c) comprises a progressing step of the anisotropic agent such that the second free surface resulting from the etching step is parallel to the planes null100null of said substrate.
摘要翻译：用于制造电磁辐射反射装置的方法，所述方法包括以下步骤：a）提供由至少一个第一自由表面限定的硅衬底，b）在所述第一表面上形成一层保护材料，所述保护材料层具有暴露区域的第一自由表面，以及c）借助于各向异性剂蚀刻所述自由表面的区域以去除所述衬底的至少一部分并且限定所述衬底相对于所述第一表面倾斜的第二自由表面。此外，所述第一自由表面平行于硅衬底的晶面{110}，并且所述步骤（c）包括各向异性剂的进行步骤，使得由蚀刻步骤产生的第二自由表面平行于平面{100 }。

10. 发明申请

US20030087073A1 Methods for producing pattern-forming body 失效
标题翻译：产生图案形成体的方法
公开(公告)号：US20030087073A1
公开(公告)日：2003-05-08
申请号：US10272096
申请日：2002-10-16
发明人： Hironori Kobayashi
IPC分类号： B05D003/02 , B32B003/00 , B32B009/06
CPC分类号： B82Y30/00 , Y10T428/24802 , Y10T428/24917 , Y10T428/31663
摘要： A method of producing a pattern-forming body with high accuracy with no need for a post-exposure treatment and without allowing any photocatalyst to remain in the resultant pattern-forming body and whereby any problematic effect of the photocatalyst in the pattern-forming body is eliminated. The method includes providing a photocatalyst-containing layer-sided substrate and a pattern-forming body substrate having a characteristic-changeable layer, which is changed by the effect of the photocatalyst in the photocatalyst-containing layer, and a light-shading part formed as a pattern in such a manner that the photocatalyst-containing layer and the characteristic-changeable layer are brought into contact with each other, followed by exposure on the side of the pattern-forming body substrate to change the characteristics of the characteristic-changeable layer of the exposed part, followed by removing the photocatalyst-containing layer-sided substrate.
摘要翻译：一种以高精度制造图案形成体的方法，不需要后曝光处理，并且不使任何光催化剂残留在所得图案形成体中，并且光催化剂在图案形成体中的任何问题的影响是消除了该方法包括提供含有光催化剂的层侧基板和具有特征变化层的图案形成体基板，其通过光催化剂层中的光催化剂的作用而改变，以及遮光部分形成为使含有光催化剂的层和特征可变层彼此接触的图案，然后在图案形成体基板的侧面曝光以改变特征可变层的特性曝光部分，然后除去含有光催化剂的层侧基板。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式